Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
05/2005
05/26/2005WO2005047974A2 Measurement and compensation of errors in interferometers
05/26/2005WO2005047955A1 Method and device for correcting slm stamp image imperfections
05/26/2005WO2005047564A2 Method of improving post-develop photoresist profile on a deposited dielectric film
05/26/2005WO2005047407A1 Uv curable composition for forming dielectric coatings and related method
05/26/2005WO2005047346A1 Curable polymer compound
05/26/2005WO2005026843A3 Illumination system for a microlithography projection exposure installation
05/26/2005WO2005026822A3 Fly's eye condenser and illumination system therewith
05/26/2005WO2005019936A3 Optically addressed extreme ultraviolet modulator and lithography system incorporating modulator
05/26/2005WO2005001573A3 Adhesion method using gray-scale photolithography
05/26/2005WO2004104704A3 Lithographic method for producing microcomponents
05/26/2005WO2004099879A3 Method of detecting relative position of exposure mask and object to be exposed, alignment method, and exposure method using the same
05/26/2005WO2003067631A3 Improved semiconductor stress buffer coating edge bead removal compositions and method for their use
05/26/2005US20050114823 Method for improving a simulation model of photolithographic projection
05/26/2005US20050113546 Process for the preparation of cyanine dyes with polysulfonate anions
05/26/2005US20050113538 (Meth)acrylate, raw material alcohol for the (meth)acrylate, method of producing the (meth)acrylate and the alcohol, polymer produced by polymerizing the (meth)acrylate, chemically amplified resist composition, and method of the formation of a pattern
05/26/2005US20050113478 Dye containing curable composition, color filter and method for producing the same
05/26/2005US20050112882 Microfabricated elastomeric valve and pump systems
05/26/2005US20050112810 Method for manufacturing conductive pattern forming body
05/26/2005US20050112676 Solid support comprising a plurality of immobilized, positionally distinguishable, multi-subunit sequence specific reagents for use in characterization and classification of biological samples; immunoaffinity chromatography
05/26/2005US20050112510 Optical element, lithographic apparatus, method for manufacturing and/or protecting an optical element, device manufacturing method and device manufactured thereby
05/26/2005US20050112508 Lithographic projection apparatus, device manufacturing method and device manufactured thereby
05/26/2005US20050112507 Apparatus and method of forming a photoresist pattern, and repair nozzle
05/26/2005US20050112506 Graphite like areas etched in situ leaving pattern
05/26/2005US20050112505 Direct write nano lithography; atomic force microscope discharges precursor fluid onto target surface in preferred orientation
05/26/2005US20050112504 Method of producing semiconductor integrated circuit device and method of producing multi-chip module
05/26/2005US20050112503 Potassium hydroxide alkali builder, phosphonic acid and a perfluoroalkyl sulphonate surfactant; forming a relief image of alkali soluble epoxy
05/26/2005US20050112502 Thermosensitive lithographic printing plate comprising specific acrylate monomers
05/26/2005US20050112501 Photosensitive composition and color filter
05/26/2005US20050112500 Photocurable/therosetting resin composition, photosensitive dry film formed therefrom and method of forming pattern with the same
05/26/2005US20050112498 Chemical amplification type positive resist composition, resist laminated material, resist pattern forming method and method of manufacturing semiconductor device
05/26/2005US20050112497 Prevent excess acid in exposed resist; phenol derivative light absorber; ether, aldehyde derivative cross linking agent; sulfonate derivative thermal acid generator; cyclohexanone solvent; formanilide photo base generator
05/26/2005US20050112496 Exposing photopolymerizable image-forming material comprising substrate with image-recording layer comprising photopolymerization initiator sensitive to light of wavelength within visible to ultraviolet ranges, polymerizable compound with ethylenically unsaturated group, binder, developing with carbonate
05/26/2005US20050112495 Low-polydispersity photoimageable polymers and photoresists and processes for microlithography
05/26/2005US20050112494 Bottom antireflective coatings
05/26/2005US20050112481 Projection optical system scans reticle shape, uses measurement as correction data, repeats multiple measurments and updates before exposing pattern image
05/26/2005US20050112480 Exposure system and method with group compensation
05/26/2005US20050112479 Methods of preventing cross-linking between multiple resists and patterning multiple resists
05/26/2005US20050112478 coating masking layers comprising inorganic phosphates having a nonlinear refractive index, to radiation transparent substrates, then applying photoresist, developing, etching to form miniature patterns and stripping the photoresists; integrated circuits; photolithography
05/26/2005US20050112475 Monitoring pattern configured to obtain information required for adjusting optical system; asymmetrical diffraction grating generates positive first order diffracted light and negative first order diffracted light; probing phase shifters
05/26/2005US20050112474 Method involving a mask or a reticle
05/26/2005US20050112383 A polysiloxane and an organotitanium chelate compound having no alkoxy group; improved storage stability, patterning and burying properties, defect-free
05/26/2005US20050112382 Molecular photoresists containing nonpolymeric silsesquioxanes
05/26/2005US20050111726 Parts manipulation and inspection system and method
05/26/2005US20050111108 Very-high aperture projection objective
05/26/2005US20050111089 Superresolving microscopy apparatus
05/26/2005US20050111081 Broad band deep ultraviolet/vacuum ultraviolet catadioptric imaging system
05/26/2005US20050111080 Mirror for use in a lithographic apparatus, lithographic apparatus, device manufacturing method, and device manufactured thereby
05/26/2005US20050111067 Method for the production of a facetted mirror
05/26/2005US20050111010 Scanner linearity tester
05/26/2005US20050111005 Lithographic interferometer system
05/26/2005US20050110975 Image forming device having a brush type processing member
05/26/2005US20050110973 Lithographic apparatus and device manufacturing method
05/26/2005US20050110972 Illumination system and exposure apparatus
05/26/2005US20050110971 Lithographic apparatus and device manufacturing method
05/26/2005US20050110970 Lithographic apparatus, device manufacturing method, and device manufactured thereby
05/26/2005US20050110969 Overlay and cd process window structure
05/26/2005US20050110968 Exposure apparatus and device manufacturing method
05/26/2005US20050110967 Cooling system, exposure apparatus having the same, and device manufacturing method
05/26/2005US20050110966 Exposure apparatus, and device manufacturing method using the same
05/26/2005US20050110965 Lithographic alignment system and device manufacturing method
05/26/2005US20050110932 Thin film transistor substrate of horizontal electric field type liquid crystal display device and fabricating method thereof
05/26/2005US20050110864 Image recorder
05/26/2005US20050110447 Device for manipulating the angular position of an object relative to a fixed structure
05/26/2005US20050110200 Convection cooling techniques in selective deposition modeling
05/26/2005US20050110180 Process for producing a tool insert for injection molding a microstructured part
05/26/2005US20050110012 Overlay mark for measuring and correcting alignment errors
05/26/2005US20050109992 Using mixture of water and polyether nonionic surfactant
05/26/2005US20050109955 Charged particle beam lithography system, pattern drawing method, and method of manufacturing semiconductor device
05/26/2005US20050109954 Apparatus and method for verification of outgassing products
05/26/2005US20050109664 Secondary latchkey mechanism and method for reticle SMIF pods
05/26/2005CA2544990A1 Terpene ether developing solvent for photopolymerizable printing plates
05/25/2005EP1533832A1 Optical unit and x-ray exposure system
05/25/2005EP1533657A1 Multilayer nano imprint lithography
05/25/2005EP1532639A2 Optical device for high energy radiation
05/25/2005EP1532490A1 Optical reproduction system, in particular catadioptric reduction lens
05/25/2005EP1532489A2 Projection optical system and method for photolithography and exposure apparatus and method using same
05/25/2005EP1532488A1 Optical subsystem, particularly for a projection exposure system comprising at least one optical element that can be brought into at least two positions
05/25/2005EP1532487A1 Radiation-sensitive negative-type resist composition for pattern formation and pattern formation method
05/25/2005EP1532486A1 Photosensitive compositions based on polycyclic polymers
05/25/2005EP1532485A2 Device for sealing a projection illumination system
05/25/2005EP1532484A2 Lithographic printing with polarized light
05/25/2005EP1532219A1 Liquid-repellent, alkali-resistant coating composition and coating suitable for pattern forming
05/25/2005EP1532193A2 Organosiloxanes
05/25/2005EP1153935B1 Photopolymerizable resin composition and use thereof
05/25/2005DE10345525A1 Forming a pattern of opaque or semi-transparent structural elements on a photomask useful for the preparation of contact cavity-layers in storage elements and in semiconductor production
05/25/2005DE10344645A1 Maske, Maskensubstrathalter und Verfahren zur Durchführung einer Doppel- oder Mehrfachbelichtung mit der Maske und dem Maskensubstrathalter Mask, mask substrate holder and method for performing a double or multiple exposure with the mask and the mask substrate holder
05/25/2005DE10341121A1 Electromagnetic irradiation of a specimen of chalcogenide based material in order to structure the specimen surface used as a mask for structuring a material under a specimen and for preparation of optical elements
05/25/2005DE102004051838A1 Mirror arrangement for reflecting electromagnetic radiation comprises an active layer made of a ferroelectric material, a piezoelectric material, a magnetostrictive material, a electrostrictive material, and/or a shape memory alloy
05/25/2005CN1620731A Imaging device in a projection exposure facility
05/25/2005CN1620634A Self-aligned pattern formation using dual wavelengths
05/25/2005CN1620633A Bases and surfactants and their use in photoresist compositions for microlithography
05/25/2005CN1620632A Optical proximity correction for phase shifting photolithographic masks
05/25/2005CN1620245A Photosensitive thick-film paste materials for forming light-transmitting electromagnetic shields, light-transmitting electromagnetic shields formed using the same, and method of manufacture thereof
05/25/2005CN1620203A Mask, display, organic electroluminescent display and mfg. method thereof
05/25/2005CN1619788A Method and system for monitoring etch process
05/25/2005CN1619774A Semi conductor element having reduced spacing and its forming method
05/25/2005CN1619770A Pattern forming method and semiconductor device mfg method
05/25/2005CN1619769A Target system and method of determining alignment error in electronic substrates
05/25/2005CN1619423A Poltier module and mfg method thereof
05/25/2005CN1619422A 辐射检测器 Radiation detector