| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 03/01/2005 | US6861209 Method to enhance resolution of a chemically amplified photoresist |
| 03/01/2005 | US6861208 Fullerene addition in photoresist via incorporation in the developer |
| 03/01/2005 | US6861206 Creating layer on the substrate, modifying to chemically neutralize the surface, creating an acid forming photoresist layer, exposing to light and removing the acid containing region with a lye |
| 03/01/2005 | US6861204 Design and layout of phase shifting photolithographic masks |
| 03/01/2005 | US6861202 Exposing to laser light, developing with a developer containing an alkali metal silicate and carrying out post-exposure treatment |
| 03/01/2005 | US6861201 Near IR sensitive photoimageable/photopolymerizable compositions, media, and associated processes |
| 03/01/2005 | US6861200 Suitable for image-drawing with a laser light; (meth)acrylic acid ester imparts alkali developability to binder |
| 03/01/2005 | US6861199 Photoresist composition |
| 03/01/2005 | US6861198 Negative resist material and pattern formation method using the same |
| 03/01/2005 | US6861197 Polymers, resist compositions and patterning process |
| 03/01/2005 | US6861196 Photosensitive compositions having mixtures of alkoxy and non-alkoxy diazonium salt containing compounds |
| 03/01/2005 | US6861187 Methods and devices for evaluating imaging characteristics of a charged-particle-beam microlithography system |
| 03/01/2005 | US6861186 Method for backside alignment of photo-processes using standard front side alignment tools |
| 03/01/2005 | US6861185 Method of manufacturing color filter, color filter, and display |
| 03/01/2005 | US6861182 Tri-tone attenuated phase shift trim mask for double exposure alternating phase shift mask process |
| 03/01/2005 | US6861180 Contact printing as second exposure of double exposure attenuated phase shift mask process |
| 03/01/2005 | US6861178 Phase shift mask, method of exposure, and method of producing semiconductor device |
| 03/01/2005 | US6861007 Contacting the substrate with a solution of ozone, water, and a surfactant to form a self-limiting oxide layer on the exposed oxidizable material. |
| 03/01/2005 | US6860956 Methods of creating patterns on substrates and articles of manufacture resulting therefrom |
| 03/01/2005 | US6860610 Reflection type projection optical system, exposure apparatus and device fabrication method using the same |
| 03/01/2005 | US6860204 Image exposure apparatus |
| 02/24/2005 | WO2005017983A2 Plasma ashing process |
| 02/24/2005 | WO2005017785A1 Method for creating patterns for producing integrated circuits |
| 02/24/2005 | WO2005017627A1 Method for etching a patterned silicone layyer |
| 02/24/2005 | WO2005017626A2 Group iia metal fluoride single crystals for lithography below 200 nm and method for selecting such crystals |
| 02/24/2005 | WO2005017625A2 Method and apparatus for monitoring and controlling imaging in immersion lithography systems |
| 02/24/2005 | WO2005017624A1 Filter for retaining a substance originating from a radiation source and method for the manufacture of the same |
| 02/24/2005 | WO2005017623A2 $m(c)method for producing inclined flank patterns by photolithography |
| 02/24/2005 | WO2005017622A1 Device for mounting an optical element, particularly a lens in an objective |
| 02/24/2005 | WO2005017621A1 Method of producing phase shift masks |
| 02/24/2005 | WO2005017620A2 Illumination device and polariser for a microlithographic projection exposure installation |
| 02/24/2005 | WO2005017604A1 Coherence reducer |
| 02/24/2005 | WO2005017483A1 Illuminant distribution evaluating method, optical member manufacturing method, illumination optical device, exposure apparatus, and exposure method |
| 02/24/2005 | WO2005017449A1 Compensation for errors in off-axis interferometric measurements |
| 02/24/2005 | WO2005016982A1 Resin for resist, positive resist composition, and method of forming resist pattern |
| 02/24/2005 | WO2005016645A1 Heat-sensitive positive working lithogaphic printing plate precursor |
| 02/24/2005 | WO2004106431A3 Curable polymer compound |
| 02/24/2005 | WO2004102273A3 Lighting system comprising an axicon module |
| 02/24/2005 | WO2004093160A3 Run-off path to collect liquid for an immersion lithography apparatus |
| 02/24/2005 | WO2004077160A3 Method of controlling the differential dissolution rate of photoresist compositions |
| 02/24/2005 | WO2004014960A3 Fluorinated monomers, fluorinated polymers having polycyclic groups with fused 4-membered heterocyclic rings, useful as photoresists, and processes for microlithography |
| 02/24/2005 | US20050043834 Method of adaptive interactive learning control and a lithographic manufacturing process and apparatus employing such a method |
| 02/24/2005 | US20050043452 Colorant-containing curable composition, color filter and method of producing the same |
| 02/24/2005 | US20050043173 Comprises infrared absorbent and acrylic amide homopolymer/copolymer; improved film-formability and strength; for recording layer of planographic printing plate precursor having wide development latitude and excellent scratch resistance |
| 02/24/2005 | US20050042958 Comprises thermoset resin layer having porosity and pressure-sensitive adhesive layer comprising a thermoplastic resin; tack-free |
| 02/24/2005 | US20050042797 Method and apparatus for manufacturing color filter |
| 02/24/2005 | US20050042780 Integrated circuit identification |
| 02/24/2005 | US20050042555 Coating and developing apparatus and pattern forming method |
| 02/24/2005 | US20050042554 Lithographic apparatus, device manufacturing method and a substrate |
| 02/24/2005 | US20050042553 Durable coating with low surface energy, extend phototool (mask) service life by reducing cleaning requirements, improves circuit making yield |
| 02/24/2005 | US20050042552 Method for manipulating the topography of a film surface |
| 02/24/2005 | US20050042550 Improved light-receiving sensitivity; insulating films; photomasks; etching planarized silicon nitride films |
| 02/24/2005 | US20050042547 Carl for bioelectronics:substrate linkage using a conductive layer |
| 02/24/2005 | US20050042544 Acid generating agent which is an iodonium salt with a fluoroalkyl sulfonate ion; interpolymer of vinylphenol, styrene and an alkyl (meth)acrylate; solubility-reducing group capable of being eliminated by acid |
| 02/24/2005 | US20050042543 Positive photoresist composition and pattern making method using the same |
| 02/24/2005 | US20050042542 Novel photosensitive bilayer composition |
| 02/24/2005 | US20050042541 Positive resist composition and method of forming resist pattern |
| 02/24/2005 | US20050042540 CoPOLYMER OF VINYLPHENOL AND a monocyclic or polycyclic (METH)ACRYLATE ester, and bisalkylsulfonyldiazomethanes ACID GENERAtor; improve alkali SOLUBILITY; improve in resolution, prevent pattern collapse; photolithography in production of semiconductors |
| 02/24/2005 | US20050042539 Without volatilization of any chemical substances from the polymers; monomers are methacrylate or norbornene esters of 2-hydroxy-8-substituted-perhydrocyclpenta(b)naphth(2,1-d)oxepin-6-one |
| 02/24/2005 | US20050042538 Antireflective hardmask and uses thereof |
| 02/24/2005 | US20050042536 Photosensitive resin composition comprising quinonediazide sulfate ester compound |
| 02/24/2005 | US20050042530 Curable composition, negative type color filter and method of producing the same |
| 02/24/2005 | US20050042529 Box-in-box field-to-field alignment structure |
| 02/24/2005 | US20050042526 Photomask blank and method of fabricating a photomask from the same |
| 02/24/2005 | US20050042525 Reticle, semiconductor exposure apparatus and method, and semiconductor device manufacturing method |
| 02/24/2005 | US20050042430 Pattern forming method, wiring pattern forming method, electro-optical device, and electronic apparatus |
| 02/24/2005 | US20050042385 Photocatalyst on radiation transparent substrate; multicolor; ink repellent convex segment on edge of picture element |
| 02/24/2005 | US20050042365 In-line deposition processes for circuit fabrication |
| 02/24/2005 | US20050042140 Sensor for determining radiated energy and use thereof |
| 02/24/2005 | US20050041701 Laser spectral engineering for lithographic process |
| 02/24/2005 | US20050041258 Optical scatterometry of asymmetric lines and structures |
| 02/24/2005 | US20050041256 Method and system to detect an alignment mark |
| 02/24/2005 | US20050041235 Exposure apparatus, method of controlling same, and method of manufacturing devices |
| 02/24/2005 | US20050041234 Substrate holder and device manufacturing method |
| 02/24/2005 | US20050041233 Lithographic apparatus and device manufacturing method |
| 02/24/2005 | US20050041232 Polarizer, projection lens system, exposure apparatus and exposing method |
| 02/24/2005 | US20050041231 Illumination system with spatially controllable partial coherence compensating for line width variances |
| 02/24/2005 | US20050041230 Projection exposure device |
| 02/24/2005 | US20050041229 Continuous direct-write optical lithography |
| 02/24/2005 | US20050041228 Method and apparatus for irradiating a microlithographic substrate |
| 02/24/2005 | US20050041227 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 02/24/2005 | US20050041226 Method and device for exposure control, method and device for exposure, and method of manufacture of device |
| 02/24/2005 | US20050041225 Lithographic apparatus and device manufacturing method |
| 02/24/2005 | US20050040562 Nanoparticle-filled stereolithographic resins |
| 02/24/2005 | US20050040545 Substrate provided with an alignment mark in a substantially transmissive process layer, mask for exposing said mark, device manufacturing method, and device manufactured thereby |
| 02/24/2005 | US20050040347 Method and device for the generation of far ultraviolet or soft x-ray radiation |
| 02/24/2005 | US20050040344 Method for generating backscattering intensity on the basis of lower layer structure in charged particle beam exposure, and method for fabricating semiconductor device utilizing this method |
| 02/24/2005 | US20050040343 Electron beam writing equipment and electron beam writing method |
| 02/24/2005 | US20050040137 Low-aberration deflectors for use in charged-particle-beam optical systems, and methods for fabricating such deflectors |
| 02/24/2005 | US20050039620 Lithographic printing process |
| 02/24/2005 | US20050039618 Stamp having an antisticking layer and a method of forming of repairing such a stamp |
| 02/24/2005 | DE19837037B4 Retikel, Belichtungsverfahren, Belichtungsgerät und Halbleitervorrichtung Reticle, exposure methods, exposure apparatus and semiconductor device |
| 02/24/2005 | DE10329644A1 Anordnung zum Zu-oder Abführen von Wärme zu/von einem Halbleitersubstrat zur Vorbereitung oder Nachbearbeitung eines lithographischen Projektionsschrittes Arrangement for supply or removal of heat to / from a semiconductor substrate in preparation or post a lithographic projection step |
| 02/24/2005 | DE102004029077A1 Removing photoresist from substrate involves treating photoresist with supercritical carbon dioxide, treating photoresist with ozone-based reactant and removing the photoresist with deionized water |
| 02/24/2005 | DE102004021151A1 Verfahren zum Reduzieren von Ungleichförmigkeit und Bildverkürzung in einem auf ein Substrat belichteten Bild unter Verwendung einer photolithographischen Maske, und photolithographische Maske A method for reducing non-uniformity and image shortening in an exposed image on a substrate using a photolithographic mask, and photolithographic mask |
| 02/23/2005 | EP1508838A2 Positive photoresist composition and pattern making method using the same |
| 02/23/2005 | EP1508837A1 Photosensitive resin composition and method for preparing heat-resistant resin film |
| 02/23/2005 | EP1508836A2 Planographic printing plate material and planographic printing plate preparing process |
| 02/23/2005 | EP1508835A2 Dye-containing resist composition and color filter using same |
| 02/23/2005 | EP1508834A2 Nanoparticle-filled stereolithographic resins |