| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 03/09/2005 | CN1590110A Image-recording apparatus and method |
| 03/09/2005 | CN1589975A Base plate treater |
| 03/09/2005 | CN1192424C Method for preparing multiple layer inner connection circuit |
| 03/09/2005 | CN1192417C Method and apparatus for supercritical processing of multiple workpieces |
| 03/09/2005 | CN1192285C Developing aqueous solution capable of reducing developer residue and method for preparing photoetching adhesive pattern |
| 03/09/2005 | CN1192284C Manufacturing device and method of refined developing liquid |
| 03/09/2005 | CN1192283C Photosensitive insulation paste and thick film multilayer circuit substrate |
| 03/09/2005 | CN1191909C Laser corrosion method and its apparatus |
| 03/08/2005 | US6865251 Device for x-ray lithography |
| 03/08/2005 | US6865210 Timing control for two-chamber gas discharge laser system |
| 03/08/2005 | US6865003 Multibeam exposure head and multibeam recording method using the same |
| 03/08/2005 | US6864988 Optical system with isolated measuring structure |
| 03/08/2005 | US6864963 Position measuring system with multiple bar mirrors |
| 03/08/2005 | US6864961 Projection exposure methods and apparatus, and projection optical systems |
| 03/08/2005 | US6864960 Zoom system for an illumination device |
| 03/08/2005 | US6864959 Projection exposure apparatus |
| 03/08/2005 | US6864958 Lithographic apparatus and device manufacturing method |
| 03/08/2005 | US6864957 Chuck, lithographic projection apparatus, method of manufacturing a chuck and device manufacturing method |
| 03/08/2005 | US6864955 Stage apparatus, exposure apparatus and method for exposing substrate plate |
| 03/08/2005 | US6864954 Exposure process and exposure device |
| 03/08/2005 | US6864953 Exposure apparatus, device manufacturing method, semiconductor manufacturing plant and method of maintaining exposure apparatus |
| 03/08/2005 | US6864602 Linear motor, stage apparatus, and exposure apparatus |
| 03/08/2005 | US6864589 X/Y alignment vernier formed on a substrate |
| 03/08/2005 | US6864556 CVD organic polymer film for advanced gate patterning |
| 03/08/2005 | US6864497 Droplet and filament target stabilizer for EUV source nozzles |
| 03/08/2005 | US6864311 Composition (e. g. ink or varnish) which can undergo cationic and/or radical polymerization and/or crosslinking by irradiation, based on an organic matrix, a silicone diluent and a photoinitiator |
| 03/08/2005 | US6864192 Langmuir-blodgett chemically amplified photoresist |
| 03/08/2005 | US6864185 Fine line printing by trimming the sidewalls of pre-developed resist image |
| 03/08/2005 | US6864144 Method of stabilizing resist material through ion implantation |
| 03/08/2005 | US6864044 For removing photoresist residues after dry etching without attacking the wiring material or the interlayer insulating film |
| 03/08/2005 | US6864041 Gate linewidth tailoring and critical dimension control for sub-100 nm devices using plasma etching |
| 03/08/2005 | US6864040 Infrared radiation absorbers, radical producers of polyhaloalkyl -substituted compounds, polycarboxylic acids, and leuco dyes; printing plate precursors |
| 03/08/2005 | US6864039 Such as naphthylvinyl-pyridine; for improved heat stability and image resolution |
| 03/08/2005 | US6864038 Printing plate material |
| 03/08/2005 | US6864037 Polymers, resist compositions and patterning process |
| 03/08/2005 | US6864036 Pattern resolution and orthogonal cross sectional profile |
| 03/08/2005 | US6864035 Positive photosensitive resin composition, positive photosensitive dry film and method of forming pattern |
| 03/08/2005 | US6864024 Real-time control of chemically-amplified resist processing on wafer |
| 03/08/2005 | US6864022 Yellow filter layer comprises a pyridine-2-one azo dye having its absorption maximum at a wavelength of 400 to 500 nm, and has a transmittance at wavelength of 450 nm of 5% or less, at 535 nm of 80% or more and at 650 nm of 90% or more |
| 03/08/2005 | US6864021 Photomask and pattern forming method used in a thermal flow process and semiconductor integrated circuit fabricated using the thermal flow process |
| 03/08/2005 | US6864019 Laminated structure; multilayer; photosensitivity; polymer matrix and photoinitiator |
| 03/08/2005 | US6863836 Method for removal of photoresist using sparger |
| 03/08/2005 | US6863701 Accelerators for cationic photopolymerizations |
| 03/08/2005 | US6863409 Apparatus for generating parallel beam with high flux |
| 03/08/2005 | US6863403 Deep ultraviolet unit-magnification projection optical system and projection exposure apparatus |
| 03/08/2005 | US6862817 Method and apparatus for kinematic registration of a reticle |
| 03/03/2005 | WO2005020644A1 Euv light source |
| 03/03/2005 | WO2005020299A1 Exposure apparatus, exposure method, and device producing method |
| 03/03/2005 | WO2005020298A1 Optical element and exposure device |
| 03/03/2005 | WO2005019939A1 Stripping and cleaning compositions for microelectronics |
| 03/03/2005 | WO2005019938A1 Proportional variable resistor structures to electrically measure mask misalignment |
| 03/03/2005 | WO2005019937A1 Material for forming resist-protecting film for immersion exposure process, resist-protecting film made of such material, and method for forming resist pattern using such resist-protecting film |
| 03/03/2005 | WO2005019936A2 Optically addressed extreme ultraviolet modulator and lithography system incorporating modulator |
| 03/03/2005 | WO2005019935A2 Refractive index system monitor and control for immersion lithography |
| 03/03/2005 | WO2005019934A2 Precursor paste and method of producing the same |
| 03/03/2005 | WO2005019900A1 Coherency reducer having a stepped mirror and method for producing a coherency reducer |
| 03/03/2005 | WO2005019878A1 Optical imaging device comprising at least one system diaphragm |
| 03/03/2005 | WO2005019503A2 Sub-micron-scale patterning method and system |
| 03/03/2005 | WO2005019284A1 Fluorocopolymer, process for producing the same, and resist composition containing the same |
| 03/03/2005 | WO2005019231A1 Phosphazene compound, photosensitive resin composition and use thereof |
| 03/03/2005 | WO2005007759A3 Viscosity reducible radiation curable resin composition |
| 03/03/2005 | WO2004107055A3 Electrode arrangement, and use thereof |
| 03/03/2005 | WO2004102624A3 Unitary dual damascene process using imprint lithography |
| 03/03/2005 | WO2004102277B1 Method providing an improved bi-layer photoresist pattern |
| 03/03/2005 | WO2004090950A3 Creation of a permanent structure with high three-dimensional resolution |
| 03/03/2005 | WO2004072737A3 Method for generating a circular periodic structure on a basic support material |
| 03/03/2005 | US20050050512 Method for projection of a circuit pattern, which is arranged on a mask, onto a semiconductor wafer |
| 03/03/2005 | US20050049839 Methods of forming radiation-patterning tools; carrier waves and computer readable media |
| 03/03/2005 | US20050049374 Etherification; deblocking, deprotecting; radiation transparent; photoresists |
| 03/03/2005 | US20050048787 Dry etching method and apparatus |
| 03/03/2005 | US20050048741 Pattern recognition and metrology structure for an x-initiative layout design |
| 03/03/2005 | US20050048733 Ultra-high density storage device using phase change diode memory cells and methods of fabrication thereof |
| 03/03/2005 | US20050048681 Light-emitting diode encapsulation material and manufacturing process |
| 03/03/2005 | US20050048678 Radiation damage reduction |
| 03/03/2005 | US20050048654 Method of evaluating reticle pattern overlay registration |
| 03/03/2005 | US20050048421 Method and system for coating and developing |
| 03/03/2005 | US20050048417 determining an optical characteristic of an antireflective coating;forming a resist feature above the coating by photolithography; andreducing a size of the feature by etching that is controlled on the basis of initial feature size, desired feature critical dimension, and the optical characteristic |
| 03/03/2005 | US20050048416 Improve the durability of the mask by using a combination of a soft material layer and a hard material layer; exposure to light and development on the soft material layer by using the hard material layer as a photomask; forming an isolated pattern; rolling, sandblasting |
| 03/03/2005 | US20050048415 Method for manufacturing ceramic green sheet and method for manufacturing electronic part using that ceramic green sheet |
| 03/03/2005 | US20050048414 Forming a photolithographic patterned nanoparticle film into integrated electronic circuits, chemical or gas sensor device, light emitting device; using water-soluble CaO mask |
| 03/03/2005 | US20050048413 Pattern forming method, semiconductor device and method for manufacturing the same |
| 03/03/2005 | US20050048412 Methods for reducing spherical aberration effects in photolithography |
| 03/03/2005 | US20050048411 Methods of patterning a monolayer |
| 03/03/2005 | US20050048410 Method of manufacturing a semiconductor device |
| 03/03/2005 | US20050048407 Gate electrode wiring, transparent conducting electrode, and the first electrode of the storage capacity are formed while the first mask is processing. selective deposition of the first metal wiring, photo-resist lift-off |
| 03/03/2005 | US20050048405 Photopatterning of conductive electrode layers containing electrically-conductive polymer particles |
| 03/03/2005 | US20050048404 Method for forming image and apparatus for forming image |
| 03/03/2005 | US20050048403 Comprising a hydrophilic support and provided thereon, a light sensitive layer and an overcoat layer, wherein light sensitive layer contains alkali soluble polymer and polymerizable compound having an ethylenically unsaturated bond; high sensitivity, high printing durability, good preheating latitude |
| 03/03/2005 | US20050048402 Positive resist composition and pattern formation method using the same |
| 03/03/2005 | US20050048401 Irradiating a polymer blends comprising a resorcinol arylate polyester with a UV beam for recording data in the form of holograms; polyesterether copolymer; free of initiators and stabilizers and do not degrade with time, nonshrinkage |
| 03/03/2005 | US20050048400 An addition copolymer having at least one (meth)acrylic monomer with an adamantane ring on the side chain; patterns with improved transparency against short-wavelength light and dry etch resistance |
| 03/03/2005 | US20050048399 Intermediate layer contains a unsaturated polymer having a carboxylic acid group in the side chain, which has specific reaction between the support and the photosensitive layer to promot adhesion strength; improve printing durability, chemical resistance; laser recording, photothermography |
| 03/03/2005 | US20050048398 Lithographic printing plate precursor and lithographic printing method |
| 03/03/2005 | US20050048397 Composition and method for removing copper-compatible resist |
| 03/03/2005 | US20050048395 Homopolymer or copolymer of polyhydroxystyrene changes its solubility in an alkali developer by action of an acid; generating an acid by exposure to radiation; bis((4-(1,3-dioxolan-2-yl)cyclohexyl)methylsulfonyl)diazomethane |
| 03/03/2005 | US20050048379 image of the structure of the lithography mask is generated by an imaging optic of a microscope; parameters of wavelength lambda , the numerical aperture NA and the coherence of the illumination sigma of the imaging optic of the microscope are chosen such that the inequality P <= lambda NA(1+ sigma ) |
| 03/03/2005 | US20050048378 Reticle, apparatus for monitoring optical system, method for monitoring optical system, and method for manufacturing reticle |
| 03/03/2005 | US20050048288 Composition and process using fluorinated diols with amide and phosphonate groups with reduced contamination for articles with adhesion do substrates |
| 03/03/2005 | US20050048248 Method for manufacturing a master of an optical information recording medium, method for forming a pattern, a master, a stamper, an optical information recording medium and a resist |
| 03/03/2005 | US20050048223 Method and apparatus for elimination of bubbles in immersion medium in immersion lithography systems |