| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 05/25/2005 | CN1619421A Exposure apparatus extendible corresponding to substrate for printed circuitboard |
| 05/25/2005 | CN1619420A Silicon-containing photoresist systems with cyclic ketal protecting groups |
| 05/25/2005 | CN1619419A Photoresist composition and method for forming photoresist pattern using the same |
| 05/25/2005 | CN1619418A Use of light sensitive agent having donor |
| 05/25/2005 | CN1619417A Multilayer nano imprint lithography |
| 05/25/2005 | CN1619416A Exposure mask, method for manufacturing the mask, and exposure method |
| 05/25/2005 | CN1619415A Silicon-containing compositions for spin-on arc/hardmask materials |
| 05/25/2005 | CN1619392A Liquid crystal display device including polycrystalline silicon thin film transistor and method of fabricating the same |
| 05/25/2005 | CN1619391A Liquid crystal display panel and fabricating method thereof |
| 05/25/2005 | CN1619390A Liquid crystal display and method of producing the same |
| 05/25/2005 | CN1618867A Resin composition, optical filter, and plasma display |
| 05/25/2005 | CN1618716A Loading lock and loading lock chamber therewith |
| 05/25/2005 | CN1618530A Method for making microcapacitor type ultrasonic transducer by using impression technique |
| 05/25/2005 | CN1618527A Base plate treater, slit jet nozzle and mechanism for determining liquid filling degree and gas mixing degree in filled body |
| 05/25/2005 | CN1203742C Etching liquid, and method for mfg .flexible distributing board |
| 05/25/2005 | CN1203533C Method for etching organic film, manufacture method of semiconductor device and pattern formin method |
| 05/25/2005 | CN1203525C Exposure mask, method for manufacturing the mask, and exposure method |
| 05/25/2005 | CN1203524C Superposed mark and its usage |
| 05/25/2005 | CN1203523C Double-layer photoetching process |
| 05/25/2005 | CN1203378C Photoresist remover composition |
| 05/25/2005 | CN1203377C Improved type exposure table main lens |
| 05/25/2005 | CN1203376C Pattern data converting method and apparatus |
| 05/25/2005 | CN1203375C Two-side exposure system |
| 05/25/2005 | CN1203374C Photopolymerizable thermosetting resin compositions and its use |
| 05/25/2005 | CN1203373C Photoresist composition for deep UV radiation |
| 05/25/2005 | CN1203371C Method for individualised marking of circuit boards |
| 05/24/2005 | US6898781 Method for modifying a chip layout to minimize within-die CD variations caused by flare variations in EUV lithography |
| 05/24/2005 | US6898537 Measurement of diffracting structures using one-half of the non-zero diffracted orders |
| 05/24/2005 | US6898267 X-ray mask |
| 05/24/2005 | US6898216 Reduction of laser speckle in photolithography by controlled disruption of spatial coherence of laser beam |
| 05/24/2005 | US6898025 Projection aligner and optical system therefor |
| 05/24/2005 | US6897994 System for correction of spatial cross-talk and pattern frame effects in imaging systems |
| 05/24/2005 | US6897963 Stage device and exposure apparatus |
| 05/24/2005 | US6897949 Exposure apparatus and a device manufacturing method using the same |
| 05/24/2005 | US6897947 Method of measuring aberration in an optical imaging system |
| 05/24/2005 | US6897945 Lithographic apparatus and device manufacturing method |
| 05/24/2005 | US6897944 Illumination optical system, exposure method and apparatus using the same |
| 05/24/2005 | US6897943 Method and apparatus for aerial image improvement in projection lithography using a phase shifting aperture |
| 05/24/2005 | US6897942 Projection exposure apparatus and method |
| 05/24/2005 | US6897941 Resolution enhanced by shaping the optical beams to provide a narrowed main lobe; beams are then focused to small spots on the substrate, which is layered with a photoresist; side lobes are prevented from exposure above threshold |
| 05/24/2005 | US6897940 System for correcting aberrations and distortions in EUV lithography |
| 05/24/2005 | US6897939 Exposure apparatus |
| 05/24/2005 | US6897938 Position measuring method and apparatus |
| 05/24/2005 | US6897888 Scanning brush and method of use |
| 05/24/2005 | US6897599 System for damping oscillations |
| 05/24/2005 | US6897462 Surface position detection device and exposure apparatus and exposure method achieved by utilizing detection device |
| 05/24/2005 | US6897456 Differential pumping system and exposure apparatus |
| 05/24/2005 | US6897455 Apparatus and method for repairing resist latent images |
| 05/24/2005 | US6897454 Energy beam exposure method and exposure apparatus |
| 05/24/2005 | US6897422 Measuring configuration and method for measuring a critical dimension of at least one feature on a semiconductor wafer |
| 05/24/2005 | US6897415 Workpiece stage of a resist curing device |
| 05/24/2005 | US6897267 Multilayer ink jet print heads; crosslinked polymer |
| 05/24/2005 | US6897165 Environmental control equipment/method of developing apparatus for developing light-exposed resist film with developer in wafer treating chamber |
| 05/24/2005 | US6897164 Aperture masks for circuit fabrication |
| 05/24/2005 | US6897162 Integrated ashing and implant annealing method |
| 05/24/2005 | US6897140 Fabrication of structures of metal/semiconductor compound by X-ray/EUV projection lithography |
| 05/24/2005 | US6897126 Semiconductor device manufacturing method using mask slanting from orientation flat |
| 05/24/2005 | US6897076 Lithography system, exposure apparatus and their control method, and device manufacturing method |
| 05/24/2005 | US6897075 Method and apparatus for controlling photolithography overlay registration incorporating feedforward overlay information |
| 05/24/2005 | US6897012 Negative-working photoresist composition |
| 05/24/2005 | US6897011 Photosensitive composition for sandblasting and photosensitive film using the same |
| 05/24/2005 | US6897010 Opaque patterns; forming photoresists; exposure; photolithography |
| 05/24/2005 | US6897008 Comprises butadiene-styrene copolymers; flexography; improved relief image quality |
| 05/24/2005 | US6897007 Method for forming image |
| 05/24/2005 | US6897006 Substrate, photosensitive resinous layer having sensitivity to light excepting infrared light and comprising elastomeric binder resin, polymerizable monomeric compound and polymerization initiator, barrier, masking layer |
| 05/24/2005 | US6897005 Mixture containing acid generator |
| 05/24/2005 | US6897004 Intermediate layer material composition for multilayer resist process and pattern formation process using the same |
| 05/24/2005 | US6896998 Pattern forming method |
| 05/24/2005 | US6896997 Method for forming resist pattern |
| 05/24/2005 | US6896967 Ultraviolet-curable resin composition and photosolder resist ink containing the composition |
| 05/24/2005 | US6896826 Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate |
| 05/24/2005 | US6896821 Fabrication of MEMS devices with spin-on glass |
| 05/24/2005 | US6896736 Photoresist purge control of semiconductor wafer coating equipment |
| 05/24/2005 | US6895862 Digital offset printing registration |
| 05/24/2005 | US6895860 Planographic printing plate precursor and its fixing method on plate cylinder |
| 05/24/2005 | US6895831 Sensor device for non-intrusive diagnosis of a semiconductor processing system |
| 05/24/2005 | US6895667 Transfer of patterned metal by cold-welding |
| 05/24/2005 | CA2259426C Composite relief image printing plates and methods for preparing same |
| 05/19/2005 | WO2005046299A1 An apparatus and method for manufacturing integrated circuits, microelectromechanical system (mems) devices and nanofilters |
| 05/19/2005 | WO2005046011A2 Relax gas discharge laser lithography light source |
| 05/19/2005 | WO2005045530A2 Lithography apparatus with extreme ultraviolet light source |
| 05/19/2005 | WO2005045529A2 Characterization and compensation of errors in multi-axis interferometry system |
| 05/19/2005 | WO2005045528A2 Interference patterning |
| 05/19/2005 | WO2005045527A2 Method of lacquering semiconductor substrates |
| 05/19/2005 | WO2005045526A1 Curable composition, cured object, color filter, and liquid-crystal display |
| 05/19/2005 | WO2005045525A1 Curable compositions and rapid prototyping process using the same |
| 05/19/2005 | WO2005045524A2 A method of forming a patterned layer on a substrate |
| 05/19/2005 | WO2005045523A1 Photocurable composition for producing cured articles having high clarity and improved mechanical properties |
| 05/19/2005 | WO2005045522A2 Photocurable compositions for articles having stable tensile properties |
| 05/19/2005 | WO2005045503A1 Diaphragm array and/or filter array for optical devices, especially microscopes, the position, shape, and/or optical properties of which can be modified |
| 05/19/2005 | WO2005044969A1 Solvent compositions containing chlorofluoroolefins or hydrochiloroolefins |
| 05/19/2005 | WO2005044893A1 Curable polyester having an oxetanyl group at end and process for preparing the same, resist composition, jet printing ink composition, curing methods and uses thereof |
| 05/19/2005 | WO2005044890A1 Tougher cycloaliphatic epoxide resins |
| 05/19/2005 | WO2005031467A3 Microlithographic projection exposure |
| 05/19/2005 | WO2005006424A8 Method and apparatus for removing a residual organic layer from a substrate using reactive gases |
| 05/19/2005 | WO2005005121A3 A method of manufacturing a mould for producing an optical surface, a method of producing a contact lens and a device for use with these methods |
| 05/19/2005 | WO2005001593A3 Reference pattern extraction method and device, pattern matching method and device, position detection method and device, and exposure method and device |
| 05/19/2005 | WO2004095140A3 Collectors in two hemispheres |
| 05/19/2005 | WO2004092693A3 Collector for euv light source |
| 05/19/2005 | WO2004066028A3 Method for process optimization and control by comparison between 2 or more measured scatterometry signals |