| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 03/29/2005 | US6872950 Electron optical system array, method of fabricating the same, charged-particle beam exposure apparatus, and device manufacturing method |
| 03/29/2005 | US6872688 Image receiver on support; thermal transferring; multicolor images; graphic arts; generating heat by exposure to laser light |
| 03/29/2005 | US6872670 Silylation treatment unit and method |
| 03/29/2005 | US6872663 Method for reworking a multi-layer photoresist following an underlayer development |
| 03/29/2005 | US6872646 Method for manufacturing conductive pattern substrate |
| 03/29/2005 | US6872588 Method of fabrication of electronic devices using microfluidic channels |
| 03/29/2005 | US6872514 Polymers, resist compositions and patterning process |
| 03/29/2005 | US6872513 Photoresist edge correction |
| 03/29/2005 | US6872512 Method of forming resist pattern |
| 03/29/2005 | US6872511 Method for forming micropatterns |
| 03/29/2005 | US6872510 Photomask having small pitch images of openings for fabricating openings in a semiconductor memory device and a photolithographic method for fabricating the same |
| 03/29/2005 | US6872509 Apparatus and methods for photolithographic processing |
| 03/29/2005 | US6872508 Exposure method and method of manufacturing semiconductor device |
| 03/29/2005 | US6872507 Patterning microelectronics using electron beam; etching masking layer; adjustment of backscattering |
| 03/29/2005 | US6872505 Splitting a high molecular weight polymer; resolution; forming integrated circuits |
| 03/29/2005 | US6872504 Applying a photoresist comprising fluoropolymer and an acid generator; exposing photoresist to an ultra-short wavelength high energy actinic radiation to release electrons from fluorine in photoresist that cause acid generator to release acid |
| 03/29/2005 | US6872503 Copolymers for photoresists and processes therefor |
| 03/29/2005 | US6872502 Chemically amplified negative photoresist, and photoresist composition |
| 03/29/2005 | US6872498 Concentric tracks; overcoating substrate with pattern; positive, negative pixels; modulation beam scanning |
| 03/29/2005 | US6872256 Film forming unit |
| 03/29/2005 | US6872254 Method and apparatus for controlling air over a spinning microelectronic substrate |
| 03/29/2005 | US6872014 Method for developing a photoresist pattern |
| 03/29/2005 | US6871847 Method of, and apparatus for, handling an exposure surface to be exposed, in particular, a printing plate |
| 03/29/2005 | US6871741 Composite substrate carrier |
| 03/29/2005 | US6871656 Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process |
| 03/29/2005 | US6871592 Method for moving printing plates into and out of exposure device |
| 03/29/2005 | US6871558 Method for determining characteristics of substrate employing fluid geometries |
| 03/24/2005 | WO2005027207A1 Illumination optical system and exposure apparatus using the same |
| 03/24/2005 | WO2005027206A1 Polishing plate, stage unit, and exposure apparatus |
| 03/24/2005 | WO2005027145A1 Radiation-sensitive resin composition |
| 03/24/2005 | WO2005026843A2 Illumination system for a microlithography projection exposure installation |
| 03/24/2005 | WO2005026842A1 Positive photoresist composition and method of forming resist pattern |
| 03/24/2005 | WO2005026841A1 Photosensitive insulating resin composition and cured product thereof |
| 03/24/2005 | WO2005026840A1 Photo-polymerisable mixtures with photoinitiators based on di-ynone derivatives |
| 03/24/2005 | WO2005026839A2 Phthalocyanine precursors in infrared sensitive compositions |
| 03/24/2005 | WO2005026838A2 Microlithography method using a mask with curved surface |
| 03/24/2005 | WO2005026837A2 Imprint lithographic method, and device and stamp for use in imprint lithography |
| 03/24/2005 | WO2005026836A2 Laminated photosensitive relief printing original plate and method for producing the relief printing plate |
| 03/24/2005 | WO2005026822A2 Fly's eye condenser and illumination system therewith |
| 03/24/2005 | WO2005026801A2 Apparatus for manipulation of an optical element |
| 03/24/2005 | WO2005026782A2 Inspection system using small catadioptric objective |
| 03/24/2005 | WO2005026658A1 Interference scatterometer |
| 03/24/2005 | WO2005026042A1 Fibrillar microstructure and process for the production thereof |
| 03/24/2005 | WO2004108413A3 Method and apparatus for applying a film of developer fluid onto a lithographic printing plate in a developing station |
| 03/24/2005 | WO2004090465A3 Apparatus and method for joint measurement of fields of scattered/reflected or transmitted orthogonally polarized beams by an object in interferometry |
| 03/24/2005 | WO2004063811A3 Method and apparatus for processing of radiation-sensitive patterning compositions |
| 03/24/2005 | WO2004025364A8 Four color digital printing process and color image element using color-sensitive photopolymers |
| 03/24/2005 | US20050065623 Vector-graphic data processing method and drawing apparatus |
| 03/24/2005 | US20050065312 Negative-working photoresist composition |
| 03/24/2005 | US20050065227 Addition polymers; exposure to radiation; photoinitiators; curing in liquid phase |
| 03/24/2005 | US20050064728 Methods for forming a photoresist pattern using an anti-optical proximity effect |
| 03/24/2005 | US20050064719 Method of controlling critical dimension microloading of photoresist trimming process by selective sidewall polymer deposition |
| 03/24/2005 | US20050064688 Methods for fabricating semiconductor devices |
| 03/24/2005 | US20050064681 Support structure for thinning semiconductor substrates and thinning methods employing the support structure |
| 03/24/2005 | US20050064679 Consolidatable composite materials, articles of manufacture formed therefrom, and fabrication methods |
| 03/24/2005 | US20050064676 Method of forming alignment mark |
| 03/24/2005 | US20050064614 Method of processing substrate and chemical used in the same |
| 03/24/2005 | US20050064347 Frequency division multiplexing (FDM) lithography |
| 03/24/2005 | US20050064346 forming photoresist films on nonmagnetic surfaces, then forming protrusions and recesses on the film by exposing to light and developing, contacting with photomasks and selectively etching to form patterns that preventing undesirable diffraction, for use in recording signals onto magnetic recording media |
| 03/24/2005 | US20050064345 Method for manufacturing a photoresist-coated glass board, method for manufacturing a stamper and method for manufacturing a recording medium |
| 03/24/2005 | US20050064344 Imprint lithography templates having alignment marks |
| 03/24/2005 | US20050064343 depositing multilayers of photoresist on substrates, then exposure and development to form microstructure or nanostructure patterns, used for forming photonic crystals, interconnection networks for optical signals or medical equipment |
| 03/24/2005 | US20050064341 Composition containing a photoacid generator monomer, substrate coated with the composition, method for synthesizing a compound on a substrate using the composition, and microarray produced according to the method |
| 03/24/2005 | US20050064340 planographic printing plate precursors comprising supports having hydrophilic surfaces, heat sensitive layers comprising water-insoluble and alkali-soluble resins, infrared absorbing dyes and sulfonium photoinitiators, use in direct platemaking with an infrared lasers |
| 03/24/2005 | US20050064339 Planographic printing plate material and printing process |
| 03/24/2005 | US20050064338 Natural color targeted printing method |
| 03/24/2005 | US20050064336 Unsaturated group-containing multi-branched compounds, curable compositions containing the same, and cured products thereof |
| 03/24/2005 | US20050064333 polymerization catalysts such as 5-(2,4-dimethylphenyl) thianthrenium hexafluoroantimonate, used for polymerization of epoxy and vinyl ether monomers |
| 03/24/2005 | US20050064332 lithographic plates comprising aluminum supports that have been subjected to surface treatment, and recording layers comprising photoinitiators, addition copolymers and infrared absorbing dyes |
| 03/24/2005 | US20050064331 Photosensitive composition and lithographic printing plate precursor using the same |
| 03/24/2005 | US20050064330 Lithographic printing plate precursor |
| 03/24/2005 | US20050064329 Positive resist composition and pattern formation method using the same |
| 03/24/2005 | US20050064328 lithographic plates comprising aluminum supports that have been subjected to surface treatment, and recording layers comprising photoinitiators, addition copolymers and infrared absorbing dyes |
| 03/24/2005 | US20050064327 Positive resist composition and process for forming pattern using the same |
| 03/24/2005 | US20050064326 Positive resist composition and pattern-forming method using the same |
| 03/24/2005 | US20050064325 Planographic printing plate precursor |
| 03/24/2005 | US20050064322 Water and aqueous base soluble antireflective coating/hardmask materials |
| 03/24/2005 | US20050064321 Positive photoresist composition for liquid crystal device |
| 03/24/2005 | US20050064307 Dye-containing negative-type curable composition, color filter, and method of producing the same |
| 03/24/2005 | US20050064304 Phase shifting for changing the phase of transmitted exposure light, having an optical transmissivity different from the mask substrate; etching the substrate to change the phase of the transmitted light; shielding layer is formed of chromium or molybdenum silicon oxynitride; semiconductor |
| 03/24/2005 | US20050064301 Forming a first fine pattern which has a fine opening, having a size of not more than a wavelength of exposure light; forming a second mask; for use with microprocessing in a short time; microlithography |
| 03/24/2005 | US20050064299 Method for fabricating a mask using a hardmask and method for making a semiconductor device using the same |
| 03/24/2005 | US20050064297 Rotary apertured interferometric lithography (RAIL) |
| 03/24/2005 | US20050064154 Transparent invisible conductive grid |
| 03/24/2005 | US20050064152 Transparent invisible conductive grid |
| 03/24/2005 | US20050064108 Method of forming metal fine particle pattern and method of forming electroconductive pattern |
| 03/24/2005 | US20050064054 Pattern forming apparatus |
| 03/24/2005 | US20050063699 Developing method for semiconductor substrate |
| 03/24/2005 | US20050063288 Technique for positioning optical system element |
| 03/24/2005 | US20050063030 Method of hologram exposure, mask for hologram exposure, semiconductor device, and electronic equipment |
| 03/24/2005 | US20050062980 Reticle focus measurement system using multiple interferometric beams |
| 03/24/2005 | US20050062973 Surface plasmon optic devices and radiating surface plasmon sources for photolithography |
| 03/24/2005 | US20050062951 Edge exposing apparatus |
| 03/24/2005 | US20050062950 Modulator circuitry |
| 03/24/2005 | US20050062949 Exposure apparatus and exposure method |
| 03/24/2005 | US20050062948 Imaging apparatus |
| 03/24/2005 | US20050062947 Near-field exposure apparatus |
| 03/24/2005 | US20050062912 Substrate for electro-optical device and manufacturing method thereof, electro-optical device and manufacturing method thereof, and electronic apparatus |
| 03/24/2005 | US20050061995 Lithographic apparatus and apparatus adjustment method |
| 03/24/2005 | US20050061981 Apparatus for multiple beam deflection and intensity stabilization |