Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
06/2005
06/02/2005WO2005050785A1 Planar antenna
06/02/2005WO2005050720A1 Method and apparatus for printing patterns with improved cd uniformity
06/02/2005WO2005050719A1 Fabrication method of extreme ultraviolet radiation mask mirror using atomic force microscope lithography
06/02/2005WO2005050718A1 Light flux conversion element, lighting optical device, exposure system, and exposure method
06/02/2005WO2005050327A1 Method for producing flexographic printing forms by thermal development
06/02/2005WO2005050326A1 Lithographic apparatus and device manufacturing method
06/02/2005WO2005050325A1 Polarization-optimizing illumination system
06/02/2005WO2005050324A2 A method and apparatus for producing microchips
06/02/2005WO2005050323A1 Optical assembly for photolithography
06/02/2005WO2005050322A1 Diaphragm changing device
06/02/2005WO2005050321A1 Refractive projection objective for immersion lithography
06/02/2005WO2005050320A1 Method for forming multilayer resist
06/02/2005WO2005050319A1 Positive photoresist and method for producing structure
06/02/2005WO2005050318A1 Photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for manufacturing printed circuit board
06/02/2005WO2005050317A2 Polarized reticle, photolithography system, and method of forming a pattern using a polarized reticle in conjunction with polarized light
06/02/2005WO2005050316A2 Method involving a mask or a reticle
06/02/2005WO2005050286A1 Arrangement and method for the suppression of speckle structures of a pulsed laser beam
06/02/2005WO2005050268A1 Process for producing color filter for image sensor
06/02/2005WO2005049764A1 Photopolymerizing composition and photopolymerizing recording medium manufactured using the same and used to manufacture 3d optical memory
06/02/2005WO2005049741A1 Formation of self-assembled monolayers
06/02/2005WO2005049737A1 Pigment compositions consisting of a yellow disazo pigment and an organic pigment
06/02/2005WO2005049681A2 Antireflective coatings for via fill and photolithography applications and methods of preparation thereof
06/02/2005WO2005031462B1 Low-polydispersity photoimageable polymers and photoresists and processes for microlithography
06/02/2005WO2005029184A3 Positive photoresist composition and resist pattern formation
06/02/2005WO2005019934A3 Precursor paste and method of producing the same
06/02/2005WO2004094967A3 Composition and method for 3-dimensional mapping or radiation dose
06/02/2005WO2004081988A3 Model pattern simulation of semiconductor wafer processing steps
06/02/2005WO2004049071A8 Radiation-sensitive elements and their storage stability
06/02/2005US20050120328 Method and system for increasing product yield by controlling lithography on the basis of electrical speed data
06/02/2005US20050120327 System and method for lithography simulation
06/02/2005US20050119843 Semiconductor production system
06/02/2005US20050119378 Controlled radical polymerization; photoresists with high transparency at 157-248 nm and good resolution
06/02/2005US20050119366 Comprising a vinyl-ether terminated urethane and a poly-functional mercaptan eg trimethylpropane tris(trimercaptopropionate); hotmelt adhesives
06/02/2005US20050119362 Comprises an oxetane compound with an oxetane ring, an epoxy compound, and a non-reactive compound having a viscosity at 25 degrees C. of from 0.1 to 20 mPa.s and a boiling point of not less than 150 degrees C; cured with high speed
06/02/2005US20050119143 corrosion resistance; removing photoresist residues; using aqueous solution containing fluoride compound
06/02/2005US20050119142 Cleaning agent composition for a positive or a negative photoresist
06/02/2005US20050118835 Lithographic projection apparatus, mirror, method of supplying a protective cap layer, device manufacturing method and device manufactured accordingly
06/02/2005US20050118831 Gas assisted method for applying resist stripper and gas-resist stripper combinations
06/02/2005US20050118817 Resist pattern forming method, magnetic recording medium manufacturing method and magnetic head manufacturing method
06/02/2005US20050118812 Method of detecting, identifying and correcting process performance
06/02/2005US20050118785 Method for forming alignment pattern of semiconductor device
06/02/2005US20050118749 Composition for forming anti-reflective coating
06/02/2005US20050118740 Method of manufacturing a branch optical waveguide
06/02/2005US20050118706 Polymer arrays
06/02/2005US20050118541 Maintenance of photoresist adhesion and activity on the surface of dielectric ARCS for 90 nm feature sizes
06/02/2005US20050118538 Method for exposing photoresist film of semiconductor device
06/02/2005US20050118536 Controlling the environment in a photolithographic multicompartment apparatus by using an air stream formation mechanism in the second space to discharge the acid generated from the chemically amplified resist film
06/02/2005US20050118535 Method of processing a substrate, heating apparatus, and method of forming a pattern
06/02/2005US20050118531 Method for semiconductor fabrication processes wherein one skilled in the art is capable of making a nano-scale gate structure with an After-Etch-Inspection that is substantially equal to After-Develop-Inspection
06/02/2005US20050118529 Layer of photoimageable composition on a substrate surface exposed to pattern of radiation which produces a catalyst capable of changing photoimageable composition's susceptibility to a developer
06/02/2005US20050118528 Lithographic apparatus and device manufacturing method
06/02/2005US20050118524 Liquid transfer articles and method for producing the same using digital imaging photopolymerization
06/02/2005US20050118517 Electrically charged particle suspended in a fluid, with a polymeric shell which is incompatible with the suspending fluid, a second charged particle having optical properties differing from the first particle, with a polymer shell; for encapsulated and microcell electrophoretic displays
06/02/2005US20050118516 For character-projection (CP) type of electron-beam exposure where a mask defect can be corrected or a pattern changed without making a new mask as part of or all the cells can be exchanged at the mask portion as the mask is made up of blocks of cells in polygon shape
06/02/2005US20050118515 Binary half tone photomasks and microscopic three-dimensional devices and method of fabricating the same
06/02/2005US20050118514 Method of the adjustable matching map system in lithography
06/02/2005US20050118380 optical recording media comprising support substrates having data recording surfaces and light transmission layer having excellent transparency, wear resistance and recording film protective ability, used for high density recording using blue lasers
06/02/2005US20050118338 Control of the spatial distribution and sorting of micro-or nano-meter or molecular scale objects on patterned surfaces
06/02/2005US20050117795 Mask inspection process accounting for mask writer proximity correction
06/02/2005US20050117794 Device manufacturing method, orientation determination method and lithographic apparatus
06/02/2005US20050117233 X-ray total reflection mirror and X-ray exposure apparatus
06/02/2005US20050117226 Optical instrument, exposure apparatus, and device manufacturing method
06/02/2005US20050117224 Catadioptric projection objective with geometric beam splitting
06/02/2005US20050117203 Method for producing an optical element from a quartz substrate
06/02/2005US20050117171 Measuring method and apparatus using interference, exposure method and apparatus using the same, and device fabrication method
06/02/2005US20050117170 Measuring method and apparatus using shearing interferometry, exposure method and apparatus using the same, and device manufacturing method
06/02/2005US20050117168 Measuring method and apparatus using shearing interferometry, exposure method and apparatus using the same, and device manufacturing method
06/02/2005US20050117154 Method and apparatus for self-referenced projection lens distortion mapping
06/02/2005US20050117148 Method of and system for determining the aberration of an imaging system test object and detector for use with the method
06/02/2005US20050117142 Assembly of a reticle holder and a reticle
06/02/2005US20050117141 Lithographic apparatus and device manufacturing method
06/02/2005US20050117139 Lithographic apparatus and device manufacturing method
06/02/2005US20050117138 Support unit, optical unit and exposure apparatus, and device manufacturing method
06/02/2005US20050117137 Illumination system and exposure apparatus
06/02/2005US20050117136 Exposure apparatus and device manufacturing method
06/02/2005US20050117135 Method and imaging apparatus for imaging a structure onto a semiconductor wafer by means of immersion lithography
06/02/2005US20050117134 Exposure method, exposure apparatus, and method for manufacturing device
06/02/2005US20050117097 Liquid crystal display and method of producing the same
06/02/2005US20050117093 Color filter on thin film transistor type liquid crystal display device and method of fabricating the same
06/02/2005US20050116549 Coil support unit, motor and exposure apparatus using the same, and device manufacturing method
06/02/2005US20050116370 Imprinting machine and imprinting method
06/02/2005US20050116187 Inspection device and inspection method for pattern profile, exposure system
06/02/2005US20050116185 Exposure system and exposure method
06/02/2005US20050116184 Measuring method and apparatus, exposure method and apparatus, and device manufacturing method
06/02/2005US20050116183 Radiation source, lithographic apparatus, and device manufacturing method
06/02/2005US20050116180 Charged-particle beam lithographic system
06/02/2005US20050115429 Method and device for printing wherein a hydrophilic layer is produced and structured
06/02/2005US20050115352 Motor, robot, substrate loader, and exposure apparatus
06/02/2005DE4226464B4 Positivresist Positive resist
06/02/2005DE10350708A1 Detecting wafer scanner translation fault in photo-lithographic structuring of semiconductor wafer, especially with RAM component, by forming overlay targets in illumination fields and detemining displacement
06/02/2005DE10349764A1 Verfahren zur Generierung einer Hartmaske für die Strukturierung einer Schicht und Hartmaske zur Strukturierung einer Schicht Method for generating a hard mask for patterning a layer and hard mask for patterning a layer
06/02/2005DE10345430A1 Beleuchtungsvorrichtung Lighting device
06/02/2005DE102004051374A1 Galvanogeformtes Ionenimplantations-Strukturmaterial und Verfahren zur Herstellung des Strukturmaterials Electroformed ion implantation structural material and process for manufacturing the structural material
06/02/2005DE102004032503A1 Musterschreibvorrichtung Pattern writing apparatus
06/02/2005CA2545210A1 Pigment compositions consisting of a yellow disazo pigment and an organic pigment
06/01/2005EP1536626A1 Scanner linearity tester
06/01/2005EP1536459A1 Maintenance system, substrate processing device, remote operation device, and communication method
06/01/2005EP1536458A1 Exposure system and exposure method
06/01/2005EP1536291A1 Removing solution
06/01/2005EP1536290A2 Stage apparatus and linear motor
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