| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 04/06/2005 | CN1603960A Process for writing registration photoetching grating into crystals |
| 04/06/2005 | CN1603959A Etching method and computer storage medium storing program for controlling same |
| 04/06/2005 | CN1603957A Chemical amplification type positive resist composition and a resin therefor |
| 04/06/2005 | CN1603956A Image-forming composition for heat-sensitive CTP image base, acid generating source for the composition and preparation thereof |
| 04/06/2005 | CN1603955A Holotype photoresist composite |
| 04/06/2005 | CN1603954A Holotype photoresist composite for discharge nozzle type coating method and resist pattern forming method |
| 04/06/2005 | CN1603953A Photoresist composite and image forming method using the same |
| 04/06/2005 | CN1603952A 光致抗蚀剂组合物 The photoresist composition |
| 04/06/2005 | CN1603950A Method for making patterns of phase shift transformation light shield used in semiconductor chips manufacturing and structure thereof |
| 04/06/2005 | CN1603949A Photomask, photomask manufacturing method and semiconductor device manufacturing method using photomask |
| 04/06/2005 | CN1603870A Cubic MgZnO crystal thin film optical waveguide device and preparation process thereof |
| 04/06/2005 | CN1603869A Fabrication method for ridge circular waveguide device |
| 04/06/2005 | CN1603114A Substrate for inkjet printing and method of manufacturing the same |
| 04/06/2005 | CN1196161C Thermal transfer film and its using method |
| 04/06/2005 | CN1196139C 介电组合物 Dielectric compositions |
| 04/06/2005 | CN1196072C Digital photolithography system for making smooth diagonal components |
| 04/06/2005 | CN1196032C Stripping agent, stripping method, stripping agent circulation equipment and stripping agent controller |
| 04/06/2005 | CN1196031C Method for error reduction in lithography |
| 04/06/2005 | CN1196030C Antireflective coating for photoresist compositions |
| 04/06/2005 | CN1196029C Positive radiation-sensitive composition |
| 04/06/2005 | CN1196028C Stereolithographic composition for preparing polyethylene-like articles |
| 04/06/2005 | CN1195603C Laser processor |
| 04/05/2005 | US6877152 Method of inter-field critical dimension control |
| 04/05/2005 | US6876494 Imaging forming apparatus |
| 04/05/2005 | US6876451 Monolithic multiaxis interferometer |
| 04/05/2005 | US6876440 Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region |
| 04/05/2005 | US6876439 Method to increase throughput in a dual substrate stage double exposure lithography system |
| 04/05/2005 | US6876438 Semiconductor exposure apparatus, control method therefor, and semiconductor device manufacturing method |
| 04/05/2005 | US6876437 Illumination optical system, exposure method and apparatus using the same |
| 04/05/2005 | US6876435 Exposure method, plane alignment method, exposure apparatus, and device manufacturing method |
| 04/05/2005 | US6876378 Apparatus for producing a printing form |
| 04/05/2005 | US6876092 Substrate provided with an alignment mark, method of designing a mask, computer program, mask for exposing said mark, device manufacturing method, and device manufactured thereby |
| 04/05/2005 | US6875992 Position measuring device, position measuring system, lithographic apparatus, and device manufacturing method |
| 04/05/2005 | US6875987 Substrate holding unit, exposure apparatus, and device manufacturing method |
| 04/05/2005 | US6875971 Wafer edge exposure apparatus, and wafer edge exposure method |
| 04/05/2005 | US6875956 Used to flow photoresist under the high pressure in the sealed oven during a resist flow process |
| 04/05/2005 | US6875704 Method for forming pattern using printing process |
| 04/05/2005 | US6875699 Method for patterning multilevel interconnects |
| 04/05/2005 | US6875695 System and method for analog replication of microdevices having a desired surface contour |
| 04/05/2005 | US6875624 Combined E-beam and optical exposure semiconductor lithography |
| 04/05/2005 | US6875622 Method and apparatus for determining electromagnetic properties of a process layer using scatterometry measurements |
| 04/05/2005 | US6875559 Method of etching materials patterned with a single layer 193nm resist |
| 04/05/2005 | US6875557 Photopolymerization; development using alkalinity developer |
| 04/05/2005 | US6875556 Resist compositions and patterning process |
| 04/05/2005 | US6875555 Preparation and use of EXO-2-fluoroalkyl(bicyclo[2.2.1] hept-5-enes) |
| 04/05/2005 | US6875554 Positive photosensitive polyimide resin composition |
| 04/05/2005 | US6875553 Method of casting photoresist onto substrates |
| 04/05/2005 | US6875552 Photoresist composition and method of making |
| 04/05/2005 | US6875545 Performing a first exposure of the substrate utilizing a x-dipole illumination, and a second exposure of the substrate utilizing a y-dipole illumination; using optical proximity correction |
| 04/05/2005 | US6875544 Method for the fabrication of three-dimensional microstructures by deep X-ray lithography |
| 04/05/2005 | US6875542 Joining substrates by anode coupling; positioning marking; forming penetration aperture |
| 04/05/2005 | US6875466 Coating a resist on the substrate, and placing in a vapor atmosphere |
| 04/05/2005 | US6875283 Film forming apparatus and film forming method |
| 04/05/2005 | US6875281 Method and system for coating and developing |
| 03/31/2005 | WO2005029559A1 Exposure apparatus and device producing method |
| 03/31/2005 | WO2005029201A1 Holographic recording medium, holographic recording method, and holographic information medium |
| 03/31/2005 | WO2005029193A2 Interferometric analysis of surfaces. |
| 03/31/2005 | WO2005029192A2 Surface triangulation and profiling through a thin film coating |
| 03/31/2005 | WO2005029191A2 Method and device for lithography by extreme ultraviolet radiation |
| 03/31/2005 | WO2005029190A1 Photopolymer printing plate precursor |
| 03/31/2005 | WO2005029189A1 Compound for resist and radiation-sensitive composition |
| 03/31/2005 | WO2005029188A1 Photosensitive element, method of forming resist pattern, and process for producing printed wiring board |
| 03/31/2005 | WO2005029187A1 Photopolymerizable composition. |
| 03/31/2005 | WO2005029186A1 Light sensitive coating compositions useful for lithographic elements |
| 03/31/2005 | WO2005029184A2 Positive photoresist composition and resist pattern formation |
| 03/31/2005 | WO2005029183A2 Method and apparatus for protecting a reticle used in chip production from contamination |
| 03/31/2005 | WO2005029182A2 Method and apparatus for protecting a reticle used in chip production from contamination |
| 03/31/2005 | WO2005029181A2 Method and apparatus for compensating for the effects of gravity on a pellicle used for protecting a reticle from contamination |
| 03/31/2005 | WO2005029178A2 A system and method for the direct imaging of color filters |
| 03/31/2005 | WO2005029177A1 Liquid photo solder resist composition and photo solder resist film thereof |
| 03/31/2005 | WO2005029138A2 Systems and methods for inducing crystallization of thin films using multiple optical paths |
| 03/31/2005 | WO2005028537A1 Photocuring resin composition containing organic polymer having epoxy group and/or oxethane group-containing silicon group at end, and method for producing same |
| 03/31/2005 | WO2005007719A3 Positive photoresist composition and method of forming resist pattern |
| 03/31/2005 | WO2005000909A3 Multiphoton photosensitization system |
| 03/31/2005 | WO2004114371A3 Compound used to form a self-assembled monolayer, layer structure, semiconductor component having a layer structure, and method for producing a layer structure |
| 03/31/2005 | WO2004109757A3 Heat pipe with temperature control |
| 03/31/2005 | WO2004108414A3 Lithographic printing plate system and method for manufacturing the plate system |
| 03/31/2005 | WO2004092843A3 Projection lens, microlithographic projection exposure system and method for producing a semiconductor circuit |
| 03/31/2005 | WO2004088425A3 Contact masks and lithographic patterning methods using said masks |
| 03/31/2005 | US20050070624 Arylsulfinate salts in photoinitiator systems for polymerization reactions |
| 03/31/2005 | US20050070622 Arylsulfinate salts in initiator systems for polymeric reactions |
| 03/31/2005 | US20050070621 sulfur compounds that generate free radical upon exposure to actinic radiation, for use as activators for addition polymerization reactions; photopolymerization |
| 03/31/2005 | US20050070125 Photo resist dispensing system and method |
| 03/31/2005 | US20050070124 Direct photo-patterning of nanoporous organosilicates, and method of use |
| 03/31/2005 | US20050070111 Etching method and computer storage medium storing program for controlling same |
| 03/31/2005 | US20050070069 Raised-lines overlay semiconductor targets and method of making the same |
| 03/31/2005 | US20050069821 reduce developing process defects; improve the development process time and the uniformity of the resist |
| 03/31/2005 | US20050069819 Method for forming resist pattern and method for manufacturing semiconductor device |
| 03/31/2005 | US20050069818 Absorption photoresists thinning to form image with secindary capture of electrons formed by ionizing radiation |
| 03/31/2005 | US20050069817 Providing a substrate, forming a photoresists layer, masking a pattern and illuminaation through a mask, development to form pattern dry etching and stripping to form a mold |
| 03/31/2005 | US20050069816 Process for forming a fine pattern using a top-coating composition for a photoresist and product formed by same |
| 03/31/2005 | US20050069815 Forming a water soluble protective film on substrate irradiation with light followed by removal with water |
| 03/31/2005 | US20050069814 Pattern formation method |
| 03/31/2005 | US20050069813 Photoresists film with aperture patterns and swelling with liquid in apertures for reverse tapering of apertures for semiconductors |
| 03/31/2005 | US20050069812 Planographic printing plate precursor |
| 03/31/2005 | US20050069811 Actinic radiation absorber, polymerization initiator and a polymerzation monomer to form polymer layer that will carry ink that can be removed and forming images with exposure to laser beams |
| 03/31/2005 | US20050069810 Lithographic printing plate precursor |
| 03/31/2005 | US20050069809 Coating solution with organic solvents for applying defect-free coating to substrate |
| 03/31/2005 | US20050069808 An acid generator, a solubilizing PFA copolymer; high precision patterns by using a vacuum ultraviolet ray with a wavelength less than 160 nm; microlithography |
| 03/31/2005 | US20050069807 Photoresist composition |