Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
05/2005
05/10/2005US6891172 Differential pumping system and exposure apparatus
05/10/2005US6891152 Nano-lithography using squeezed atomic and molecular states
05/10/2005US6890879 Can record with high sensitivity to light in the ultraviolet, visible and infrared regions and can be applied to inks, color filters, holograms, proofs, sealants, adhesives, surface printing, resin relief printing, photoresists
05/10/2005US6890702 Sensitivity, storage stability, printing durability
05/10/2005US6890701 Negative working lithography printing plates
05/10/2005US6890699 A copolymers comprising monomers of tert-butyl methacrylate, maleic anhydride, allyltrimethylsilane and ethoxyethyl methacrylate, and a photosensitive acid generator, and a solvent
05/10/2005US6890697 Positive-working chemical-amplification photoresist composition
05/10/2005US6890692 Method of focus monitoring and manufacturing method for an electronic device
05/10/2005US6890688 Lithographic template and method of formation and use
05/10/2005US6890663 Process of forming a pattern on a substrate
05/10/2005US6890626 Imide-benzoxazole polycondensate and process for producing the same
05/10/2005US6890598 Removing the dithiocarboxylic acid self-assembled monolayers by mild oxidation, e.g. air, ambient temperature, with or without ultra- violet radiation, from protected regions; high-density resists; lithography; efficient cleaning
05/10/2005US6890595 Method for coating low viscosity materials
05/10/2005US6890448 Comprises silicon etched with fluorine/chlorine plasma, and underlying organic dielectric layer is selectively etched with oxygen plasma; microelectronic wafer coating
05/10/2005US6890387 Method and device for correcting pattern film on a semiconductor substrate
05/10/2005US6889976 Image recorder
05/06/2005WO2005041291A2 Mask and method for using the mask in lithographic processing
05/06/2005WO2005041277A1 Lighting optical device and projection aligner
05/06/2005WO2005041276A1 Exposure apparatus, exposure method, and device producing method
05/06/2005WO2005040945A1 Stage device
05/06/2005WO2005040932A2 Apparatus and method for aligning surfaces
05/06/2005WO2005040931A1 Composition for separating photoresist and separating method
05/06/2005WO2005040930A1 Development device, development method, and developer circulating method
05/06/2005WO2005040929A2 Apparatus for and method of forming optical images
05/06/2005WO2005040928A1 Compact projection objective for arf lithography
05/06/2005WO2005040927A2 Device and method for illumination dose adjustments in microlithography
05/06/2005WO2005040926A2 Optical subassembly and projection objective for semiconductor lithography
05/06/2005WO2005040925A1 Euv projection lens with mirrors made from materials with differing signs for the rise in temperature dependence of the thermal expansion coefficient around the zero transition temperature
05/06/2005WO2005040924A2 Photoresist coating process for microlithography
05/06/2005WO2005040923A1 Improved antireflective coatings
05/06/2005WO2005040922A1 Resist composition and method for forming resist pattern
05/06/2005WO2005040921A1 Resist composition for electron beam or euv
05/06/2005WO2005040920A2 Multistep process for creating irregularities in a repating array of pattern elements
05/06/2005WO2005040919A1 Photo mask, pattern formation method using the same, and mask data generation method
05/06/2005WO2005040918A2 Low-activation energy silicon-containing resist system
05/06/2005WO2005040917A2 System and method for lithography simulation
05/06/2005WO2005040890A2 Catadioptric projection objective with real intermediate images
05/06/2005WO2005040719A1 Shape profile measuring unit and production method for semiconductor device using it
05/06/2005WO2005040245A1 Photosensitive resin composition and film having cured coat formed therefrom
05/06/2005WO2005040083A1 White solid photoinitiator in the form of powder and preparation thereof
05/06/2005WO2005040037A1 Large area fabrication method based on the local oxidation of silicon and/or different materials on micro- and nano-scale
05/06/2005WO2005019503A3 Sub-micron-scale patterning method and system
05/06/2005WO2005008336A3 Dissolution inhibitors in photoresist compositions for microlithography
05/06/2005WO2004085993A3 Generic interface for an optical metrology system
05/06/2005WO2004077104A3 High performance catadioptric imaging system
05/06/2005WO2004019077A3 Structures and methods for reducing retardance
05/06/2005CA2537947A1 Photoresist coating process for microlithography
05/05/2005US20050097500 System and method for lithography simulation
05/05/2005US20050096447 Purifying an addition polymerization reaction mixture by precipitation and filtration steps in a hermetically-closable single vessel divided by a filter; using a poor solvent for feeding; backwashing of filter; temperature control; high efficiency and good quality reproducibility; stable quality
05/05/2005US20050096246 Solvent compositions containing chlorofluoroolefins
05/05/2005US20050096237 Maleic acid and ethylene urea containing formulation for removing residue from semiconductor substrate and method for cleaning wafer
05/05/2005US20050095866 Method for forming patterned conductive film, electrooptical device, and electronic appliance
05/05/2005US20050095829 Housing unit and exposure method using the same
05/05/2005US20050095818 Wiring technique
05/05/2005US20050095652 Solid support comprising immobilized biopolymers for use as assay in monitoring receptor ligand interaction; drug screening; antibodiy sensitivity
05/05/2005US20050095539 Forming photoresist film on substrate; exposure to light through antireflective coating; adjust refractive index and thickness
05/05/2005US20050095537 Method and system of controlling dummy dispense
05/05/2005US20050095535 Mixture of acid generator and unsaturated acrylated ester nonmer; surface and edge smoothness
05/05/2005US20050095533 Nitrogen-containing organic compound, resist composition and patterning process
05/05/2005US20050095532 Photosensitive composition and pattern forming method using the same
05/05/2005US20050095530 Dye-containing resist composition and color filter using same
05/05/2005US20050095529 Alkali-soluble polymer and polymerizable composition thereof
05/05/2005US20050095527 Radiation-sensitive resin composition
05/05/2005US20050095515 Filtration measurement; measuring overlay displacement; calibration using model of optical errors
05/05/2005US20050095514 Method of fabricating color filter panel using back exposure and structure of color filter panel
05/05/2005US20050095512 Lithography mask for imaging of convex structures
05/05/2005US20050095511 Optical fiber having Bragg grating and method of manufacturing the same
05/05/2005US20050095510 Flare measuring mask and flare measuring method of semiconductor aligner
05/05/2005US20050095509 Method for providing representative features for use in inspection of photolithography mask and for use in inspection photo-lithographically developed and/or patterned wafer layers, and products of same
05/05/2005US20050095368 Yield and line width performance for liquid polymers and other materials
05/05/2005US20050094997 Illumination optical system and exposure apparatus having the same
05/05/2005US20050094764 Collector unit with a reflective element for illumination systems with a wavelength of smaller than 193 nm
05/05/2005US20050094289 Optical reduction system with elimination of reticle diffraction induced bias
05/05/2005US20050094276 Transfer of optical element patterns on a same side of a substrate already having a feature thereon
05/05/2005US20050094271 Hybrid optical component for x ray applications and method associated therewith
05/05/2005US20050094268 Optical system with birefringent optical elements
05/05/2005US20050094257 Projection optical system, exposure apparatus and device fabricating method
05/05/2005US20050094245 Using time and/or power modulation to achieve dose gray-scaling in optical maskless lithography
05/05/2005US20050094155 Reduction of thermal non-cyclic error effects in interferometers
05/05/2005US20050094153 Metrology system using optical phase
05/05/2005US20050094152 Interference patterning
05/05/2005US20050094145 Overlay mark for aligning different layers on a semiconductor wafer
05/05/2005US20050094132 Process compensation for step and scan lithography
05/05/2005US20050094126 Substrate holder and exposure apparatus having the same
05/05/2005US20050094125 Supporting plate, stage device, exposure apparatus, and exposure method
05/05/2005US20050094124 Stage base, stage apparatus, exposure apparatus and device manufacturing method
05/05/2005US20050094123 Alignable low-profile substrate chuck for large-area projection lithography
05/05/2005US20050094122 Exposure method and exposure apparatus, light source unit and adjustment method of light source unit, and device manufacturing method
05/05/2005US20050094121 Illuminator controlled tone reversal printing
05/05/2005US20050094120 Direct exposure system and user interface
05/05/2005US20050094119 Lithographic apparatus and device manufacturing method
05/05/2005US20050094118 Lithographic apparatus and device manufacturing method
05/05/2005US20050094117 Scanning exposure method and an apparatus thereof
05/05/2005US20050094116 Gradient immersion lithography
05/05/2005US20050094115 Projection exposure apparatus and method
05/05/2005US20050094114 Lithographic apparatus and device manufacturing method
05/05/2005US20050094079 Thin film transistor substrate using a horizontal electric field type liquid crystal display device and fabricating method thereof
05/05/2005US20050093960 Method for correcting skewed recording when exposing printing originals
05/05/2005US20050093924 Photosensitive resin composition, ink-jet recording head using the composition, and production method for the same
05/05/2005US20050093666 Substrate holding technique
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