Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
02/2014
02/20/2014WO2014027484A1 Drawing device, exposure drawing device, drawing method, and recording medium whereon program is stored
02/20/2014WO2014027483A1 Drawing device, exposure drawing device, drawing method, and recording medium whereon program is stored
02/20/2014WO2014026704A1 Optical arrangement, optical module and a method for correctly positioning an optical module in a housing
02/20/2014WO2014026662A2 Method for optical transmission of a structure into a recording medium
02/20/2014WO2014026416A1 Color film developer
02/20/2014WO2014026368A1 Device and method for exposing liquid crystal display panel
02/20/2014WO2014005011A3 Positive-tone, chemically amplified, aqueous-developable, permanent dielectric
02/20/2014WO2013022573A8 Laminated flexographic printing sleeves and methods of making the same
02/20/2014US20140051814 Photosensitive Alkali-Soluble Resin, Method Of Preparing The Same, And Color Photosensitive Resist Containing The Same
02/20/2014US20140051027 Multiple Step Printing Methods for Microbarcodes
02/20/2014US20140051026 Patterning process and resist composition
02/20/2014US20140051025 Negative resist composition and patterning process
02/20/2014US20140051024 Fluorinated ester monomer, making method, fluorinated ester polymer, and difluorohydroxycarboxylic acid
02/20/2014US20140051017 Photosensitive resin composition and application thereof
02/20/2014US20140050900 Curable composition for imprints, pattern-forming method and pattern
02/20/2014US20140049764 Exposure apparatus, exposure method, device manufacturing method, and carrier method
02/20/2014US20140049763 Holding apparatus, exposure apparatus and manufacturing method of device
02/20/2014US20140049762 Two axis encoder head assembly
02/20/2014US20140049760 Lithographic printing system with placement corrections
02/20/2014US20140049759 Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method
02/20/2014US20140049758 Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method
02/20/2014US20140048754 Maintenance liquid
02/20/2014US20140048512 Composition for forming resist underlayer film and pattern-forming method
02/20/2014US20140048318 Composition, anti-oxide film including the same, electronic component including the anti-oxide film, and methods for forming the anti-oxide film and electronic component
02/20/2014US20140047992 Optimization of uv curing
02/19/2014EP2698670A1 Upper surface antireflective film forming composition and pattern forming method using same
02/19/2014EP2698669A1 Photosensitive organic particle
02/19/2014EP2698389A1 Photosensitive alkali-soluble resin, method of preparing the same, and color photosensitive resist containing the same
02/19/2014EP2697689A1 Lithography process
02/19/2014EP2697688A1 Facet mirror device
02/19/2014EP2697687A1 Process for producing three-dimensional structures
02/19/2014EP2697681A1 Spatially relaying radiation components
02/19/2014CN203445141U Impressing apparatus
02/19/2014CN203444239U Focal plane adjusting device
02/19/2014CN203444238U Automatic photo-sensitive emulsion coating machine for text screen printing plate
02/19/2014CN103597579A EUV lithography flare calculation and compensation
02/19/2014CN103597572A Charged particle system for processing a target surface
02/19/2014CN103597407A Photosensitive composition
02/19/2014CN103597404A Lithographic apparatus, programmable patterning device and lithographic method
02/19/2014CN103597381A Color filter, CCD sensor, CMOS sensor, organic CMOS sensor, and solid-state image sensor
02/19/2014CN103596770A Presensitized plate for lithographic printing and method for processing same
02/19/2014CN103594353A Inkjet printable etch resist
02/19/2014CN103592827A Method used for removing photoresist layer after high-dosage ion implantation
02/19/2014CN103592826A Raw bone meal rapid preparation of non-edible additive for special-purpose gelatin of jelly
02/19/2014CN103592825A Development apparatus for circuit board
02/19/2014CN103592824A Two-degree-of-freedom high-precision large-stroke air-bearing workpiece platform
02/19/2014CN103592823A Method for measuring grating position
02/19/2014CN103592822A Method for raising extreme ultraviolet radiation transfer efficiency and device
02/19/2014CN103592821A Novel LED (light-emitting diode) light source system for ultraviolet exposure machine
02/19/2014CN103592820A Apparatus and method for global leveling circle scan
02/19/2014CN103592819A Photosensitive resin composition, spacer formed thereby, protective film and liquid crystal display device
02/19/2014CN103592818A Positioning nanoimprint lithography system for preparation of patterned substrate by utilizing AFM (Atomic Force Microscope) probe
02/19/2014CN103592815A Mask plate, substrate and display device
02/19/2014CN103592727A LED-based photolithographic illuminator with high collection efficiency
02/19/2014CN103589193A Colored curable composition, color resist, color filter, method for producing the same, solid-state image sensor, and image display device
02/19/2014CN103587273A Photosensitive grain-free printing plate and manufacturing method and application thereof
02/19/2014CN103587272A Thermo-sensitive non-grain plate, manufacturing method for thermo-sensitive non-grain plate and application of thermo-sensitive non-grain plate
02/19/2014CN103583934A Inedible additive of special gelatin for jellies
02/19/2014CN102681363B Multi-stage exchange system and exchange method for multi-station silicon wafer stage
02/19/2014CN102590974B Position fine adjustment device and objective lens adopting same
02/19/2014CN102566287B Vertical direction control device and method for photoetching machine
02/19/2014CN102549023B Method for producing polybutadiene
02/19/2014CN102540752B Photoetching illumination system
02/19/2014CN102517247B Lattice-type three-dimensional cell culture support and its manufacturing method and use method
02/19/2014CN102486215B Gravity compensation device
02/19/2014CN102455247B Device and method for detecting optimal focal plane of projection objective
02/19/2014CN102455169B Zero-position sensor
02/19/2014CN102445149B Workpiece table position measuring device and measuring method
02/19/2014CN102402140B Alignment system
02/19/2014CN102393612B Double-rail double-drive-based three-beat double-workpiece bench exchange apparatus and method thereof
02/19/2014CN102200693B Illumination system and lithographic apparatus
02/19/2014CN102177230B Aqueous acidic formulations for copper oxide etch residue removal and prevention of copper electrodeposition
02/19/2014CN102096330B Lithographic apparatus and a device manufacturing method
02/19/2014CN102081308B Measuring device for wave aberration of projection objective and method thereof
02/19/2014CN102053502B Lithographic apparatus and patterning device
02/19/2014CN101833201B Method for marking sequence number of scanning lines
02/19/2014CN101540259B 磁控管 Magnetron
02/19/2014CN101454277B New materials for lithographic plates coatings, lithographic plates and coatings containing same, methods of preparation and use
02/18/2014US8654310 Exposure method, exposure apparatus, photomask and method for manufacturing photomask
02/18/2014US8654309 Fluid extraction system, lithographic apparatus and device manufacturing method
02/18/2014US8653491 System, method and apparatus for aligning and synchronizing target material for optimum extreme ultraviolet light output
02/18/2014US8653487 Lithography apparatus and lithography method
02/18/2014US8653153 Violet curable ink
02/18/2014US8652768 Nanopatterns by phase separation of patterned mixed polymer monolayers
02/18/2014US8652766 Manufacturing method of display device
02/18/2014US8652764 Method for manufacturing a piezoelectric membrane type device
02/18/2014US8652763 Method for fabricating dual damascene profiles using sub pixel-voting lithography and devices made by same
02/18/2014US8652762 Organic graded spin on BARC compositions for high NA lithography
02/18/2014US8652761 Photosensitive resin laminate and thermal processing of the same
02/18/2014US8652760 Printing plate precursor for laser engraving, printing plate, and method for producing printing plate
02/18/2014US8652759 Processing of lithographic printing plates with a developer solution containing a hydrophilic polymer
02/18/2014US8652758 Lithographic imaging and printing with printing members having fusible polymeric particles
02/18/2014US8652757 Method for forming resist underlayer film, patterning process using the same, and composition for the resist underlayer film
02/18/2014US8652755 Positive photosensitive resin composition and lyophobic film
02/18/2014US8652754 Resist composition and method for producing resist pattern
02/18/2014US8652753 Resist composition and method for producing resist pattern
02/18/2014US8652752 Sulphonium salt initiators
02/18/2014US8652751 Resist composition, method for forming resist pattern, and method for producing electronic device
02/18/2014US8652750 Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method
02/18/2014US8652749 Photoresist composition and method of forming pattern by using the same
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