| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 04/27/2005 | CN1609133A Polyamide resin, positive-working photosensitive resin composition, and method for producing pattern-formed resin film, semiconductor device, display element and manufacturing method thereof |
| 04/27/2005 | CN1608861A Printing plate precursor of negative thermal lithographic printing containing smooth aluminium carrier |
| 04/27/2005 | CN1199257C Fine graphic forming method and method for making semiconductor device using the same |
| 04/27/2005 | CN1199242C Substrate treatment equipment and substrate treatment method |
| 04/27/2005 | CN1199240C Method for forming bottom anti-reflective coating using rapid thermal anneal with oxidizing gas |
| 04/27/2005 | CN1199239C Coating and developing system |
| 04/27/2005 | CN1199238C Method and system for coating and developing |
| 04/27/2005 | CN1199234C Method and device for forming film |
| 04/27/2005 | CN1199086C Lighting system, projecting exposure apparatus and device making process |
| 04/27/2005 | CN1198863C Energy ray solidification type resin composition |
| 04/27/2005 | CN1198831C Organic metal monoacylalkylphosphine compound |
| 04/26/2005 | US6886154 Multiple-exposure drawing apparatus and method thereof |
| 04/26/2005 | US6886153 Design driven inspection or measurement for semiconductor using recipe |
| 04/26/2005 | US6885908 Method of determining movement sequence, alignment apparatus, method and apparatus of designing optical system, and medium in which program realizing the designing method |
| 04/26/2005 | US6885503 Achromatic fresnel optics based lithography for short wavelength electromagnetic radiations |
| 04/26/2005 | US6885502 Radial polarization-rotating optical arrangement and microlithographic projection exposure system incorporating said arrangement |
| 04/26/2005 | US6885491 Diffraction-optical component, illumination system and exposure system comprising such a diffraction-optical component as well as an exposure method employing such an exposure system |
| 04/26/2005 | US6885488 Semiconductor device and method for forming the same using cubic crystalline optical system with reduced birefringence |
| 04/26/2005 | US6885450 Apparatus for detecting optical positional deviation |
| 04/26/2005 | US6885437 Mask exchanging method and exposure apparatus |
| 04/26/2005 | US6885436 Optical error minimization in a semiconductor manufacturing apparatus |
| 04/26/2005 | US6885435 Method, system, and apparatus for management of reaction loads in a lithography system |
| 04/26/2005 | US6885434 Diaphragm for an integrator unit |
| 04/26/2005 | US6885433 Projection exposure apparatus and method |
| 04/26/2005 | US6885432 Projection exposure apparatus and device manufacturing method |
| 04/26/2005 | US6885431 Exposure apparatus and method of manufacturing a semiconductor device using the same |
| 04/26/2005 | US6885430 System and method for resetting a reaction mass assembly of a stage assembly |
| 04/26/2005 | US6885429 System and method for automated focus measuring of a lithography tool |
| 04/26/2005 | US6885425 Active plate for a display device having a conductive layer with increased conductivity |
| 04/26/2005 | US6885276 Photosensitive thick film composition and electronic device using the same |
| 04/26/2005 | US6885117 Magnetic actuator under piezoelectric control |
| 04/26/2005 | US6885015 Thermionic-cathode for pre-ionization of an extreme ultraviolet (EUV) source supply |
| 04/26/2005 | US6884984 System and method for lithography process monitoring and control |
| 04/26/2005 | US6884735 Materials and methods for sublithographic patterning of gate structures in integrated circuit devices |
| 04/26/2005 | US6884571 Process comprising (A) an octakis(silsesquioxane) skeleton-containing polymer obtained by hydrosilylation polymerization of a compound represented by formula (I) defined in the specification with bis(substituted ethynyl) compound with |
| 04/26/2005 | US6884570 Actinic ray-curable urethane resin containing vinyl ether, vinyl ester or propenyl ester groups |
| 04/26/2005 | US6884568 Stabilized infrared-sensitive polymerizable systems |
| 04/26/2005 | US6884567 For use in photolithography |
| 04/26/2005 | US6884566 Addition polymer containing organosilicon compound and unsaturated compound |
| 04/26/2005 | US6884565 Planographic printing plate precursor |
| 04/26/2005 | US6884564 Fluorinated polymers having ester groups and photoresists for microlithography |
| 04/26/2005 | US6884562 Photosensitive mixtures of comb polymers and acid generators, having high clarity, good development and etch resistance, used to form relief images |
| 04/26/2005 | US6884561 Actinically imageable and infrared heated printing plate |
| 04/26/2005 | US6884560 Lithographic printing plate precursor |
| 04/26/2005 | US6884554 Semiconductor wafer tilt compensation by wafer rotation and wafer tilt averaging |
| 04/26/2005 | US6884552 Focus masking structures, focus patterns and measurements thereof |
| 04/26/2005 | US6884551 Exposing the substrate using a mask containing gray-tone features |
| 04/26/2005 | US6884462 Solvent prewet and method to dispense the solvent prewet |
| 04/26/2005 | US6884361 Method for making a mirror for photolithography |
| 04/26/2005 | US6884298 Method and system for coating and developing |
| 04/26/2005 | US6883428 Method of conveying recording material and device for controlling conveying of recording material |
| 04/26/2005 | US6883283 Semiconductor manufacturing facility and a semiconductor manufacturing method |
| 04/21/2005 | WO2005036624A1 Exposure apparatus, exposure method, and device producing method |
| 04/21/2005 | WO2005036623A1 Substrate transporting apparatus and method, exposure apparatus and method, and device producing method |
| 04/21/2005 | WO2005036622A1 Substrate carrying apparatus, exposure apparatus, and method for producing device |
| 04/21/2005 | WO2005036621A1 Substrate carrying apparatus, substrate carrying method, exposure apparatus, exposure method, and method for producing device |
| 04/21/2005 | WO2005036620A1 Exposure method, exposure device, and device manufacturing method |
| 04/21/2005 | WO2005036619A1 Illumination optical device, and exposure device and method |
| 04/21/2005 | WO2005036618A1 Stage device and exposure device |
| 04/21/2005 | WO2005036592A2 Control of overlay registration |
| 04/21/2005 | WO2005036278A1 Holographic recording medium and method for manufacturing the same |
| 04/21/2005 | WO2005036274A2 Optical lithography method for patterning lines of equal width |
| 04/21/2005 | WO2005036273A2 Composite optical lithography method for patterning lines of significantly different widths |
| 04/21/2005 | WO2005036272A1 Method for radiation treating an optical system |
| 04/21/2005 | WO2005036271A2 Systems and methods for fabricating microstructures by imaging a radiation sensitive layer sandwiched between outer layers, and microstructures fabricated thereby |
| 04/21/2005 | WO2005036270A1 Radiation-curing composition, method for storing same, method for forming cured film, method for forming pattern, method for using pattern, electronic component, and optical waveguide |
| 04/21/2005 | WO2005036269A1 Radiation-curing composition, method for storing same, method for forming cured film, method for forming pattern, method for using pattern, electronic component, and optical waveguide |
| 04/21/2005 | WO2005036268A1 Photoresist composition |
| 04/21/2005 | WO2005036267A2 Photosensitive resin compositions and photosensitive dry films using the same |
| 04/21/2005 | WO2005036266A1 Masks, lithography device and semiconductor component |
| 04/21/2005 | WO2005036265A2 Photoresist compositions comprising diamondoid derivatives |
| 04/21/2005 | WO2005036261A1 Negative resist composition with fluorosulfonamide-containing polymer |
| 04/21/2005 | WO2005035828A1 Photoresist stripping composition |
| 04/21/2005 | WO2005035602A1 Photoresist resin and photoresist resin composition |
| 04/21/2005 | WO2005035591A1 Arylsulfinate salts in photoinitiator systems for polymerization reactions |
| 04/21/2005 | WO2005035590A1 Arylsulfinate salts in initiator systems for polymeric reactions |
| 04/21/2005 | WO2005035438A1 Method for patterning a substrate surface |
| 04/21/2005 | WO2005035435A2 Systems and methods for mastering microstructures through a substrate using negative photoresist and microstructure masters so produced |
| 04/21/2005 | WO2005035257A1 Elastomeric stamp, patterning method using such a stamp and method for producing such a stamp |
| 04/21/2005 | WO2005034885A1 Photoinitiators having triarylsulfonium and arylsulfinate ions |
| 04/21/2005 | WO2005022269A3 Pattern recognition and metrology structure for an x-initiative layout design |
| 04/21/2005 | WO2005015309A3 Alkali-developable radiation curable composition |
| 04/21/2005 | WO2005003858A3 Compositions comprising photoacid generators |
| 04/21/2005 | WO2005001572A3 Lithographic apparatus and device manufacturing method |
| 04/21/2005 | WO2004110607A3 Multiphoton photosensitization method |
| 04/21/2005 | WO2004099373A3 Biocompatible resists |
| 04/21/2005 | WO2004090577A3 Maintaining immersion fluid under a lithographic projection lens |
| 04/21/2005 | WO2004066455A3 Projection illumination unit with an illumination system |
| 04/21/2005 | WO2004011161A3 Manipulating device for photomasks that provides possibilities for cleaning and inspection of photomasks |
| 04/21/2005 | WO2004010220A8 Nozzle assembly for applying a liquid to a substrate |
| 04/21/2005 | US20050086629 Method of defining forbidden pitches for a lithography exposure tool |
| 04/21/2005 | US20050085587 Protective coating blend of solvent and phenol-formaldehyde resole with crosslinking agent and promoter |
| 04/21/2005 | US20050085094 Integrated ashing and implant annealing method using ozone |
| 04/21/2005 | US20050085093 Integrated ashing and implant annealing method |
| 04/21/2005 | US20050085090 Method for controlling accuracy and repeatability of an etch process |
| 04/21/2005 | US20050085085 Composite patterning with trenches |
| 04/21/2005 | US20050085078 Light absorbent agent polymer useful for organic anti-reflective coating, its preparation method and organic anti-reflective coating composition comprising the same |
| 04/21/2005 | US20050085076 Inorganic compound for removing polymers in semiconductor processes |
| 04/21/2005 | US20050084807 Reducing photoresist line edge roughness using chemically-assisted reflow |
| 04/21/2005 | US20050084806 Wiring pattern (mask layout) in the form of a line including angled portions with a local difference in line width is divided into rectangular patterns each having a large area and node portions interconnecting the rectangular patterns; high correction accuracy |