Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
06/2005
06/23/2005US20050137103 Stripper for cured negative-tone isoprene-based photoresist and bisbenzocyclobutene coatings
06/23/2005US20050136787 Method of forming carbon nanotube emitter and method of manufacturing field emission display using the same
06/23/2005US20050136681 Method and apparatus for removing photoresist from a substrate
06/23/2005US20050136362 Exposing photopolymerizable image-forming material comprising substrate with image-recording layer comprising photopolymerization initiator sensitive to light of wavelength within visible to ultraviolet ranges, polymerizable compound with ethylenically unsaturated group, binder, developing with carbonate
06/23/2005US20050136361 Exposure system and pattern formation method using the same
06/23/2005US20050136359 Multilayer MEMS device and method of making same
06/23/2005US20050136358 Patterning using wax printing and lift off
06/23/2005US20050136346 Optimized correction of wafer thermal deformations in a lithographic process
06/23/2005US20050136343 Colored curable composition, color filter and manufacturing method thereof
06/23/2005US20050136340 Lithographic apparatus and methods, patterning structure and method for making a patterning structure, device manufacturing method, and device manufactured thereby
06/23/2005US20050136338 Using a photomask that can prevent critical dimension biases of pattern images of different pattern densities while forming a circuit pattern
06/23/2005US20050136337 Method for forming wires of sub-micron-order scale
06/23/2005US20050136335 Sequential linewidth measurement and trimming of a patterned mask layer to form multiply trimmed patterned mask layer; precise linewidth control
06/23/2005US20050136334 Device manufacturing method and mask for use therein
06/23/2005US20050136333 Polymeric transparent substrate, photochemically active narrowband dye selected from 4-dimethylamino-2',4'-dinitrostilbene, 4-dimethylamino-4'-cyano-2'-nitrostilbene, 4-hydroxy-2',4'-dinitrostilbene, and 4-methoxy-2',4'-dinitrostilbene; Holographic storage media
06/23/2005US20050134980 Projection objective and method for its manufacture
06/23/2005US20050134973 Method for producing an optical unit
06/23/2005US20050134972 Replacement apparatus for an optical element
06/23/2005US20050134967 Projection lens and microlithographic projection exposure apparatus
06/23/2005US20050134867 Systems and methods for measuring distance of semiconductor patterns
06/23/2005US20050134866 Pattern-producing method for semiconductor device
06/23/2005US20050134862 Characterization and compensation of errors in multi-axis interferometry systems
06/23/2005US20050134831 Reticle carrier
06/23/2005US20050134830 Safety mechanism for a lithographic patterning device
06/23/2005US20050134829 Lithographic apparatus, device manufacturing method, and device manufactured thereby
06/23/2005US20050134828 Lithographic apparatus and device manufacturing method
06/23/2005US20050134827 Lithographic apparatus and device manufacturing method
06/23/2005US20050134826 Projection objective for microlithography
06/23/2005US20050134825 Polarization-optimized illumination system
06/23/2005US20050134824 Grating patch arrangement, lithographic apparatus, method of testing, device manufacturing method, and device manufactured thereby
06/23/2005US20050134823 Photolithography system and method of monitoring the same
06/23/2005US20050134822 Optimized polarization illumination
06/23/2005US20050134821 Assembly, a lithographic apparatus, and a device manufacturing method
06/23/2005US20050134820 Method for exposing a substrate, patterning device, and lithographic apparatus
06/23/2005US20050134819 Lithographic projection apparatus and device manufacturing method
06/23/2005US20050134818 Lithographic apparatus and device manufacturing method
06/23/2005US20050134817 Liquid immersion type exposure apparatus
06/23/2005US20050134815 Lithographic apparatus and device manufacturing method
06/23/2005US20050134814 Lithographic apparatus and method of manufacturing a device
06/23/2005US20050134676 Method and device for imaging of a printing form
06/23/2005US20050134639 Color filter and process for producing the same
06/23/2005US20050134122 Linear motor, exposure apparatus using the same, and device manufacturing method
06/23/2005US20050133954 Composite stamper for imprint lithography
06/23/2005US20050133743 Method for position determination, method for overlay optimization, and lithographic projection apparatus
06/23/2005US20050133739 Charged beam writing method and writing tool
06/23/2005US20050133734 Exposure apparatus, exposure method and semiconductor device production method
06/23/2005US20050133732 Stage unit, drive table, and scanning exposure apparatus using same
06/23/2005US20050133727 Assembly for detection of radiation flux and contamination of an optical component, lithographic apparatus including such an assembly and device manufacturing method
06/23/2005US20050133436 Internal die filters with multiple passageways which are fluidically in parallel
06/23/2005US20050132962 Pipe structure, alignment apparatus, electron beam lithography apparatus, exposure apparatus, exposure apparatus maintenance method, semiconductor device manufacturing method, and semiconductor device manufacturing factory
06/23/2005US20050132955 Chemical solution coating method and chemical solution coating apparatus
06/23/2005US20050132916 Transport apparatus for printing plates and method of operating the transport apparatus
06/23/2005US20050132915 Printing process and manufacturing process of printing plate material
06/23/2005US20050132914 Lithographic apparatus, alignment apparatus, device manufacturing method, and a method of converting an apparatus
06/23/2005US20050132812 Transducer-based sensor system
06/23/2005US20050132750 Method for joining at least a first member and a second member, lithographic apparatus and device manufacturing method, as well as a device manufactured thereby
06/23/2005DE19735755B4 Verfahren zur Herstellung einer lithographischen Druckplatte A process for producing a lithographic printing plate
06/23/2005DE10355301B3 Verfahren zur Abbildung einer Struktur auf einen Halbleiter-Wafer mittels Immersionslithographie Method for mapping a structure on a semiconductor wafer by means of immersion lithography
06/23/2005DE10353798A1 Verfahren zum Erzeugen eines Abbildungsfehler vermeidenden Maskenlayouts für eine Maske A method for generating a mapping error-avoiding mask layout for a mask
06/23/2005DE10353762A1 Verfahren zur Herstellung von Flexodruckformen durch thermische Entwicklung Process for the preparation of flexographic printing plates by thermal development
06/23/2005DE10352820A1 Flanschbaugruppe eines optischen Systems The flange assembly of an optical system
06/23/2005DE10352639A1 Verfahren zur dynamischen Kontrolle eines Reticles A method for dynamic control of a reticle
06/23/2005DE10351972A1 Determining optical influence of mask layer of lithographic mask involves measuring geometric dimensions of first and second test structures and determining phase shift and/or absorption of mask layer by comparing them
06/23/2005DE10351607A1 Arrangement for projecting pattern on photo mask onto semiconductor wafer has supporting substrate surface with filter structure so more of perpendicularly incident light beam is reflected than of beam incident at inclination angle
06/23/2005DE102004049735A1 Mask for microlithographic projection exposure apparatus, has pattern of opaque structures applied on support, where intermediate spaces between bar-like structures of opaque structures are filled with dielectric material
06/23/2005CA2590325A1 Resist, barc and gap fill material stripping chemical and method
06/22/2005EP1545168A1 X-ray generating device and exposure device
06/22/2005EP1544911A2 Adjusting device
06/22/2005EP1544896A2 Chemical solution coating method and chemical solution coating apparatus
06/22/2005EP1544895A2 Exposure apparatus, exposure method and semiconductor device production method
06/22/2005EP1544681A2 Exposure apparatus
06/22/2005EP1544680A2 Feature optimisation using interference mapping lithography
06/22/2005EP1544679A2 Optimized polarization illumination
06/22/2005EP1544678A1 Lithographic apparatus and device manufacturing method
06/22/2005EP1544677A1 Grating patch arrangement, lithographic apparatus, method of testing, device manufacturing method, and device manufactured thereby
06/22/2005EP1544676A2 Refractive projection objective for immersion lithography
06/22/2005EP1544324A1 Remover solution
06/22/2005EP1544178A1 Method for making a transparent element comprising invisible electrodes
06/22/2005EP1543960A1 Printing plate material and printing process
06/22/2005EP1543451A2 Method and system for context-specific mask writing
06/22/2005EP1543384A2 Composition which forms an electrically-conducting protective coat and a method for structuring a photoresist using the protective layer
06/22/2005EP1543383A1 Stereoflexography
06/22/2005EP1397651A4 Birefringence measurement at deep-ultraviolet wavelengths
06/22/2005CN1631064A System and methods for conveying and transporting levitated articles
06/22/2005CN1630835A Acid-degradable resin compositions containing ketene-aldehyde copolymer
06/22/2005CN1630583A High speed negative working thermal printing plates
06/22/2005CN1630551A Process for producing film forming resins for photoresist compositions
06/22/2005CN1630035A Pattern formation method
06/22/2005CN1630034A Method for forming resist pattern and method for manufacturing semiconductor device
06/22/2005CN1630031A Pattern-producing method for semiconductor device
06/22/2005CN1629734A Pattern formation method
06/22/2005CN1629733A Lithographic apparatus and device manufacturing method
06/22/2005CN1629732A Erosion resistant pattern forming method, micro-pattern forming method using the same
06/22/2005CN1629731A Optimized polarization illumination
06/22/2005CN1629730A Method for executing model-based optical proximity correction
06/22/2005CN1629729A Adaptive lithographic critical dimension enhancement
06/22/2005CN1629728A Method for making glass chip under ordinary laboratory condition
06/22/2005CN1629727A Photosensitive composition and color filter
06/22/2005CN1629726A Paste, display member, and process for production of display member
06/22/2005CN1629707A Liquid crystal display panel and method of fabricating the same
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