Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
06/2005
06/09/2005US20050122491 Lithographic apparatus with contamination suppression, device manufacturing method, and device manufactured thereby
06/09/2005US20050122490 Lithographic apparatus and device manufacturing method
06/09/2005US20050122446 Color filter substrate and method of manufacturing the same
06/09/2005US20050122442 Liquid crystal display device and method of fabricating the same
06/09/2005US20050121625 Wafer chuck illumination device for use in semiconductor manufacturing equipment
06/09/2005US20050121624 Lithographic apparatus, illumination system and method for providing a projection beam of EUV radiation
06/09/2005US20050121436 Heating method for a band-shaped body and heating apparatus for a band-shaped body
06/09/2005US20050121144 Processing system and exposure apparatus using the same
06/09/2005US20050120953 Method of and apparatus for supplying a dynamic protective layer to a mirror
06/09/2005US20050120902 Edge transfer lithography
06/09/2005DE4420409B4 Photomaske mit Mustern zur Verringerung der erforderlichen Lichtleistung eines Steppers Photomask patterns to reduce the required light output of a stepper
06/09/2005DE19938893B4 Schwingungsfreie Vorrichtung zur Halbleiterbelichtung Vibration-free device for semiconductor exposure
06/09/2005DE19815398B4 Verfahren zur Herstellung einer litographischen Druckplatte A method for preparing a lithographic printing plate
06/09/2005DE19534132B4 Lichtannäherungs-Korrekturverfahren Light proximity correction method
06/09/2005DE10353127A1 Pigmentzusammensetzungen aus gelbem Disazopigment und organischem Pigment Pigment compositions of yellow dis-azo pigment and organic pigment
06/09/2005DE10351963A1 Verfahren zum Belacken von Halbleitersubstraten A method for lacquering of semiconductor substrates
06/09/2005DE10350688B3 Vorrichtung und Verfahren zum Nachweis von Ausgasprodukten Device and method for the detection of Ausgasprodukten
06/09/2005DE102004053563A1 Photomaske und Verfahren zum Bilden eines Musters Photo mask and method for forming a pattern
06/09/2005DE102004052650A1 Belichtungsverfahren Exposure method
06/09/2005DE10106424B4 Verfahren zum Überwachen der Herstellung integrierter Schaltkreise abhängig von Korrekturwerten einer Belichtungsanlage sowie zugehörige Komponenten A method for monitoring the manufacture of integrated circuits depending on correction values ​​of an exposure system, and associated components
06/09/2005CA2544265A1 Improvements in and relating to printing plate ovens
06/08/2005EP1538484A1 EUV illumination system and lithographic apparatus
06/08/2005EP1538483A1 Measuring method and apparatus, exposure method and apparatus and device manufacturing method
06/08/2005EP1538482A1 Device and method for large area lithography
06/08/2005EP1538481A1 A method of activating a silicon surface for subsequent patterning of molecules onto said surface
06/08/2005EP1538185A1 Colored curable composition, color filter and manufacturing method thereof
06/08/2005EP1537455A2 Lithographic method for small line printing
06/08/2005EP1537454A2 Four color digital printing process and color image element using color-sensitive photopolymers
06/08/2005EP1537449A1 Catadioptric projection lens and method for compensating the intrinsic birefringence in a lens of this type
06/08/2005EP1536940A2 Method for making ophthalmic devices
06/08/2005EP1472574A4 Spin-on anti-reflective coatings for photolithography
06/08/2005EP1323004A4 Photosensitive resin composition for flexographic printing plates
06/08/2005EP1299774A4 Perfluoroalkylsulfonic acid compounds for photoresists
06/08/2005EP1221072B1 Contact hole production by means of crossing sudden phase shift edges of a single phase mask
06/08/2005EP0885405B1 Photoresist compositions comprising polycyclic polymers with acid labile pendant groups
06/08/2005CN1625798A Image formation state adjustment system, exposure method, exposure apparatus, program, and information recording medium
06/08/2005CN1625797A Substrate treatment apparatus
06/08/2005CN1625796A Reticle and optical characteristic measuring method
06/08/2005CN1625718A Lens consisting of a crystalline material
06/08/2005CN1624865A Method of controlling critical dimension microloading of photoresist trimming process by polymer deposition
06/08/2005CN1624850A Method of forming carbon nanotube emitter and method of manufacturing field emission display using the same
06/08/2005CN1624590A Measuring method and correction method for illumination irregularity of exposure device
06/08/2005CN1624588A Immersion lithographic system and method of manufacturing semiconductor device
06/08/2005CN1624586A Vacuum negative pressure nanometer press printing method
06/08/2005CN1624585A Vacuum netative pressure nanometer press printing device
06/08/2005CN1624576A Image recorder
06/08/2005CN1624548A Color filter on thin film transistor type liquid crystal display device and method of fabricating the same
06/08/2005CN1624545A Liquid crystal display device and method of fabricating the same
06/08/2005CN1624530A Vanadium oxide film micro photo-switch and its making method
06/08/2005CN1623864A Composite substrate carrier
06/08/2005CN1205655C Post chemical-mechanical planarization (CMP) cleaning composition
06/08/2005CN1205649C Micropattern manufacturing process with multiexposing steps
06/08/2005CN1205514C Method of eliminating contour distortion in planar printing process with chemical contraction for raising definition
06/08/2005CN1205513C Method for improving photolithography analyticity
06/08/2005CN1205325C Stabilized alkaline compositions for cleaning microelectronic substrates
06/08/2005CN1205241C Fractionation of resins using a static mixer and a liquid-liquid centrifuge
06/08/2005CN1205215C Oxime derivatives and the use thereof as latent acids
06/08/2005CN1205053C Lithographic printing plate for laser-imaging device
06/07/2005US6904073 High power deep ultraviolet laser with long life optics
06/07/2005US6903859 Homogenizer
06/07/2005US6903821 Inspection method, apparatus and system for circuit pattern
06/07/2005US6903809 Integrated, in-line bumping and exposure system
06/07/2005US6903808 Alignable low-profile substrate chuck for large-area projection lithography
06/07/2005US6903807 Stage apparatus and its driving method, exposure apparatus and device manufacturing method
06/07/2005US6903806 Stage control apparatus, exposure apparatus, and device manufacturing method
06/07/2005US6903805 Lithographic apparatus and device manufacturing method
06/07/2005US6903804 Projection optical system and projection and light exposure apparatus using it
06/07/2005US6903803 Projection optical system, exposure apparatus incorporating this projection optical system, and manufacturing method for micro devices using the exposure apparatus
06/07/2005US6903802 Projection objective having adjacently mounted aspheric lens surfaces
06/07/2005US6903801 Illumination optical system for use in projection exposure apparatus
06/07/2005US6903799 Exposure method and exposure apparatus
06/07/2005US6903798 Pattern writing apparatus and pattern writing method
06/07/2005US6903467 Apparatus for manufacturing product, including product stage assembly, having movable product stage, product stage assembly having at least one input supplied by at least one tube
06/07/2005US6903355 Electron beam exposure apparatus, electron beam method, semiconductor device manufacturing method, mask, and mask manufacturing method
06/07/2005US6903353 Charged particle beam exposure apparatus, device manufacturing method, and charged particle beam applied apparatus
06/07/2005US6903352 Charged-particle beam exposure apparatus, charged-particle beam exposure method, control data determination method, and device manufacturing method using this method
06/07/2005US6903347 Superresolution in microlithography and fluorescence microscopy
06/07/2005US6903346 Stage assembly having a follower assembly
06/07/2005US6903345 Electron optical system, charged-particle beam exposure apparatus using the same, and device manufacturing method
06/07/2005US6903337 Examining system for the particle-optical imaging of an object, deflector for charged particles as well as method for the operation of the same
06/07/2005US6903027 Method of forming dielectric film and dielectric film
06/07/2005US6903023 In-situ plasma etch for TERA hard mask materials
06/07/2005US6902999 Pattern formation method
06/07/2005US6902875 Exposing and then developing, wherein the exposed radiation sensitive polysilazane coating film is subjected to moistening treatment and then developed; use as finely patterned interlayer dielectric
06/07/2005US6902874 193 nm ultraviolet radiation patternwise exposure; without the use of a phase shift mask; imaging polymer and a radiation sensitive acid generator
06/07/2005US6902870 Patterning of dielectric with added layers of materials aside from photoresist for enhanced pattern transfer
06/07/2005US6902868 Method of manufacturing integrated circuit
06/07/2005US6902866 Thermosensitive lithographic printing plate comprising specific acrylate monomers
06/07/2005US6902865 Non-alkaline aqueous development of thermosensitive lithographic printing plates
06/07/2005US6902864 Polymerizable composition
06/07/2005US6902862 For producing semiconductor devices
06/07/2005US6902860 Two-layer imageable element comprising thermally reversible polymers
06/07/2005US6902859 Chemically amplified resist composition and method for forming patterned film using same
06/07/2005US6902855 Qualifying patterns, patterning processes, or patterning apparatus in the fabrication of microlithographic patterns
06/07/2005US6902853 Dual wavelength method of determining a relative position of a substrate and a template
06/07/2005US6902852 Pattern transfer method using a mask and half tone mask
06/07/2005US6902772 Silicon-containing polymer, resist composition and patterning process
06/07/2005US6902762 Method and device for processing substrate
06/07/2005US6902330 Printing plate processing apparatus
06/07/2005US6902283 Microlithography reduction objective and projection exposure apparatus