Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
03/2005
03/24/2005US20050061773 Capillary imprinting technique
03/24/2005US20050061441 Substrate treating apparatus
03/24/2005US20050061439 Method of processing substrate and chemical used in the same
03/24/2005US20050061437 Curable silicone resin composition
03/24/2005US20050061429 Comprises oxetane compounds, cyclic epoxy compound, and catalytic photoinitiator; actinic radiation curable
03/24/2005US20050061242 Substrate processing apparatus for performing photolithography
03/24/2005US20050061183 Printing plate material, printing plate material roll, printing plate manufacturing process, and printing process
03/24/2005US20050061178 Photosensitive planographic printing plate and method of producing the same
03/24/2005US20050061028 The gas-flow duct surrounded by divided housing with a section conveying the coolant in contact with a smaller section controlling the coolant temperature; nozzle damaged minimised by sufficient spacing from generated xenon; efficient recirculation; extreme ultraviolet photolithographic laser target
03/24/2005DE10356177A1 Manufacturing semiconductor device, e.g. dynamic random access memory, by forming photoresist pattern using photoresist polymer remover composition with sulfuric and acetic acids, hydrogen peroxide or ozone, ammonium fluoride
03/24/2005DE10340611A1 Lithographic mask for making integrated semiconductor circuit by photolithographic process, comprising angular structure element formed by two opaque segments, with adjacent transparent structure at convex section of angular structure
03/24/2005DE10339362A1 Vorrichtung zur Verhinderung des Kriechens eines optischen Elementes A device for preventing creeping of a optical element
03/24/2005DE10337667A1 Plasma-Strahlungsquelle und Anordnung zur Erzeugung eines Gasvorhangs für Plasma-Strahlungsquellen Plasma radiation source and arrangement for producing a gas curtain for plasma radiation sources
03/24/2005DE10337037A1 Vorrichtung zur Vermessung einer Belichtungsintensität auf einem Wafer An apparatus for measuring an exposure intensity on a wafer
03/23/2005EP1517356A2 Electron-beam lithography method and device
03/23/2005EP1517339A2 Illumination optical system and exposure apparatus
03/23/2005EP1517338A2 Illumination optical system and exposure apparatus
03/23/2005EP1517318A1 Ultra-high density data storage device
03/23/2005EP1517189A2 Critical dimension optimisation in lithography
03/23/2005EP1517188A2 Lithographic apparatus and device manufacturing method
03/23/2005EP1517187A2 Lithographic apparatus, device manufacturing method, and device manufactured thereby
03/23/2005EP1517186A1 Lithographic apparatus and device manufacturing method
03/23/2005EP1517185A1 Lithographic apparatus, device manufacturing method, and device manufactured thereby
03/23/2005EP1517184A1 Lithographic apparatus and device manufacturing method
03/23/2005EP1517183A1 Lithographic apparatus, device manufacturing method, and device manufactured thereby
03/23/2005EP1517182A1 Positive resist composition and process for forming pattern using the same
03/23/2005EP1517181A1 Sulfonamide compound, polymer compound, reist material and pattern formation method
03/23/2005EP1517180A2 Method of producing a pattern and photomask used in the same
03/23/2005EP1517179A1 Photosensitive composition and pattern forming method using the same
03/23/2005EP1517178A1 A process for preparing peptide nucleic acid probe using monomeric photoacid generator
03/23/2005EP1517177A2 Method of producing a pattern and photomask used in the same
03/23/2005EP1517176A2 Printing plate material, printing plate material roll, printing plate manufacturing process, and printing process
03/23/2005EP1516746A2 Photosensitive planographic printing plate and method of producing the same
03/23/2005EP1516743A1 Planographic printing plate precursor
03/23/2005EP1516725A2 Lithographic printing plate precursor
03/23/2005EP1516724A1 Presensitized plate and lithographic printing method
03/23/2005EP1516723A2 Printing plate material and printing process
03/23/2005EP1516230A2 Photosensitive compositions
03/23/2005EP1516229A2 Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds
03/23/2005EP1516228A1 Patterning method
03/23/2005EP1516226A1 Developer-soluble metal alkoxide coatings for microelectronic applications
03/23/2005EP1516208A1 Planar optical waveguide assembly and method of preparing same
03/23/2005EP1461596A4 Direct write nanolithographic deposition of nucleic acids from nanoscopic tips
03/23/2005EP0852599B1 Improved colored articles and compositions
03/23/2005CN1599887A Method for forming fine resist pattern
03/23/2005CN1599886A Determination of center of focus by cross-section analysis
03/23/2005CN1599885A Positive resist composition and method of forming resist pattern
03/23/2005CN1599884A Photosensitive resin composition and photosensitive films and laminates made by using the same
03/23/2005CN1599883A Photosensitive flexible printing element and method for the production of newspaper flexible printing plates
03/23/2005CN1599874A 均化器 Homogenizer
03/23/2005CN1599770A Heat-curable resin composition
03/23/2005CN1599769A 树脂组合物 Resin composition
03/23/2005CN1599659A Method of producing resin molded product
03/23/2005CN1599039A Method of processing substrate and chemical used in the same
03/23/2005CN1599029A Template padding method for padding edges of holes on semiconductor masks
03/23/2005CN1598697A Lithographic apparatus and device manufacturing method
03/23/2005CN1598696A Method of forming optical element
03/23/2005CN1598695A Method for forming pattern, and optical element
03/23/2005CN1598694A Method of forming nano pattern and manufacturing cnt-bio-nano chip
03/23/2005CN1598693A Photosensitive planographic printing plate and method of producing the same
03/23/2005CN1598692A Printing plate material, printing plate material roll, printing plate manufacturing process, and printing process, and printing plate material manufacturing process
03/23/2005CN1597335A Method of performing micro contact printing using colloidal crystal as ink
03/23/2005CN1597313A Lithographic printing method and presensitized plate
03/23/2005CN1194383C Pattern forming method
03/23/2005CN1194267C Diluent composition for removing unnecessary sensitive resin
03/23/2005CN1194022C Organic anti-reflecting coating polymer and preparation thereof
03/23/2005CN1193899C 平版印刷版 Lithographic printing plate
03/22/2005US6871337 Optimized by determining an appropriate illumination mode based on diffraction orders of the reticle, and the autocorrelation of the projection optic; improved depth of focus
03/22/2005US6870952 Positioning apparatus used in a process for producing multi-layered printed circuit board and method of using the same
03/22/2005US6870865 Laser oscillation apparatus, exposure apparatus, semiconductor device manufacturing method, semiconductor manufacturing factory, and exposure apparatus maintenance method
03/22/2005US6870668 Method for evaluating image formation performance
03/22/2005US6870632 Apparatus for mounting an optical element in an optical system
03/22/2005US6870623 Position detection apparatus, alignment apparatus and methods therefor, and exposure apparatus and device manufacturing method
03/22/2005US6870604 High resolution point array
03/22/2005US6870603 Lithographic apparatus and method to determine beam characteristics
03/22/2005US6870602 Applying a heated and pressurized sol solution, containing minute particles dispersed in, onto an optical lens, without gelation, forming antireflection film
03/22/2005US6870601 Lithographic apparatus and device manufacturing method
03/22/2005US6870599 Exposure method and apparatus, and device manufacturing method
03/22/2005US6870598 Projection exposure apparatus
03/22/2005US6870554 Maskless lithography with multiplexed spatial light modulators
03/22/2005US6870310 Multibeam generating apparatus and electron beam drawing apparatus
03/22/2005US6870301 Applying two different peeling and pulling forces, one is to form an angle between two surfaces, one is to increase distance; high precision forming extremely small features on semiconductor wafer, without high temperature, high pressure
03/22/2005US6870284 Linear motor and stage apparatus, exposure apparatus, and device manufacturing method using the same
03/22/2005US6870173 Electron-beam focusing apparatus and electron-beam projection lithography system employing the same
03/22/2005US6870171 Exposure apparatus
03/22/2005US6870168 Varying feature size in resist across the chip without the artifact of “grid-snapping” from the mask writing tool
03/22/2005US6869921 Stripping composition
03/22/2005US6869887 Method for manufacturing thin film semiconductor device and method for forming resist pattern thereof
03/22/2005US6869807 Method and its apparatus for manufacturing semiconductor device
03/22/2005US6869754 Transfer of optical element patterns on a same side of a substrate already having a feature thereon
03/22/2005US6869753 Comprises phosphors on silicon gel carrier on light emitting diode; photoresists/photomasks
03/22/2005US6869748 Resist composition and patterning process
03/22/2005US6869747 Organic polymeric antireflective coatings deposited by chemical vapor deposition
03/22/2005US6869746 Addition polymer; photopolymerization; sensitivity, storage stability
03/22/2005US6869745 Acid generating agent which is an onium salt with a fluoroalkyl sulfonate ion; interpolymer of vinylphenol, styrene and an alkyl (meth)acrylate; solubility-reducing group capable of being eliminated by acid
03/22/2005US6869744 Contains carboxyl or phenolic hydroxyl group-containing resin soluble in alkaline solution, in which acid labile groups are incorporated into some of hydrogen atoms on carboxyl or phenolic hydroxyl groups to make resin alkali insoluble
03/22/2005US6869743 Exposing a photosensitive material having photosensitive layer on a support, and subjecting to development by dipping or coating system, and then peeling photosensitive layer off bringing a peeling means into close contact with the layer
03/22/2005US6869742 Alkali-soluble novolak resin containing 1,2-naphthoquinonediazidosulfonyl groups
03/22/2005US6869739 Creating simulated images, at different exposure dose and focus settings of the metrology imaging system, uses the developed image of the object pattern in the resist film on a substrate
03/22/2005US6869738 The serifs or pattern combine to produce an optical proximity correction that reduces corner rounding and increases edge straightness in the resist pattern
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