Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
06/2005
06/16/2005US20050128464 Integrated lithographic fabrication cluster
06/16/2005US20050128463 Lithographic apparatus and device manufacturing method
06/16/2005US20050128462 Holding system, exposure apparatus, and device manufacturing method
06/16/2005US20050128461 Lithographic apparatus and device manufacturing method, and measurement systems
06/16/2005US20050128460 Lithographic apparatus and device manufacturing method
06/16/2005US20050128459 Lithographic apparatus and device manufacturing method
06/16/2005US20050128458 System and method for custom-polarized photolithography illumination
06/16/2005US20050128457 Defect mitigation in spatial light modulator used for dynamic photolithography
06/16/2005US20050128456 Method and systems for improving focus accuracy in a lithography system
06/16/2005US20050128454 Exposure method and apparatus
06/16/2005US20050128453 Exposure apparatus
06/16/2005US20050128450 Real time image resizing for dynamic digital photolithography
06/16/2005US20050128449 Utilities transfer system in a lithography system
06/16/2005US20050128448 Lithographic apparatus and device manufacturing method
06/16/2005US20050128447 Measuring method and apparatus, exposure method and apparatus using the same, and device manufacturing method
06/16/2005US20050128446 Exposure apparatus and device manufacturing method
06/16/2005US20050128445 Lithographic apparatus and device manufacturing method
06/16/2005US20050128444 Lithographic apparatus and device manufacturing method
06/16/2005US20050128383 Liquid crystal display panel and method of fabricating the same
06/16/2005US20050128367 Liquid crystal cell that resists degradation from exposure to radiation
06/16/2005US20050127786 System and method for moving an object employing piezo actuators
06/16/2005US20050127355 Composition for forming organic insulating film and organic insulating film formed from the same
06/16/2005US20050127326 Liquid crystal composition, selectively reflective film and method for producing the same
06/16/2005US20050127307 Methods and devices for evaluating beam blur in subfields projection-exposed by a charged-particle-beam microlithography apparatus
06/16/2005US20050127299 Apparatus for checking a laser processed deteriorated layer
06/16/2005US20050127293 Auto focusing apparatus and method
06/16/2005US20050127184 Optical delay module for lenghtening the propagation path of a light beam and pulse multiplication or elongation module
06/16/2005US20050126474 Coating film forming method and coating film forming apparatus
06/16/2005US20050126315 Sensor device for non-intrusive diagnosis of a semiconductor processing system
06/16/2005DE19818529B4 Photoresistbeschichtungsverfahren und Vorrichtung zur Durchführung dieses Verfahrens Photoresist coating method and apparatus for carrying out this method
06/16/2005DE19509173B4 Masse aus einem Epoxygruppen enthaltenden thermoplastischen Norbornenharz und ihre Verwendung Mass containing epoxy groups from a thermoplastic norbornene and their use
06/16/2005DE10350686A1 Vorrichtung und Verfahren zum Nachweis von Ausgasprodukten Device and method for the detection of Ausgasprodukten
06/16/2005DE10350685A1 Polymers comprising fluorinated norbornene repeat units useful in photoresists for high-resolution photolithography
06/16/2005DE10350114A1 Optical element made from transparent material used in excimer lasers comprises a technical surface provided with a protective layer in the region of the light passage or in the region of reflection
06/16/2005DE102004051153A1 Resin solution for forming protection layer for semiconductor device, e.g. dynamic random access memory cell, comprises organic solvent and resol resin or novolac resin
06/16/2005DE10120676B4 Verfahren zur Strukturierung einer Photolackschicht A method for patterning a photoresist layer
06/16/2005DE10120674B4 Verfahren zur Strukturierung einer Photolackschicht A method for patterning a photoresist layer
06/16/2005DE10035430B4 Verfahren und Vorrichtung zur thermischen Behandlung einer Fotolackschicht auf einem Schaltungssubstrat, insbesondere Halbleiterwafer Method and apparatus for thermal treatment of a photoresist layer on a circuit substrate, in particular semiconductor wafers
06/15/2005EP1542520A1 Method for forming bump on electrode pad with use of double-layered film
06/15/2005EP1542263A1 Electron beam exposure method and system therefor
06/15/2005EP1542241A1 Composition for forming organic insulating film and organic insulating film formed from the same
06/15/2005EP1542080A1 Photoresist residue remover composition
06/15/2005EP1542079A1 Coating forming agent for reducing pattern dimension and method of forming fine pattern therewith
06/15/2005EP1542078A1 Composition for antireflection coating and method for forming pattern
06/15/2005EP1542077A1 Process for preventing development defect and composition for use in the same
06/15/2005EP1542076A2 Lithographic apparatus and device manufacturing method
06/15/2005EP1542075A1 Composition for antireflection film formation
06/15/2005EP1542074A1 Manufacturing a replication tool, sub-master or replica
06/15/2005EP1541624A1 Improved colored articles and compositions and methods for their fabrication
06/15/2005EP1541543A1 Resist and method of forming resist pattern
06/15/2005EP1540716A2 Replication and transfer of microstructures and nanostructures
06/15/2005EP1540459A2 Reticle manipulating device
06/15/2005EP1540423A1 Grating based spectral filter for eliminating out of band radiation in an extreme ultra-violet lithography system
06/15/2005EP1540422A1 System and method for optical metrology of semiconductor wafers
06/15/2005EP1540421A1 Highly sensitive, high-resolution photoresist for electron beam lithography
06/15/2005EP1540420A2 Spin bowl compatible polyamic acids/imides as wet developable polymer binders for anti-reflective coatings
06/15/2005EP1540419A1 Method for producing a pattern formation mold
06/15/2005EP1540417A2 Photosensitive bottom anti-reflective coatings
06/15/2005EP1540393A1 Writing of photo-induced structures
06/15/2005EP1540287A1 Backlighting system for displays
06/15/2005EP1540005A2 Antireflective coatings for high-resolution photolithographic synthesis of dna array
06/15/2005EP1539771A1 Silyl alkyl esters of anthracene- and phenanthrene carboxylic acids
06/15/2005EP1539690A2 Fluorinated monomers, fluorinated polymers having polycyclic groups with fused 4-membered heterocyclic rings, useful as photoresists, and processes for microlithography
06/15/2005EP1539638A2 Decal transfer microfabrication
06/15/2005EP1539492A1 High speed negative-working thermal printing plates
06/15/2005EP1539451A2 Polymer derived ceramic materials
06/15/2005EP1539386A2 Manipulating device for photomasks that provides possibilities for cleaning and inspection of photomasks
06/15/2005EP1480738B1 Apparatus for treatment of light-sensitive biopolymers
06/15/2005EP1478683A4 Spin-on-glass anti-reflective coatings for photolithography
06/15/2005EP1478682A4 Anti-reflective coatings for photolithography and methods of preparation thereof
06/15/2005EP1440349B1 Method for the production of a semiconductor device
06/15/2005EP1435021B1 Aqueous developable photoimageable thick film compositions for making photoimageable black electrodes
06/15/2005EP1278633B1 Lithographic imaging with printing members having multiphase laser-responsive layers
06/15/2005EP1051664A4 Method for forming a critical dimension test structure and its use
06/15/2005EP0837940B1 Ftsy expressing gram-positive microorganisms with enhanced secretion properties
06/15/2005CN1628382A Test wafer and method for investigating elecrostatic discharge induced wafer defects
06/15/2005CN1628269A Antireflective composition
06/15/2005CN1628268A Sulfonate derivatives and the use therof as latent acids
06/15/2005CN1628038A On-press developable ir sensitive printing plates
06/15/2005CN1628000A Methods for cleaning microelectronic structures
06/15/2005CN1627479A Resist pattern forming method
06/15/2005CN1627478A Immersion type microfilm procedure and structure applied to the procedure
06/15/2005CN1627193A Method of removing resist pattern
06/15/2005CN1627192A Lithographic apparatus and device manufacturing method
06/15/2005CN1627191A Lithographic apparatus, illumination system and method for providing a projection beam of EUV radiation
06/15/2005CN1627190A Photo etching alignment mark in use for X-ray
06/15/2005CN1627189A Dry film photo resist
06/15/2005CN1627188A Resin compsn. contg. inoganic powders, transffer mold and mfg. method of plasma display panel
06/15/2005CN1627187A Extraction method of dangerous patterns, program and mfg. method of semiconductor
06/15/2005CN1627186A Error correction method for yellow light making process of diversified products
06/15/2005CN1627185A Phase shifting mask without Cr film layer, its mfg. method, and fabricating method for semiconductor
06/15/2005CN1627114A Flange assembly of an optical system
06/15/2005CN1626593A Radiation-curing binders containing carboxylic acid esters
06/15/2005CN1626337A Method and device for imaging a printing form
06/15/2005CN1206702C Method for forming structure of fine sizes
06/15/2005CN1206701C Optical mask structure and microphotograph process
06/15/2005CN1206576C Liquid spraying method for preventing drop relict
06/15/2005CN1206575C Developer/rising-liquid composition for preventing image from damage in corrosion-resistant agent
06/15/2005CN1206574C Exposure device and exposure method
06/14/2005US6907176 Planar optical waveguide assembly and method of preparing same
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