| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 04/19/2005 | US6882674 Four KHz gas discharge laser system |
| 04/19/2005 | US6882477 Method and system for interference lithography utilizing phase-locked scanning beams |
| 04/19/2005 | US6882417 Method and system for detecting defects |
| 04/19/2005 | US6882408 Reticle transferring support and transferring method thereof |
| 04/19/2005 | US6882407 Exposure apparatus |
| 04/19/2005 | US6882406 Euv lithographic projection apparatus comprising an optical element with a self-assembled monolayer, optical element with a self-assembled monolayer, method of applying a self-assembled monolayer, device manufacturing method and device manufactured thereby |
| 04/19/2005 | US6882405 Off-axis levelling in lithographic projection apparatus |
| 04/19/2005 | US6882403 Lithography system and method |
| 04/19/2005 | US6881991 Dry-etching method and apparatus, photomasks and method for the preparation thereof, and semiconductor circuits and method for the fabrication thereof |
| 04/19/2005 | US6881971 Arrangement for the suppression of particle emission in the generation of radiation based on hot plasma |
| 04/19/2005 | US6881965 Multi-foil optic |
| 04/19/2005 | US6881534 Method of forming mask, method of forming patterned thin film, and method of fabricating micro device |
| 04/19/2005 | US6881533 Flexographic printing plate with ink-repellent non-image areas |
| 04/19/2005 | US6881532 Method of processing light sensitive planographic printing plate precursor and pre-washing solution used in the method |
| 04/19/2005 | US6881531 Resist material and exposure method |
| 04/19/2005 | US6881530 Thin film sol-gel derived glass |
| 04/19/2005 | US6881529 Positive photoresist transfer material and method for processing surface of substrate using the transfer material |
| 04/19/2005 | US6881526 A process for adjusting the energy of an imaging laser for imaging of a thermally imageable element including the steps of: (a) providing an imaging unit having a non-imaging laser and an imaging laser, the nonimaging laser having a light |
| 04/19/2005 | US6881524 Photolithography method including a double exposure/double bake |
| 04/19/2005 | US6881369 Microelectroforming mold using a preformed metal as the substrate and the fabrication method of the same |
| 04/19/2005 | US6881058 Apparatus for processing substrate and method of processing the same |
| 04/19/2005 | US6880942 Adaptive optic with discrete actuators for continuous deformation of a deformable mirror system |
| 04/19/2005 | US6880724 System and method for supplying photoresist |
| 04/19/2005 | US6880462 Apparatus and method for peeling a printing plate from a stack of plates |
| 04/19/2005 | CA2163551C Energy-curable cyanate/ethylenically unsaturated compositions |
| 04/14/2005 | WO2005034594A1 Method of forming through hole in photosensitive glass substrate |
| 04/14/2005 | WO2005034211A2 Sacrificial surfactanated pre-wet for defect reduction in a semiconductor photolithography developing process |
| 04/14/2005 | WO2005034193A2 Single scan irradiation for crystallization of thin films |
| 04/14/2005 | WO2005034174A2 Method and device for immersion lithography |
| 04/14/2005 | WO2005033802A2 Discharge lamp |
| 04/14/2005 | WO2005033801A2 Adaptive thermal control of lithographic chemical processes |
| 04/14/2005 | WO2005033800A1 Lithography lens system and projection exposure system provided with at least one lithography lens system of this type |
| 04/14/2005 | WO2005033799A2 Spin-printing of electronic and display components |
| 04/14/2005 | WO2005033797A2 Single phase fluid imprint lithography method |
| 04/14/2005 | WO2005032840A1 Antistatic conductive grid pattern with integral logo |
| 04/14/2005 | WO2005017626A3 Group iia metal fluoride single crystals for lithography below 200 nm and method for selecting such crystals |
| 04/14/2005 | WO2005003864A3 Apparatus and method for providing a confined liquid for immersion lithography |
| 04/14/2005 | WO2005003859A3 Resist composition |
| 04/14/2005 | WO2004113826A3 Compensation for imperfections in a measurement object and for beam misalignments in plane mirror interferometers |
| 04/14/2005 | WO2004105046A3 Scanning probe microscopy probe and method for scanning probe contact printing |
| 04/14/2005 | WO2004104698A3 Dielectric materials to prevent photoresist poisoning |
| 04/14/2005 | WO2004102224A3 Axicon system and exposure system equipped with the same |
| 04/14/2005 | WO2004092845A3 Precision motion control using feed forward of acceleration |
| 04/14/2005 | WO2004092237A3 Radiation curable resin layer |
| 04/14/2005 | WO2004090965A3 Organosilicate resin formulation for use in microelectronic devices |
| 04/14/2005 | WO2004079753A3 Reflective optical element and euv lithography appliance |
| 04/14/2005 | WO2004078930A3 Nanometer-controlled polymeric thin films that resist adsorption of biological molecules and cells |
| 04/14/2005 | US20050081179 Method and apparatus for generating an OPC segmentation based on modeled intensity gradients |
| 04/14/2005 | US20050081178 Multiple exposure technique to pattern tight contact geometries |
| 04/14/2005 | US20050080174 Radiation-curing binders containing carboxylic acid esters |
| 04/14/2005 | US20050079650 Device including an amorphous carbon layer for improved adhesion of organic layers and method of fabrication |
| 04/14/2005 | US20050079639 Developing method, substrate treating method, and substrate treating apparatus |
| 04/14/2005 | US20050079601 Apparatus comprising rotatable mirrors and ultraviolet emission source for use as tool in DNA and genomic analysis |
| 04/14/2005 | US20050079529 Using laser excitation and fluorescence to identify regions of hybridization along microarray comprised of immobilized polynucleotides; gene expression analysis; genomics |
| 04/14/2005 | US20050079454 Contrast enhancement materials containing non-PFOS surfactants |
| 04/14/2005 | US20050079452 Developer regenerators |
| 04/14/2005 | US20050079451 Processes for treating a substrate and removing resist from a substrate |
| 04/14/2005 | US20050079450 Method for manufacturing ceramic green sheet and method for manufacturing electronic part using that ceramic green sheet |
| 04/14/2005 | US20050079449 Apparatus and method of fabricating thin film transistor array substrate |
| 04/14/2005 | US20050079448 Method for forming resist pattern |
| 04/14/2005 | US20050079447 A polyurethane containing ethylene glycol and an ethylenically unsaturated group; the display member has a post-firing pattern without any defects |
| 04/14/2005 | US20050079446 Base resin polymer for a positive-resist composition of acrylic ester monomers with pendant adamantine and norbornene groups ; high sensitivity, high resolution in exposure with a high energy beam, reduced line edge roughness due to suppressed swelling at the time of development |
| 04/14/2005 | US20050079445 improvement in resolution, a reduction in LER (line edge roughness) and level of defects |
| 04/14/2005 | US20050079443 Radiation-sensitive polymer composition and pattern forming method using the same |
| 04/14/2005 | US20050079442 An acrylic, low glass transition temperature, graft copolymer binder component, having an alkali resistant backbone-segment and a pendant arm segment comprising hydrophilic moieties, and a thiophene-type adhesion promoter; flexible, aqueous processible |
| 04/14/2005 | US20050079441 A resin whose solubility increases in an alkali developer by acid action, a triarylsulfonium salt optionally with fluorine atoms in the cation portion, a nitrogen-containing base, and an organic solvent; improved resolution, sensitivity, initial particle level, profile, and curvature reproducibility |
| 04/14/2005 | US20050079440 Novel polymer, positive resist composition, and patterning process using the same |
| 04/14/2005 | US20050079439 Imageable composition containing an infrared absorber with counter anion derived from a non-volatile acid |
| 04/14/2005 | US20050079438 Photoresists with reduced outgassing for extreme ultraviolet lithography |
| 04/14/2005 | US20050079437 applying a mixture of novolacs, photosensitizers and acid generators to substrate surfaces, then silylating and exposing to infrared radiation |
| 04/14/2005 | US20050079436 An alkali soluble acrylic resin, a photosensitizer containing a quinone diazide group, a solvent mixture of propylene glycol monomethyl ether acetate and a hardening agent containing epoxy groups; interlayer dielectrics, flat panel displays, planarization films, and semiconductors |
| 04/14/2005 | US20050079432 Multilayer imageable elements |
| 04/14/2005 | US20050079428 Preparing a photomask, forming latent images on the first photoresist film, calculating defocus values, forming latent images on a second resist film; photolithography, miniaturization; detailed focus correction based on pressure |
| 04/14/2005 | US20050079331 Manufacturing method of optical device provided with resin thin film having micro-asperity pattern |
| 04/14/2005 | US20050078386 Retainer, exposure apparatus, and device fabrication method |
| 04/14/2005 | US20050078319 Surface profiling using an interference pattern matching template |
| 04/14/2005 | US20050078318 Methods and systems for interferometric analysis of surfaces and related applications |
| 04/14/2005 | US20050078294 Method of forming optical images, diffration element for use with this method, apparatus for carrying out this method |
| 04/14/2005 | US20050078293 Methods and systems for controlling radiation beam characteristics for microlithographic processing |
| 04/14/2005 | US20050078292 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 04/14/2005 | US20050078291 Lithographic apparatus, device manufacturing method, and computer program |
| 04/14/2005 | US20050078290 Alignment apparatus, exposure apparatus, and device manufacturing method |
| 04/14/2005 | US20050078288 Lithographic apparatus and interferometer system |
| 04/14/2005 | US20050078287 Lithographic apparatus and device manufacturing method |
| 04/14/2005 | US20050078286 Lithographic apparatus and device manufacturing method |
| 04/14/2005 | US20050078285 System for adjusting a photo-exposure time |
| 04/14/2005 | US20050078284 Lithographic apparatus and device manufacturing method |
| 04/14/2005 | US20050078167 Imaging device for a printing press |
| 04/14/2005 | US20050078085 Data input device power management including beacon state |
| 04/14/2005 | US20050077833 Emitter for electron-beam projection lithography system, and method of manufacturing and operating the emitter |
| 04/14/2005 | US20050077786 Lithographic apparatus and device manufacturing method |
| 04/14/2005 | US20050077484 Method and system for improved trajectory planning and execution |
| 04/14/2005 | US20050077483 Radiation system, contamination barrier, lithographic apparatus, device manufacturing method and device manufactured thereby |
| 04/14/2005 | US20050077475 Multi-charged beam lens and charged beam exposure apparatus using the same |
| 04/14/2005 | US20050077285 Device for homogeneous heating of an object |
| 04/14/2005 | US20050076801 Comprises replenisher and regenerator to maintain activity; for printing plate precursors |
| 04/14/2005 | DE19754867B4 Spaltabtast-Projektionsbelichtungsgerät und Halbleitereinrichtung Spaltabtast projection exposure apparatus and semiconductor device |
| 04/14/2005 | DE10343333A1 Illumination system for microlithography projection exposure system, has mirror arrangement with array of individual mirrors that is controlled individually by changing angular distribution of light incident on mirror arrangement |
| 04/14/2005 | DE10341594A1 Arrangement for highly precise positioning and measuring of objects placed on an object table, e.g. for use in producing microstructures in semiconductor manufacturing, has an interferometer block and measurement mirrors |
| 04/14/2005 | DE10339786A1 Half-tone phase mask for projection of its structure onto substrate in manufacturing integrated circuits with periodical setting fully transparent and semi-transparent structure |