| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 02/23/2005 | EP1508833A2 Hologram recording material composition, hologram recording material and hologram recording method |
| 02/23/2005 | EP1508772A1 Measuring a diffracting structure, broadband, polarized, ellipsometric |
| 02/23/2005 | EP1508597A1 Curable composition, negative type color filter and method of producing the same |
| 02/23/2005 | EP1508453A2 Method of forming metal fine particle pattern and method of forming electroconductive pattern |
| 02/23/2005 | EP1508440A2 Lithographic printing process |
| 02/23/2005 | EP1508157A2 High efficiency solid-state light source and methods of use and manufacture |
| 02/23/2005 | EP1508144A1 Holographic data storage media comprising an aluminum salt compound and an asymmetric acrylate compound |
| 02/23/2005 | EP1508073A2 Method for determining wavefront aberrations |
| 02/23/2005 | EP1508072A2 Acid generating agents and their use in processes for imaging radiation-sensitive elements |
| 02/23/2005 | EP1508071A1 Radiation-sensitive compositions containing polymeric sulfonate acid generators and their use in imaging |
| 02/23/2005 | EP1508070A2 Method for producing photoresist masks for structuring semiconductor substrates by means of optical lithography |
| 02/23/2005 | EP1277085A4 Method for measuring diffusion of photogenerated catalyst in chemically amplified resists |
| 02/23/2005 | EP1066506A4 Method and apparatus for synthesis of arrays of dna probes |
| 02/23/2005 | CN1585914A Chemical rinse composition |
| 02/23/2005 | CN1585908A Graphics engine for high precision lithography |
| 02/23/2005 | CN1585782A Preparation of homo-, co- and terpolymers of substituted styrenes |
| 02/23/2005 | CN1585097A Antireflective hardmask and uses thereof |
| 02/23/2005 | CN1585040A Photosensitive electric conductive composition and plasma display panel |
| 02/23/2005 | CN1584745A Projection exposure device |
| 02/23/2005 | CN1584744A Substrate type developing device |
| 02/23/2005 | CN1584742A Positive light sensitive resin composition |
| 02/23/2005 | CN1584741A Light sensitive resin composition for gap |
| 02/23/2005 | CN1584740A Photoresist polymer and photoresist composition containing the same |
| 02/23/2005 | CN1584739A Planographic printing plate material and planographic printing plate preparing process |
| 02/23/2005 | CN1584714A Method for preparing semi-transparent and semi-reflective thin-film transistor liquid-crystal displaying device |
| 02/23/2005 | CN1584632A Optical guiding panel and its preparation and background module therewith |
| 02/23/2005 | CN1584631A Dye-containing resist composition and color filter using same |
| 02/23/2005 | CN1584536A Device for specific research on polarization, optical image system and its calibration |
| 02/23/2005 | CN1583543A Method for integral micromachining multilayer composite structure |
| 02/23/2005 | CN1583424A Stone products with color images and producing method thereof |
| 02/23/2005 | CN1190706C Chemical intensified positive photoresist composite |
| 02/23/2005 | CN1190705C Optical imageadable composite with improved flexibility |
| 02/23/2005 | CN1190704C Two-sided imaging material |
| 02/22/2005 | US6859515 Illumination system, particularly for EUV lithography |
| 02/22/2005 | US6859337 Optical-element mountings exhibiting reduced deformation of optical elements held thereby |
| 02/22/2005 | US6859328 Illumination system particularly for microlithography |
| 02/22/2005 | US6859265 Stage device, method of controlling same, and exposure apparatus |
| 02/22/2005 | US6859264 Projection exposure apparatus having aberration measurement device |
| 02/22/2005 | US6859263 Apparatus for generating partially coherent radiation |
| 02/22/2005 | US6859261 Lithography exposure device |
| 02/22/2005 | US6859260 Method and system for improving focus accuracy in a lithography system |
| 02/22/2005 | US6859259 Lithographic projection apparatus and reflector assembly for use therein |
| 02/22/2005 | US6859257 Stage system |
| 02/22/2005 | US6859223 Pattern writing apparatus and pattern writing method |
| 02/22/2005 | US6858948 Substrate provided with an alignment mark in a substantially transmissive process layer, mask for exposing said mark, device manufacturing method, and device manufactured thereby |
| 02/22/2005 | US6858853 Illumination system particularly for microlithography |
| 02/22/2005 | US6858760 Fluorine-containing cyclic compounds, fluorine-containing polymerizable monomers, fluorine-containing polymers resist compositions and patterning method |
| 02/22/2005 | US6858542 Semiconductor fabrication method for making small features |
| 02/22/2005 | US6858445 Method for adjusting the overlay of two mask planes in a photolithographic process for the production of an integrated circuit |
| 02/22/2005 | US6858379 Photoresist compositions for short wavelength imaging |
| 02/22/2005 | US6858378 Photoimageable composition |
| 02/22/2005 | US6858376 Process for structuring a photoresist layer on a semiconductor substrate |
| 02/22/2005 | US6858375 Method for forming resist pattern |
| 02/22/2005 | US6858374 Photosensitive layer containing an infrared ray absorber; onium salt; radically polymerizable compound; binder polymer; and organic dye or the precursor thereof capable of undergoing change in color tone upon exposure. |
| 02/22/2005 | US6858373 Monomers having an alpha -hetero- substituted methylacryl group |
| 02/22/2005 | US6858372 For use in photolithography |
| 02/22/2005 | US6858371 Maleimide-photoresist monomers containing halogen, polymers thereof and photoresist compositions comprising the same |
| 02/22/2005 | US6858370 Positive photosensitive composition |
| 02/22/2005 | US6858361 Controlling critical dimensions (CDs) of features formed on the semiconductor substrate through feedback and fee-forward of information gathering during in-process inspection of the feature |
| 02/22/2005 | US6858359 Scuff resistance |
| 02/22/2005 | US6858358 Photosensitive transfer material comprising thermoplastic resin layer and intermediate layer each having specified surface potential, and method for producing color filter |
| 02/22/2005 | US6858357 Attenuated embedded phase shift photomask blanks |
| 02/22/2005 | US6858260 Irradiation crosslinking a mixture of an epoxy compound, polyol like a polyetherpolyol or a polyesterpolyol, and a photoinitiator and applying the exposed composition onto a substrate thereby forming a coating upon the substrate. |
| 02/22/2005 | US6858088 Method and apparatus for treating substrates |
| 02/22/2005 | US6857795 Developing apparatus and method for developing organic electroluminescent display panels |
| 02/22/2005 | US6857764 Illumination optical system and exposure apparatus having the same |
| 02/22/2005 | US6857543 Low volume dispense unit and method of using |
| 02/17/2005 | WO2005015962A2 Plasma radiation source and device for creating a gas curtain for plasma radiation sources |
| 02/17/2005 | WO2005015699A1 Two-stage laser pulse energy control device and two-stage laser system |
| 02/17/2005 | WO2005015628A1 Plasma processing device and ashing method |
| 02/17/2005 | WO2005015616A1 Electronic beam exposure device and exposure method |
| 02/17/2005 | WO2005015615A1 Exposure method and exposure apparatus, stage unit, and device manufacturing method |
| 02/17/2005 | WO2005015318A1 Apparatus and method for treating imaging materials |
| 02/17/2005 | WO2005015317A1 Pattern exposing system and pattern exposing method |
| 02/17/2005 | WO2005015316A2 Projection objective for microlithography |
| 02/17/2005 | WO2005015315A2 Microlithographic projection exposure system, and method for introducing an immersion liquid into an immersion chamber |
| 02/17/2005 | WO2005015314A2 An illumination system for microlithography |
| 02/17/2005 | WO2005015313A1 Illumination mask for range-resolved detection of scattered light |
| 02/17/2005 | WO2005015312A2 Method for determining optimal resist thickness |
| 02/17/2005 | WO2005015311A2 Near-field exposure method and apparatus, near-field exposure mask, and device manufacturing method |
| 02/17/2005 | WO2005015310A2 Illumination system for a microlithographic projection exposure apparatus |
| 02/17/2005 | WO2005015309A2 Alkali-developable radiation curable composition |
| 02/17/2005 | WO2005015283A1 Projection objectives including a plurality of curved mirrors with lenses ahead of the last but one mirror |
| 02/17/2005 | WO2005014745A1 Liquid-repellent, alkali-resistant coating composition and coating suitable for pattern forming |
| 02/17/2005 | WO2005014686A1 Photo-curable resin composition and sealing agent for flat panel display using the same |
| 02/17/2005 | WO2005014682A1 Photocrosslinkable polyurethanes |
| 02/17/2005 | WO2005014515A2 Clear photopolymerizable systems for the preparation of high thickness coatings |
| 02/17/2005 | WO2004107056B1 Compositions suitable for removing photoresist, photoresist byproducts and etching residue, and use thereof |
| 02/17/2005 | WO2004090600A3 Catadioptric projection objective |
| 02/17/2005 | WO2003094582A3 A system and method for manufacturing printed circuit boards employing non-uniformly modified images |
| 02/17/2005 | WO2003087938A3 Plasma polymerized electron beam resist |
| 02/17/2005 | WO2003076978A3 Compensator for radially symmetric birefringence |
| 02/17/2005 | WO2003075099A8 Method and system for overlay measurement |
| 02/17/2005 | US20050038618 Substrate inspecting device, coating/developing device and substrate inspecting method |
| 02/17/2005 | US20050038261 Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition |
| 02/17/2005 | US20050038216 Silicon-containing polymer, process for its production, resist composition employing it, pattern-forming method and electronic device fabrication method |
| 02/17/2005 | US20050038180 Adding space grade encapsulant to curing agent, mixing fumed silica therein, then de-airing; for replicating sub-micron feature size patterns |
| 02/17/2005 | US20050037603 Method for forming, under a thin layer of a first material, portions of another material and/or empty areas |
| 02/17/2005 | US20050037293 Imaging printing plate having a coating containinga diazo compound; exposure to infrared radiation; development |
| 02/17/2005 | US20050037291 Method for forming fine resist pattern |