| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 06/14/2005 | US6906866 Compact 1½-waist system for sub 100 nm ArF lithography |
| 06/14/2005 | US6906805 Position detecting system and exposure apparatus using the same |
| 06/14/2005 | US6906790 Reticle manipulators and related methods for conveying thin, circular reticles as used in charged-particle-beam microlithography |
| 06/14/2005 | US6906789 Magnetically levitated and driven reticle-masking blade stage mechanism having six degrees freedom of motion |
| 06/14/2005 | US6906788 Lithographic projection apparatus with multiple suppression meshes |
| 06/14/2005 | US6906787 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 06/14/2005 | US6906786 Lithographic apparatus and device manufacturing method |
| 06/14/2005 | US6906785 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 06/14/2005 | US6906783 System for using a two part cover for protecting a reticle |
| 06/14/2005 | US6906782 Stage apparatus, scanning type exposure apparatus, and device produced with the same |
| 06/14/2005 | US6906781 Reticle stage based linear dosimeter |
| 06/14/2005 | US6906779 Process for roll-to-roll manufacture of a display by synchronized photolithographic exposure on a substrate web |
| 06/14/2005 | US6906777 Pellicle for a lithographic lens |
| 06/14/2005 | US6906336 Methods for reducing blur and variation in blur in projected images produced by charged-particle-beam microlithography |
| 06/14/2005 | US6906334 Curved I-core |
| 06/14/2005 | US6906305 System and method for aerial image sensing |
| 06/14/2005 | US6906303 Method and apparatus for self-referenced dynamic step and scan intra-field scanning distortion |
| 06/14/2005 | US6906156 Accelerators for cationic polymerization catalyzed by iron-based catalyst |
| 06/14/2005 | US6905975 Methods of forming patterned compositions |
| 06/14/2005 | US6905973 Methods of forming semiconductor constructions |
| 06/14/2005 | US6905949 Semiconductor apparatus fabrication method forming a resist pattern, a film over the resist, and reflowing the resist |
| 06/14/2005 | US6905904 Planar optical waveguide assembly and method of preparing same |
| 06/14/2005 | US6905899 Methods for forming a photoresist pattern using an anti-optical proximity effect |
| 06/14/2005 | US6905898 Semiconductor substrate, method of manufacturing the semiconductor substrate, semiconductor device and pattern forming method |
| 06/14/2005 | US6905811 Overcoating photoresist substrate; electron beam exposure; computer control; heat treatment, development |
| 06/14/2005 | US6905810 Permanent resist, permanent resist-laminated substrate and process for producing the same |
| 06/14/2005 | US6905809 Mixture of novolak phenolic resin and naphthoquinonediazidosulfonyl compound; exposure masking development |
| 06/14/2005 | US6905802 Writing exposure to blanket photoresist; overlapping patterns; attenuation phase shifting |
| 06/14/2005 | US6905800 Etching a substrate in a process zone |
| 06/14/2005 | US6905621 Method for preventing the etch transfer of sidelobes in contact hole patterns |
| 06/14/2005 | US6905333 Method of heating a substrate in a variable temperature process using a fixed temperature chuck |
| 06/14/2005 | US6905267 Method for reducing consumption of plate processing fluid |
| 06/14/2005 | US6905120 Drum for fixing sheet-type member |
| 06/14/2005 | US6904844 Printing plate removing/supplying device |
| 06/09/2005 | WO2005053368A1 Metal pattern forming method, metal pattern obtained by the same, printed wiring board, conductive film forming method, and conductive film obtained by the same |
| 06/09/2005 | WO2005053007A1 Exposure method, device manufacturing method, exposure device, and program |
| 06/09/2005 | WO2005053006A1 Conveyance system substrate treating apparatus |
| 06/09/2005 | WO2005052694A2 Improvements in and relating to printing plate ovens |
| 06/09/2005 | WO2005052693A1 Positive resist composition and method for forming resist pattern |
| 06/09/2005 | WO2005052692A1 Ultraviolet curable silver composition and related method |
| 06/09/2005 | WO2005052690A1 Image forming device with brush type processing member |
| 06/09/2005 | WO2005052689A2 Method for developing multilayer imageable elements |
| 06/09/2005 | WO2005052688A2 Chemically amplified positive photosensitive thermosetting resin composition method of forming cured article and method of producing functional device |
| 06/09/2005 | WO2005052021A1 One-pack-type resin composition curable with combination of light and heat and use of the same |
| 06/09/2005 | WO2005052016A2 Bottom antireflective coatings |
| 06/09/2005 | WO2005051663A1 Method for forming images using negative working imageable elements |
| 06/09/2005 | WO2005035435A3 Systems and methods for mastering microstructures through a substrate using negative photoresist and microstructure masters so produced |
| 06/09/2005 | WO2005034174A3 Method and device for immersion lithography |
| 06/09/2005 | WO2005029191A3 Method and device for lithography by extreme ultraviolet radiation |
| 06/09/2005 | WO2005026838A3 Microlithography method using a mask with curved surface |
| 06/09/2005 | WO2005008335A3 Method for analysing objects in microlithography |
| 06/09/2005 | WO2005003863A3 Device and method for processing a mask pattern used for the production of semiconductors |
| 06/09/2005 | WO2004099873A3 Illumination system for a microlithographic projection illumination installation |
| 06/09/2005 | US20050125765 Method and apparatus for decomposing semiconductor device patterns into phase and chrome regions for chromeless phase lithography |
| 06/09/2005 | US20050125764 Method for producing a mask layout avoiding imaging errors for a mask |
| 06/09/2005 | US20050125178 Apparatus for correcting a plurality of exposure tools, method for correcting a plurality of exposure tools, and method for manufacturing semiconductor device |
| 06/09/2005 | US20050125164 Method for dynamically monitoring a reticle |
| 06/09/2005 | US20050124774 Acrylic ester copolymers having a nonfluorinated monomer with an acetal or ketal linkage, and a second monomer containing a pendant fluorinated hydroxyalkyl or sulfonamide group; photolithography; chemical amplification photoresists |
| 06/09/2005 | US20050124517 Aqueous solution containing fluorine compound, amine and chelate compound |
| 06/09/2005 | US20050124516 Composition and method for removing photoresist materials from electronic components |
| 06/09/2005 | US20050124168 Semiconductor device and method of manufacturing the same |
| 06/09/2005 | US20050124162 Fabrication method for a hard mask on a semiconductor structure |
| 06/09/2005 | US20050124092 Patterning method |
| 06/09/2005 | US20050124078 Mask pattern correction method, semiconductor device manufacturing method, mask manufacturing method and mask |
| 06/09/2005 | US20050123863 Protective layer over the photoresist layer prevents chemicals in the photoresist layer from diffusing into the immersion liquid and vice versa; protective layer can be patterned simultaneously in the development step, and requires no extra step to remove |
| 06/09/2005 | US20050123862 Photoimaging using a hybrid organic-inorganic polymer such as POSS (Polyhedral Oligomeric Silsesquioxane)-based polymers and multi-photon exposure; making waveguides for example; polysilsesquioxanes can be used in high temperature process without decomposing |
| 06/09/2005 | US20050123859 Photosensitive composition, compound for use in the photosensitive composition, and pattern forming method using the photosensitive composition |
| 06/09/2005 | US20050123858 Forming a fine hole pattern having a dimension equal to or less than a value of a resolution of an exposure tool |
| 06/09/2005 | US20050123856 Solvent development replaced by heat; selectively exposing to actinic radiation a layer of photopolymer on a relatively thin metal backed printing plate element, heating to selectively soften or melt the photopolymer layer and then blotting to absorb the melt and form a relief image |
| 06/09/2005 | US20050123854 Alkali-soluble polysilsesquioxane with e.g. units of p-hydroxybenzylsilanetriol and phenylsilanetriol, an acid generator, and an acid decomposable ester, ether or carbonate-protected phenolic compound; wavelengths equal to or shorter than that of KrF excimer laser |
| 06/09/2005 | US20050123853 Water-developable infrared-sensitive printing plate |
| 06/09/2005 | US20050123852 Method for patterning a low activation energy photoresist |
| 06/09/2005 | US20050123851 Photoresist of water soluble acrylic polymers and a water soluble triazine crosslinking agent; shrinks under heat to obtain fine line patterns |
| 06/09/2005 | US20050123845 Method of adjusting deviation of critical dimension of patterns |
| 06/09/2005 | US20050123844 First and second alignment marks arranged one over the other; alignment based on periodicity of the Moire pattern |
| 06/09/2005 | US20050123841 an electromagnetic waveform comprising a computer program for producing a mask set including a phase shifting mask and a corresponding trim mask; semiconductors; integrated circuits |
| 06/09/2005 | US20050123840 Opaque pattern consists of electrically conductive material; has a higher diffraction efficiency for projection wavelength polarised parallel to the structures than for projection light of the same wavelength polarised perpendicular; intermediate spaces filled withliquid and solid dielectrics |
| 06/09/2005 | US20050123838 Clear field annular type phase shifting mask |
| 06/09/2005 | US20050123691 Photo-cured and stabilized coatings |
| 06/09/2005 | US20050123676 Forming a film which adjusts a shape of the substrate above at least one of the front side and the back side of the substrate; anddrilling through-holes in the substrate |
| 06/09/2005 | US20050123674 Imprint lithography for superconductor devices |
| 06/09/2005 | US20050122600 Lens holding technique |
| 06/09/2005 | US20050122594 Objective with fluoride crystal lenses |
| 06/09/2005 | US20050122593 Maskless, microlens EUV lithography system with grazing-incidence illumination optics |
| 06/09/2005 | US20050122589 Optical element, lithographic apparatus including such optical element and device manufacturing method, and device manufactured thereby |
| 06/09/2005 | US20050122567 Manufacturing method of electro-optical apparatus substrate, manufacturing method of electro-optical apparatus, electro-optical apparatus substrate, electro-optical apparatus, and electronic instrument |
| 06/09/2005 | US20050122516 Overlay metrology method and apparatus using more than one grating per measurement direction |
| 06/09/2005 | US20050122506 Moire method and measuring system for measuring the distortion of an optical imaging system |
| 06/09/2005 | US20050122505 Substrate-holding technique |
| 06/09/2005 | US20050122503 Lithographic apparatus and device manufacturing method |
| 06/09/2005 | US20050122502 Exposure apparatus |
| 06/09/2005 | US20050122501 Printing a mask with maximum possible process window through adjustment of the source distribution |
| 06/09/2005 | US20050122500 System and method for lithography simulation |
| 06/09/2005 | US20050122499 Projection optical system and an exposure apparatus with the projection optical system |
| 06/09/2005 | US20050122498 Lithographic apparatus and device manufacturing method |
| 06/09/2005 | US20050122497 Immersion lithographic process using a conforming immersion medium |
| 06/09/2005 | US20050122496 Method of exposure error adjustment in photolithography for multiple products |
| 06/09/2005 | US20050122495 Method and device for imaging a mask onto a substrate |
| 06/09/2005 | US20050122494 Illumination compensator for curved surface lithography |
| 06/09/2005 | US20050122493 Inert-gas purge method, exposure apparatus, device fabrication method and devices |