Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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05/05/2005 | US20050093502 Stage with isolated actuators for low vacuum environment |
05/05/2005 | US20050093441 Flat display device and method of manufacturing the same |
05/05/2005 | US20050093378 Alignment stage apparatus |
05/05/2005 | US20050093102 Mixed lvr and hvr reticle set design for the processing of gate arrays, embedded arrays and rapid chip products |
05/05/2005 | US20050093041 Illumination system having a nested collector for annular illumination of an exit pupil |
05/05/2005 | US20050092991 Thin film transistor substrate of horizontal electric field type liquid crystal display device and fabricating method thereof |
05/05/2005 | US20050092936 Apparatus and method for proof of outgassing products |
05/05/2005 | US20050092608 Ion-implanted electroformed structural material and method of producing the structural material |
05/05/2005 | US20050092198 Printing plate, fabricating method thereof, method of making a printing plate with a print image, method of reproducing the printing plate with a print image, and printing press |
05/05/2005 | US20050092013 Cooling technique |
05/05/2005 | US20050091781 Device for cleaning reticle box |
05/04/2005 | EP1528846A2 EUV source |
05/04/2005 | EP1528592A2 Method for etching smooth sidewalls in III-V based compounds for electro-optical devices |
05/04/2005 | EP1528435A1 Method for forming images |
05/04/2005 | EP1528434A1 Lithographic apparatus and device manufacturing method |
05/04/2005 | EP1528433A2 Lithographic apparatus |
05/04/2005 | EP1528432A1 Lithographic apparatus and device manufacturing method |
05/04/2005 | EP1528431A2 Supporting plate, stage device, exposure apparatus and exposure method |
05/04/2005 | EP1528430A1 A device manufacturing method, as well as a lithographic apparatus |
05/04/2005 | EP1527374A2 Micro-contact printing method |
05/04/2005 | EP1527373A1 Method for producing flexo printing forms by means of laser direct engraving |
05/04/2005 | EP1527364A1 Method and system for correction of intrinsic birefringence in uv microlithography |
05/04/2005 | EP1259842A4 System and method for writing fiber gratings |
05/04/2005 | EP1251974B1 Methods for forming submicron patterns on films |
05/04/2005 | EP1224717B1 High pulse rate pulse power system with fast rise time and low leakage current |
05/04/2005 | EP1095304A4 Multiplexer for laser lithography |
05/04/2005 | DE4447786B4 Light sensitive compsn. e.g. for resist film - comprising an alkali soluble polymer with an alkali-soluble gp. protected by an acid-labile gp., a photogenerator of acid and a miscibility improver |
05/04/2005 | CN1612927A Aqueous stripping and cleaning composition |
05/04/2005 | CN1612777A Method of producing a sheet comprising through pores and the application thereof in the production of micronic and submicronic filters |
05/04/2005 | CN1612292A Supporting plate, stage device, exposure apparatus and exposure method |
05/04/2005 | CN1612055A Photoetching with micro trace photoresist detecting pattern and its detecting method |
05/04/2005 | CN1612054A Method and device for automatically stripping surface rubber-film for printed circuit base board |
05/04/2005 | CN1612053A Lithographic apparatus |
05/04/2005 | CN1612052A Lithographic apparatus and device manufacturing method |
05/04/2005 | CN1612051A Lithographic apparatus and device manufacturing method |
05/04/2005 | CN1612049A Method for executing optical near correction based on model |
05/04/2005 | CN1612048A Method for making printed circuit board |
05/04/2005 | CN1612047A Method for executing optical near correction based on model |
05/04/2005 | CN1612046A Method for executing photoetching correction based on model |
05/04/2005 | CN1612045A Method for forming resist pattern, method for manufacturing master information carrier, magnetic recording medium |
05/04/2005 | CN1612044A Method and system of controlling dummy dispense |
05/04/2005 | CN1612043A Lithographic apparatus and device manufacturing method |
05/04/2005 | CN1612042A Colouring photosensitive resin composition |
05/04/2005 | CN1611639A Mask forming method, mask forming functional layer, dry etching method, and method of manufacturing an information recording medium |
05/04/2005 | CN1611632A Ion-implanted electroformed structural material and method of producing the structural material |
05/04/2005 | CN1611495A Compound having an epoxy group and a chalcone group, method of preparing the same, and photoresist composition comprising the same |
05/04/2005 | CN1611490A Sulfonamide compound, polymer compound, resist material and pattern formation method |
05/04/2005 | CN1611430A Carrying device, coating system and checking system |
05/04/2005 | CN1200450C Novel button anti-reflection film structure |
05/04/2005 | CN1200321C Step-by-step projection photo-etching machine double set shifting exposure ultra precision positioning silicon chip bench system |
05/04/2005 | CN1200319C Method of evaluation of mask image using aerial image simulator |
05/04/2005 | CN1200014C Organic polymer for antireflective coating and its preparation |
05/04/2005 | CN1200012C Organic antireflecting coating and its preparation |
05/03/2005 | US6889162 Wafer target design and method for determining centroid of wafer target |
05/03/2005 | US6889014 Exposure system, device production method, semiconductor production factory, and exposure apparatus maintenance method |
05/03/2005 | US6888853 Laser radiation source |
05/03/2005 | US6888712 Combination current sensor and relay |
05/03/2005 | US6888638 Interferometry system having a dynamic beam steering assembly for measuring angle and distance |
05/03/2005 | US6888621 Mask-holding apparatus for a light exposure apparatus and related scanning-exposure method |
05/03/2005 | US6888620 System and method for holding a device with minimal deformation |
05/03/2005 | US6888619 Positioning device |
05/03/2005 | US6888618 Exposure apparatus and exposure method |
05/03/2005 | US6888617 Reversed, double-helical bellows seal |
05/03/2005 | US6888616 Programmable photolithographic mask system and method |
05/03/2005 | US6888615 System and method for improving linewidth control in a lithography device by varying the angular distribution of light in an illuminator as a function of field position |
05/03/2005 | US6888297 Method and apparatus for debris mitigation for an electrical discharge source |
05/03/2005 | US6888151 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
05/03/2005 | US6887796 Method of wet etching a silicon and nitrogen containing material |
05/03/2005 | US6887722 Method for exposing a semiconductor wafer |
05/03/2005 | US6887655 Photoresist removing compositions |
05/03/2005 | US6887654 Residue and scum reducing composition and method |
05/03/2005 | US6887653 Including a film-forming polymer containing molecule groups convertable into alkali-soluble groups by acid-catalyzed reaction, a photoacid generator and a thermobase generator; semiconductors; crosslinking inhibition; accuracy; smoothness |
05/03/2005 | US6887651 Electrodeposited photoresist and dry film photoresist photolithography process for printed circuit board patterning |
05/03/2005 | US6887649 Multi-layered resist structure and manufacturing method of semiconductor device |
05/03/2005 | US6887648 A protective coatings for photoresists, comprising an acid generator, a toluenesulfonate acid amine salt, as crosslinking agent, promoting shelf life, storage stability, consistent absorption spectra |
05/03/2005 | US6887647 Used for super-micro lithography; capable of forming high precision patterns |
05/03/2005 | US6887646 Chemical amplification resist composition |
05/03/2005 | US6887645 Negative resist composition |
05/03/2005 | US6887644 Polymer compound for a chemical amplification resist and a fabrication process of a semiconductor device using such a chemical amplification resist |
05/03/2005 | US6887643 A heat resistant resin precursor polymer containing polylactam, a radiation sensitive quinonediazde compound; and a hydroxyalky or cycloalkyl ketone as solvent |
05/03/2005 | US6887642 Imageable layer comprises a negative working imageable composition; and the underlayer is soluble or dispersible in a developer. |
05/03/2005 | US6887629 Radiation-patterning tool |
05/03/2005 | US6887628 Manufacturing method for photomask |
05/03/2005 | US6887625 Isolated areas that contrast with a background and represent features to be printed, arranged generally in an array; and a plurality of assist features smaller than said isolated areas and positioned so as to make said array more symmetric. |
05/03/2005 | US6887332 Patterning solution deposited thin films with self-assembled monolayers |
05/03/2005 | US6886825 Plate handling system |
05/03/2005 | US6886728 Ticket dispensing modules and method |
04/28/2005 | WO2005038888A1 Exposure apparatus, exposure method, and method for manufacturing device |
04/28/2005 | WO2005038887A1 Environment-controlling apparatus, device-producing apparatus, device-producing method, and exposure apparatus |
04/28/2005 | WO2005038886A1 Multilayer film reflection mirror, production method for multilayer film reflection mirror, and exposure system |
04/28/2005 | WO2005038885A1 Optical characteristics measuring device and optical characteristics measuring method, exposure system and exposure method, and device production method |
04/28/2005 | WO2005038884A2 Reducing photoresist line edge roughness using chemically-assisted reflow |
04/28/2005 | WO2005038865A2 Amorphous carbon layer to improve photoresist adhesion |
04/28/2005 | WO2005038822A2 Plasma source of directed beams and application thereof to microlithography |
04/28/2005 | WO2005038530A1 Thinner composition for removing photoresist |
04/28/2005 | WO2005038529A2 Method for determining relative swing curve amplitude |
04/28/2005 | WO2005038528A2 Method of coating a multilayered element |
04/28/2005 | WO2005038527A2 Enhancing photoresist performance using electric fields |
04/28/2005 | WO2005038526A1 Imaging element having protective overcoat layers |
04/28/2005 | WO2005038525A1 Stamp device for use in soft lithography and method for producing the same |