| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 02/17/2005 | US20050037290 Simple, low cost formation of highly precise micropatterns; utilizing photoresist film and electroless deposition metal plating |
| 02/17/2005 | US20050037289 monomers that can be homopolymerized or copolymerized with other reactive components to make resins within sub-200 nanometer (nm) photoresist compositions |
| 02/17/2005 | US20050037288 Adjustment of printed circuit incline when imaging photolithographic patterns having asymmetrical configuration, |
| 02/17/2005 | US20050037287 Method for postbaking a lithographic printing plate |
| 02/17/2005 | US20050037286 Cationic polymerizable acrylate-type monomer with oxetane or 7-oxabicyclo(4.1.0)heptane group and amide-containing acrylate-type monomer; iron-arene complex polymerization initiator and binder; printing durability; antisoilants |
| 02/17/2005 | US20050037284 Resist composition |
| 02/17/2005 | US20050037283 An addition copolymer having at least one (meth)acrylic monomer with an adamantane ring on the side chain; patterns with improved transparency against short-wavelength light and dry etch resistance |
| 02/17/2005 | US20050037282 Support; image recording layer containing infrared radiation absorber,and initiator |
| 02/17/2005 | US20050037281 for preparation of a printed circuit board; pattern with high resolution and a tough tenting film |
| 02/17/2005 | US20050037278 Blck paste on radiation transparent glass substrate; exposure to actinic radiation; development |
| 02/17/2005 | US20050037276 Photoresists processable under biocompatible conditions for multi-biomolecule patterning |
| 02/17/2005 | US20050037275 Pattern forming method and wiring pattern forming method, and electro-optic device and electronic equipment |
| 02/17/2005 | US20050037272 Method and apparatus for manufacturing semiconductor |
| 02/17/2005 | US20050037271 For resist pattern; observation data such as electron microscopy is applied to model data created beforehand in accordance with the exposure conditions to estimate fluctuations in the exposure dose and the focal position |
| 02/17/2005 | US20050037270 Method for measuring overlay shift |
| 02/17/2005 | US20050037269 Determination defects; using laser beams |
| 02/17/2005 | US20050037268 Apparatus for measuring an exposure intensity on a wafer |
| 02/17/2005 | US20050037267 Illumination multilayer, vertical pattern through mask |
| 02/17/2005 | US20050037266 Combines laser cladding technique along with automated direct feedback control to achieve a good quality clad in terms of dimensional and metallurgical characteristics |
| 02/17/2005 | US20050036783 Pattern production system, exposure system, and exposure method |
| 02/17/2005 | US20050036213 Projection objectives including a plurality of mirrors with lenses ahead of mirror M3 |
| 02/17/2005 | US20050036201 Correction of birefringence in cubic crystalline optical systems |
| 02/17/2005 | US20050036184 Lithography apparatus for manufacture of integrated circuits |
| 02/17/2005 | US20050036183 Immersion fluid for immersion Lithography, and method of performing immersion lithography |
| 02/17/2005 | US20050036127 Aligning apparatus and its control method, and exposure apparatus |
| 02/17/2005 | US20050036125 System for laser beam expansion without expanding spatial coherence |
| 02/17/2005 | US20050036124 Scanning exposure technique |
| 02/17/2005 | US20050036123 Lithographic apparatus and device manufacturing method |
| 02/17/2005 | US20050036122 Evaluation mask, focus measuring method and aberration measuring method |
| 02/17/2005 | US20050036121 Lithographic apparatus and device manufacturing method |
| 02/17/2005 | US20050035983 Methods and apparatus for ink delivery to nanolithographic probe systems |
| 02/17/2005 | US20050035684 Positioning mechanism, exposure apparatus and device manufacturing method |
| 02/17/2005 | US20050035312 Arrangement for feeding or dissipating heat to/from a semiconductor substrate for the purpose of preparing or post-processing a lithographic projection step |
| 02/17/2005 | US20050035308 Pattern writing equipment |
| 02/17/2005 | US20050035307 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 02/17/2005 | US20050035306 Focused charged particle beam apparatus |
| 02/17/2005 | US20050035299 Lens array with a laterally movable optical axis for corpuscular rays |
| 02/17/2005 | US20050035290 Automatic methods for focus and astigmatism corrections in charged-particle beam instrument |
| 02/17/2005 | US20050034810 Mask and container and manufacturing apparatus |
| 02/17/2005 | US20050034744 Ashing photoresist pattern; srtripping residues; aqueous solution containing tetramethylammonium hydroxide |
| 02/17/2005 | DE10392464T5 Maskenmuster-Korrekturverfahren, Herstellungsverfahren einer Halbleitervorrichtung, Maskenherstellungsverfahren und Maske Mask pattern correction method, a semiconductor device manufacturing method, mask fabrication method and mask |
| 02/17/2005 | DE10336039A1 Positionierhilfe und Verfahren zur Unterstützung derAusrichtung von schweren Maschinen Positioning and procedures to support derAusrichtung of heavy machinery |
| 02/17/2005 | DE10331686A1 Verfahren zur Bewertung von aufgenommenen Bildern von Wafern Procedures for the evaluation of captured images of wafers |
| 02/17/2005 | DE10330456A1 Vorrichtung zum Erstellen einer Oberflächenstruktur auf einem Wafer Apparatus for creating a surface structure on a wafer |
| 02/17/2005 | DE10329325A1 Structuring treatment of surface with edge, on which protection layer is deposited and then removed by etching together with edge |
| 02/17/2005 | CA2532440A1 Photocrosslinkable polyurethanes |
| 02/16/2005 | EP1507286A2 Formation process under a thin layer of a first material from portions of another material and/or from vacuum gaps |
| 02/16/2005 | EP1507173A1 Lithographic apparatus and apparatus adjustment method |
| 02/16/2005 | EP1507172A1 Lithographic apparatus and apparatus adjustment method |
| 02/16/2005 | EP1507171A2 Light-Sensitive sheet comprising support, first and second light-sensitive layers and barrier layer |
| 02/16/2005 | EP1507170A2 Polymerizable composition and image-recording material using the same |
| 02/16/2005 | EP1507169A1 Photosensitive thick-film paste materials for forming light-transmitting electromagnetic shields, light-transmitting electromagnetic shields formed using the same, and method of manufacture thereof |
| 02/16/2005 | EP1507168A2 Developer exit tank for immersion type printing plate processor |
| 02/16/2005 | EP1506983A2 Copolymers useful for the preparation of thermal digital lithographic printing plates |
| 02/16/2005 | EP1506855A2 Lithographic printing plate precursor and lithographic printing method |
| 02/16/2005 | EP1506854A1 Method for postbaking a lithographic printing plate |
| 02/16/2005 | EP1506456A1 Radiation filter element and manufacturing processes therefore |
| 02/16/2005 | EP1506455A2 Method for the targeted deformation of an optical element |
| 02/16/2005 | EP1506454A2 Sensitized chemically amplified photoresist for use in photomask fabrication and semiconductor processing |
| 02/16/2005 | EP1055251A4 Large area silent discharge excitation radiator |
| 02/16/2005 | CN1582417A Agent for forming coating for narrowing pattern and method for forming fine pattern using the same |
| 02/16/2005 | CN1582416A Photosensitive film and photosensitive composition for printed wiring board and production processes |
| 02/16/2005 | CN1582415A Photosensitive ceramics composition and method for making multi-layer substrate using it |
| 02/16/2005 | CN1582414A Composition having permitivity being radiation-sensitively changeable and method for forming permitivity pattern |
| 02/16/2005 | CN1582407A Improved method and apparatus using an slm |
| 02/16/2005 | CN1582267A Novel difunctional photoinitiators |
| 02/16/2005 | CN1582202A Nozzle device and substrate treating apparatus having using the device |
| 02/16/2005 | CN1582094A Figure-forming method and wire-layout figure forming method and photoelectronic device |
| 02/16/2005 | CN1582093A Figure-forming method and wire-layout figure forming method, photoelectronic device and electronic apparatus |
| 02/16/2005 | CN1582091A Method for forming store grid cofferdam and pattern , photoelectronic device and electronic machine |
| 02/16/2005 | CN1582090A Method for making circuit substrate |
| 02/16/2005 | CN1581651A Reacting force treating system of operation table device |
| 02/16/2005 | CN1581499A Method for making solid camera device |
| 02/16/2005 | CN1581437A Optical mask, method for making figure and method for making semiconductor device |
| 02/16/2005 | CN1581436A Method for forming corrosion-resisting pattern and distribution pattern, and method for making semiconductor device |
| 02/16/2005 | CN1581434A Design of pivture, optical mask and photoetching colloid figure, and method for making smiconductor device |
| 02/16/2005 | CN1581432A Processing method and method for making semiconductor device |
| 02/16/2005 | CN1581402A Array type filter for colour picture tube exposure platform |
| 02/16/2005 | CN1580959A Diluent composition for removing photosensitive resin |
| 02/16/2005 | CN1580958A Modulation of exposure duration and/or power to achieve gray-scaling in maskless photolithography |
| 02/16/2005 | CN1580956A Lithographic apparatus and apparatus adjustment method |
| 02/16/2005 | CN1580955A Charged particle beam exposure method and apparatus and device manufacturing method using the apparatus |
| 02/16/2005 | CN1580954A Photosensitive resin composition and transparent material for colour filter made therefrom |
| 02/16/2005 | CN1580953A Light-sensitive transfer sheet, light-sensitive layers, picture pattern forming method and layout pattern forming method |
| 02/16/2005 | CN1580952A Light guide board module core manufacturing method |
| 02/16/2005 | CN1580951A Method for manufacturing light guide board module core |
| 02/16/2005 | CN1580950A Pattern production system, exposure system, and exposure method |
| 02/16/2005 | CN1580865A Beam homogenizing device, laser radiating device and method for making semiconductor device |
| 02/16/2005 | CN1580864A 曝光头 Exposure head |
| 02/16/2005 | CN1580835A 感光性树脂组成物 The photosensitive resin composition |
| 02/16/2005 | CN1580221A Stripping and cleaning compositions for microelectronics |
| 02/16/2005 | CN1579893A Positive PS plate vacuum package |
| 02/16/2005 | CN1579816A Method for manufacturing coloured copperplate etching |
| 02/16/2005 | CN1579804A 平版印刷版前体和平版印刷方法 Lithographic printing plate precursor and lithographic methods |
| 02/16/2005 | CN1189932C Detection method of electric defect in inner conduting layer of tested area |
| 02/16/2005 | CN1189794C Improved pattern generator |
| 02/16/2005 | CN1189793C Dry film photoresist |
| 02/16/2005 | CN1189792C Photoresist composition and its structure and forming method |
| 02/16/2005 | CN1189791C Production process of photoresist composite and production process of semiconductor element with the composite |
| 02/16/2005 | CN1189330C Imaging media containing heat developable photosensitive microcapsule |