| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 06/22/2005 | CN1629663A Silicon ridge optical waveguide with novel crosssectional shape on an insulator and method for manufacturing the same |
| 06/22/2005 | CN1629602A Method for detecting tilted position of heat tie plate |
| 06/22/2005 | CN1629222A Composition for forming dielectric film and method for forming dielectric film or pattern using the composition |
| 06/22/2005 | CN1207758C Exposure equipment with interferometer system |
| 06/22/2005 | CN1207757C Process for decreasing photoresist roughness by cross-linking reaction of deposit on photoresist |
| 06/22/2005 | CN1207728C Process for producing metallic high-energy X-ray focusing combination lens |
| 06/22/2005 | CN1207634C Composition for stripping photoresist |
| 06/22/2005 | CN1207633C Positive film type light sensitiveness anticorrosion additive compsn. and application thereof |
| 06/22/2005 | CN1207632C Chemical enhancement type positive photoetching gum composition |
| 06/21/2005 | US6910203 Photomask and method for qualifying the same with a prototype specification |
| 06/21/2005 | US6909774 Apparatus and methods for surficial milling of selected regions on surfaces of multilayer-film reflective mirrors as used in X-ray optical systems |
| 06/21/2005 | US6909587 Apparatus having a static eliminator for manufacturing semiconductor devices and a method for eliminating a static electricity on a semiconductor wafer |
| 06/21/2005 | US6909528 Filling the microcavities of a porous transparent siliceous body with a polymerisable composition |
| 06/21/2005 | US6909492 Projection optical system, exposure apparatus and exposure method |
| 06/21/2005 | US6909490 Reticle chambers and reticle cassettes providing temperature control and ready exchange of reticles for exposure |
| 06/21/2005 | US6909478 Method for producing cholesteric liquid crystal color filters |
| 06/21/2005 | US6909372 Power monitoring unit, control method therefor, and exposure apparatus |
| 06/21/2005 | US6909103 Ion irradiation of a target at very high and very low kinetic ion energies |
| 06/21/2005 | US6908953 Polymerizable compositions based on epoxides |
| 06/21/2005 | US6908892 Photoresist remover composition |
| 06/21/2005 | US6908861 Method for imprint lithography using an electric field |
| 06/21/2005 | US6908852 Method of forming an arc layer for a semiconductor device |
| 06/21/2005 | US6908830 Method for printing marks on the edges of wafers |
| 06/21/2005 | US6908775 Method for performing an alignment measurement of two patterns in different layers on a semiconductor wafer |
| 06/21/2005 | US6908729 Amplified photoresist; radiation with ultraviolet radiation |
| 06/21/2005 | US6908724 Fluorine-containing polymer having acid-reactive group and chemically amplifying type photoresist composition prepared from same |
| 06/21/2005 | US6908723 Composed of a silane network containing titanium alkoxides; high refractive index and propagation losses below 1 dB/cm at the telecommunication wavelengths. |
| 06/21/2005 | US6908722 Contains fluoroalkyl groups; for use in a chemically amplified radiation-sensitive resin mixture, gives high transparency, no bioaccumulation, high acidity of produced acid, high boiling point, short diffusion length |
| 06/21/2005 | US6908719 Such as water soluble disodium-4,4'-diazido-2,2'-methylenedibenzenedisulfonate; improved ultraviolet radiation absorption in short wavelengths; color cathode ray tubes |
| 06/21/2005 | US6908717 Positive photosensitive resin composition, process for its preparation, and semiconductor devices |
| 06/21/2005 | US6908716 Disposable hard mask for photomask plasma etching |
| 06/21/2005 | US6908684 Apparatus comprising dielectric substrate with metallic surface, layer of water soluble cationic polymer, and layer of non-water soluble polymer |
| 06/21/2005 | US6908514 Wafer alignment marks protected by photoresist |
| 06/21/2005 | US6908511 Apparatus for uniformly baking substrates such as photomasks |
| 06/21/2005 | US6908083 Recording plate or film loading device |
| 06/21/2005 | CA2329511C Apparatus for producing printing plates |
| 06/16/2005 | WO2005055313A1 Electrostatic chuck, exposure apparatus, and object chucking method |
| 06/16/2005 | WO2005055296A1 Exposure apparatus, exposure method, device producing method, and optical component |
| 06/16/2005 | WO2005055295A1 Exposure method and system, and device producing method |
| 06/16/2005 | WO2005055294A1 Developing method and developing apparatus |
| 06/16/2005 | WO2005055224A1 Process for producing original disc for optical disc and original disc for optical disc |
| 06/16/2005 | WO2005054956A2 Projection optical system |
| 06/16/2005 | WO2005054955A2 Lithographic apparatus and device manufacturing method |
| 06/16/2005 | WO2005054954A2 Microlithography projection system and device manufacturing method |
| 06/16/2005 | WO2005054953A2 Holding device for an optical element in an objective |
| 06/16/2005 | WO2005054952A1 Radiation-sensitive compositions and imageable elements based thereon |
| 06/16/2005 | WO2005054951A2 Thick film photoresist composition and method of forming resist pattern |
| 06/16/2005 | WO2005054950A2 Method for creating a control command for a mask writing device |
| 06/16/2005 | WO2005054948A2 Device and method for large area lithography |
| 06/16/2005 | WO2005054336A1 Pellicle and novel fluorinated polymer |
| 06/16/2005 | WO2005054330A1 Flame retardant radiation curable compositions |
| 06/16/2005 | WO2005054307A1 Uv-curing thiolenes for pressure sensitive and hotmelt adhesives |
| 06/16/2005 | WO2005054256A1 Fluorine-containing compound, water repellent composition and thin film |
| 06/16/2005 | WO2005054119A2 Methods and devices for fabricating three-dimensional nanoscale structures |
| 06/16/2005 | WO2005053906A1 Method of manufacturing mirrors from joined mirror blanks, x-y interferometer and method of inspecting wafers |
| 06/16/2005 | WO2005026839A3 Phthalocyanine precursors in infrared sensitive compositions |
| 06/16/2005 | WO2005026801A3 Apparatus for manipulation of an optical element |
| 06/16/2005 | WO2004092830A3 Liquid jet and recovery system for immersion lithography |
| 06/16/2005 | WO2004019079A3 Continuous direct-write optical lithography |
| 06/16/2005 | US20050131190 Multi-functional linear siloxane compound, a siloxane polymer prepared from the compound, and a process for forming a dielectric film by using the polymer |
| 06/16/2005 | US20050131184 Preparation process of copolymer for semiconductor lithography and a copolymer for semiconductor lithography available by this process |
| 06/16/2005 | US20050131114 Blue colored composition for color filter and color filter |
| 06/16/2005 | US20050130445 Substrate processing method and substrate processing apparatus |
| 06/16/2005 | US20050130444 Photosensitive lacquer for providing a coating on a semiconductor substrate or a mask |
| 06/16/2005 | US20050130410 Contact hole printing by packing and unpacking |
| 06/16/2005 | US20050130400 Method for manufacturing a transparent element with invisible electrodes |
| 06/16/2005 | US20050130351 Methods for maskless lithography |
| 06/16/2005 | US20050130082 Hexamethylene diamine tetramethylene phosphonic acid chelating agent; citric acid chelating assistant; developer with calcium chloride; photoresist is a phenolic resin |
| 06/16/2005 | US20050130079 Overcoating substrate with photoresist ; exposure to hydrophilic compound; exposure to light; development |
| 06/16/2005 | US20050130078 Plating using copolymer |
| 06/16/2005 | US20050130077 Method for positioning and transferring at least two different patterns from a supply strip |
| 06/16/2005 | US20050130076 Method for producing a hard mask in a capacitor device and a hard mask for use in a capacitor device |
| 06/16/2005 | US20050130075 Method for making fluid emitter orifice |
| 06/16/2005 | US20050130074 Method for the manufacture of micro structures |
| 06/16/2005 | US20050130072 Sawtooth grating groove the vertex of which has an assured sharpness to attain a high diffraction efficiency and provide the two surfaces forming the vertex with an enhanced linearity and the reflective surface of which has a reduced roughness to eliminate scattered light; Two step etching |
| 06/16/2005 | US20050130070 Dividing a giant magnetic resistor semiconductor (GMR) stack into upper and lower parts; Alignment between the two pedestals is exact because a self-aligning is used; size of the lower pedestal is controlled with the upper pedestal precisely aligned to be centrally located |
| 06/16/2005 | US20050130069 Silicon as an etching resistance improving component is contained in the upper-layer resist film of polysiloxane based resin or polyhydroxystyrene based resin but not in the lower-layer resist film; |
| 06/16/2005 | US20050130068 Resist pattern on a substrate; hydrophilic and hydrophobic processing, causing crosslinking at the interface of the first resist pattern and the resist film and the first resist pattern; and etching the substrate using the second resist pattern as a mask |
| 06/16/2005 | US20050130067 Pattern formation method |
| 06/16/2005 | US20050130066 Using a tilted mask layer as a mask to form a selective deposited oxide layer on the sidewall of an opening on the substrate |
| 06/16/2005 | US20050130064 Antihalation dye for negative-working printing plates |
| 06/16/2005 | US20050130062 Hydrophilic layer contains 40-90% by weight of metal oxide (especially black metal oxide) particles in octahedral form and the thermosensitive image formation layer contains 10-50% by weight of a water-soluble polymer, preferably polysaccharide, polyacrylic acid, polyacrylic acid salt or polyacrylamide |
| 06/16/2005 | US20050130061 Coating of a polymer of maleic anhydride to and dimethyl 1,4-dihydro-1,4-methanoindene-5,8-dicarboxylic aciprevent diffused light reflection and notching by the semiconductor substrate and to reduce standing waves; uniformity for forming ultra-fine patterns by photolithography using 193 nm Argon fluoride |
| 06/16/2005 | US20050130060 Positive photosensitive composition |
| 06/16/2005 | US20050130058 Chemically amplified, sensitive to wavelengths (300 nm - 100 nm); comprises a novel polymer with a sulfone group pendant from a polymer backbone that is insoluble in an aqueous alkaline solution and has acidic moiety protected with acid labile group, and a compound that producing an acid upon irradiation |
| 06/16/2005 | US20050130057 Polymer from a hydroxy substituted carboxylic acid and acid or acid generator in response to an external stimulus; photoresist for a semiconductor element; high sensitivity, high resolution |
| 06/16/2005 | US20050130056 Polymer compound, resist composition and dissolution inhibitor agent containing the polymer compound |
| 06/16/2005 | US20050130055 Method and removing resist pattern |
| 06/16/2005 | US20050130049 generating a laser beam, changing a phase of the laser beam to smooth the brightness distribution, applying the smoothed beam to the photomask, acquiring an image of the photomask using a sensor while the laser beam and the photomask are relatively moved, examining the image for defects |
| 06/16/2005 | US20050130048 Electro-optic device substrate and method for manufacturing the same electro-optic device and method for manufacturing the same, photomask, and electronic device |
| 06/16/2005 | US20050129489 Load lock and load lock chamber using the same |
| 06/16/2005 | US20050129397 Exposure device |
| 06/16/2005 | US20050129339 Static gas bearing system, stage mechanism, exposure apparatus, and device manufacturing method |
| 06/16/2005 | US20050128926 Method for producing stamper used for producing optical disc and optical disc producing method |
| 06/16/2005 | US20050128607 Low-deformation support device of an optical element |
| 06/16/2005 | US20050128565 Method and apparatus for patterning a workpiece and methods of manufacturing the same |
| 06/16/2005 | US20050128559 Spatial light modulator and method for performing dynamic photolithography |
| 06/16/2005 | US20050128540 Beam shaping element for use in a lithographic system |
| 06/16/2005 | US20050128483 Method and optical arrangement for beam guiding of a light beam with beam delay |
| 06/16/2005 | US20050128473 Method and apparatus for article inspection including speckle reduction |