| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 04/07/2005 | WO2005031463A1 Negative blue-violet laser photosensitive composition, image forming material, image former and method of image formation |
| 04/07/2005 | WO2005031462A1 Low-polydispersity photoimageable polymers and photoresists and processes for microlithography |
| 04/07/2005 | WO2005031461A1 Low-polydispersity photoimageable acrylic polymers, photoresists and processes for microlithography |
| 04/07/2005 | WO2005031460A2 Lithograph method and system with selective illumination of mask features separated in the frequency domain using different illumination schemes |
| 04/07/2005 | WO2005031459A1 Block copolymer composition for photosensitive flexographic plate |
| 04/07/2005 | WO2005031425A1 Catadioptric system with high numerical aperture for microlithography |
| 04/07/2005 | WO2005031228A1 System for liquefying or freezing xenon |
| 04/07/2005 | WO2005031030A2 Method for plasma treating a surface |
| 04/07/2005 | WO2005030784A1 Photoacid generator |
| 04/07/2005 | WO2005030472A1 Tool for the production of a microstructured surface |
| 04/07/2005 | WO2005007564B1 Method for fixing metal particle, and method for producing metal particle-containing substrate, method for producing carbon nanotube-containing substrate and method for producing semiconductor crystalline rod-containing substrate respectively using such fixing method |
| 04/07/2005 | WO2004114018A3 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 04/07/2005 | WO2004059393A3 Method for applying a resist layer, uses of adhesive materials, and adhesive materials and a resist layer |
| 04/07/2005 | US20050076323 Method for improving the critical dimension uniformity of patterned features on wafers |
| 04/07/2005 | US20050076322 System and method for lithography simulation |
| 04/07/2005 | US20050075819 Adaptive lithographic critical dimension enhancement |
| 04/07/2005 | US20050075247 A support and a recording layer comprising a polymerizable compound containing a dendrimer having unsaturated groups, a radical initiator and an alkali-soluble polymer; high sensitivity using a semiconductor laser; direct plate-making based on digital data of a computer; press life; storage stability |
| 04/07/2005 | US20050074981 Increasing the etch resistance of photoresists |
| 04/07/2005 | US20050074963 Fabrication method of a semiconductor device |
| 04/07/2005 | US20050074906 Method and systems for total focus deviation adjustments on maskless lithography systems |
| 04/07/2005 | US20050074709 Cleaning solution for photoresist and method for forming pattern using the same |
| 04/07/2005 | US20050074708 Method for the manufacture of an active matrix, corresponding electro-optical display devices and mask |
| 04/07/2005 | US20050074706 Enhancing photoresist performance using electric fields |
| 04/07/2005 | US20050074705 Method of forming a resist pattern, method of forming a wiring pattern, method of fabricating a semiconductor device, electro-optic device, and electronic apparatus |
| 04/07/2005 | US20050074704 Semiconductor fabrication apparatus and pattern formation method using the same |
| 04/07/2005 | US20050074703 Forming fine patterns of a semiconductor using an electric field to infiltrate an acid produced when a photoresist film is exposed into non-exposure regions |
| 04/07/2005 | US20050074701 Applying a chemically amplified resist; converting an information signal into a multipulse signal having a symmetrical shape; exposing the resist layer in accordance with the multipulse signal; heat-treating the resist layer; and developing the resist layer to form signal pits |
| 04/07/2005 | US20050074700 Method for imaging a semiconductor wafer |
| 04/07/2005 | US20050074699 An extremely thin photoresist layer is coated on top of a photosensitive and anti-reflective protective layer of organometallic polymer; stack of the films is selectively exposed to actinic radiation and the latent images on the layers are developed with a common alkaline developer |
| 04/07/2005 | US20050074698 Composite optical lithography method for patterning lines of significantly different widths |
| 04/07/2005 | US20050074697 Master is directly fabricated by patterning of a resist; nanoimprint lithography |
| 04/07/2005 | US20050074695 A resin with substituent group capable of forming a sulfonic acid residue after exposure to heat or light; e.g. ethyl p-styrenesulfonate-containing polymers; lithography; amines and quaternary ammonium hydroxide used as stripping solution for easy removal |
| 04/07/2005 | US20050074693 Addition polymer containing an unsaturated aromatic sulfonamide compound, unsaturated aromatic ether and acrylated resin; exposure to light; forming pattern |
| 04/07/2005 | US20050074692 Lithographic printing plate precursor and lithographic printing method |
| 04/07/2005 | US20050074691 Photosensitive composition for use in stereolithography; an epoxide, an aromatic or cycloaliphatic acrylate, optional hydroxy-containing material, cationic photoinitiator, free-radical photoinitiator; finished product has look and feel of polypropylene |
| 04/07/2005 | US20050074690 Monomers and polymers based on acrylated diamondoids (adamantane, diamantane, triamantane) having optional hydrophilic-moieties and the synthesis thereof; enhanced resolution, sensitivity, and adhesion to the substrate |
| 04/07/2005 | US20050074689 Silicon-containing compositions for spin-on arc/hardmask materials |
| 04/07/2005 | US20050074688 Bottom antireflective coatings |
| 04/07/2005 | US20050074686 Use in optical applications such as immersion lithography; lower absorbance at wavelengths lower than 250 nm; free of chlorine atoms, even in end groups; made by oxidation of tetrafluoroethylene (TFE) in presence of dilute fluorine gas |
| 04/07/2005 | US20050074682 Forming slit features intersecting one another with good reproducibility; photomask has first light-shielding portions each in insular shape that shield exposure light and are spaced equidistantly; second light-shielding portion is formed to contain a point located equidistantly from first portions |
| 04/07/2005 | US20050074679 Method of manufacturing semiconductor device |
| 04/07/2005 | US20050074677 Optical proximity correction (OPC); modifying a mask layout to include scattering bars, which increases the amount of scattering bars included in the mask design, while minimizing the number of individual pieces of scattering bars |
| 04/07/2005 | US20050074676 Chromium oxide film serves as etching stopper formed on diamond film serving as transmitter, and absorptive tungsten layer |
| 04/07/2005 | US20050074616 for use in producing ophthalmic lenses |
| 04/07/2005 | US20050074563 Ionizing radiation curable terpolymer comprising monomers of N-cyclohexylmaleimide, N-benzylmaleimide and/or a substituted N-benzylmaleimide; (meth)acrylic acid; and (meth)acrylic acid ester; blue pigment dispersion containing phthalocyanine; color filters; photopolymerization; discoloration inhibition |
| 04/07/2005 | US20050074552 Spray coating at angle while rotating at varying speed to uniformly cover deep etched features |
| 04/07/2005 | US20050074512 System for creating a turbulent flow of fluid between a mold and a substrate |
| 04/07/2005 | US20050074352 Method and system for active purging of pellice volumes |
| 04/07/2005 | US20050074160 Position detection technique |
| 04/07/2005 | US20050073671 Composite optical lithography method for patterning lines of substantially equal width |
| 04/07/2005 | US20050073670 Method and device for immersion lithography |
| 04/07/2005 | US20050073669 Dual sided lithographic substrate imaging |
| 04/07/2005 | US20050073668 Stage device, exposure apparatus and device manufacturing method |
| 04/07/2005 | US20050073666 Illumination optical system and exposure apparatus having the same |
| 04/07/2005 | US20050073664 photoresists; radiation transparency; level shifting caused by gravitational load is prevented |
| 04/07/2005 | US20050073663 Reflection mirror apparatus, exposure apparatus and device manufacturing method |
| 04/07/2005 | US20050073573 Apparatus and method for processing media |
| 04/07/2005 | US20050072942 EUV source |
| 04/07/2005 | US20050072941 Method of charged particle beam lithography and equipment for charged particle beam lithography |
| 04/07/2005 | US20050072939 Electron beam writing equipment and electron beam writing method |
| 04/07/2005 | US20050072757 Method of creating a turbulent flow of fluid between a mold and a substrate |
| 04/07/2005 | US20050072755 Single phase fluid imprint lithography method |
| 04/07/2005 | US20050072519 Photocurable compositions for articles having stable tensile properties |
| 04/07/2005 | US20050072325 Computer screen imaging system for the preparation of print screens |
| 04/07/2005 | US20050072122 Packaging method for lithographic printing plate |
| 04/07/2005 | DE10344010A1 Wabenkondensor und Beleuchtungssystem damit Honeycomb condenser and lighting system so |
| 04/07/2005 | DE10343323A1 Stempellithografieverfahren sowie Vorrichtung und Stempel für die Stempellithografie Stamp lithography method and apparatus for the stamp and stamp lithography |
| 04/07/2005 | DE10339992A1 Eine Technik zur Erhöhung der Genauigkeit kritischer Abmessungen einer Gateelektrode durch Nutzung von Eigenschaften einer antireflektierenden Beschichtung One technique for increasing the accuracy of critical dimensions of a gate electrode by use of properties of an anti-reflective coating |
| 04/07/2005 | DE10339606A1 Photochemical treating method for forming grooved structures on cylindrical sliding surfaces comprises coating cleaning sliding surfaces with light-sensitive material and drying, exposing the coated cylinder inner, and further processing |
| 04/07/2005 | DE10238420B4 Vorrichtung zur Qualitätssteigerung einer Druckformbelichtung Apparatus for improving the quality of a printing plate exposure |
| 04/07/2005 | CA2530607A1 Device for detecting biological and chemical particles |
| 04/06/2005 | EP1521272A2 Mirror and lithographic apparatus with mirror |
| 04/06/2005 | EP1521155A2 Cooling system, exposure apparatus having the same, and device manufacturing method |
| 04/06/2005 | EP1521123A1 Alkaline Developer for radiation sensitive compositions |
| 04/06/2005 | EP1521122A1 Control of a lithographic apparatus |
| 04/06/2005 | EP1521121A2 Cooling technique |
| 04/06/2005 | EP1521120A2 Substrate holding system and exposure apparatus using the same |
| 04/06/2005 | EP1521119A2 A focusing-device for the radiation from a light source |
| 04/06/2005 | EP1521118A2 Use of perfluoropolyethers in optical systems |
| 04/06/2005 | EP1521111A1 Illumination device |
| 04/06/2005 | EP1521110A1 Device for reducing the optical coherence |
| 04/06/2005 | EP1521106A1 Color filter and process for producing the same |
| 04/06/2005 | EP1521067A2 Optical imaging system |
| 04/06/2005 | EP1520728A2 Method of manufacturing a support for a lithographic printing plate |
| 04/06/2005 | EP1520695A2 Photosensitive composition and image recording material using the same |
| 04/06/2005 | EP1520694A2 Lithographic printing plate precursor and lithographic printing method |
| 04/06/2005 | EP1520211A2 Microelectronic cleaning compositions containing oxidizers and organic solvents |
| 04/06/2005 | EP1520210A2 Optical device comprising an light source |
| 04/06/2005 | EP1520209A1 Heat stable photocurable resin composition for dry film resist |
| 04/06/2005 | EP1520151A1 Cyclic error compensation in interferometry systems |
| 04/06/2005 | EP1155164A4 In situ chemical generator and method |
| 04/06/2005 | EP0995243A4 Wavelength reference for excimer laser |
| 04/06/2005 | EP0900412B1 Lithographic apparatus comprising a positioning device having two object holders |
| 04/06/2005 | CN1605112A Method and apparatus for mitigating cross-contamination between liquid dispensing jets in close proximity to a surface |
| 04/06/2005 | CN1605047A Method of forming optical images, diffration element for use with this method, apparatus for carrying out this method |
| 04/06/2005 | CN1605046A Method and apparatus for patterning a workpiece |
| 04/06/2005 | CN1604849A Photosensitive composition and photosensitive planographic printing plate |
| 04/06/2005 | CN1604275A Pattern formation method |
| 04/06/2005 | CN1603962A Thinner composition for removing photoresist |
| 04/06/2005 | CN1603961A Lithographic apparatus and device manufacturing method |