Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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06/09/2005 | US20050122491 Lithographic apparatus with contamination suppression, device manufacturing method, and device manufactured thereby |
06/09/2005 | US20050122490 Lithographic apparatus and device manufacturing method |
06/09/2005 | US20050122446 Color filter substrate and method of manufacturing the same |
06/09/2005 | US20050122442 Liquid crystal display device and method of fabricating the same |
06/09/2005 | US20050121625 Wafer chuck illumination device for use in semiconductor manufacturing equipment |
06/09/2005 | US20050121624 Lithographic apparatus, illumination system and method for providing a projection beam of EUV radiation |
06/09/2005 | US20050121436 Heating method for a band-shaped body and heating apparatus for a band-shaped body |
06/09/2005 | US20050121144 Processing system and exposure apparatus using the same |
06/09/2005 | US20050120953 Method of and apparatus for supplying a dynamic protective layer to a mirror |
06/09/2005 | US20050120902 Edge transfer lithography |
06/09/2005 | DE4420409B4 Photomaske mit Mustern zur Verringerung der erforderlichen Lichtleistung eines Steppers Photomask patterns to reduce the required light output of a stepper |
06/09/2005 | DE19938893B4 Schwingungsfreie Vorrichtung zur Halbleiterbelichtung Vibration-free device for semiconductor exposure |
06/09/2005 | DE19815398B4 Verfahren zur Herstellung einer litographischen Druckplatte A method for preparing a lithographic printing plate |
06/09/2005 | DE19534132B4 Lichtannäherungs-Korrekturverfahren Light proximity correction method |
06/09/2005 | DE10353127A1 Pigmentzusammensetzungen aus gelbem Disazopigment und organischem Pigment Pigment compositions of yellow dis-azo pigment and organic pigment |
06/09/2005 | DE10351963A1 Verfahren zum Belacken von Halbleitersubstraten A method for lacquering of semiconductor substrates |
06/09/2005 | DE10350688B3 Vorrichtung und Verfahren zum Nachweis von Ausgasprodukten Device and method for the detection of Ausgasprodukten |
06/09/2005 | DE102004053563A1 Photomaske und Verfahren zum Bilden eines Musters Photo mask and method for forming a pattern |
06/09/2005 | DE102004052650A1 Belichtungsverfahren Exposure method |
06/09/2005 | DE10106424B4 Verfahren zum Überwachen der Herstellung integrierter Schaltkreise abhängig von Korrekturwerten einer Belichtungsanlage sowie zugehörige Komponenten A method for monitoring the manufacture of integrated circuits depending on correction values of an exposure system, and associated components |
06/09/2005 | CA2544265A1 Improvements in and relating to printing plate ovens |
06/08/2005 | EP1538484A1 EUV illumination system and lithographic apparatus |
06/08/2005 | EP1538483A1 Measuring method and apparatus, exposure method and apparatus and device manufacturing method |
06/08/2005 | EP1538482A1 Device and method for large area lithography |
06/08/2005 | EP1538481A1 A method of activating a silicon surface for subsequent patterning of molecules onto said surface |
06/08/2005 | EP1538185A1 Colored curable composition, color filter and manufacturing method thereof |
06/08/2005 | EP1537455A2 Lithographic method for small line printing |
06/08/2005 | EP1537454A2 Four color digital printing process and color image element using color-sensitive photopolymers |
06/08/2005 | EP1537449A1 Catadioptric projection lens and method for compensating the intrinsic birefringence in a lens of this type |
06/08/2005 | EP1536940A2 Method for making ophthalmic devices |
06/08/2005 | EP1472574A4 Spin-on anti-reflective coatings for photolithography |
06/08/2005 | EP1323004A4 Photosensitive resin composition for flexographic printing plates |
06/08/2005 | EP1299774A4 Perfluoroalkylsulfonic acid compounds for photoresists |
06/08/2005 | EP1221072B1 Contact hole production by means of crossing sudden phase shift edges of a single phase mask |
06/08/2005 | EP0885405B1 Photoresist compositions comprising polycyclic polymers with acid labile pendant groups |
06/08/2005 | CN1625798A Image formation state adjustment system, exposure method, exposure apparatus, program, and information recording medium |
06/08/2005 | CN1625797A Substrate treatment apparatus |
06/08/2005 | CN1625796A Reticle and optical characteristic measuring method |
06/08/2005 | CN1625718A Lens consisting of a crystalline material |
06/08/2005 | CN1624865A Method of controlling critical dimension microloading of photoresist trimming process by polymer deposition |
06/08/2005 | CN1624850A Method of forming carbon nanotube emitter and method of manufacturing field emission display using the same |
06/08/2005 | CN1624590A Measuring method and correction method for illumination irregularity of exposure device |
06/08/2005 | CN1624588A Immersion lithographic system and method of manufacturing semiconductor device |
06/08/2005 | CN1624586A Vacuum negative pressure nanometer press printing method |
06/08/2005 | CN1624585A Vacuum netative pressure nanometer press printing device |
06/08/2005 | CN1624576A Image recorder |
06/08/2005 | CN1624548A Color filter on thin film transistor type liquid crystal display device and method of fabricating the same |
06/08/2005 | CN1624545A Liquid crystal display device and method of fabricating the same |
06/08/2005 | CN1624530A Vanadium oxide film micro photo-switch and its making method |
06/08/2005 | CN1623864A Composite substrate carrier |
06/08/2005 | CN1205655C Post chemical-mechanical planarization (CMP) cleaning composition |
06/08/2005 | CN1205649C Micropattern manufacturing process with multiexposing steps |
06/08/2005 | CN1205514C Method of eliminating contour distortion in planar printing process with chemical contraction for raising definition |
06/08/2005 | CN1205513C Method for improving photolithography analyticity |
06/08/2005 | CN1205325C Stabilized alkaline compositions for cleaning microelectronic substrates |
06/08/2005 | CN1205241C Fractionation of resins using a static mixer and a liquid-liquid centrifuge |
06/08/2005 | CN1205215C Oxime derivatives and the use thereof as latent acids |
06/08/2005 | CN1205053C Lithographic printing plate for laser-imaging device |
06/07/2005 | US6904073 High power deep ultraviolet laser with long life optics |
06/07/2005 | US6903859 Homogenizer |
06/07/2005 | US6903821 Inspection method, apparatus and system for circuit pattern |
06/07/2005 | US6903809 Integrated, in-line bumping and exposure system |
06/07/2005 | US6903808 Alignable low-profile substrate chuck for large-area projection lithography |
06/07/2005 | US6903807 Stage apparatus and its driving method, exposure apparatus and device manufacturing method |
06/07/2005 | US6903806 Stage control apparatus, exposure apparatus, and device manufacturing method |
06/07/2005 | US6903805 Lithographic apparatus and device manufacturing method |
06/07/2005 | US6903804 Projection optical system and projection and light exposure apparatus using it |
06/07/2005 | US6903803 Projection optical system, exposure apparatus incorporating this projection optical system, and manufacturing method for micro devices using the exposure apparatus |
06/07/2005 | US6903802 Projection objective having adjacently mounted aspheric lens surfaces |
06/07/2005 | US6903801 Illumination optical system for use in projection exposure apparatus |
06/07/2005 | US6903799 Exposure method and exposure apparatus |
06/07/2005 | US6903798 Pattern writing apparatus and pattern writing method |
06/07/2005 | US6903467 Apparatus for manufacturing product, including product stage assembly, having movable product stage, product stage assembly having at least one input supplied by at least one tube |
06/07/2005 | US6903355 Electron beam exposure apparatus, electron beam method, semiconductor device manufacturing method, mask, and mask manufacturing method |
06/07/2005 | US6903353 Charged particle beam exposure apparatus, device manufacturing method, and charged particle beam applied apparatus |
06/07/2005 | US6903352 Charged-particle beam exposure apparatus, charged-particle beam exposure method, control data determination method, and device manufacturing method using this method |
06/07/2005 | US6903347 Superresolution in microlithography and fluorescence microscopy |
06/07/2005 | US6903346 Stage assembly having a follower assembly |
06/07/2005 | US6903345 Electron optical system, charged-particle beam exposure apparatus using the same, and device manufacturing method |
06/07/2005 | US6903337 Examining system for the particle-optical imaging of an object, deflector for charged particles as well as method for the operation of the same |
06/07/2005 | US6903027 Method of forming dielectric film and dielectric film |
06/07/2005 | US6903023 In-situ plasma etch for TERA hard mask materials |
06/07/2005 | US6902999 Pattern formation method |
06/07/2005 | US6902875 Exposing and then developing, wherein the exposed radiation sensitive polysilazane coating film is subjected to moistening treatment and then developed; use as finely patterned interlayer dielectric |
06/07/2005 | US6902874 193 nm ultraviolet radiation patternwise exposure; without the use of a phase shift mask; imaging polymer and a radiation sensitive acid generator |
06/07/2005 | US6902870 Patterning of dielectric with added layers of materials aside from photoresist for enhanced pattern transfer |
06/07/2005 | US6902868 Method of manufacturing integrated circuit |
06/07/2005 | US6902866 Thermosensitive lithographic printing plate comprising specific acrylate monomers |
06/07/2005 | US6902865 Non-alkaline aqueous development of thermosensitive lithographic printing plates |
06/07/2005 | US6902864 Polymerizable composition |
06/07/2005 | US6902862 For producing semiconductor devices |
06/07/2005 | US6902860 Two-layer imageable element comprising thermally reversible polymers |
06/07/2005 | US6902859 Chemically amplified resist composition and method for forming patterned film using same |
06/07/2005 | US6902855 Qualifying patterns, patterning processes, or patterning apparatus in the fabrication of microlithographic patterns |
06/07/2005 | US6902853 Dual wavelength method of determining a relative position of a substrate and a template |
06/07/2005 | US6902852 Pattern transfer method using a mask and half tone mask |
06/07/2005 | US6902772 Silicon-containing polymer, resist composition and patterning process |
06/07/2005 | US6902762 Method and device for processing substrate |
06/07/2005 | US6902330 Printing plate processing apparatus |
06/07/2005 | US6902283 Microlithography reduction objective and projection exposure apparatus |