| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
|---|
| 04/21/2005 | US20050084805 Method for forming patterned ITO structure by using photosensitive ITO solution |
| 04/21/2005 | US20050084804 Diamond-like composition acts as a release layer and is radiation transparent; use in imprint lithography |
| 04/21/2005 | US20050084803 Method of manufacturing lithographic printing plate |
| 04/21/2005 | US20050084802 High sensitivity, excellent on-press developability and high printing durability; light sensitive layer has a water insoluble sensitizing dye that is soluble in an organic solvent, and particles to which the sensitizing dye is adhered |
| 04/21/2005 | US20050084798 Light absorbent agent polymer useful for organic anti-reflective coating, its preparation method and organic anti-reflective coating composition comprising the same |
| 04/21/2005 | US20050084796 Resist compositions and patterning process |
| 04/21/2005 | US20050084795 (Meth)acrylic acid-alkyl acrylate copolymer, distilled water and an amine salt of a halide or carboxylate or a crown compound; neutralize acid produced in the upper portion of a photoresist film to uniform the vertical distribution of the acids allowing vertical and fine patterns to be obtained |
| 04/21/2005 | US20050084794 Altering the liquid-contact properties of the photoresist by adding constituent(s) such as a hydrophobic ionic photoacid generator or a non-ionic photoacid generator into the liquid photoresist; reducing diffusion between the photoresist and the water; liquid immersion lithography |
| 04/21/2005 | US20050084793 Methods and compositions for reducing line wide roughness |
| 04/21/2005 | US20050084792 salt of hydrofluoric acid with a non-metal base, a water-soluble organic solvent, a mercapto group containing corrosion inhibitor, and water; protects aluminum and copper wiring from corrosion while stripping photoresist films and post-ashing residues; nonprecipitating corrosion inhibitor |
| 04/21/2005 | US20050084791 Method and apparatus for thermal development |
| 04/21/2005 | US20050084790 Color developer composition and imaging element containing same |
| 04/21/2005 | US20050084789 Substrate of polyolefin or a copolymer thereof, wherein said substrate has a density of greater than 0.9 grams/cc; support free of paper fiber; high stiffness, excellent surface uniformity and smoothness, high opacity, humidity curl resistance, recyclable |
| 04/21/2005 | US20050084788 Method of coating a multilayered element |
| 04/21/2005 | US20050084783 Light or heat sensitive image microcapsules and developer; interior and exterior protective overcoatings; ultraviolet radiation and wear resistance; waterproof; cushions against damage by handling |
| 04/21/2005 | US20050084782 Exposure method and exposure management system |
| 04/21/2005 | US20050084780 X/Y alignment vernier and method of fabricating same |
| 04/21/2005 | US20050084778 Reticle alignment procedure |
| 04/21/2005 | US20050084776 Process for production of pattern-forming body |
| 04/21/2005 | US20050084772 Mask for exposing an alignment mark, and method and computer program for designing the mask |
| 04/21/2005 | US20050084766 lithography using computer controlled imaging layouts, such as spatial light modulators (SLM), with an improved virtual grid |
| 04/21/2005 | US20050084689 organometallic compounds containing a hydrazine compound complexed with metals, that can be thermally decomposed at low temperatures and converted into metals or metal oxides, on substrates; impressions having high durability and conductivity |
| 04/21/2005 | US20050084620 Method for applying a layer containing at least polymeric material |
| 04/21/2005 | US20050084613 coating surfaces of substrates with a liquid layers, then positioning molds having recesses defining copies of the nanopattern in proximity with the liquid layer to cause the liquid layer to self-fill the recesses of the mold and transforming the layer to form films to that retain the patterns |
| 04/21/2005 | US20050084187 Hydrodynamic bearing apparatus and stage apparatus using the same |
| 04/21/2005 | US20050083983 Relax gas discharge laser lithography light source |
| 04/21/2005 | US20050083583 Compact 1 1/2-waist system for sub 100nm arf lithography |
| 04/21/2005 | US20050083532 Methods for making holographic reticles for characterizing optical systems |
| 04/21/2005 | US20050083518 Mask for use in measuring flare, method of manufacturing the mask, method of identifying flare-affected region on wafer, and method of designing new mask to correct for flare |
| 04/21/2005 | US20050083511 Computer architecture for and method of high-resolution imaging using a low-resolution image transducer |
| 04/21/2005 | US20050083510 Assembly for exposing a double-sided printed circuit panel to light and installation comprising at least one such exposure assembly |
| 04/21/2005 | US20050083509 Apparatus for exposing substrate materials |
| 04/21/2005 | US20050083508 Lithographic apparatus, device manufacturing method, and slide assembly |
| 04/21/2005 | US20050083507 Projection exposure system for microlithography and method for generating microlithographic images |
| 04/21/2005 | US20050083506 Projection exposure system for microlithography and method for generating microlithographic images |
| 04/21/2005 | US20050083505 System and method for laser beam expansion |
| 04/21/2005 | US20050083504 Lithographic apparatus and device manufacturing method |
| 04/21/2005 | US20050083503 Multi mirror system for an illumination system |
| 04/21/2005 | US20050083502 Exposure device |
| 04/21/2005 | US20050083501 Scanning exposure apparatus and device manufacturing method |
| 04/21/2005 | US20050083500 Lithographic apparatus and device manufacturing method |
| 04/21/2005 | US20050083499 Safety mechanism for a lithographic patterning device |
| 04/21/2005 | US20050083498 [dynamic mask module] |
| 04/21/2005 | US20050083497 Composite printing |
| 04/21/2005 | US20050083496 Lithographic apparatus and device manufacturing method |
| 04/21/2005 | US20050083398 Plate scanning system with field replaceable laser source subsystem |
| 04/21/2005 | US20050083243 Control of overlay registration |
| 04/21/2005 | US20050083006 Electromagnetic alignment and scanning apparatus |
| 04/21/2005 | US20050082641 Flexible and elastic dielectric integrated circuit |
| 04/21/2005 | US20050082626 Membrane 3D IC fabrication |
| 04/21/2005 | US20050082559 Mask and method for using the mask in lithographic processing |
| 04/21/2005 | US20050082496 Method and apparatus for image formation |
| 04/21/2005 | US20050082254 Product and method for protecting metal during etching |
| 04/21/2005 | US20050082253 Applying imprinting material to substrates employing electromagnetic fields |
| 04/21/2005 | US20050081996 determining/estimating in advance the relation of photoresist dissolution concentration in developing solution and resist dissolution speed, then developing; photolithography; for production of semiconductors |
| 04/21/2005 | US20050081777 Optical member, method of manufacturing the same, and projection exposure system |
| 04/21/2005 | DE19853588B4 Halteeinrichtung für ein Substrat Holding means for a substrate |
| 04/21/2005 | DE10324502B3 Photomaske, sowie Verfahren zur Herstellung von Halbleiter-Bauelementen Photomask, and to processes for the production of semiconductor devices |
| 04/21/2005 | DE10103707B4 Halterung zum Positionieren eines Objektträgers sowie Vorrichtung zum Laserschneiden von Präparaten Holder for positioning a microscope slide and apparatus for laser cutting preparations |
| 04/21/2005 | CA2540570A1 Photoresist compositions comprising diamondoid derivatives |
| 04/20/2005 | EP1524560A1 System for illuminating two sides of a printed circuit board and apparatus with at least one such system |
| 04/20/2005 | EP1524559A2 Hydrodynamic bearing apparatus and stage apparatus using the same |
| 04/20/2005 | EP1524558A1 Lithographic apparatus and device manufacturing method |
| 04/20/2005 | EP1524557A1 Lithographic apparatus and device manufacturing method |
| 04/20/2005 | EP1524556A1 Lithographic apparatus, device manufacturing method and positioning system |
| 04/20/2005 | EP1524555A1 Lithographic apparatus and device manufacturing method |
| 04/20/2005 | EP1524554A2 Curable silicone resin composition |
| 04/20/2005 | EP1524553A2 Pattern formation |
| 04/20/2005 | EP1524546A1 Scanning system with field-replaceable laser source subsystem. |
| 04/20/2005 | EP1524111A2 Printing plate material |
| 04/20/2005 | EP1523699A2 Projection objective for a projection exposure apparatus |
| 04/20/2005 | EP1523698A1 Polymerizable composition, polymer, resist, and lithography methods |
| 04/20/2005 | EP1523697A2 Method for the production of photoresist structures |
| 04/20/2005 | EP1523696A2 Defect inspection methods that include acquiring aerial images of a reticle for different lithographic process variables |
| 04/20/2005 | EP1523695A1 Nozzle assembly for applying a liquid to a substrate |
| 04/20/2005 | EP1523692A2 Catadioptric projection objective |
| 04/20/2005 | EP1523528A1 Polymerisable diketopyrrolopyrroles, use of such compounds in colour filters and polymers prepared from these compounds |
| 04/20/2005 | EP1523525A1 Planar optical waveguide assembly and method of preparing same |
| 04/20/2005 | EP1523506A1 New difunctional photoinitiators |
| 04/20/2005 | EP0954768B1 Method and apparatus for wafer-focusing |
| 04/20/2005 | CN1608231A UV curable powder suitable for use as a photoresist |
| 04/20/2005 | CN1608230A Multiphoton photosensitization system |
| 04/20/2005 | CN1607975A Chemical liquid supplying device and method for venting air |
| 04/20/2005 | CN1607649A Forming method of contact hole and manufacturing method of semiconductor device |
| 04/20/2005 | CN1607640A Method of charged particle beam lithography and equipment for charged particle beam lithography |
| 04/20/2005 | CN1607639A Fabrication method of a semiconductor device |
| 04/20/2005 | CN1607466A Pattern formation |
| 04/20/2005 | CN1607465A Emitter for electron-beam projection lithography system, and method of manufacturing and operating the emitter |
| 04/20/2005 | CN1607464A Method for fabricating high density nano structure using atomic photoetching technique |
| 04/20/2005 | CN1607463A Acoustooptic frequency modulation single exposure imaging interference photo-etching method and system thereof |
| 04/20/2005 | CN1607462A Ordinary light source closefitting type nano photo-etching optical device |
| 04/20/2005 | CN1607461A Resist polymer, resist composition and patterning process |
| 04/20/2005 | CN1607460A Polarizing film mask slice with high resolution |
| 04/20/2005 | CN1607101A Imaging device for a printing form |
| 04/20/2005 | CN1198334C 半导体器件 Semiconductor devices |
| 04/20/2005 | CN1198181C Photoresist compositions comprising polycyclic polymers with acid labile pendant groups |
| 04/20/2005 | CN1197852C High molecular monomer of chemical amplification type light resistance agent compson. |
| 04/19/2005 | US6883159 Patterning semiconductor layers using phase shifting and assist features |
| 04/19/2005 | US6883158 Method for error reduction in lithography |
| 04/19/2005 | US6882742 Method and apparatus for providing a bioinformatics database |