| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 04/28/2005 | WO2005038524A2 Novel photosensitive resin compositions |
| 04/28/2005 | WO2005038523A2 Imprint lithography templates having alignment marks |
| 04/28/2005 | WO2005038522A2 Transparent invisible conductive grid |
| 04/28/2005 | WO2005038340A2 Lithography illumination device |
| 04/28/2005 | WO2005037931A1 Pigment dispersion liquid, process for producing the same, colored resin composition, color filter and liquid crystal display |
| 04/28/2005 | WO2005037846A1 Silane compound, polysiloxane and radiation-sensitive resin composition |
| 04/28/2005 | WO2005037446A2 Applying imprinting material to substrates employing electromagnetic fields |
| 04/28/2005 | WO2005014515A3 Clear photopolymerizable systems for the preparation of high thickness coatings |
| 04/28/2005 | WO2005010618A3 Modulator circuitry |
| 04/28/2005 | WO2004107048A3 Microlithographic projection exposure system |
| 04/28/2005 | WO2004053938A3 Programmable photolithographic mask based on nano-sized semiconductor particles |
| 04/28/2005 | US20050091634 Renesting interaction map into design for efficient long range calculations |
| 04/28/2005 | US20050091633 System and method for lithography simulation |
| 04/28/2005 | US20050091014 Performance in model-based OPC engine utilizing efficient polygon pinning method |
| 04/28/2005 | US20050091013 Incorporation of a phase map into fast model-based optical proximity correction simulation kernels to account for near and mid-range flare |
| 04/28/2005 | US20050090925 Method and device for control of the data flow on application of reticles in a semiconductor component production |
| 04/28/2005 | US20050090605 Acid generator and thin film composition containing the same |
| 04/28/2005 | US20050090575 Method and composition for making ceramic parts by stereolithophotography and use in dentistry |
| 04/28/2005 | US20050090570 Composition for forming dielectric film and method for forming dielectric film or pattern using the composition |
| 04/28/2005 | US20050090416 Using aqueous solution of 2-ethylaminoethyl-2-ethanol and a hydroxylamine compound of given formula; high flash point; removing photoresist residue for example without damaging underlying layers |
| 04/28/2005 | US20050090120 removing post-etch residue; passivating silicon oxide low-k materials; solution comprises a silylating agent such as hexamethyldisilazane (HMDS), chlorotrimethylsilane (TMCS), trichloromethylsilane (TCMS) |
| 04/28/2005 | US20050090116 Method for etching smooth sidewalls in III-V based compounds for electro-optical devices |
| 04/28/2005 | US20050090114 Method for the production of a semiconductor device |
| 04/28/2005 | US20050089804 Developer for photopolymerizable presensitized plate for use in making lithographic printing plate |
| 04/28/2005 | US20050089803 Method of lift-off microstructuring deposition material on a substrate, substrates obtainable by the method, and use thereof |
| 04/28/2005 | US20050089801 Coating film layer moisture adjusting device and planographic printing plate producing method |
| 04/28/2005 | US20050089800 Photoresist polymer and photoresist composition containing the same |
| 04/28/2005 | US20050089797 Polymers, resist compositions and patterning process |
| 04/28/2005 | US20050089796 Acrylic ester terpolymer having units of a C5-C6 cycloalkyl (meth)acrylate, a hydroxy-adamantanyl acrylate, and acrylate of cyclic lactone; high resolution, patterns with less sidewall roughness, acceptable dry etch resistance, and a good margin allowed for heat treatment temperature after exposure |
| 04/28/2005 | US20050089795 Light sensitive media for optical devices using organic mesophasic materials |
| 04/28/2005 | US20050089794 Silver powder, an organic binder, a photopolymerizable monomer,a photopolymerization initiator and a lead-free glass; |
| 04/28/2005 | US20050089793 a photoresist composition of a polyether; a diphenyl propenol polymerized with epichlorhydrin, an acrylate resin, a curing agent, and an organic solvent; a high curing efficiency, brightness; prevents the formation of remnant in photoresist patterns |
| 04/28/2005 | US20050089792 Low-activation energy silicon-containing resist system |
| 04/28/2005 | US20050089791 Poly(3,4-alkylenedioxythiophene) as organic conductor, a water soluble polymeric photoinitiator containing two or more azide or diazonium groups, a polyacid or salt; crosslinkable |
| 04/28/2005 | US20050089790 Photoresist composition for a spinless coater and method of forming a photoresist pattern using the same |
| 04/28/2005 | US20050089777 Multilayer; dielectric substrate, spacers and masking layer; etching patterns |
| 04/28/2005 | US20050089776 Resist reflow measurement key and method of forming a fine pattern of a semiconductor device using the same |
| 04/28/2005 | US20050089775 Fortified, compensated and uncompensated process-sensitive scatterometry targets |
| 04/28/2005 | US20050089774 for imprint lithography |
| 04/28/2005 | US20050089773 System and method for measuring overlay errors |
| 04/28/2005 | US20050089771 Halftone mask to make photoresist regions of different film thicknesses as a resist pattern |
| 04/28/2005 | US20050089769 External pattern area surrounding the layout pattern area provides registration for accurate allignment |
| 04/28/2005 | US20050089766 Method for improving uniformity and alignment accuracy of contact hole array pattern |
| 04/28/2005 | US20050089763 photolithography mask; a tri-tone partially transmitting phase shift reticle used to form dual damascene openings |
| 04/28/2005 | US20050089762 photolithographic imaging; low resolution imaging tool |
| 04/28/2005 | US20050089733 Patterned ceramic films and method for producing the same |
| 04/28/2005 | US20050089679 Spin-printing of electronic and display components |
| 04/28/2005 | US20050089324 Lithography equipment |
| 04/28/2005 | US20050089211 Simultaneous computation of multiple points on one or multiple cut lines |
| 04/28/2005 | US20050088949 Exposure apparatus of an optical disk master, method of exposing an optical disk master and pinhole mechanism |
| 04/28/2005 | US20050088761 Projection optical system and projection exposure apparatus |
| 04/28/2005 | US20050088760 Illumination system particularly for microlithography |
| 04/28/2005 | US20050088722 Compositions and methods involving direct write optical lithography |
| 04/28/2005 | US20050088664 Method for writing a pattern on a surface intended for use in exposure equipment and for measuring the physical properties of the surface |
| 04/28/2005 | US20050088640 Optimized mirror design for optical direct write |
| 04/28/2005 | US20050088639 Method and apparatus to facilitate separation of a mask and a mask platform |
| 04/28/2005 | US20050088638 Off-axis levelling in lithographic projection apparatus |
| 04/28/2005 | US20050088637 Method and system for a pellicle frame with heightened bonding surfaces (as amended) |
| 04/28/2005 | US20050088636 Scanning exposure technique |
| 04/28/2005 | US20050088635 Lithographic apparatus and device manufacturing method |
| 04/28/2005 | US20050088634 Exposure system and device production process |
| 04/28/2005 | US20050088633 Composite optical lithography method for patterning lines of unequal width |
| 04/28/2005 | US20050088630 Projection optical system, exposure apparatus and device fabricating method |
| 04/28/2005 | US20050088133 Electromagnetic alignment and scanning apparatus |
| 04/28/2005 | US20050088099 Correction system, method of correcting deflection distortion, program and method for manufacturing a semiconductor device |
| 04/28/2005 | US20050087699 Method of evaluating optical element |
| 04/28/2005 | US20050087578 Method and system for correcting web deformation during a roll-to-roll process |
| 04/28/2005 | US20050087289 Method for forming film, method for forming wiring pattern, method for manufacturing semiconductor device, electro-optical device, and electronic device |
| 04/28/2005 | US20050087217 Substrate treating method, substrate-processing apparatus, developing method, method of manufacturing a semiconductor device, and method of cleaning a developing solution nozzle |
| 04/28/2005 | US20050086820 Method for calibration of a metrology stage |
| 04/27/2005 | EP1526584A2 Photosensitive semiconductor nanocrystals, photosensitive composition comprising semiconductor nanocrystals and method for forming semiconductor nanocrystal pattern using the same |
| 04/27/2005 | EP1526550A1 Mirror for use in a lithographic apparatus, lithographic apparatus comprising such a mirror and device manufacturing method |
| 04/27/2005 | EP1526411A1 Apparatus and method for aligning surface |
| 04/27/2005 | EP1526410A1 Method and apparatus for thermal development |
| 04/27/2005 | EP1526409A2 Scanning exposure apparatus and device manufacturing method |
| 04/27/2005 | EP1526408A1 Lithographic apparatus and device manufacturing method, and measurement systems |
| 04/27/2005 | EP1526407A2 An assembly, a lithographic apparatus, and a device manufacturing method |
| 04/27/2005 | EP1526406A1 Photomask |
| 04/27/2005 | EP1525513A2 Infrared-sensitive composition containing a metallocene derivative |
| 04/27/2005 | EP1525512A2 Method of forming and repairing a lithographic template having a gap defect |
| 04/27/2005 | EP1280664A4 Chemical imaging of a lithographic printing plate |
| 04/27/2005 | EP1082182A4 Apparatus and method for providing pulsed fluids |
| 04/27/2005 | EP0968181B1 Perfluorynated sulphone salts, and their uses as ionic conduction materials |
| 04/27/2005 | CN1610942A Method of manufacturing original disk for optical disks, and method of manufacturing optical disk |
| 04/27/2005 | CN1610863A Coating material for pattern fineness enhancement and method of forming fine pattern with the same |
| 04/27/2005 | CN1610487A Assembly for exposure of two sides of a printed circuit board and apparatus with the same exposure assembly |
| 04/27/2005 | CN1610060A Grating alignment procedure |
| 04/27/2005 | CN1609716A A composition containing a photoacid generator monomer and carrier coated with the same and application thereof |
| 04/27/2005 | CN1609715A Top layer of a mirror for use in a lithographic apparatus, mirror for use in a lithographic apparatus, lithographic apparatus comprising such a mirror and device manufacturing method |
| 04/27/2005 | CN1609714A An assembly, a lithographic apparatus, and a device manufacturing method |
| 04/27/2005 | CN1609713A Lithographic apparatus and device manufacturing method, and measurement systems |
| 04/27/2005 | CN1609712A Method for etching smooth sidewalls in III-V based compounds for electro-optical devices |
| 04/27/2005 | CN1609711A Method for controlling accuracy and repeatability of an etch process |
| 04/27/2005 | CN1609710A Method for forming patterned ITO structure by using photosensitive ITO solution |
| 04/27/2005 | CN1609709A 黑色感光性树脂组合物 Black photosensitive resin composition |
| 04/27/2005 | CN1609708A Positive type photoresist composition for manufacturing system LCD, and method for forming resist pattern |
| 04/27/2005 | CN1609707A Over-coating composition for photoresist and process for forming photoresist pattern using the same |
| 04/27/2005 | CN1609706A Method for patterning metal layer and method for producing metal internal connection wire |
| 04/27/2005 | CN1609689A Reflective and semi-transmission type liquid crystal display device and producing method thereof |
| 04/27/2005 | CN1609638A Color filter composition, and method and device for manufacturing color filter using the same |