Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
05/2005
05/19/2005WO2004030916A3 Card printing system and method
05/19/2005US20050107575 Unsaturated ester substituted polymers with reduced halogen content
05/19/2005US20050107569 Crosslinked compositions comprising a poly(arylene ether) and a nonlinear optical chromophore, and devices incorporating same
05/19/2005US20050107568 Process for preparing poly(arylene ethers) with pendant crosslinkable groups
05/19/2005US20050107567 e.g., prepared by reacting a polymer of 2,2'-bis(4-hydroxyphenyl) hexafluoropropane and 3,5-dihydroxybenzylalcohol with p-trifluorovinyloxybenzoyl chloride; optical waveguide
05/19/2005US20050106888 Method of in-situ damage removal - post O2 dry process
05/19/2005US20050106875 Plasma ashing method
05/19/2005US20050106870 Methods for using a silylation technique to reduce cell pitch in semiconductor devices
05/19/2005US20050106861 Resistless lithography method for fabricating fine structures
05/19/2005US20050106737 Protection of semiconductor fabrication and similar sensitive processes
05/19/2005US20050106512 Semiconductor manufacturing apparatus and pattern formation method
05/19/2005US20050106511 Developing method, substrate treating method, and substrate treating apparatus
05/19/2005US20050106510 Water and a compositions of alkaline amphoteric and non-ionic inorganic salts, one surfactant having a non-ionic hydrophilic group of polyethylenoxide or polyether; less depositions in the developing apparatus and on the processed printing plates, especially during long run processing
05/19/2005US20050106509 Single layer resist liftoff process for nano track width
05/19/2005US20050106508 fabricating a device wherein an uneven configuration is formed in the device having a crystalline region and an amorphous region by selectively removing any one of said crystalline region and said amorphous region
05/19/2005US20050106505 defining a base bump of solder mask material by a photolithography process, and covering the base bump with a conductive bump layer of copper
05/19/2005US20050106504 Photoimaged dielectric polymer and film, and circuit package containing the same
05/19/2005US20050106503 Suitable for wet lithographic printing; shows a high differentiation between exposed and non-exposed areas and which has a good shelf life without heat treatment
05/19/2005US20050106500 Nitrogen-containing organic compound, resist composition and patterning process
05/19/2005US20050106499 Polymers, resist compositions and patterning process
05/19/2005US20050106498 Polymer with units of oligo-4-hydroxystyrene and oligo-1,4-dihydroxy-phenylcarbonate-bis tertiary alcohol; high molecular weight, mechanical properties, line edge roughness, resolution
05/19/2005US20050106497 melamine derivative, a polyvinylphenol type polymer, a photoacid generator, and an organic solvent
05/19/2005US20050106496 comprises photo-initiator, photosensitive polymerizable monomers or oligomers selected from the groups consisting of double-bond compounds, compounds having epoxy functional group and mixtures thereof;
05/19/2005US20050106495 Polymerizable composition
05/19/2005US20050106494 high resolution; pendant solubility inhibiting acid-labile moieties that have low activation energy for the acid-catalyzed cleaving or deprotection reaction; effective at wavelengths 193 nm and below
05/19/2005US20050106493 Water soluble negative tone photoresist
05/19/2005US20050106492 Carboxyl group-containing acidic compound, basic alkanolamines or quaternary ammonium hydroxides, water, a sulfur-containing corrosion inhibitor and acidic ph; corrosion protection of copper, aluminum wirings with efficient stripping of photoresist, never damages interlevel films
05/19/2005US20050106480 Mask, exposure method, line width measuring method, and method for manufacturing semiconductor devices
05/19/2005US20050106479 deriving hyper-sampled correlation information indicative of photoresist behavior for a plurality of wafer substrates processed at pre-specified target processing conditions
05/19/2005US20050106478 applying layers containing carbon over the layer to be patterned, then spin coating a layer containing silicon and carbon, andapplying an antireflective coating layer to be used with an overlying photoresist layer that is patternable using nanotechnology
05/19/2005US20050106476 Method for producing a mask adapted to an exposure apparatus
05/19/2005US20050106416 Process for preparing crosslinked polymer blends that include a luminescent polymer
05/19/2005US20050106366 Biocompatibility protective coating; dielectrics; prevent current leakage
05/19/2005US20050106321 Dispense geometery to achieve high-speed filling and throughput
05/19/2005US20050105903 Transmission technique in system including chamber
05/19/2005US20050105855 Method for constructing an optical beam guide system in a contamination-free atmosphere and universal optical module for said construction
05/19/2005US20050105290 Illumination optical system and exposure apparatus
05/19/2005US20050105188 Focusing screen master and manufacturing method thereof
05/19/2005US20050105180 Polarized reticle, photolithography system, and method of forming a pattern using a polarized reticle in conjunction with polarized light
05/19/2005US20050105102 Wafer stage position calibration method and system
05/19/2005US20050105100 Optical position measuring system and method using a low coherence light source
05/19/2005US20050105093 Microprocessing apparatus, semiconductor device manufacturing apparatus, and device manufacturing method
05/19/2005US20050105092 Overlay target and measurement method using reference and sub-grids
05/19/2005US20050105087 Exposure apparatus and method of measuring mueller matrix of optical system of exposure apparatus
05/19/2005US20050105074 Mask supporting apparatus using vacuum and light exposing system, and method using the same
05/19/2005US20050105073 Method for carrying out a double or multiple exposure
05/19/2005US20050105072 Optical system for providing a hexapole illumination and method of forming a photoresist pattern on a substrate using the same
05/19/2005US20050105071 Methods for patterning substrates having arbitrary and unexpected dimensional changes
05/19/2005US20050105070 Lithographic apparatus and device manufacturing method
05/19/2005US20050105069 Lithographic apparatus and device manufacturing method
05/19/2005US20050105068 Reticle, exposure monitoring method, exposure method and manufacturing method for semiconductor device
05/19/2005US20050105067 Exposure apparatus and device manufacturing method
05/19/2005US20050105066 Lithographic apparatus and device manufacturing method
05/19/2005US20050104952 Apparatus and method for measuring the length change of the feed spindle in an exposer for printing originals
05/19/2005US20050104015 Device, euv-lithographic device and method for preventing and cleaning contamination on optical elements
05/19/2005US20050104013 Charged-particle multi-beam exposure apparatus
05/19/2005US20050103967 Flexure-supported split reaction mass
05/19/2005US20050103260 Method of exposing wafer using scan-type exposure apparatus
05/19/2005DE10346124A1 Werkzeug zur Erzeugen von mikrostrukturierten Oberflächen Tool for generating micropatterned surfaces
05/19/2005DE10340436A1 Method of modeling characteristics of resist in lithographic exposure process for manufacture of integrated circuits, by adapting polynomial function to results of simulations and deriving error function
05/19/2005DE10335565A1 Verfahren zur Überprüfung von periodischen Strukturen auf Lithographiemasken Proceedings for review of periodic structures on lithography masks
05/19/2005CA2544854A1 Laser-based termination of passive electronic components
05/19/2005CA2540863A1 Photocurable compositions for articles having stable tensile properties
05/18/2005EP1531611A1 Apparatus and method for measuring the change in length of a driving spindle in an exposure printing apparatus
05/18/2005EP1531365A1 Lithographic apparatus with contamination suppression
05/18/2005EP1531364A2 Lithographic apparatus and device manufacturing method
05/18/2005EP1531363A1 Reticle holder
05/18/2005EP1531362A2 Semiconductor manufacturing apparatus and pattern formation method
05/18/2005EP1531346A1 Focusing screen master comprising microlenses and manufacturing method thereof comprising multistage exposure process
05/18/2005EP1531188A2 Mask , its uses and method for its manufacture
05/18/2005EP1531166A2 Cycloaliphatic epoxy compounds containing styrenic, cinnamyl, or maleimide functionality
05/18/2005EP1530737A1 Catadioptric reduction lens having a polarization beamsplitter
05/18/2005EP1530492A1 Method for immobilizing hydrogel-bonding polymers on polymer substrate surfaces
05/18/2005EP1095314B1 Method and apparatus for coating a solution onto a substrate
05/18/2005EP1044394B1 Process for preparing a radiation-sensitive composition
05/18/2005CN2700908Y High definition micro optical gray scale mask producing device
05/18/2005CN1618259A Method and device for generating extreme ultraviolet radiation in particular for lithography
05/18/2005CN1618114A Reflection mirror apparatus, exposure apparatus and device manufacturing method
05/18/2005CN1618069A Photomask and method for qualifying the same with a prototype specification
05/18/2005CN1618043A Multi-tone photomask and method for manufacturing the same
05/18/2005CN1618042A Developing solution for photoresist
05/18/2005CN1618041A Developing solution for photoresist
05/18/2005CN1618040A Stamp, method, and apparatus
05/18/2005CN1617899A Radiation curable resin composition for making colored three dimensional objects
05/18/2005CN1617306A Semiconductor manufacturing apparatus and pattern formation method
05/18/2005CN1617296A Method and system for correcting web deformation during a roll-to-roll process
05/18/2005CN1617048A Lithographic apparatus and device manufacturing method
05/18/2005CN1617047A Method, program product and apparatus for generating assist features utilizing an image field map
05/18/2005CN1617046A Electro-optic device, substrate for electro-optic device and method for manufacturing the same, photomask, and electronic device
05/18/2005CN1617019A Mask supporting apparatus using vacuum and light exposing system, and method using the same
05/18/2005CN1616992A Anti-glare film and image display device
05/18/2005CN1616708A Diamond cone tip and its making method
05/18/2005CN1616549A Energy-ray curing resin composition
05/18/2005CN1616522A Polymer compound, resist material and pattern formation method
05/18/2005CN1616501A High molecular compound, photo anti-corrosion agent material and pattern forming method
05/18/2005CN1616243A Method for positioning and transferring at least two diffrerent patterns from a supply strip
05/18/2005CN1202559C Folded vernier pattern and measurement method for measuring alignment accuracy rating between overlapped multiple layers
05/18/2005CN1202443C Light cover composite and making method of contact hole with same
05/18/2005CN1202180C Ultraviolet curing resin composition and photoprotection welding ink
05/17/2005US6895295 Method and apparatus for controlling a multi-chamber processing tool
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