Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
03/2014
03/06/2014US20140065540 Photoresist and coated substrate comprising same
03/06/2014US20140065539 Positive-working lithographic printing plate precursors and use
03/06/2014US20140065538 Positive-working lithographic printing plate precursor for infrared laser and process for making lithographic printing plate
03/06/2014US20140065528 Exposure apparatus, exposure method, and method of manufacturing semiconductor device
03/06/2014US20140065526 Positive photosensitive resin composition and method for forming patterns by using the same
03/06/2014US20140065522 Pattern forming method, positional deviation measuring method and photomask
03/06/2014US20140065520 Generating and displaying holograms
03/06/2014US20140065309 Substrate processing apparatus and substrate processing method
03/06/2014US20140063628 Device for the low-deformation replaceable mounting of an optical element
03/06/2014US20140063480 Exposure device and exposure method
03/06/2014US20140063479 Method for controlling exposure apparatus and exposure apparatus
03/06/2014US20140063478 Focus Recipe Determination for a Lithographic Scanner
03/06/2014US20140063477 Euv exposure apparatus and cleaning method
03/06/2014US20140061970 Nanoimprint curable composition, nanoimprint-lithographic molded product, and method for forming pattern
03/06/2014US20140061543 Method of manufacturing non-firing type electrode using photosensitive paste
03/06/2014US20140061154 Methods of forming a pattern
03/06/2014DE102013226567A1 Projection exposure system for microlithography, has switchable deflector switching incident light beam from one direction to another direction, where angle between directions is adjustable at specific switching speed
03/06/2014DE102013213785A1 Verfahren und System zur Bestimmung von Überlappungsprozessfenstern in Halbleitern durch Inspektionstechniken Method and system for determining overlapping process windows in semiconductors by inspection techniques
03/06/2014DE102013205568A1 Micro-lithographic projection exposure apparatus has variable transmission filter which has refractive optical element with photo-chromic layer on which excitation light is irradiated by secondary illumination system
03/06/2014DE102013205567A1 Micro-lithographic projection exposure system for manufacturing micro-structured component, has refractive optical element whose absorption coefficient for projection of light is changed due to effect of induced absorption
03/06/2014DE102013203034A1 Optical assembly for semiconductor-projection exposure system for semiconductor lithography, has optical element mounted in support structure by mechanical support unit, where additional heat-transfer unit removes heat from optical element
03/06/2014DE102012215697A1 Blockierelement zum Schutz von optischen Elementen in Projektionsbelichtungsanlagen Blocking element for the protection of optical elements in projection exposure apparatus
03/06/2014DE102012215359A1 Method for coating substrate of optical element, involves variably adjusting arrival rate of coating material on to-be coated surface of sheet element relative to spin axis for different rotation angles of substrate
03/06/2014DE102012108211A1 Belichtungsanlage Exposure system
03/06/2014DE10155038B4 Wechselbare Bebilderungseinrichtung zum Bebildern von Druckformen Replaceable imaging for imaging of printing forms
03/05/2014EP2702595A1 Charged particle system comprising a manipulator device for manipulation of one or more charged particle beams
03/05/2014EP2702452A1 Method of processing a substrate in a lithography system
03/05/2014EP2702451A1 Selectively etching of a polymer matrix on pet
03/05/2014CN203465518U Wire cable table for workpiece platform of photoetching machine
03/05/2014CN203465517U Wire cable table with flexible joint for workpiece platform of photoetching machine
03/05/2014CN203465516U Circuit board exposure machine
03/05/2014CN103620738A Pattern forming method, method for manufacturing electronic device by using the same, and electronic device
03/05/2014CN103620737A Driving system and driving method, light exposure device and light exposure method, and driving system designing method
03/05/2014CN103620693A Charged particle system comprising a manipulator device for manipulation of one or more charged particle beams
03/05/2014CN103620500A Projection arrangement
03/05/2014CN103620499A Positive-type resist composition
03/05/2014CN103620498A Holographic storage method and article
03/05/2014CN103620497A Mask plate
03/05/2014CN103619960A Flame-retardant curable resin composition, dry film using same, and printed wiring board
03/05/2014CN103619892A Phenolic resin and material for forming underlayer film for lithography
03/05/2014CN103619889A Polymer and method for producing same
03/05/2014CN103619809A Holographic recording medium
03/05/2014CN103619770A Manufacturing method and apparatus therefor
03/05/2014CN103617309A Rapid and strict simulation method for extreme ultra-violet lithography zero-defect masking diffraction spectrum
03/05/2014CN103616978A Small piece locating and direct imaging system for manufacturing monolithic integrated capacitive touch screen with collaging method
03/05/2014CN103616806A Cleaning fluid for photosensitive membrane
03/05/2014CN103616805A Cleaning fluid used in semiconductor manufacture process
03/05/2014CN103616804A Dynamic mask plate system for preparing monolithic integration capacitive touch screen by collage method
03/05/2014CN103616803A Vacuum reproduction exposure equipment for grating ruler
03/05/2014CN103616802A Method for measuring projection objective wave aberration of photo-etching machine
03/05/2014CN103616801A Making method of special high-uniformity light source for PCB surface exposure, and apparatus of light source
03/05/2014CN103616800A A light curing resin composition
03/05/2014CN103616799A Organically soluble photosensitive resin after being cured and preparation method and dissolving method thereof
03/05/2014CN103616798A Photosensitive resin with flame retardant property and application thereof in production of photosensitive ink
03/05/2014CN103616797A Novel nanoimprinting equipment with rapid alignment function
03/05/2014CN103616796A Method for preparing ultraviolet curing soft lithography composite template
03/05/2014CN103616794A Photomask blank and preparation method thereof
03/05/2014CN103616757A Aspheric ultraviolet photoetching objective lens
03/05/2014CN103616739A Integrated manufacturing method of optical microspherical cavity made of wafer-level polymer
03/05/2014CN103616166A Projection objective focal plane shape measuring and marking device and application
03/05/2014CN102799070B Double coating negative photoresist dry film
03/05/2014CN102736419B Defoaming device for photoresist
03/05/2014CN102702406B Photosensitive resin and preparation method and application thereof
03/05/2014CN102627770B Organosiloxane polymer, preparation method of organosiloxane polymer, color photoresist for color filter, color filter and preparation method of color filter
03/05/2014CN102621822B Lens for achieving curved-surface-to-plane super-resolution demagnification imaging photo-etching
03/05/2014CN102621601B Manufacturing method for planar image field super-resolution imaging lens
03/05/2014CN102393609B Device and method for exchanging of double workpiece tables on lintel type single/double guide rails in double-drive stepping scanning
03/05/2014CN102301282B Anti-corrosive photoresist-removing agent composition
03/05/2014CN102150084B Radiation source, lithographic apparatus, and device manufacturing method
03/05/2014CN102082093B Manufacturing technique of chip for two-way voltage regulator diode DB3
03/05/2014CN102066509B Aqueous composition for coating over photoresist pattern
03/05/2014CN101805281B Oxime ester compound and photosensitive polymer composition using same
03/04/2014USRE44792 Rapid scattering simulation of objects in imaging using edge domain decomposition
03/04/2014US8666206 Asymmetric slotted waveguide and method for fabricating the same
03/04/2014US8665455 Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method
03/04/2014US8663907 Method of forming pattern
03/04/2014US8663906 Silicon-containing composition for fine pattern formation and method for fine pattern formation using the same
03/04/2014US8663905 Pattern-forming method
03/04/2014US8663904 Norbornene-type polymers, compositions thereof and lithographic process using such compositions
03/04/2014US8663903 Top coating composition
03/04/2014US8663901 Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same
03/04/2014US8663900 Resist composition and method for producing resist pattern
03/04/2014US8663899 Resist composition and method for producing resist pattern
03/04/2014US8663898 Resist underlayer film composition and patterning process using the same
03/04/2014US8663897 Fluorine-containing sulfonates having polymerizable anions and manufacturing method therefor, fluorine-containing resins, resist compositions, and pattern-forming method using same
03/04/2014US8663896 Resin composition for laser engraving, relief printing plate precursor for laser engraving and process for producing same, and relief printing plate and process for making same
03/04/2014US8663895 Method for manufacturing template and method for manufacturing semiconductor device
03/04/2014US8663880 Polymerizable composition for color filter, color filter, and solid-state imaging device
03/04/2014US8663877 Lithography masks, systems, and manufacturing methods
03/04/2014CA2511790C Radiation curable aqueous compositions
02/2014
02/27/2014WO2014031582A1 Negative-working lithographic printing plate precursors and use
02/27/2014WO2014031432A1 Method for creating topographical patterns in polymers via surface energy patterned films and the marangoni effect
02/27/2014WO2014031146A1 Method for preparing a relief printing form
02/27/2014WO2014030724A1 Pattern forming method, method for manufacturing electronic device, and electronic device
02/27/2014WO2014030723A1 Pattern forming method, electron beam-sensitive or extreme ultraviolet ray-sensitive resin composition, resist film, and method for manufacturing electronic device, and electronic device using the same
02/27/2014WO2014030687A1 A resist stripping solution and a resist strip process
02/27/2014WO2014030645A1 Light-source device and data processing method
02/27/2014WO2014030579A1 Composition for forming resist underlayer film, which contains novolac resin having polynuclear phenol
02/27/2014WO2014030441A1 Positive photosensitive resin composition, method for manufacturing curable film, curable film, organic el display device, and liquid-crystal display device
02/27/2014WO2014029678A1 Lithographic apparatus and device manufacturing method
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