Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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03/06/2014 | US20140065540 Photoresist and coated substrate comprising same |
03/06/2014 | US20140065539 Positive-working lithographic printing plate precursors and use |
03/06/2014 | US20140065538 Positive-working lithographic printing plate precursor for infrared laser and process for making lithographic printing plate |
03/06/2014 | US20140065528 Exposure apparatus, exposure method, and method of manufacturing semiconductor device |
03/06/2014 | US20140065526 Positive photosensitive resin composition and method for forming patterns by using the same |
03/06/2014 | US20140065522 Pattern forming method, positional deviation measuring method and photomask |
03/06/2014 | US20140065520 Generating and displaying holograms |
03/06/2014 | US20140065309 Substrate processing apparatus and substrate processing method |
03/06/2014 | US20140063628 Device for the low-deformation replaceable mounting of an optical element |
03/06/2014 | US20140063480 Exposure device and exposure method |
03/06/2014 | US20140063479 Method for controlling exposure apparatus and exposure apparatus |
03/06/2014 | US20140063478 Focus Recipe Determination for a Lithographic Scanner |
03/06/2014 | US20140063477 Euv exposure apparatus and cleaning method |
03/06/2014 | US20140061970 Nanoimprint curable composition, nanoimprint-lithographic molded product, and method for forming pattern |
03/06/2014 | US20140061543 Method of manufacturing non-firing type electrode using photosensitive paste |
03/06/2014 | US20140061154 Methods of forming a pattern |
03/06/2014 | DE102013226567A1 Projection exposure system for microlithography, has switchable deflector switching incident light beam from one direction to another direction, where angle between directions is adjustable at specific switching speed |
03/06/2014 | DE102013213785A1 Verfahren und System zur Bestimmung von Überlappungsprozessfenstern in Halbleitern durch Inspektionstechniken Method and system for determining overlapping process windows in semiconductors by inspection techniques |
03/06/2014 | DE102013205568A1 Micro-lithographic projection exposure apparatus has variable transmission filter which has refractive optical element with photo-chromic layer on which excitation light is irradiated by secondary illumination system |
03/06/2014 | DE102013205567A1 Micro-lithographic projection exposure system for manufacturing micro-structured component, has refractive optical element whose absorption coefficient for projection of light is changed due to effect of induced absorption |
03/06/2014 | DE102013203034A1 Optical assembly for semiconductor-projection exposure system for semiconductor lithography, has optical element mounted in support structure by mechanical support unit, where additional heat-transfer unit removes heat from optical element |
03/06/2014 | DE102012215697A1 Blockierelement zum Schutz von optischen Elementen in Projektionsbelichtungsanlagen Blocking element for the protection of optical elements in projection exposure apparatus |
03/06/2014 | DE102012215359A1 Method for coating substrate of optical element, involves variably adjusting arrival rate of coating material on to-be coated surface of sheet element relative to spin axis for different rotation angles of substrate |
03/06/2014 | DE102012108211A1 Belichtungsanlage Exposure system |
03/06/2014 | DE10155038B4 Wechselbare Bebilderungseinrichtung zum Bebildern von Druckformen Replaceable imaging for imaging of printing forms |
03/05/2014 | EP2702595A1 Charged particle system comprising a manipulator device for manipulation of one or more charged particle beams |
03/05/2014 | EP2702452A1 Method of processing a substrate in a lithography system |
03/05/2014 | EP2702451A1 Selectively etching of a polymer matrix on pet |
03/05/2014 | CN203465518U Wire cable table for workpiece platform of photoetching machine |
03/05/2014 | CN203465517U Wire cable table with flexible joint for workpiece platform of photoetching machine |
03/05/2014 | CN203465516U Circuit board exposure machine |
03/05/2014 | CN103620738A Pattern forming method, method for manufacturing electronic device by using the same, and electronic device |
03/05/2014 | CN103620737A Driving system and driving method, light exposure device and light exposure method, and driving system designing method |
03/05/2014 | CN103620693A Charged particle system comprising a manipulator device for manipulation of one or more charged particle beams |
03/05/2014 | CN103620500A Projection arrangement |
03/05/2014 | CN103620499A Positive-type resist composition |
03/05/2014 | CN103620498A Holographic storage method and article |
03/05/2014 | CN103620497A Mask plate |
03/05/2014 | CN103619960A Flame-retardant curable resin composition, dry film using same, and printed wiring board |
03/05/2014 | CN103619892A Phenolic resin and material for forming underlayer film for lithography |
03/05/2014 | CN103619889A Polymer and method for producing same |
03/05/2014 | CN103619809A Holographic recording medium |
03/05/2014 | CN103619770A Manufacturing method and apparatus therefor |
03/05/2014 | CN103617309A Rapid and strict simulation method for extreme ultra-violet lithography zero-defect masking diffraction spectrum |
03/05/2014 | CN103616978A Small piece locating and direct imaging system for manufacturing monolithic integrated capacitive touch screen with collaging method |
03/05/2014 | CN103616806A Cleaning fluid for photosensitive membrane |
03/05/2014 | CN103616805A Cleaning fluid used in semiconductor manufacture process |
03/05/2014 | CN103616804A Dynamic mask plate system for preparing monolithic integration capacitive touch screen by collage method |
03/05/2014 | CN103616803A Vacuum reproduction exposure equipment for grating ruler |
03/05/2014 | CN103616802A Method for measuring projection objective wave aberration of photo-etching machine |
03/05/2014 | CN103616801A Making method of special high-uniformity light source for PCB surface exposure, and apparatus of light source |
03/05/2014 | CN103616800A A light curing resin composition |
03/05/2014 | CN103616799A Organically soluble photosensitive resin after being cured and preparation method and dissolving method thereof |
03/05/2014 | CN103616798A Photosensitive resin with flame retardant property and application thereof in production of photosensitive ink |
03/05/2014 | CN103616797A Novel nanoimprinting equipment with rapid alignment function |
03/05/2014 | CN103616796A Method for preparing ultraviolet curing soft lithography composite template |
03/05/2014 | CN103616794A Photomask blank and preparation method thereof |
03/05/2014 | CN103616757A Aspheric ultraviolet photoetching objective lens |
03/05/2014 | CN103616739A Integrated manufacturing method of optical microspherical cavity made of wafer-level polymer |
03/05/2014 | CN103616166A Projection objective focal plane shape measuring and marking device and application |
03/05/2014 | CN102799070B Double coating negative photoresist dry film |
03/05/2014 | CN102736419B Defoaming device for photoresist |
03/05/2014 | CN102702406B Photosensitive resin and preparation method and application thereof |
03/05/2014 | CN102627770B Organosiloxane polymer, preparation method of organosiloxane polymer, color photoresist for color filter, color filter and preparation method of color filter |
03/05/2014 | CN102621822B Lens for achieving curved-surface-to-plane super-resolution demagnification imaging photo-etching |
03/05/2014 | CN102621601B Manufacturing method for planar image field super-resolution imaging lens |
03/05/2014 | CN102393609B Device and method for exchanging of double workpiece tables on lintel type single/double guide rails in double-drive stepping scanning |
03/05/2014 | CN102301282B Anti-corrosive photoresist-removing agent composition |
03/05/2014 | CN102150084B Radiation source, lithographic apparatus, and device manufacturing method |
03/05/2014 | CN102082093B Manufacturing technique of chip for two-way voltage regulator diode DB3 |
03/05/2014 | CN102066509B Aqueous composition for coating over photoresist pattern |
03/05/2014 | CN101805281B Oxime ester compound and photosensitive polymer composition using same |
03/04/2014 | USRE44792 Rapid scattering simulation of objects in imaging using edge domain decomposition |
03/04/2014 | US8666206 Asymmetric slotted waveguide and method for fabricating the same |
03/04/2014 | US8665455 Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method |
03/04/2014 | US8663907 Method of forming pattern |
03/04/2014 | US8663906 Silicon-containing composition for fine pattern formation and method for fine pattern formation using the same |
03/04/2014 | US8663905 Pattern-forming method |
03/04/2014 | US8663904 Norbornene-type polymers, compositions thereof and lithographic process using such compositions |
03/04/2014 | US8663903 Top coating composition |
03/04/2014 | US8663901 Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same |
03/04/2014 | US8663900 Resist composition and method for producing resist pattern |
03/04/2014 | US8663899 Resist composition and method for producing resist pattern |
03/04/2014 | US8663898 Resist underlayer film composition and patterning process using the same |
03/04/2014 | US8663897 Fluorine-containing sulfonates having polymerizable anions and manufacturing method therefor, fluorine-containing resins, resist compositions, and pattern-forming method using same |
03/04/2014 | US8663896 Resin composition for laser engraving, relief printing plate precursor for laser engraving and process for producing same, and relief printing plate and process for making same |
03/04/2014 | US8663895 Method for manufacturing template and method for manufacturing semiconductor device |
03/04/2014 | US8663880 Polymerizable composition for color filter, color filter, and solid-state imaging device |
03/04/2014 | US8663877 Lithography masks, systems, and manufacturing methods |
03/04/2014 | CA2511790C Radiation curable aqueous compositions |
02/27/2014 | WO2014031582A1 Negative-working lithographic printing plate precursors and use |
02/27/2014 | WO2014031432A1 Method for creating topographical patterns in polymers via surface energy patterned films and the marangoni effect |
02/27/2014 | WO2014031146A1 Method for preparing a relief printing form |
02/27/2014 | WO2014030724A1 Pattern forming method, method for manufacturing electronic device, and electronic device |
02/27/2014 | WO2014030723A1 Pattern forming method, electron beam-sensitive or extreme ultraviolet ray-sensitive resin composition, resist film, and method for manufacturing electronic device, and electronic device using the same |
02/27/2014 | WO2014030687A1 A resist stripping solution and a resist strip process |
02/27/2014 | WO2014030645A1 Light-source device and data processing method |
02/27/2014 | WO2014030579A1 Composition for forming resist underlayer film, which contains novolac resin having polynuclear phenol |
02/27/2014 | WO2014030441A1 Positive photosensitive resin composition, method for manufacturing curable film, curable film, organic el display device, and liquid-crystal display device |
02/27/2014 | WO2014029678A1 Lithographic apparatus and device manufacturing method |