Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
03/2014
03/12/2014CN103631092A Formation method for semiconductor structure
03/12/2014CN103631091A Preparation method of photosensitive curing resin composition
03/12/2014CN103631090A Photosensitive resin composition
03/12/2014CN103631089A Preparation method of ultraviolet light cured nano-imprint lithography polymer template
03/12/2014CN103631088A Novel thermoplastic nanoimprint lithography adhesive as well as synthesis and application methods thereof
03/12/2014CN103631087A Light obstructing substrate and manufacturing method thereof, and method for obstructing UV light in box aligning process
03/12/2014CN103631086A Manufacturing method for micro-nano graphs used for integrated optoelectronic device
03/12/2014CN103631084A Optical proximity correction method
03/12/2014CN103631083A Optical proximity correction focal plane selecting method
03/12/2014CN103631066A Shutter device used for lithographic exposure and application method of shutter device
03/12/2014CN103631002A Compact photolithographic projection lens
03/12/2014CN103630959A Holographic grating development method and special equipment thereof
03/12/2014CN103630953A Prism film, and preparation method and apparatus thereof
03/12/2014CN103627316A Antireflective coatings for via fill and photolithography applications and methods of preparation thereof
03/12/2014CN103626717A Compound for pigment
03/12/2014CN102866575B Manufacture method of phase-shift optical mask
03/12/2014CN102707584B Double-light-beam exposure system and method for manufacturing photonic crystal mask layer
03/12/2014CN102662307B High-resolution projection optical system
03/12/2014CN102636962B Aerial image overlay test method and array base plate
03/12/2014CN102621827B Maskless exposure system and exposure method thereof
03/12/2014CN102591141B Method for preparing bottom die for flexible resin plates
03/12/2014CN102566334B Supply system of photoresist stripping solution and supply method thereof
03/12/2014CN102445859B Method for testing shading baffle of photo-etching machine
03/12/2014CN102419510B Substrate to be processed, manufacturing method and forming method of resist pattern
03/12/2014CN102414618B Photo-curable and heat-curable resin composition
03/12/2014CN102376552B Method for preventing grid electrode from damage in ion implantation process
03/12/2014CN102365588B Exposure method and exposure apparatus
03/12/2014CN102360170B Immersion liquid, exposure apparatus, and exposure process
03/12/2014CN102338983B Method of fabricating pattern
03/12/2014CN102325843B Dispersion composition, polymerizable composition, opaque color filter, liquid crystal display element equipped with opaque color filter, solid state imaging element, wafer-level lens, and imaging unit equipped with wafer-level lens
03/12/2014CN102317865B Multi-table lithographic systems
03/12/2014CN102292676B Image reading and writing using complex two-dimensional interlace scheme
03/12/2014CN102272227B Radiation curable resin composition and rapid three-dimensional imaging process using same
03/12/2014CN102269935B Displacement device, lithographic apparatus and positioning method
03/12/2014CN102265220B Method of determining characteristic
03/12/2014CN102241209B Preparation method for regenerated waterless offset printing plate
03/12/2014CN102227684B Method for manufacturing lithographic printing plate, developer for original lithographic printing plate, and replenisher for developing original lithographic printing plate
03/12/2014CN102216853B Lithographic apparatus, radiation system, device manufacturing method and debris mitigation method
03/12/2014CN102188918B Solution supplying unit and substrate treating apparatus having same
03/12/2014CN102177470B Collector assembly, radiation source, lithographic apparatus and device manufacturing method
03/12/2014CN102160144B Patterning single integrated circuit layer using automatically-generated masks and multiple masking layers
03/12/2014CN102119364B Optical apparatus with adjustable action of force on optical module
03/12/2014CN102103330B Method of measuring properties of dynamic positioning errors in lithographic apparatus, data processing apparatus, and computer program product
03/12/2014CN102096322B Lithographic pellicle
03/12/2014CN102081256B Color filter substrate for liquid crystal display devices and liquid crystal display devices
03/12/2014CN101685264B Lighting optical device, exposure system and exposure method
03/12/2014CN101639583B Pixel structure, color filtration substrate and corresponding manufacturing method thereof
03/12/2014CN101555362B Pigment dispersing composition and manufacturing method thereof, coloured polymerized composition, colour filter and manufacturing method thereof
03/11/2014US8670640 Optical fiber, method of preparation thereof and device
03/11/2014US8670105 Immersion photolithography system and method using microchannel nozzles
03/11/2014US8670104 Cleanup method for optics in immersion lithography with cleaning liquid opposed by a surface of object
03/11/2014US8669042 Resist pattern-forming method
03/11/2014US8669041 Method for improving print performance of flexographic printing elements
03/11/2014US8669040 Method of manufacturing relief printing plate and printing plate precursor for laser engraving
03/11/2014US8669039 Flexographic printing precursors and methods of making
03/11/2014US8669038 Polyimide-based polymers, copolymers thereof and positive type photoresist compositions comprising the same
03/11/2014US8669026 Black matrix for colour filters
03/11/2014US8669025 Polymerizable composition, cured film, color filter, method of producing color filter and solid-state image sensor
03/11/2014US8669024 Method of fabricating color filter substrate and infrared heating apparatus for the same
03/06/2014WO2014035963A1 Topcoat surfaces for directing the assembly of block copolymer films on chemically patterned surfaces
03/06/2014WO2014035871A1 Euv resist sensitivity reduction
03/06/2014WO2014035566A1 Method of improving print performance in flexographic printing plates
03/06/2014WO2014035203A1 Styryl-based compound, coloring material comprising the styryl-based compound, photosensitive resin composition comprising the coloring material, photoresist material prepared from the photosensitive resin composition, color filter comprising the photoresist material, and display device comprising the color filter
03/06/2014WO2014034815A1 Dispersion composition, and curable composition, transparent film, microlens and solid-state imaging element using same
03/06/2014WO2014034814A1 Dispersion composition, and curable composition, transparent film, microlens and solid-state imaging element using same
03/06/2014WO2014034813A1 Dispersion composition, and curable composition, transparent film, microlens and solid-state imaging element using same, and polymer compound
03/06/2014WO2014034768A1 Photosensitive resin composition, cured product of same, method for producing same, method for producing resin pattern, cured film, liquid crystal display device, organic el display device, and touch panel display device
03/06/2014WO2014034596A1 Illumination monitoring apparatus and exposure apparatus provided with same
03/06/2014WO2014034578A1 Pattern forming method, and, electronic device producing method and electronic device, each using the same
03/06/2014WO2014034541A1 Photosensitive resin composition and pattern formation method using same
03/06/2014WO2014034533A1 Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, pattern forming method, and method for manufacturing electronic device and electronic device, and compound
03/06/2014WO2014034302A1 Photosensitive resin composition, method for forming curable film, curable film, organic el display device, and lcd device
03/06/2014WO2014034301A1 Photosensitive resin composition, method for forming curable film, curable film, organic el display device, and lcd device
03/06/2014WO2014034213A1 Photosensitive resin composition for flexographic printing original plate
03/06/2014WO2014034190A1 Radiation-sensitive resin composition, resist pattern forming method, radiation-sensitive acid generator, compound and method for producing compound
03/06/2014WO2014034161A1 Substrate support device and exposure device
03/06/2014WO2014034094A1 Dye compound, ink, resist composition for color filter and thermal transfer recording sheet
03/06/2014WO2014034093A1 Dye compound, ink, resist composition for color filter, and heat-sensitive transfer recording sheet
03/06/2014WO2014033452A1 Multiple probe actuation
03/06/2014WO2014033451A1 Multiple probe detection and actuation
03/06/2014WO2014033118A1 Maskless writing in different focal planes
03/06/2014WO2014032897A1 Real-time reticle curvature sensing
03/06/2014WO2014032887A1 Reticle cleaning by means of sticky surface
03/06/2014WO2014032833A1 Deformation pattern recognition method, pattern transferring method, processing device monitoring method, and lithographic apparatus
03/06/2014WO2014032499A1 Double layer-coated negative photoinducing etching resist dry film
03/06/2014WO2014032312A1 Pattern repairing device and method for array substrate
03/06/2014WO2014032304A1 Plasmonic nano-lithography based on attenuated total reflection
03/06/2014WO2014013396A3 Composition for manufacturing integrated circuit devices, optical devices, micromachines and mechanical precision devices
03/06/2014US20140065556 Patterning method
03/06/2014US20140065555 Manufacturing method of semiconductor device
03/06/2014US20140065554 Method and Apparatus for Developing Process
03/06/2014US20140065553 Chuck and semiconductor process using the same
03/06/2014US20140065551 Lithographic Pattern Development Process For Amorphous Fluoropolymer
03/06/2014US20140065550 Polymer comprising end groups containing photoacid generator, photoresist comprising the polymer, and method of making a device
03/06/2014US20140065546 Resist composition and patterning process
03/06/2014US20140065545 Resist composition and patterning process
03/06/2014US20140065544 Resist composition and patterning process
03/06/2014US20140065543 New compound, photosensitive composition comprising the same and photosensitive material
03/06/2014US20140065542 Photoresist composition and method of forming a black matrix using the same
03/06/2014US20140065541 Method of Stabilizing Fluorine-Containing Acid Amplifier
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