Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
03/2005
03/03/2005US20050048220 Lithographic apparatus and device manufacturing method
03/03/2005US20050048208 Resist supply apparatus with resist recycling function, coating system having the same and method of resist recycling
03/03/2005US20050047543 Method and apparatus for personalization of semiconductor
03/03/2005US20050046945 Diffractive optical element, illumination system comprising the same, and method of manufacturing semiconductor device using illumination system
03/03/2005US20050046934 Method and system for drying a substrate
03/03/2005US20050046915 Hologram recording material composition, hologram recording material and hologram recording method
03/03/2005US20050046856 Gas discharge mopa laser spectral analysis module
03/03/2005US20050046855 Interference scatterometer
03/03/2005US20050046846 Lithography alignment
03/03/2005US20050046845 System and method of measurement, system and method of alignment, lithographic apparatus and method
03/03/2005US20050046820 Bearing arrangement for reaction mass in a controlled environment
03/03/2005US20050046819 Maskless lithography systems and methods utilizing spatial light modulator arrays
03/03/2005US20050046816 Multiple mask step and scan aligner
03/03/2005US20050046815 Supporting structure of optical element, exposure apparatus having the same, and manufacturing method of semiconductor device
03/03/2005US20050046813 Lithographic apparatus and device manufacturing method
03/03/2005US20050046326 Cathode with improved work function and method for making the same
03/03/2005US20050046105 Slip sheet capture mechanism and method of operation
03/03/2005US20050046068 Color filter manufacturing method for a plastic substrate
03/03/2005US20050045997 Method for producing self-aligned mask, articles produced by same and composition for same
03/03/2005US20050045836 Dual-mode electron beam lithography machine
03/03/2005US20050045590 FRAM capacitor stack clean
03/03/2005US20050045268 Method for manufacturing ceramic green sheet and method for manufacturing electronic part using that ceramic green sheet
03/03/2005US20050045262 Attaching a pellicle frame to a reticle
03/03/2005US20050045206 Post-etch clean process for porous low dielectric constant materials
03/03/2005US20050044802 Hermetically sealable housing and enclosed getter material; protecting laser from ultraviolet radiation pitting damage
03/03/2005DE19600427B4 Verfahren zum Ausrichten und Markieren eines Wafers A method for aligning and marking a wafer
03/03/2005DE10392337T5 Verfahren zum Herstellen einer orientierten Vorform aus einem Fluoridkristall A method of manufacturing an oriented preform of a fluoride crystal
03/03/2005DE10354181A1 Production of optically active micro-structures, e.g. lenses, comprises mechanically forming an optically active surface topography on a substrate, masking the topography by photolithography, and smoothing by etching
03/03/2005DE10335982A1 Checking method for imaging characteristics of photomask used for microelectronic circuit manufacture using ultra-violet imaging of mask onto photoelectric converter
03/03/2005DE10335816A1 Method for adjusting substrate, e.g. semiconductor wafer, prior to projection in exposure appliance, using two planes on test substrate for two subsequently exposed planes
03/03/2005DE10335670A1 Kohärenzminderer Coherence-reducing
03/03/2005DE102004050004A1 Microlithographic projection appliance with projection light generating exposure unit with different exposure angle distribution and catadioptric projection objective lens for imaging reticle in objective lens
03/03/2005DE102004036747A1 Fabrication of semiconductor device by forming passivation layer on circuit element, patterning passivation layer, forming photosensitive layer and photoresist layer, and removing photoresist layer and exposed region of photosensitive layer
03/03/2005DE102004032524A1 Elektronenstrahl-Lithographievorrichtung mit zwei Betriebsarten Electron beam lithography apparatus having two operating modes
03/03/2005DE102004024924A1 Verfahren zum Herstellen polykristallinen Siliciums sowie Schaltbauteil unter Verwendung polykristallinen Siliciums A method for producing polycrystalline silicon as well as switching device using polycrystalline silicon
03/03/2005DE102004008378A1 Optisches Nähenkorrekturverfahren Optical proximity correction method
03/03/2005DE10044199B4 Ablenkanordnung und Projektionssystem für geladene Teilchen Deflection device and projection system for charged particles
03/03/2005CA2536520A1 Precursor paste and method of producing the same
03/03/2005CA2536159A1 Stripping and cleaning compositions for microelectronics
03/02/2005EP1511072A2 Post-etch clean process for porous low dielectric constant materials
03/02/2005EP1511026A2 Method for manufacturing a master of an optical information recording medium, method for forming a pattern, a mater, a stamper, an optical information recording medium and a resist
03/02/2005EP1510872A2 Lithographic apparatus and device manufacturing method
03/02/2005EP1510871A2 Lithographic apparatus and device manufacturing method
03/02/2005EP1510870A1 Lithographic apparatus and device manufacturing method
03/02/2005EP1510869A2 Lithographic apparatus, device manufacturing method, and device manufactured thereby
03/02/2005EP1510868A1 Lithographic apparatus and device manufacturing method
03/02/2005EP1510867A1 Lithographic apparatus and device manufacturing method
03/02/2005EP1510866A2 Image recording material and planographic printing plate
03/02/2005EP1510865A2 Photopolymerizable composition and image recording material
03/02/2005EP1510864A2 Merged-mask micro-machining process
03/02/2005EP1510863A2 Mask and method of fabricating the same, and method of machining material
03/02/2005EP1510862A2 Hologram recording method and hologram recording material
03/02/2005EP1510861A1 Method for patterning organic materials or combinations of organic and inorganic materials
03/02/2005EP1510481A2 Slip sheet capture mechanism and method of operation
03/02/2005EP1509816A2 Electrostatically driven lithography
03/02/2005EP1509815A1 Photosensitive lacquer for providing a coating on a semiconductor substrate or a mask
03/02/2005EP1509814A2 Acetal protected polymers and photoresists compositions thereof
03/02/2005EP1509560A1 Actinic radiation curable compositions and their use
03/02/2005EP1509490A1 Semiconductor process residue removal composition and process
03/02/2005EP1509379A1 Methods and apparatus of field-induced pressure imprint lithography
03/02/2005EP1444271A4 Fluorinated optical polymer composition
03/02/2005EP1179028B1 Solvent resistant photosensitive compositions
03/02/2005CN1589490A Method and device for aligning a charged particle beam column
03/02/2005CN1589420A Method for improving sensitometric response of photosensitive imaging media employing microcapsules
03/02/2005CN1589276A Multimer of acylphosphines and their derivatives
03/02/2005CN1588236A Method for preparing nano dot array of controllable unit size using nano ball template
03/02/2005CN1588235A Continuous scanning synchronous control method and system for step scanning photoetching machine
03/02/2005CN1588234A Photoetching glue correcting method
03/02/2005CN1588233A Method for producing polymer light wave guide device based on silicon lining
03/02/2005CN1588232A Method for realizing micro nano pattern transfer based on rotary coating and bonding
03/02/2005CN1588190A Liquid crystal display using oblique electric field to control lqiuid crystal molecule tipping direction and its producing method
03/02/2005CN1191610C Semiconductor integrated circuit device, and method for producing the same, and method of producing masks
03/02/2005CN1191580C Method for copying gradation recording type read only CD
03/02/2005CN1191579C Method of manufacturnig an optically scannable information carrier
03/02/2005CN1191502C Method of reducing easy broken base wafer contact exposure broken rate
03/02/2005CN1191501C Photosensitive material employing micro capsules
03/02/2005CN1191498C Liquid, radiation-curable composition, especially for producing flexible cured articles by stereolithography
03/02/2005CN1191167C Manufacture process of single ink jet head
03/01/2005US6862726 Light intensity simulation method, program product, and designing method of photomask
03/01/2005US6862545 Linewidth measurement tool calibration method employing linewidth standard
03/01/2005US6862138 Holder for positioning a specimen slide, and apparatus for laser cutting of specimens, and microscope
03/01/2005US6862080 Substrate holding device, semiconductor manufacturing apparatus and device manufacturing method
03/01/2005US6862079 Light source, light source generation control method, exposure apparatus and maintenance method therefor, and semiconductor device manufacturing method and semiconductor production facility
03/01/2005US6862078 Projection optical system and exposure apparatus with the same
03/01/2005US6862077 Anti-vibration system for exposure apparatus
03/01/2005US6862076 Method of determining stray radiation lithographic projection apparatus
03/01/2005US6862075 Lithographic projection apparatus, device manufacturing method, and device manufacturing thereby
03/01/2005US6862034 Imaging method for printing forms
03/01/2005US6861657 Electron beam exposure mask, electron beam exposure method, method of fabricating semiconductor device, and electron beam exposure apparatus
03/01/2005US6861656 High-luminosity EUV-source devices for use in extreme ultraviolet (soft X-ray) lithography systems and other EUV optical systems
03/01/2005US6861651 Electron-optical corrector for eliminating third-order aberations
03/01/2005US6861648 Scanning probe microscopy inspection and modification system
03/01/2005US6861500 Resins curable with actinic energy ray, process for the production thereof, and photocurable and thermosetting resin composition
03/01/2005US6861456 Photosensitive compound, photosensitive resin, and photosensitive composition
03/01/2005US6861455 Composition for bulkhead of thin display panel
03/01/2005US6861376 Photoresist scum free process for via first dual damascene process
03/01/2005US6861367 Semiconductor processing method using photoresist and an antireflective coating
03/01/2005US6861365 Method and system for forming a semiconductor device
03/01/2005US6861273 Grayscale exposure of curable photoresist with partially removal ofthe uncured material to control the surface roughness for the extreme ultraviolet (EUV) multilayer based diffuser; multilayer relief profiles; semiconductors
03/01/2005US6861210 Resist remover composition
1 ... 686 687 688 689 690 691 692 693 694 695 696 697 698 699 700 701 702 703 704 705 706 ... 1272