Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
05/2005
05/05/2005US20050093502 Stage with isolated actuators for low vacuum environment
05/05/2005US20050093441 Flat display device and method of manufacturing the same
05/05/2005US20050093378 Alignment stage apparatus
05/05/2005US20050093102 Mixed lvr and hvr reticle set design for the processing of gate arrays, embedded arrays and rapid chip products
05/05/2005US20050093041 Illumination system having a nested collector for annular illumination of an exit pupil
05/05/2005US20050092991 Thin film transistor substrate of horizontal electric field type liquid crystal display device and fabricating method thereof
05/05/2005US20050092936 Apparatus and method for proof of outgassing products
05/05/2005US20050092608 Ion-implanted electroformed structural material and method of producing the structural material
05/05/2005US20050092198 Printing plate, fabricating method thereof, method of making a printing plate with a print image, method of reproducing the printing plate with a print image, and printing press
05/05/2005US20050092013 Cooling technique
05/05/2005US20050091781 Device for cleaning reticle box
05/04/2005EP1528846A2 EUV source
05/04/2005EP1528592A2 Method for etching smooth sidewalls in III-V based compounds for electro-optical devices
05/04/2005EP1528435A1 Method for forming images
05/04/2005EP1528434A1 Lithographic apparatus and device manufacturing method
05/04/2005EP1528433A2 Lithographic apparatus
05/04/2005EP1528432A1 Lithographic apparatus and device manufacturing method
05/04/2005EP1528431A2 Supporting plate, stage device, exposure apparatus and exposure method
05/04/2005EP1528430A1 A device manufacturing method, as well as a lithographic apparatus
05/04/2005EP1527374A2 Micro-contact printing method
05/04/2005EP1527373A1 Method for producing flexo printing forms by means of laser direct engraving
05/04/2005EP1527364A1 Method and system for correction of intrinsic birefringence in uv microlithography
05/04/2005EP1259842A4 System and method for writing fiber gratings
05/04/2005EP1251974B1 Methods for forming submicron patterns on films
05/04/2005EP1224717B1 High pulse rate pulse power system with fast rise time and low leakage current
05/04/2005EP1095304A4 Multiplexer for laser lithography
05/04/2005DE4447786B4 Light sensitive compsn. e.g. for resist film - comprising an alkali soluble polymer with an alkali-soluble gp. protected by an acid-labile gp., a photogenerator of acid and a miscibility improver
05/04/2005CN1612927A Aqueous stripping and cleaning composition
05/04/2005CN1612777A Method of producing a sheet comprising through pores and the application thereof in the production of micronic and submicronic filters
05/04/2005CN1612292A Supporting plate, stage device, exposure apparatus and exposure method
05/04/2005CN1612055A Photoetching with micro trace photoresist detecting pattern and its detecting method
05/04/2005CN1612054A Method and device for automatically stripping surface rubber-film for printed circuit base board
05/04/2005CN1612053A Lithographic apparatus
05/04/2005CN1612052A Lithographic apparatus and device manufacturing method
05/04/2005CN1612051A Lithographic apparatus and device manufacturing method
05/04/2005CN1612049A Method for executing optical near correction based on model
05/04/2005CN1612048A Method for making printed circuit board
05/04/2005CN1612047A Method for executing optical near correction based on model
05/04/2005CN1612046A Method for executing photoetching correction based on model
05/04/2005CN1612045A Method for forming resist pattern, method for manufacturing master information carrier, magnetic recording medium
05/04/2005CN1612044A Method and system of controlling dummy dispense
05/04/2005CN1612043A Lithographic apparatus and device manufacturing method
05/04/2005CN1612042A Colouring photosensitive resin composition
05/04/2005CN1611639A Mask forming method, mask forming functional layer, dry etching method, and method of manufacturing an information recording medium
05/04/2005CN1611632A Ion-implanted electroformed structural material and method of producing the structural material
05/04/2005CN1611495A Compound having an epoxy group and a chalcone group, method of preparing the same, and photoresist composition comprising the same
05/04/2005CN1611490A Sulfonamide compound, polymer compound, resist material and pattern formation method
05/04/2005CN1611430A Carrying device, coating system and checking system
05/04/2005CN1200450C Novel button anti-reflection film structure
05/04/2005CN1200321C Step-by-step projection photo-etching machine double set shifting exposure ultra precision positioning silicon chip bench system
05/04/2005CN1200319C Method of evaluation of mask image using aerial image simulator
05/04/2005CN1200014C Organic polymer for antireflective coating and its preparation
05/04/2005CN1200012C Organic antireflecting coating and its preparation
05/03/2005US6889162 Wafer target design and method for determining centroid of wafer target
05/03/2005US6889014 Exposure system, device production method, semiconductor production factory, and exposure apparatus maintenance method
05/03/2005US6888853 Laser radiation source
05/03/2005US6888712 Combination current sensor and relay
05/03/2005US6888638 Interferometry system having a dynamic beam steering assembly for measuring angle and distance
05/03/2005US6888621 Mask-holding apparatus for a light exposure apparatus and related scanning-exposure method
05/03/2005US6888620 System and method for holding a device with minimal deformation
05/03/2005US6888619 Positioning device
05/03/2005US6888618 Exposure apparatus and exposure method
05/03/2005US6888617 Reversed, double-helical bellows seal
05/03/2005US6888616 Programmable photolithographic mask system and method
05/03/2005US6888615 System and method for improving linewidth control in a lithography device by varying the angular distribution of light in an illuminator as a function of field position
05/03/2005US6888297 Method and apparatus for debris mitigation for an electrical discharge source
05/03/2005US6888151 Lithographic apparatus, device manufacturing method, and device manufactured thereby
05/03/2005US6887796 Method of wet etching a silicon and nitrogen containing material
05/03/2005US6887722 Method for exposing a semiconductor wafer
05/03/2005US6887655 Photoresist removing compositions
05/03/2005US6887654 Residue and scum reducing composition and method
05/03/2005US6887653 Including a film-forming polymer containing molecule groups convertable into alkali-soluble groups by acid-catalyzed reaction, a photoacid generator and a thermobase generator; semiconductors; crosslinking inhibition; accuracy; smoothness
05/03/2005US6887651 Electrodeposited photoresist and dry film photoresist photolithography process for printed circuit board patterning
05/03/2005US6887649 Multi-layered resist structure and manufacturing method of semiconductor device
05/03/2005US6887648 A protective coatings for photoresists, comprising an acid generator, a toluenesulfonate acid amine salt, as crosslinking agent, promoting shelf life, storage stability, consistent absorption spectra
05/03/2005US6887647 Used for super-micro lithography; capable of forming high precision patterns
05/03/2005US6887646 Chemical amplification resist composition
05/03/2005US6887645 Negative resist composition
05/03/2005US6887644 Polymer compound for a chemical amplification resist and a fabrication process of a semiconductor device using such a chemical amplification resist
05/03/2005US6887643 A heat resistant resin precursor polymer containing polylactam, a radiation sensitive quinonediazde compound; and a hydroxyalky or cycloalkyl ketone as solvent
05/03/2005US6887642 Imageable layer comprises a negative working imageable composition; and the underlayer is soluble or dispersible in a developer.
05/03/2005US6887629 Radiation-patterning tool
05/03/2005US6887628 Manufacturing method for photomask
05/03/2005US6887625 Isolated areas that contrast with a background and represent features to be printed, arranged generally in an array; and a plurality of assist features smaller than said isolated areas and positioned so as to make said array more symmetric.
05/03/2005US6887332 Patterning solution deposited thin films with self-assembled monolayers
05/03/2005US6886825 Plate handling system
05/03/2005US6886728 Ticket dispensing modules and method
04/2005
04/28/2005WO2005038888A1 Exposure apparatus, exposure method, and method for manufacturing device
04/28/2005WO2005038887A1 Environment-controlling apparatus, device-producing apparatus, device-producing method, and exposure apparatus
04/28/2005WO2005038886A1 Multilayer film reflection mirror, production method for multilayer film reflection mirror, and exposure system
04/28/2005WO2005038885A1 Optical characteristics measuring device and optical characteristics measuring method, exposure system and exposure method, and device production method
04/28/2005WO2005038884A2 Reducing photoresist line edge roughness using chemically-assisted reflow
04/28/2005WO2005038865A2 Amorphous carbon layer to improve photoresist adhesion
04/28/2005WO2005038822A2 Plasma source of directed beams and application thereof to microlithography
04/28/2005WO2005038530A1 Thinner composition for removing photoresist
04/28/2005WO2005038529A2 Method for determining relative swing curve amplitude
04/28/2005WO2005038528A2 Method of coating a multilayered element
04/28/2005WO2005038527A2 Enhancing photoresist performance using electric fields
04/28/2005WO2005038526A1 Imaging element having protective overcoat layers
04/28/2005WO2005038525A1 Stamp device for use in soft lithography and method for producing the same
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