Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
02/2014
02/27/2014WO2014029603A1 Method of preparing a pattern, method of forming a mask set, device manufacturing method and computer program
02/27/2014WO2014029601A1 Lithographic apparatus, device manufacturing method and displacement measurement system
02/27/2014WO2013104583A3 Apparatus and method for surface processing of a substrate
02/27/2014US20140057808 Deformable polymer testing device
02/27/2014US20140057437 Rinsing agent for lithography, method for forming a resist pattern, and method for producing a semiconductor device
02/27/2014US20140057379 Photoresist Film and Manufacturing Method for Organic Light Emitting Display Device Using the Same
02/27/2014US20140057211 Method of forming tight-pitched pattern
02/27/2014US20140057209 Method of forming patterns
02/27/2014US20140057208 Method for preparing a relief printing form
02/27/2014US20140057207 Method of Improving Print Performance in Flexographic Printing Plates
02/27/2014US20140057205 Method of Improving Surface Cure in Digital Flexographic Printing Plates
02/27/2014US20140057204 Negative-working lithographic printing plate precursors and use
02/27/2014US20140057104 Process for Fabricating High-Precision Objects by High-Resolution Lithography and Dry Deposition and Objects thus Obtained
02/27/2014US20140057082 Mask Plate, Method For Fabricating Array Substrate Using The Same, And Array Substrate
02/27/2014US20140055861 Prism Film And Method And Apparatus For Manufacturing The Same
02/27/2014US20140055788 Method and Apparatus for Angular-Resolved Spectroscopic Lithography Characterization
02/27/2014US20140055769 Method For Nanolithography
02/27/2014US20140055767 Mirror array
02/27/2014US20140055766 Exposure apparatus and method of manufacturing article
02/27/2014US20140055765 Exposure apparatus, exposure method, and method of manufacturing article
02/27/2014US20140055764 Lithographic apparatus, programmable patterning device and lithographic method
02/27/2014US20140055763 Exposure apparatus, exposure method, and method for producing device
02/27/2014US20140055762 Optical arrangement of autofocus elements for use with immersion lithography
02/27/2014US20140055761 Liquid immersion exposure apparatus
02/27/2014US20140055760 Method For Monitoring Developer Solution And A Developing Apparatus
02/27/2014US20140054822 Method for creating topographical patterns in polymers via surface energy patterned films and the marangoni effect
02/27/2014DE102013203032A1 Optical arrangement for projection exposure system for semiconductor lithography, has fastening elements for fixing lens in frames, and thermally conductive pastes, bond wires, and thermally conductive rod discharging heat from lens
02/27/2014DE102013202645A1 Optical system for microlithographic projection exposure system, has polarizers that are interacted to enable rotation of linearly polarized light in polarization direction around angular pitch whose sum corresponds with total angle
02/27/2014DE102013202278A1 Optical system of microlithography projection exposure apparatus used for manufacturing e.g. LCD, has optical element that is arranged, such that incident angle of element of electromagnetic radiation is set to predetermined range
02/27/2014DE102013201803A1 Device for non-contact cooling of component loaded with heat, particularly component of projection exposure apparatus for micro lithography, has cooling body, which is set to lower temperature than cooled component
02/27/2014DE102013201264A1 Connection assembly for connecting e.g. lens with temperature sensor of optical imaging device in microlithography applications, has connector comprising contact elements, where connector and optic element are connected by bonded connection
02/27/2014DE102008028528B4 Vorrichtung mit Photoresistmaterialstruktur und Verfahren zum Herstellen derselben Device with photoresist material structure and method of manufacturing the same
02/26/2014EP2701006A2 Method for preparing a pattern to be printed on a plate or mask by electron beam lithography, corresponding printed circuit design system and computer program
02/26/2014EP2700984A1 Prism film and method and apparatus for manufacturing the same
02/26/2014EP2700088A1 Methods and materials for lithography of a high resolution hsq resist
02/26/2014EP2700081A2 Network architecture for lithography machine cluster
02/26/2014EP2699966A2 Network architecture and protocol for cluster of lithography machines
02/26/2014EP2699965A2 Enhanced multi-photon imaging resolution method
02/26/2014EP2699964A1 Photosensitive resin laminate and thermal processing of the same
02/26/2014EP2699530A1 Method for producing a ceramic component composed of a plurality of preforms
02/26/2014EP2699426A1 Aluminum substrates and lithographic printing plate precursors
02/26/2014CN1527136B 光致抗蚀剂组合物 The photoresist composition of
02/26/2014CN103608729A 测量系统 Measurement System
02/26/2014CN103608728A Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern
02/26/2014CN103608727A Negative photosensitive resin composition and cured product of same
02/26/2014CN103608726A Photoresists containing polymer-tethered nanoparticles
02/26/2014CN103608704A Colored radiation-sensitive composition for color filter, pattern forming method, color filter and method of producing the same, and solid-state image sensor
02/26/2014CN103608703A Radiation-sensitive composition, method for forming pattern, color filter and method of producing the same, and solid-state image sensor
02/26/2014CN103605448A Manufacturing method for integrally forming circuit diagram of film-structure capacitive touch screen sensor and product manufactured through manufacturing method
02/26/2014CN103605270A Photoresist water-base silicon chip cleaning fluid and preparation method thereof
02/26/2014CN103605269A Novel photoresist removal liquid used for semiconductor making
02/26/2014CN103605268A Cleaning liquid used during semiconductor manufacturing process
02/26/2014CN103605267A Isolation structure for remote radio-frequency plasma source
02/26/2014CN103605266A Liquid composition for removing photoresist residue and polymer residue
02/26/2014CN103605265A Curve lithographic processing system for variable angle of pixel based on path of vector curve and lithographing method
02/26/2014CN103605264A Method for patterning substrate
02/26/2014CN103605263A Method and masks for detecting splicing exposure error of color film substrate
02/26/2014CN103605262A Exposure apparatus and device production method
02/26/2014CN103605261A Ultraviolet positive photoresist
02/26/2014CN103605260A Preparation method for nanoscale EUV mask
02/26/2014CN103605180A Etching device for spiral fiber grating fiber grating
02/26/2014CN103600614A Chemical treatment forming method for stones
02/26/2014CN102799069B Photo-polymerization type lithographic printing plate body
02/26/2014CN102736451B Three-beam interference lithography method and system
02/26/2014CN102650831B Exposure machine stand and method for freely setting shades in exposure machine stand
02/26/2014CN102636967B Surface plasma nanometer photo-etching structure and method
02/26/2014CN102591160B Rinse solution for lithography
02/26/2014CN102566254B Methods for arranging sub-resolution auxiliary feature in mask layout and method for determining one or more positions of features
02/26/2014CN102543697B Method for manufacturing tunnel oxide layer window in electrically erasable programmable read only memory (EEPROM)
02/26/2014CN102520593B Alignment verification method for exposure machine
02/26/2014CN102478762B Photoetching method
02/26/2014CN102203675B Illuminating optic for EUV microlithography
02/26/2014CN102153695B Photosensitive compositions
02/26/2014CN102074462B Method for forming electronic device
02/26/2014CN102047179B Photosensitive resin composition, process for producing cured relief pattern, and semiconductor device
02/26/2014CN102043333B Photosensitive resin composition, method for producing cured film, cured film, organic el display device and liquid crystal display device
02/26/2014CN102030855B Urethanated unsaturated water-soluble vinyl multipolymer and preparation method thereof
02/26/2014CN101903808B Grating for euv-radiation, method for manufacturing the grating and wavefront measurement system
02/26/2014CN101900944B Coating compositions suitable for use with an overcoated photoresist
02/26/2014CN101896869B Illumination optics for microlithography
02/26/2014CN101765799B Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
02/26/2014CN101526737B Immersion lithography compositions and immersion lithography method
02/26/2014CN101398617B Replication and transfer of microstructures and nanostructures
02/26/2014CN101355056B Method of fabricating a thin film transistor substrate and a photosensitive composition used in the thin film transistor substrate
02/25/2014US8661375 Frequency division multiplexing (FDM) lithography
02/25/2014US8659843 Apparatus for method for immersion lithography
02/25/2014US8659744 Method for correcting a lithography projection objective, and such a projection objective
02/25/2014US8659741 Lithographic apparatus, removable member and device manufacturing method
02/25/2014US8658907 Conductive film and method for producing the same
02/25/2014US8658347 Method of manufacturing micro lens array
02/25/2014US8658346 Pattern forming process, chemically amplified positive resist composition, and resist-modifying composition
02/25/2014US8658345 Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same
02/25/2014US8658344 Patterning process and photoresist with a photodegradable base
02/25/2014US8658343 Resist composition, and method of forming resist pattern
02/25/2014US8658342 Photosensitive composition including photopolymerizable polymer having fluorene skeleton
02/25/2014US8658341 Pattern reversal film forming composition and method of forming reversed pattern
02/25/2014US8658332 Photopolymer media with enhanced dynamic range
02/25/2014CA2791249C Method and system for ion beam delayering of a sample and control thereof
02/20/2014WO2014028231A1 Automatic film washout system
02/20/2014WO2014027550A1 Coloring composition, color filter and method for manufacturing same, and display device
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