Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
06/2005
06/29/2005EP1546805A1 Multi-photon reactive compositions with inorganic particles and method for fabricating structures
06/29/2005EP1546804A1 Device for transferring a pattern to an object
06/29/2005EP1546788A1 Methods and systems for improved boundary contrast
06/29/2005EP1546647A1 Laser interferometer for repeatable mounting on the wall of a vacuum chamber
06/29/2005EP1546222A1 Photoresists, fluoropolymers and processes for 157 nm microlithography
06/29/2005EP1546221A2 PHOTORESISTS, FLUORINATED POLYMERS AND PROCESSES FOR 157 nm MICROLITHOGRAPHY
06/29/2005EP1546026A2 Fabrication of 3d photopolymeric devices
06/29/2005EP1545878A1 Thermally sensitive multilayer imageable element
06/29/2005EP1216435B1 Method for synchronising positioning and exposure processes
06/29/2005EP1032866B1 Printing elements comprising liquid photopolymer layer and solid photopolymer layer
06/29/2005CN1633701A Post-etch photoresist strip with O2 and NH3 for organosilicate glass low-K dielectric etch applications
06/29/2005CN1633628A Resist compositions
06/29/2005CN1633627A Photosensitve resin composition
06/29/2005CN1633523A Method for forming a micro-pattern on a substrate by using capillary force
06/29/2005CN1633518A Aperture masks for circuit fabrication
06/29/2005CN1633517A In-line deposition processes for circuit fabrication
06/29/2005CN1633442A Acyl- and bisacylphosphine derivatives
06/29/2005CN1632916A Method for manufacturing semiconductor device
06/29/2005CN1632915A Method for distinguishing imperfect graphic spacing to improve microimage process
06/29/2005CN1632699A Method for manufacturing micro mechanical components with different aspect ratio using X-ray exposure
06/29/2005CN1632698A Method for projecting and photo etching on thick epitaxial layer
06/29/2005CN1632697A Flexible optical sensor fabricating method
06/29/2005CN1632696A Light shield and method for forming polycrystalline silicon layer applying the same
06/29/2005CN1632685A Array substrate of thin film transistor liquid crystal display and manufacturing method thereof
06/29/2005CN1632679A Copper conductor structure for liquid crystal display assembly and manufacturing method thereof
06/29/2005CN1632678A Copper conductor structure for liquid crystal display assembly and manufacturing method thereof
06/29/2005CN1632675A Method for manufacturing dot structure of thin film transistor liquid crystal display
06/29/2005CN1631672A Method of expanding fluid channel
06/29/2005CN1208810C Bright field image reversal for contact hole patterning
06/29/2005CN1208809C Semiconductor manufacturing apparatus control system
06/29/2005CN1208693C Organic electroluminescent display panel developing apparatus and method thereof
06/29/2005CN1208692C Focal distance detecting method of micro image making process
06/29/2005CN1208691C Pattern transfer method
06/29/2005CN1208690C Photoetching process with multilayer photoresist layer application
06/29/2005CN1208689C Method for producing photosensitive lithoprint plate
06/29/2005CN1208688C Polymer applicable to photoresist and positive photoresist composition
06/29/2005CN1208687C High-resolution photosensitive resin composition usable with I-line and method of forming patter
06/29/2005CN1208686C Radiosensitive composition
06/29/2005CN1208685C Photosensitive compound and photoresist
06/29/2005CN1208684C Process for producing 1, 2-naphthaquinone dinitride photosensitisers
06/29/2005CN1208683C Positive type photosensitive polyimide resin composition
06/29/2005CN1208406C Radiation curable water based cationic inks and coatings
06/29/2005CN1208306C Process for preparing alkyladamantyl esters and compositions
06/28/2005US6912476 Position measuring device and method for determining a position
06/28/2005US6912267 Erosion reduction for EUV laser produced plasma target sources
06/28/2005US6912094 Projection optical system, a projection exposure apparatus, and a projection exposure method
06/28/2005US6912077 Optical system
06/28/2005US6912054 Interferometric stage system
06/28/2005US6912052 Gas discharge MOPA laser spectral analysis module
06/28/2005US6912043 Removable reticle window and support frame using magnetic force
06/28/2005US6912041 Lithographic apparatus and method
06/28/2005US6911780 Electron beam, generating device, and testing device
06/28/2005US6911661 Electron beam exposure apparatus
06/28/2005US6911400 Nonlithographic method to produce self-aligned mask, articles produced by same and compositions for same
06/28/2005US6911399 Method of controlling critical dimension microloading of photoresist trimming process by selective sidewall polymer deposition
06/28/2005US6911301 Methods of forming aligned structures with radiation-sensitive material
06/28/2005US6911299 To produce presensitized plate for use in making a lithographic printing plate which is directly imageable by scanning an infrared (IR) laser on the basis of digital signals through computer, etc.
06/28/2005US6911297 Comprises acid generator for relief imaging; improved resolution, photospeed, and depth of focus with decreasing line width and film thickness in manufacturing of semiconductors
06/28/2005US6911296 Heat sensititve element on substrate
06/28/2005US6911294 Multicolor image forming material and method of multicolor image formation
06/28/2005US6911293 Photoresist compositions comprising acetals and ketals as solvents
06/28/2005US6911292 Novolak resin with 3-27 mol % of the hydroxyl group hydrogens are substituted with 1,2-naphthoquinonediazidosulfonyl ester groups, a methyl vinyl ether-monoalkyl maleate copolymer and optionally, an alkali-soluble cellulose
06/28/2005US6911291 Recording material having a negative-working, radiation-sensitive layer which comprises additives for promoting developability
06/28/2005US6911287 Method and apparatus for measuring process errors and method and apparatus for measuring overlay using the same
06/28/2005US6911286 Photolithographic process used in semiconductor manufacturing
06/28/2005US6911173 Methods for stereolithographic processing of components and assemblies
06/28/2005US6911091 Environment exchange control for material on a wafer surface
06/28/2005US6911088 Substrate processing apparatus and slit nozzle
06/28/2005CA2367698C Individually addressable micro-electromagnetic unit array chips
06/23/2005WO2005057675A1 Method for photo-embossing a monomer-containing layer
06/23/2005WO2005057671A2 Irradiation systems
06/23/2005WO2005057670A2 Irradiation apparatuses
06/23/2005WO2005057669A2 Irradiation apparatus
06/23/2005WO2005057636A1 Stage system, exposure apparatus and exposure method
06/23/2005WO2005057635A1 Projection exposure apparatus, stage apparatus, and exposure method
06/23/2005WO2005057634A1 Pattern-forming process utilizing nanoimprint and apparatus for performing such process
06/23/2005WO2005057633A1 Substrate treatment device control method and substrate treatment device
06/23/2005WO2005057291A1 Method and apparatus for patterning a workpiece and methods of manufacturing the same
06/23/2005WO2005057290A2 Sensor for lithographic apparatus and method of obtaining measurements
06/23/2005WO2005057289A1 Improved lithographic process
06/23/2005WO2005057288A1 Resist polymer solution and process for producing the same
06/23/2005WO2005057287A1 Positive resist composition and method for forming resist pattern
06/23/2005WO2005057286A1 COATING MATERIALS CONTAINING α-(1'-HYDROXYALKYL)ACRYLATES
06/23/2005WO2005057285A1 Thermal curable one-liquid type epoxy resin composition for over-coat
06/23/2005WO2005057284A1 Photoresist composition and method for forming resist pattern
06/23/2005WO2005057283A1 Manufacturing a replication tool, sub-master or replica
06/23/2005WO2005057281A2 Resist, barc and gap fill material stripping chemical and method
06/23/2005WO2005057280A2 Lithographic apparatus and device manufacturing method
06/23/2005WO2005056694A1 Use of a pigment preparation based on ci pigment yellow 74
06/23/2005WO2005056294A1 Method and apparatus for printing a patterned layer on a flatsubstrate with a flat-type-bed
06/23/2005WO2005038340A3 Lithography illumination device
06/23/2005WO2005031799A3 Exposure apparatus, exposure method, and device manufacturing method
06/23/2005WO2005013002A3 Process sequence for photoresist stripping and/or cleaning of photomasks for integrated circuit manufacturing
06/23/2005WO2004102278A3 Computer-implemented method and carrier medium configured to generate a set of process parameters and/or a list of potential causes of deviations for a lithography process
06/23/2005WO2004097894A9 Self-organized nanopore arrays with controlled symmetry and order
06/23/2005WO2004092831A3 Photoresists and methods for use thereof
06/23/2005WO2004044654A3 Compositions and processes for nanoimprinting
06/23/2005US20050137837 Management system and apparatus method therefor, and device manufacturing method
06/23/2005US20050137734 Method of operating a lithographic apparatus or lithographic processsing cell, lithographic apparatus and lithographic processing cell
06/23/2005US20050137278 For use in graphic arts and packaging applications, such as more specifically, temperature sensitive packaging and foil seals
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