| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 03/22/2005 | US6869737 Method for exposing a photosensitive resist layer with near-field light |
| 03/22/2005 | US6869640 Coating film forming method and coating film forming apparatus |
| 03/22/2005 | US6869557 Multi-level stamper for improved thermal imprint lithography |
| 03/22/2005 | US6869541 Epoxy resin composition, surface treating method, ink-jet recording head, and ink-jet recording apparatus |
| 03/22/2005 | US6869499 Substrate processing method and substrate processing apparatus |
| 03/22/2005 | US6868787 Printing plate precursor and printing plate |
| 03/22/2005 | US6868786 Applying polymer onto master have projected pattern; hardening; removal; forming stamp; applying ink to substrate; dipping into hydrophilic solution; contrast zones |
| 03/22/2005 | CA2320545C Energy ray curing resin composition |
| 03/22/2005 | CA2265658C Aqueous developable photosensitive polyurethane-methacrylate |
| 03/17/2005 | WO2005024921A1 Exposure apparatus and device producing method |
| 03/17/2005 | WO2005024807A1 Disk master producing method, disk master producing device,method for detecting difference in disk master travel distance, and device for detecting difference in disk master travel distance |
| 03/17/2005 | WO2005024520A2 Phototool coating |
| 03/17/2005 | WO2005024517A2 Apparatus and method for providing fluid for immersion lithography |
| 03/17/2005 | WO2005024516A2 Illuminating device for a microlithographic projection illumination system |
| 03/17/2005 | WO2005024487A1 Programmable optical component for spatially controlling the intensity of beam of radiation |
| 03/17/2005 | WO2005024325A2 Method and system for drying a substrate |
| 03/17/2005 | WO2005023880A1 Method for producing compound having acid-labile group |
| 03/17/2005 | WO2005023822A1 Perfluoropolyether amide-linked phosphonates, phosphates, and derivatives thereof |
| 03/17/2005 | WO2004093159A3 Immersion lithography fluid control system |
| 03/17/2005 | WO2004092841A3 Method for the production of photopolymerizable, cylindrical, continuous seamless flexographic printing elements, and use thereof for the production of cylindrical flexographic printing forms |
| 03/17/2005 | WO2004059395A3 Method of measuring the performance of an illumination system |
| 03/17/2005 | WO2004055593A3 Process for producing a heat resistant relief structure |
| 03/17/2005 | WO2004025710A3 Method of heating a substrate in a variable temperature process using a fixed temperature chuck |
| 03/17/2005 | WO2003106582A8 Adhesive for sealing organic electroluminescent element and use thereof |
| 03/17/2005 | US20050059981 Fragmentation and extraction basket |
| 03/17/2005 | US20050059787 Synthesis of photoresist polymers |
| 03/17/2005 | US20050059543 Fluoroarylsulfonium photoacid generators |
| 03/17/2005 | US20050059256 Method of forming a resist pattern and fabricating tapered features |
| 03/17/2005 | US20050059224 Systems and methods for inducing crystallization of thin films using multiple optical paths |
| 03/17/2005 | US20050058953 A thinner, resist-removing composition comprising an inorganic alkali compound, an organic amine, an organic solvent, anionic and nonionic surfactants and water; removes residue on edges and backs of substrates for thin film transistor-liquid crystal displays and semiconductors; corrosion resistance |
| 03/17/2005 | US20050058952 by electron beam lithography, by first forming a photoresist pedestal in the conventional way, followed by flood exposing with electrons and then a second development treatment to remove additional material from the sidewalls; write pole for vertical magnetic recording |
| 03/17/2005 | US20050058951 photolithography technique to form an organic mono-molecular film pattern, then thin film is selectively grown on the organic monomolecular film pattern, transcribed onto a second substrate to form a micro pattern made of the thin film on the second substrate |
| 03/17/2005 | US20050058950 Method for reducing pattern dimension in photoresist layer |
| 03/17/2005 | US20050058949 Mastering microstructures through a substrate using negative photoresist and microstructure masters; used in computer displays (monitors) and/or projection televisions; photolithography |
| 03/17/2005 | US20050058948 Systems and methods for mastering microstructures through a substrate using negative photoresist and microstructure masters so produced |
| 03/17/2005 | US20050058944 Dissolving gaseous molecule having oxidizing properties or reducing properties in an aqueous alkaline solution; reducing solution is an aqueous solution containing at least one of hydrogen, hydrogen sulfide, nitric acid, and sulfurous acid; semiconductor manufacturing |
| 03/17/2005 | US20050058943 For CTP (computer-to-plate) system, which is less dependent on the temperature at exposure and less affected by the temperature of the exposing machine (plate setter) |
| 03/17/2005 | US20050058942 Printing plate material in roll form of the on-press development type |
| 03/17/2005 | US20050058940 Photosensitive mixtures of comb polymers and acid generators, having high clarity, good development and etch resistance, used to form relief images |
| 03/17/2005 | US20050058938 Polymer, resist composition and patterning process |
| 03/17/2005 | US20050058937 photoresists comprising mixtures of alkali-soluble novolaks resin and phenolic compounds esterification with 1,2-naphthoquinonediazidosulfonic acid, having uniformity, high sensitivity and high resolution, and improved heat resistance, film retention, substrate adhesion, and storage stability |
| 03/17/2005 | US20050058936 Intermediate layer contains a unsaturated polymer having a carboxylic acid group in the side chain, which has specific reaction between the support and the photosensitive layer to promot adhesion strength; improve printing durability, chemical resistance; laser recording, photothermography |
| 03/17/2005 | US20050058935 Sulfonamide compound, polymer compound, resist material and pattern formation method |
| 03/17/2005 | US20050058934 Acrylic polymer with a polymerizable side chain which interacts with an infrared absorbent, exhibiting good resistance against an alkaline developer |
| 03/17/2005 | US20050058933 Quantum efficient photoacid generators for photolithographic processes |
| 03/17/2005 | US20050058932 Preparation and use of exo-2-fluoroalkyl(bicyclo[2.2.1] hept-5-enes) |
| 03/17/2005 | US20050058931 Enabling chain scission of branched photoresist |
| 03/17/2005 | US20050058930 Negative resist composition with fluorosulfonamide-containing polymer |
| 03/17/2005 | US20050058929 For production of layered materials, electronic components and semiconductor components |
| 03/17/2005 | US20050058914 Pattern designing method, photomask manufacturing method, resist pattern forming method and semiconductor device manufacturing method |
| 03/17/2005 | US20050058913 Stencil mask, charged particle irradiation apparatus and the method |
| 03/17/2005 | US20050058911 Holographic recording medium, holographic recording method and holographic information medium |
| 03/17/2005 | US20050058910 Producing a latent image by holographic exposure; andcausing a polymerization reaction due to the latent image, so as to form a first interference fringe providing a refractive index modulation |
| 03/17/2005 | US20050058840 Bank forming method, wiring pattern forming method, electro-optical device, and electronic apparatus |
| 03/17/2005 | US20050058837 Processes for facilitating removal of stereolithographically fabricated objects from platens of stereolithographic fabrication equipment, object release elements for effecting such processes, systems and fabrication processes employing the object release elements, and objects which have been fabricated using the object release elements |
| 03/17/2005 | US20050058836 Sublimating process for cleaning and protecting lithography masks |
| 03/17/2005 | US20050058785 Substrate for inkjet printing and method of manufacturing the same |
| 03/17/2005 | US20050058447 Substrate processing apparatus for inspecting processing history data |
| 03/17/2005 | US20050058446 Method, apparatus and computer product for substrate processing |
| 03/17/2005 | US20050058054 Exposure apparatus of an optical disk master, method of exposing an optical disk master and pinhole mechanism |
| 03/17/2005 | US20050057827 Apparatus and method for retaining mirror, and mirror exchange method |
| 03/17/2005 | US20050057796 Ultra-broadband UV microscope imaging system with wide range zoom capability |
| 03/17/2005 | US20050057757 Low coherence grazing incidence interferometry systems and methods |
| 03/17/2005 | US20050057752 Method of detecting attracting force between substrates, and near-field exposure method and apparatus |
| 03/17/2005 | US20050057740 Lithography tool having a vacuum reticle library coupled to a vacuum chamber |
| 03/17/2005 | US20050057739 Dose transfer standard detector for a lithography tool |
| 03/17/2005 | US20050057738 Illumination optical system and exposure apparatus |
| 03/17/2005 | US20050057737 Illumination optical system and exposure apparatus |
| 03/17/2005 | US20050057735 Reduction Smith-Talbot interferometer prism for micropatterning |
| 03/17/2005 | US20050057734 Lithographic apparatus, device manufacturing method and device manufactured thereby |
| 03/17/2005 | US20050057733 Adaptive thermal control of lithographic chemical processes |
| 03/17/2005 | US20050057681 Light amount adjustment method for use in image exposure apparatus |
| 03/17/2005 | US20050057632 Image recording method and image recording apparatus |
| 03/17/2005 | US20050057102 Holding member, coolant, cooling method and cooling device, linear motor device, stage device, and exposure apparatus |
| 03/17/2005 | US20050056913 Stereolithographic method for forming insulative coatings for via holes in semiconductor devices, insulative coatings so formed, systems for forming the insulative coatings, and semiconductor devices including via holes with the insulative coatings |
| 03/17/2005 | US20050056792 Cooling of voice coil motors |
| 03/17/2005 | US20050056351 Surface treatment method, process for producing near-field exposure mask using the method, and nanoimprint lithography mask |
| 03/17/2005 | US20050056179 Printing plate material and printing process |
| 03/17/2005 | DE19757696B4 Simulationsverfahren in einem lithographischen Prozeß Simulation method in a lithographic process |
| 03/17/2005 | DE10338983A1 Projection lens for microlithography scans a pattern set up in a projection lens object plane into a projection lens focal plane |
| 03/17/2005 | DE10337506A1 Wärmeempfindlicher positiv arbeitender Lithographie-Druckplattenvorläufer The heat-sensitive positive working lithographic printing plate precursor |
| 03/17/2005 | DE10337286A1 Verfahren zur Projektion eines auf einer Maske angeordneten Schaltungsmusters auf einen Halbleiterwafer A method for projecting a mask arranged on a circuit pattern on a semiconductor wafer |
| 03/17/2005 | DE10215469B4 Anordnung zur Unterdrückung von Teilchenemission bei einer Strahlungserzeugung auf Basis eines heißen Plasmas Arrangement for the suppression of particle emission at a radiation generation based on a hot plasma |
| 03/17/2005 | DE102004026206A1 Belichtungsmaskensubstrat-Herstellungsverfahren, Belichtungsmasken-Herstellungsverfahren und Halbleitereinrichtungs-Herstellungsverfahren Exposure mask substrate manufacturing method, exposure mask manufacturing method and semiconductor device production method |
| 03/17/2005 | DE102004015253A1 Verfahren zur Herstellung einer lichtempfindlichen lithographischen Druckplatte und Verfahren zur Bearbeitung derselben A process for preparing a photosensitive lithographic printing plate and method for processing the same |
| 03/16/2005 | EP1515190A2 Exposure apparatus and device fabrication method using the same |
| 03/16/2005 | EP1515189A2 Method for exposing a substrate and lithographic projection apparatus |
| 03/16/2005 | EP1515188A1 Method for protecting an optical element, and optical element |
| 03/16/2005 | EP1515187A1 Coating device for printing screens |
| 03/16/2005 | EP1515186A2 Positive resist composition and pattern formation method using the same |
| 03/16/2005 | EP1515168A1 Optical component formation method |
| 03/16/2005 | EP1514681A1 Printing plate material in roll form of the on-press development type |
| 03/16/2005 | EP1514158A1 Device for positioning an optical element in a structure |
| 03/16/2005 | EP1513689A1 Method and device for transferring a pattern |
| 03/16/2005 | EP1513688A1 Mold tool method of manufacturing a mold tool and storage medium formed by use of the mold tool |
| 03/16/2005 | EP1513603A1 Integrated photochemical treatment of gases |
| 03/16/2005 | EP1470207A4 Aqueous stripping and cleaning composition |
| 03/16/2005 | EP1263590B1 Thermally imageable element and lithographic printing plate |
| 03/16/2005 | CN1596492A Timing control for two-chamber gas discharge laser system |
| 03/16/2005 | CN1596388A Defective pixel compensation method |