Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
03/2005
03/16/2005CN1596387A Imaging apparatus
03/16/2005CN1596386A Photosensitive resin composition and applications thereof
03/16/2005CN1596384A Photolithographic critical dimension control using reticle measurements
03/16/2005CN1596368A Inspection device and inspection method for pattern profile, exposure system
03/16/2005CN1595560A Manufacturing method of ceramic raw sheet and manufacturing method of electronic member using the ceramic raw sheet
03/16/2005CN1595300A Method for exposing a substrate and lithographic projection apparatus
03/16/2005CN1595299A Ultra-precise silicon wafer positioning system with balance weight damping apparatus
03/16/2005CN1595298A Image recording material and planographic printing plate
03/16/2005CN1595297A Photosensitive resin composition, photosensitive element, resist pattern, method for producing resist pattern, and substrate having the resist pattern laminated thereon
03/16/2005CN1595296A Lithographic antireflective hardmask compositions and uses thereof
03/16/2005CN1595295A Photosensitive composition and lithograph plate made of same
03/16/2005CN1595294A Three-dimensional mask
03/16/2005CN1595286A Optical power adjusting method and apparatus
03/16/2005CN1595242A Dust cleaning apparatus for process reaction chamber and process reaction chamber having dust removing function
03/16/2005CN1595241A Method for forming pattern of liquid crystal display device and method for fabricating thin film transistor array substrate
03/16/2005CN1595237A Particle clearing device
03/16/2005CN1595232A A method and apparatus for producing three-dimensional photon crystal structure
03/16/2005CN1595207A Optical sheet and process for producing the same
03/16/2005CN1594065A Partial photo-etching process used for silicon micro machining
03/16/2005CN1193410C Cleaning solution for removing residue
03/16/2005CN1193406C Electronic emission photoetching device using selective-grow carbon nanometer tube and method thereof
03/16/2005CN1193405C Optical mask, its producing method, image forming method and method for producing semiconductor device
03/16/2005CN1193268C Method for forming resist pattern in reverse-tapered shape
03/16/2005CN1193267C Method for mfg. photosensitive lithographic plate
03/16/2005CN1193266C Chip heating device and method for using heated chip
03/16/2005CN1193056C Polynuclear epoxy compound, resin obtained therefrom curable with actinic energy ray, and photocurable/thermosetting resin composition containing the same
03/16/2005CN1192905C Method for making offset printing plate supporting body, offset printing plate supporting body and offset printing plate
03/16/2005CN1192858C Method for engraving calligraphy and painting on plate of hard material and engraved products
03/15/2005US6868355 Automatic calibration of a masking process simulator
03/15/2005US6868301 Method and application of metrology and process diagnostic information for improved overlay control
03/15/2005US6868209 Optical fiber Bragg gratings and an improved method for writing masks for use in fabricating in-fiber chirped Bragg gratings.
03/15/2005US6867931 Dual-imaging optical system
03/15/2005US6867923 Projection lens, in particular for microlithography
03/15/2005US6867922 Projection optical system and projection exposure apparatus using the same
03/15/2005US6867913 6-mirror microlithography projection objective
03/15/2005US6867867 Interferometric stage metrology system
03/15/2005US6867849 Stage apparatus which supports interferometer, stage position measurement method, projection exposure apparatus, projection exposure apparatus maintenance method, semiconductor device manufacturing method, and semiconductor manufacturing factory
03/15/2005US6867848 Supporting structure of optical element, exposure apparatus having the same, and manufacturing method of semiconductor device
03/15/2005US6867846 Tailored reflecting diffractor for EUV lithographic system aberration measurement
03/15/2005US6867845 Mask and projection exposure apparatus
03/15/2005US6867844 Immersion photolithography system and method using microchannel nozzles
03/15/2005US6867843 Debris removing system for use in X-ray light source
03/15/2005US6867842 Edge rinse apparatus and edge rinse method
03/15/2005US6867534 Low-mass and compact stage devices exhibiting six degrees of freedom of fine motion, and microlithography systems comprising same
03/15/2005US6867443 Parallel, individually addressable probes for nanolithography
03/15/2005US6867435 Microoptical system and fabrication method therefor
03/15/2005US6867325 Organosiloxane polymer, photo-curable resin composition, patterning process, and substrate-protecting coat
03/15/2005US6867282 Photocurable and thermosetting resin composition
03/15/2005US6867148 Adjustment concentration of ozone dissolved in acid solution; corrosion resistance
03/15/2005US6867063 Organic spin-on anti-reflective coating over inorganic anti-reflective coating
03/15/2005US6866989 Exposing a photosensitive paste provided on the substrate through masks of a predetermined pattern, developing and firing
03/15/2005US6866988 Preventing distortion of profile during fixation; utilizing spin-on glass or sputter oxide patterning and transmission electron micrography
03/15/2005US6866987 Resolution and process window improvement using lift-off
03/15/2005US6866986 Method of 193 NM photoresist stabilization by the use of ion implantation
03/15/2005US6866984 Including 2-hydroxyethyl-5-norbornene-2-carboxylate monomer; deep ultraviolet submicrolithography; etch and heat resis-tance; adhesiveness; tetramethyl ammonium hydroxide solution developing
03/15/2005US6866983 Resist compositions and patterning process
03/15/2005US6866982 Resist composition and patterning process
03/15/2005US6866981 Light-sensitive composition
03/15/2005US6866980 At least one of the hydroxy groups carries a tert-alkoxycarbonyl group; reacted with dicarboxylic acids to form polyamides; cyclization
03/15/2005US6866979 Laser addressable thermal transfer imaging element with an interlayer
03/15/2005US6866976 Monitoring method, exposure method, a manufacturing method for a semiconductor device, including an etching method and exposure processing unit
03/15/2005US6866975 Best focus determining method
03/15/2005US6866973 For forming semiconductor device
03/15/2005US6866972 Color layer forming method
03/15/2005US6866971 Full phase shifting mask in damascene process
03/15/2005US6866970 Energy reflecting mask; removes heat; reducing magnification and focus deviations
03/15/2005US6866969 Photomask, microstructure, manufacturing method of photomask, and aligner
03/15/2005US6866968 Photomask for off-axis illumination and method of fabricating the same
03/15/2005US6866917 Substrate for liquid crystal display and method of fabricating the same
03/15/2005US6866898 Method and apparatus for linking and/or patterning self-assembled objects
03/15/2005US6866791 Method of forming patterned nickel and doped nickel films via microcontact printing and uses thereof
03/15/2005US6866723 Wet cleaning process and wet cleaning equipment
03/15/2005US6866432 Measuring electroconductivity value of developer and time interval between replenishments; data processing, mathematics
03/15/2005US6865949 Transducer-based sensor system
03/12/2005CA2481157A1 Method and device for imaging a printing form
03/10/2005WO2005022616A1 Exposure apparatus and device producing method
03/10/2005WO2005022615A1 Liquid recovery apparatus, exposure apparatus, exposure method, and device production method
03/10/2005WO2005022614A1 Exposure method and apparatus, and device manufacturing method
03/10/2005WO2005022613A1 Vacuum device, operation method for vacuum device, exposure system, and operation method for exposure system
03/10/2005WO2005022600A2 Method and systems for processing overlay data
03/10/2005WO2005022525A1 Methods of photoaddressing a polymer composition and the articles derived therefrom
03/10/2005WO2005022274A1 Method and arrangement for the production of a hologram
03/10/2005WO2005022269A2 Pattern recognition and metrology structure for an x-initiative layout design
03/10/2005WO2005022268A1 Liquid photoresist remover composition for substrate comprising silver and/or silver alloy, process for producing pattern with the same, and display employing the same
03/10/2005WO2005022267A1 Developer for positive photosensitive composition
03/10/2005WO2005022266A2 Immersion medium bubble elimination in immersion lithography
03/10/2005WO2005022265A2 Method of forming optical images, apparatus for carrying out said method and process for manufacturing a device using said method
03/10/2005WO2005022264A2 Optical image formation using a light valve array and a light converging array
03/10/2005WO2005022263A2 Control circuit and method for forming optical images
03/10/2005WO2005022261A1 Polyamide acid-containing composition for forming antireflective film
03/10/2005WO2005022260A1 Photosensitive resin composition, photosensitive element using same, method for forming resist pattern, method for producing printed wiring board, and method for removing photocured product
03/10/2005WO2005022259A2 Attaching a pellicle frame to a reticle
03/10/2005WO2005022257A2 Novel photosensitive bilayer composition
03/10/2005WO2005022231A1 Device for preventing the displacement of an optical element
03/10/2005WO2005022204A2 Catadioptric imaging system for broad band microscopy
03/10/2005WO2005021597A1 Photopatterning conductive electrode layers with electrically-conductive polymer
03/10/2005WO2005021156A2 Capillary imprinting technique
03/10/2005WO2004080722A3 Flexographic printing
03/10/2005WO2004065934A3 Semiconductor fabrication method for making small features
03/10/2005WO2004046826A3 Positive tone lithography in carbon dioxide solvents
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