Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
03/2005
03/31/2005US20050069791 Patterns with pivots measured in energy and semiconductor construction
03/31/2005US20050069790 Method for reducing an overlay error and measurement mark for carrying out the same
03/31/2005US20050069788 Photomask, photomask manufacturing method and semiconductor device manufacturing method using photomask
03/31/2005US20050069787 Mask blanks and method of producing the same
03/31/2005US20050069786 Stencil mask, production method thereof, exposure apparatus, exposure method and electronic device production method
03/31/2005US20050069783 masking; selectively coding the spaced regions to define a masked read only memory (ROM) structure that causes optical interference; illumination; development; improved circuit density and reliability; miniaturization; integrated circuits
03/31/2005US20050069683 Antistatic conductive grid pattern with integral logo
03/31/2005US20050069631 Photoresist supply apparatus and method of controlling the operation thereof
03/31/2005US20050069433 Technique of suppressing influence of contamination of exposure atmosphere
03/31/2005US20050068997 Laser spectral engineering for lithographic process
03/31/2005US20050068644 Synthetic quartz glass for optical member, projection exposure apparatus and projection exposure method
03/31/2005US20050068639 Contact printing using a magnified mask image
03/31/2005US20050068613 Optically addressed extreme ultraviolet modulator and lithography system incorporating modulator
03/31/2005US20050068599 Projector and projection method
03/31/2005US20050068594 Holographic recording material composition
03/31/2005US20050068593 Holographic optical recording medium, manufacturing method thereof and holographic optical recording method
03/31/2005US20050068540 Triangulation methods and systems for profiling surfaces through a thin film coating
03/31/2005US20050068514 Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region
03/31/2005US20050068513 Device and method of correcting exposure defects in photolithography
03/31/2005US20050068512 Optical unit, exposure apparatus, and device manufacturing method
03/31/2005US20050068511 Lithographic apparatus and device manufacturing method
03/31/2005US20050068510 Lithographic apparatus and device manufacturing method
03/31/2005US20050068509 Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap without an explicit attenuation
03/31/2005US20050068499 Microlithographic projection exposure apparatus
03/31/2005US20050068467 Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system not utilizing overlap of the exposure zones
03/31/2005US20050068414 Image forming method and image forming apparatus for planographic printing plate
03/31/2005US20050068413 Presensitized plate and lithographic printing method
03/31/2005US20050067776 Method and apparatus for controlling the vacuum distribution in an exposer for printing originals
03/31/2005US20050067675 Molded substrate for topograpy based lithography
03/31/2005US20050067379 Imprint lithography template having opaque alignment marks
03/31/2005US20050067376 Method of manufacturing monolithic inkjet printhead
03/31/2005US20050067371 Mask forming method, mask forming functional layer, dry etching method, and method of manufacturing an information recording medium
03/31/2005US20050067100 Apparatus and method for removing coating film
03/31/2005US20050066830 Image forming device for planographic printing plates
03/31/2005DE10341137A1 Verwendung von hydroxyfunktionellen Polyalkylorganosiloxanen als Lösungsmittel für kationische Photoinitiatoren für die Verwendung in strahlenhärtbaren Siliconen The use of hydroxy-functional Polyalkylorganosiloxanen as solvents for cationic photoinitiators for use in radiation-curable silicones
03/31/2005DE10339888A1 Mask used in photolithographic process for manufacturing integrated circuits, has absorbent layer with more readily-etched layer near substrate
03/31/2005DE10339514A1 Light projection system for use during manufacture of semiconductor elements on substrate has lamp shining light through slit onto mask or reticle scanned in front of lens
03/31/2005DE10337767A1 Verfahren zur Messung der Overlay-Verschiebung A method of measuring the overlay displacement
03/31/2005DE10243755B4 Verfahren zum Bilden einer matrixförmigen Anordnung von Belichtungsfeldern auf einem idealisierten Halbleiterwafer A method for forming a matrix-shaped arrangement of exposure fields on a semiconductor wafer idealized
03/31/2005DE102004035012A1 Thermische Kompensation in der Magnetfeldbeeinflussung eines Elektronenstrahls Thermal compensation in the magnetic influence of an electron beam
03/30/2005EP1519234A2 Stripping and cleaning compositions for microelectronics
03/30/2005EP1519233A1 Lithographic apparatus and device manufacturing method
03/30/2005EP1519232A2 Optical device and exposure device equipped with said optical device
03/30/2005EP1519231A1 Lithographic apparatus and device manufacturing method
03/30/2005EP1519230A1 Lithographic apparatus and device manufacturing method
03/30/2005EP1519229A2 Process for the prevention of coating defects
03/30/2005EP1519228A2 Positive resist composition and pattern formation method using the same
03/30/2005EP1519227A2 Method for fabricating complex three-dimensional structures on the submicrometric scale by combined lithography of two resists
03/30/2005EP1519226A2 Stencil mask, production method thereof, exposure apparatus, exposure method and electronic device production method
03/30/2005EP1518912A1 Adhesive for sealing organic electroluminescent element and use thereof
03/30/2005EP1518902A2 Use of polyorganosiloxanes comprising hydroxyl functions as a solvent for a cationic photoinitiator in radiating curable silicones
03/30/2005EP1518899A2 Photocurable adhesive and bonding process employing same
03/30/2005EP1518711A2 Planographic printing plate material and printing process
03/30/2005EP1518710A2 Support for lithographic printing plate and presensitized plate
03/30/2005EP1518704A1 Photosensitive composition and lithographic printing plate precursor using the same
03/30/2005EP1518673A2 Photosensitive composition and planographic printing plate precursor
03/30/2005EP1518672A2 Lithographic printing plate precursor and lithographic printing method
03/30/2005EP1518671A2 Lithographic printing plate precursor
03/30/2005EP1518670A2 Lithographic printing plate precursor
03/30/2005EP1518262A1 Reflection mirror apparatus, exposure apparatus and device manufacturing method
03/30/2005EP1518151A2 Method and arrangement for the manipulation of reticles
03/30/2005EP1244938B1 Method for the production of nanometer range surface decorated substrates
03/30/2005CN2689294Y Fine ultraviolet light beam sources
03/30/2005CN1602451A Maskless photon-electron spot-grid array printer
03/30/2005CN1602450A Method and apparatus for image formation
03/30/2005CN1601698A Method of forming alignment mark
03/30/2005CN1601697A Method of forming light resist pattern by using reflect nearby effect
03/30/2005CN1601694A Mfg.method of element and observing method thereof
03/30/2005CN1601387A Self-aligning method for outskirt state phase shifting light shade
03/30/2005CN1601386A Lithographic apparatus, device manufacturing method, and device manufactured thereby
03/30/2005CN1601385A Method of determining range of exposure dose in tech of picture quality detection of aligner
03/30/2005CN1601382A Support for lithographic printing plate and presensitized plate
03/30/2005CN1601381A Presensitized plate and lithographic printing method
03/30/2005CN1601380A 干燥薄膜光阻剂 Dry film photoresist
03/30/2005CN1601379A Method of mfg, wafer and method of evaluating overlapping alignment between light shade patterns
03/30/2005CN1601322A Projector and projection method
03/30/2005CN1600771A Usage of photosensitizer of hypocrellin and class of amido group ramification
03/30/2005CN1600549A Method of manufacturing monolithic inkjet printhead
03/30/2005CN1195316C Method for improving microspur consistency
03/30/2005CN1195315C Multiple-layer type dielectric antireflection layer and its forming method
03/30/2005CN1195248C Development device of organic light emitted pixel definition layer
03/30/2005CN1195247C Vibration carving and writing method for optical probe scan IC in photoetching system
03/30/2005CN1195240C Process for mfg. multi-phase diffraction optic element
03/29/2005US6873938 Adaptive lithographic critical dimension enhancement
03/29/2005US6873753 Columnar optical device and method for manufacturing the same
03/29/2005US6873720 System and method of providing mask defect printability analysis
03/29/2005US6873478 Kinematic lens mount with reduced clamping force
03/29/2005US6873476 Microlithographic reduction projection catadioptric objective
03/29/2005US6873404 Stage apparatus and method of driving the same
03/29/2005US6873401 Reflective liquid crystal display lithography system
03/29/2005US6873400 Scanning exposure method and system
03/29/2005US6873399 Exposure system and method
03/29/2005US6873397 Exposure apparatus, gas replacing method, and method of manufacturing a semiconductor device
03/29/2005US6873396 Photolithography processing system
03/29/2005US6873087 High precision orientation alignment and gap control stages for imprint lithography processes
03/29/2005US6873026 Inhomogeneous materials having physical properties decoupled from desired functions
03/29/2005US6872961 Vibration control utilizing signal detrending
03/29/2005US6872958 Platform positioning system
03/29/2005US6872952 Electron optical system array, method of manufacturing the same, charged-particle beam exposure apparatus, and device manufacturing method
03/29/2005US6872951 Electron optical system array, charged-particle beam exposure apparatus using the same, and device manufacturing method
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