| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 05/17/2005 | US6895294 Assembly comprising a plurality of mask containers, manufacturing system for manufacturing semiconductor devices, and method |
| 05/17/2005 | US6894839 Illumination optical system and laser processor having the same |
| 05/17/2005 | US6894834 Objective with pupil obscuration |
| 05/17/2005 | US6894783 Overlay alignment mark design |
| 05/17/2005 | US6894782 Method of measuring defocusing and method of obtaining correct focusing |
| 05/17/2005 | US6894765 Methods and systems for controlling radiation beam characteristics for microlithographic processing |
| 05/17/2005 | US6894764 Illumination optical system, exposure apparatus having the same, and device fabricating method |
| 05/17/2005 | US6894763 Exposure apparatus and methods utilizing plural mask and object stages movable in opposite directions, and methods of producing devices using the same |
| 05/17/2005 | US6894762 Dual source lithography for direct write application |
| 05/17/2005 | US6894712 Exposure head, exposure apparatus, and application thereof |
| 05/17/2005 | US6894449 Vibration control device, stage device and exposure apparatus |
| 05/17/2005 | US6894435 Method and device for rastering source redundancy |
| 05/17/2005 | US6894334 Active material zones separated by dielectric and channel barrier; etching using mask; overcoating aperture with tungsten, then aluminum, or alloy thereof |
| 05/17/2005 | US6894298 Arrangement for generating extreme ultraviolet (EUV) radiation based on a gas discharge |
| 05/17/2005 | US6894295 Emission collimation beams; masking patterns |
| 05/17/2005 | US6894293 System for recycling gases used in a lithography tool |
| 05/17/2005 | US6894292 System and method for maskless lithography using an array of sources and an array of focusing elements |
| 05/17/2005 | US6894291 Apparatus and methods for blocking highly scattered charged particles in a patterned beam in a charged-particle-beam microlithography system |
| 05/17/2005 | US6894261 Position measuring system for use in lithographic apparatus |
| 05/17/2005 | US6894104 A curable protective coatings material for protecting contactor or holes during etching silicon wafer |
| 05/17/2005 | US6893985 UV-activated dielectric layer |
| 05/17/2005 | US6893972 Applying a resist film to a substrate, producing a resist structure with webs having sidewall structures chemically amplified in a dry etching resistance and removing unamplified sections |
| 05/17/2005 | US6893966 Method of patterning the surface of an article using positive microcontact printing |
| 05/17/2005 | US6893958 Methods for preventing cross-linking between multiple resists and patterning multiple resists |
| 05/17/2005 | US6893882 Multivariate RBR tool aging detector |
| 05/17/2005 | US6893806 Multiple purpose reticle layout for selective printing of test circuits |
| 05/17/2005 | US6893805 Substrate processing apparatus and substrate processing method |
| 05/17/2005 | US6893804 Surface smoothing of stereolithographically formed 3-D objects |
| 05/17/2005 | US6893803 By which costs for fabricating the barrier rib are reduced and the fabricating method is simplified; forming barrier layer using a black resist having a photosensitivity property |
| 05/17/2005 | US6893802 Masking; peelable film; undercutting |
| 05/17/2005 | US6893801 Fabrication method of semiconductor integrated circuit device |
| 05/17/2005 | US6893800 Substrate topography compensation at mask design: 3D OPC topography anchored |
| 05/17/2005 | US6893797 High speed negative-working thermal printing plates |
| 05/17/2005 | US6893794 Chemical amplification type positive resist composition |
| 05/17/2005 | US6893793 Photosensitive polymer and chemically amplified photoresist composition containing the same |
| 05/17/2005 | US6893792 Positive resist composition |
| 05/17/2005 | US6893791 Light sensitive elements comprising mixtures of novolaks, photosensitive compounds, solvents, sensitivity intensifiers and retarders, for use in liquid crystal displays or semiconductors |
| 05/17/2005 | US6893790 Microencapsulated photohardenable particles in binder; exposure to actinic radiation |
| 05/17/2005 | US6893787 Method of a photolithography processing system |
| 05/17/2005 | US6893786 Field correction of overlay error |
| 05/17/2005 | US6893785 Method of manufacturing an electronic device and a semiconductor integrated circuit device |
| 05/17/2005 | US6893784 Carboxyl group-containing photosensitive resin, alkali-developable, photocurable and thermosetting composition containing the same, and cured products thereof |
| 05/17/2005 | US6893783 Bakable lithography printing plates; multilayer, substrates, undercoatings, ink receiver overoatings; alkaline developer |
| 05/17/2005 | US6893782 Method of fabricating color filter substrate for liquid crystal display device |
| 05/17/2005 | US6893684 Anti-reflective coating compositions for use with low k dielectric materials |
| 05/17/2005 | US6893676 Glow in the dark puff heat transfer method and composition |
| 05/17/2005 | US6893585 Liquid crystal composition, selectively reflective film and method for producing the same |
| 05/17/2005 | US6893576 Method of manufacturing multi-layer printed wiring board |
| 05/17/2005 | US6893575 Mask and method of manufacturing the same, electro-luminescence device and method of manufacturing the same, and electronic instrument |
| 05/17/2005 | US6893172 Rapid, uniform production of thick film photoresists; chuck device with support portion holding spinner within anti-scattering cup |
| 05/17/2005 | US6893171 Substrate treating apparatus |
| 05/17/2005 | US6892668 Apparatus for forming a photosensitive element having a layer of particulate material |
| 05/13/2005 | CA2485778A1 Method for positioning and transferring at least two different patterns from a supply strip |
| 05/12/2005 | WO2005043610A1 Cleaning composition for semiconductor containing unsaturated dicarboxylic acid and ethylene urea and cleaning method |
| 05/12/2005 | WO2005043608A1 A processing liquid coating apparatus and a processing liquid coating method |
| 05/12/2005 | WO2005043607A1 Exposure apparatus and device producing method |
| 05/12/2005 | WO2005043603A2 Integrated ashing and implant annealing method |
| 05/12/2005 | WO2005043250A2 Process for the use of bis-choline and tris-choline in the cleaning of quartz-coated polysilicon and other materials |
| 05/12/2005 | WO2005043249A2 Composite optical lithography method for patterning lines of unequal width |
| 05/12/2005 | WO2005043248A1 Composition for forming underlying film containing dextrin ester compound |
| 05/12/2005 | WO2005043247A1 Thick film or ultrathick film responsive chemical amplification type photosensitive resin composition |
| 05/12/2005 | WO2005043246A2 Patterned ceramic films and method for producing the same |
| 05/12/2005 | WO2005043245A2 Alkaline, post plasma etch/ash residue removers and photoresist stripping compositions containing metal-halide corrosion inhibitors |
| 05/12/2005 | WO2005043244A2 Methods and systems for controlling radiation beam characteristics for microlithographic processing |
| 05/12/2005 | WO2005043243A2 Methods and apparatuses for applying wafer-alignment marks |
| 05/12/2005 | WO2005043239A1 Fluorinated photoresists prepared, deposited, developed and removed in carbon dioxide |
| 05/12/2005 | WO2005043077A1 A method for calibration of metrology stage |
| 05/12/2005 | WO2005042453A1 Fluorine compound, fluoropolymer, and process for producing the same |
| 05/12/2005 | WO2005042258A1 Pattern generating apparatus and an apparatus for measuring the physical properties of the surface |
| 05/12/2005 | WO2005041807A1 Novel photopolymers and use in dental restorative materials |
| 05/12/2005 | WO2005033799A3 Spin-printing of electronic and display components |
| 05/12/2005 | WO2005029189A8 Compound for resist and radiation-sensitive composition |
| 05/12/2005 | WO2005010940A3 High resolution, dynamic positioning mechanism for specimen inspection and processing |
| 05/12/2005 | WO2004104707A3 Method and device for cleaning at least one optical component |
| 05/12/2005 | WO2004095600A3 Deposition of permanent polymer structures for oled fabrication |
| 05/12/2005 | WO2004090633A3 An electro-osmotic element for an immersion lithography apparatus |
| 05/12/2005 | WO2004044652A3 Positive tone lithography with carbon dioxide development systems |
| 05/12/2005 | US20050102723 Method of operating a lithographic processing machine, control system, lithographic apparatus, lithographic processing cell, and computer program |
| 05/12/2005 | US20050102648 Orientation dependent shielding for use with dipole illumination techniques |
| 05/12/2005 | US20050102263 Exposure apparatus and device manufacturing method |
| 05/12/2005 | US20050101686 UV curable composition for forming dielectric coatings and related method |
| 05/12/2005 | US20050101685 UV curable composition for forming dielectric coatings and related method |
| 05/12/2005 | US20050101684 Curable compositions and rapid prototyping process using the same |
| 05/12/2005 | US20050101500 Resist remover composition |
| 05/12/2005 | US20050101156 Film forming apparatus and film forming method |
| 05/12/2005 | US20050101151 Laminate for IR ablation |
| 05/12/2005 | US20050101144 Method and apparatus for treating a substrate surface by bubbling |
| 05/12/2005 | US20050101136 Etching method and method of manufacturing circuit device using the same |
| 05/12/2005 | US20050101135 Minimizing the loss of barrier materials during photoresist stripping |
| 05/12/2005 | US20050101125 Damage-free resist removal process for ultra-low-k processing |
| 05/12/2005 | US20050101050 Photolithograph system and method for driving the same |
| 05/12/2005 | US20050100833 Reduced photolithography residues; using diphenyl oxide and antifoam agents |
| 05/12/2005 | US20050100832 Exposure device, exposure method and method of manufacturing semiconductor device |
| 05/12/2005 | US20050100831 Exposure a photoresist on substrate ti image pattern; changing position of substrate holder during exposure |
| 05/12/2005 | US20050100830 Methods for fabricating patterned features utilizing imprint lithography |
| 05/12/2005 | US20050100829 Lithography method |
| 05/12/2005 | US20050100828 Mass production method for three-dimensional micro structure having high aspect ratio |
| 05/12/2005 | US20050100827 Photolithography method for reducing effects of lens aberration |
| 05/12/2005 | US20050100825 Method for evaluating planographic printing plates and quality-control method thereof |
| 05/12/2005 | US20050100824 Coating fluid contains a carrier liquid, thermoplastic resin particles and an IR absorber that has a decomposition temperature higher than the resin melt temperature; TiO2 photocatalyst; images can be written in response to input digital data and can be easily regenerated and reused |