| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 04/14/2005 | CA2481951A1 Imaging device for a printing form |
| 04/13/2005 | EP1523028A2 Electron beam writing equipment and method |
| 04/13/2005 | EP1523027A2 Method and equipment for charged particle beam lithography |
| 04/13/2005 | EP1522898A2 Developer regenerators |
| 04/13/2005 | EP1522897A2 Developer system |
| 04/13/2005 | EP1522896A2 Illumination optical system and exposure apparatus having the same |
| 04/13/2005 | EP1522895A1 Method of and apparatus for supplying a dynamic protective layer to a mirror |
| 04/13/2005 | EP1522894A2 Semiconductor fabrication apparatus and pattern formation method using the same |
| 04/13/2005 | EP1522893A2 Illumination optical system and exposure apparatus having the same |
| 04/13/2005 | EP1522892A1 Lithographic apparatus and device manufacturing method |
| 04/13/2005 | EP1522891A1 Positive resist composition and pattern forming method using the same |
| 04/13/2005 | EP1522890A2 Packaging method for lithographic printing plate |
| 04/13/2005 | EP1522889A2 Method and apparatus for generating an OPC segmentation |
| 04/13/2005 | EP1522560A1 A radiation curable binder containing carboxylic acid ester |
| 04/13/2005 | EP1522557A1 Polymerizable composition and image recording material containing the same |
| 04/13/2005 | EP1522417A1 Multilayer imageable elements |
| 04/13/2005 | EP1521998A2 Machine for exposing printed circuit boards |
| 04/13/2005 | EP1521997A2 Plasma polymerized electron beam resist |
| 04/13/2005 | EP1521990A2 Compensator for radially symmetric birefringence |
| 04/13/2005 | EP1521942A2 Gas discharge ultraviolet wavemeter with enhanced illumination |
| 04/13/2005 | EP1521797A1 Antireflective silicon-containing compositions as hardmask layer |
| 04/13/2005 | EP1330859A4 Smart laser with fast deformable grating |
| 04/13/2005 | EP1123954B1 Composition for polyimide electrodeposition and method of forming patterned polyimide film with the same |
| 04/13/2005 | EP1038340A4 Narrow band laser with etalon based output coupler |
| 04/13/2005 | EP1012929A4 Laser with line narrowing output coupler |
| 04/13/2005 | EP0998774A4 Wavelength shift correction technique for a laser |
| 04/13/2005 | CN1606797A Resistless lithography method for producing fine structures |
| 04/13/2005 | CN1606791A Electron emitter, cold-cathode field electron emitter, and method for manufacturing cold-cathode field electron emission display |
| 04/13/2005 | CN1606716A Carl for bioelectronics:substrate linkage using a conductive layer |
| 04/13/2005 | CN1606715A Method for optimizing the imaging characteristics of at least two optical elements and photolithographic production process |
| 04/13/2005 | CN1606714A Photoresist composition having a high heat resistance |
| 04/13/2005 | CN1606713A Spincoating antireflection paint for photolithography |
| 04/13/2005 | CN1606130A Correction system and method of correcting deflection distortion, method for manufacturing a semiconductor device |
| 04/13/2005 | CN1606129A Electron beam writing equipment and electron beam writing method |
| 04/13/2005 | CN1606128A Semiconductor fabrication apparatus and pattern formation method using the same |
| 04/13/2005 | CN1605943A Hydrazine free etching liquid |
| 04/13/2005 | CN1605942A Method for processing substrate and medicinal liquid used therefor |
| 04/13/2005 | CN1605941A Method of and apparatus for supplying a dynamic protective layer to a mirror |
| 04/13/2005 | CN1605940A Dynamic cellular automaton method for simulation of photoresist three dimensional etching process |
| 04/13/2005 | CN1605939A Discharge nozzle type positive photoresist composite used for coating method and method for forming anticorrosion pattern |
| 04/13/2005 | CN1605938A Photoresist polymer and photoresist composition containing the same |
| 04/13/2005 | CN1605937A Method for maintaining permissible level of microimage process |
| 04/13/2005 | CN1605936A Photomask and method for forming pattern |
| 04/13/2005 | CN1605934A Exposure device detecting mask, exposure device detecting method and exposure device |
| 04/13/2005 | CN1605893A Method for preparing integrated Prague plane waveguide grating by primary ion exchange process |
| 04/13/2005 | CN1605548A Packaging method for lithographic printing plate |
| 04/13/2005 | CN1605397A Mask blanks and method of producing the same |
| 04/13/2005 | CN1197160C Semiconductor device and its mfg. method |
| 04/13/2005 | CN1196978C Shield nozzle for control of gas spray in super ultraviolet light source |
| 04/13/2005 | CN1196748C Resin composition curable with actinic energy ray |
| 04/13/2005 | CN1196705C Organo-silicon compounds and their use as photoinitiators |
| 04/13/2005 | CN1196602C Thermal transfer element for forming multi-layer devices |
| 04/13/2005 | CN1196586C Planographic printing image using non-etching wet type printing elements |
| 04/12/2005 | US6880135 Method of incorporating lens aberration information into various process flows |
| 04/12/2005 | US6879400 Single tone process window metrology target and method for lithographic processing |
| 04/12/2005 | US6879382 Substrate processing apparatus |
| 04/12/2005 | US6879381 Exposure apparatus, control method for the same, and device fabricating method |
| 04/12/2005 | US6879380 Method for evaluating lithography system, method for adjusting substrate-processing apparatus, lithography system, and exposure apparatus |
| 04/12/2005 | US6879379 Projection lens and microlithographic projection exposure apparatus |
| 04/12/2005 | US6879378 Exposure apparatus and method of conveying mask and work |
| 04/12/2005 | US6879377 Lithographic apparatus and device manufacturing method |
| 04/12/2005 | US6879376 Method and apparatus for exposing photoresists using programmable masks |
| 04/12/2005 | US6879375 Exposure apparatus and method that exposes a pattern onto a substrate |
| 04/12/2005 | US6879374 Device manufacturing method, device manufactured thereby and a mask for use in the method |
| 04/12/2005 | US6879362 Cholesteric liquid crystal color filter and process for producing the same |
| 04/12/2005 | US6879127 3-ring magnetic anti-gravity support |
| 04/12/2005 | US6879063 Displacement device |
| 04/12/2005 | US6878950 Method of reducing heat-induced distortion of photomasks during lithography |
| 04/12/2005 | US6878936 Applications operating with beams of charged particles |
| 04/12/2005 | US6878916 Method for focus detection for optically detecting deviation of the image plane of a projection lens from the upper surface of a substrate, and an imaging system with a focus-detection system |
| 04/12/2005 | US6878634 Structure having recesses and projections, method of manufacturing structure, and functional device |
| 04/12/2005 | US6878577 Method of forming LDD of semiconductor devices |
| 04/12/2005 | US6878508 Resist patterning process |
| 04/12/2005 | US6878507 Semiconductor processing methods |
| 04/12/2005 | US6878506 Method for manufacturing semiconductor device |
| 04/12/2005 | US6878505 Storage stability; workability; for lithographic printing plate which is highly sensitive to short oscillation wavelengths of semiconductor laser |
| 04/12/2005 | US6878504 Chemically-amplified resist compositions |
| 04/12/2005 | US6878503 Capable of being imagewise recorded by scanning exposure with an infrared laser beam based on digital signals, can be mounted on a printing machine without being subjected to a conventional developing |
| 04/12/2005 | US6878502 Resin which comprises a specified repeating units and (B) a compound capable of generating an acid upon irradiation with one of an actinic ray and a radiation. |
| 04/12/2005 | US6878501 Polymer, chemically amplified resist composition and patterning process |
| 04/12/2005 | US6878500 Removal of photodefinable materials such as photoresists from a substrate using as a solvent an alkyl or alkyleneoxy ester of acetic acid, propanoic acid or lactic acid, especially isobutyl, tert-butyl, isoamyl or hexyl acetate |
| 04/12/2005 | US6878470 Suitable for printing using aqueous ink; excellent coloring properties with respect to colorant; electroluminescence element that is excellent in sharpness of pixels and durability; can be subjected to uniform and local patterning |
| 04/12/2005 | US6878417 Molecules adsorb at surfaces in patterns and then the surface is imprinted with the pattern by inducing localized chemical reaction between adsorbate molecules and the surface of the solid |
| 04/12/2005 | US6878042 Devices and methods for holding an optical element with reduced stress in an optical column and while performing an out-of-column procedure on the element |
| 04/12/2005 | US6877428 Separate developing step independent of a printing step; lithography |
| 04/10/2005 | CA2484031A1 Radiation-curing binders containing carboxylic acid esters |
| 04/07/2005 | WO2005031855A1 Fabrication method |
| 04/07/2005 | WO2005031824A1 Projection exposure device, projection exposure method, and device manufacturing method |
| 04/07/2005 | WO2005031823A1 Liquid immersion type lens system and projection aligner, device production method |
| 04/07/2005 | WO2005031822A1 Working chamber, maintenance method, exposure apparatus, and environment chamber |
| 04/07/2005 | WO2005031821A1 Optical system, exposure system, and production methods therefor |
| 04/07/2005 | WO2005031820A1 Projection exposure apparatus, cleaning and maintenance methods of projection exposure apparatus, and method of producing device |
| 04/07/2005 | WO2005031801A2 Apparatus for multiple beam deflection and intensity stabilization |
| 04/07/2005 | WO2005031799A2 Exposure apparatus, exposure method, and device manufacturing method |
| 04/07/2005 | WO2005031748A1 Oblique reflector normal incidence collector system for light sources, in particular for euv plasma discharge sources |
| 04/07/2005 | WO2005031468A1 Near-field light generating method near-field exposure mask and near-field exposure method and apparatus |
| 04/07/2005 | WO2005031467A2 Microlithographic projection exposure |
| 04/07/2005 | WO2005031466A1 Method of determining optical properties and projection exposure system comprising a wave front detection system |
| 04/07/2005 | WO2005031465A2 Immersion lithography method and device for illuminating a substrate |
| 04/07/2005 | WO2005031464A1 Positive resist composition and resist laminate for low-acceleration electron beam and method of pattern formation |