| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 06/30/2005 | WO2004083490A3 Methods and apparatus for patterned deposition of nanostructure-containing materials by self-assembly and related articles |
| 06/30/2005 | US20050143271 with a sulfur-containing detergent that forms a protective film to prevent corrosion of aluminum wires; used in the manufacture of a highly integrated semiconductor with advanced scale-down; e.g. oxalic acid, ammonium sulfate, ultrapure water |
| 06/30/2005 | US20050142881 Mask and method of using the same |
| 06/30/2005 | US20050142855 Method for manufacturing semiconductor device |
| 06/30/2005 | US20050142684 Method for fabricating a structure for a microelectromechanical system (MEMS) device |
| 06/30/2005 | US20050142681 Mask and method of manufacturing liquid crystal display device using the same |
| 06/30/2005 | US20050142501 Method of forming an isolated line pattern using photolithography |
| 06/30/2005 | US20050142500 Exposure methods |
| 06/30/2005 | US20050142497 Method of forming a pattern in a semiconductor device and method of forming a gate using the same |
| 06/30/2005 | US20050142496 Method of fabricating bottom gate type organic thin film transistor |
| 06/30/2005 | US20050142494 Photosensitivity; relief imaging; heating to liquify and absorbing via development medium |
| 06/30/2005 | US20050142493 Aluminum support for lithographic printing plate and base plate for lithographic printing plate |
| 06/30/2005 | US20050142491 Novel epoxy compounds having an alicyclic structure, polymer compounds, resist materials, and patterning methods |
| 06/30/2005 | US20050142486 Chemically-amplified positive-acting resists that can be effectively imaged at short wavelengths; polymers containing acrylate/anhydride groups exhibit improved adhesion to underlying silicon oxynitride and silicon nitride surfaces; relief imaging |
| 06/30/2005 | US20050142485 Image recording material |
| 06/30/2005 | US20050142484 Image recording material |
| 06/30/2005 | US20050142482 Photoresist for spacer and manufacturing method of liquid crystal display using the same |
| 06/30/2005 | US20050142481 Poly(meth)acrolein acetalized with a hydroxyalkyl alkanoate, e.g., ethyl lactate; capable of preventing scattered reflection from a bottom film layer, eliminating standing wave effect due to alteration of of the photoresist film, and increasing thickness uniformity; increased etching velocity |
| 06/30/2005 | US20050142480 a matted layer on a photopolymerizable layer which provides a unique surface topography to the photopolymerizable layer characterized by depressions that provide significantly improved printing quality; picks up less deposits of paper fibers and dried ink which would fill in reverses areas of the plate |
| 06/30/2005 | US20050142479 Comprises epoxy compound and cationic photoinitiator; changes color as cures |
| 06/30/2005 | US20050142465 Method for fabricating a liquid crystal display device |
| 06/30/2005 | US20050142458 Exposure mask and exposure method using the same |
| 06/30/2005 | US20050142454 Grid with a space smaller than a minimum pitch allowed by a design rule, and provides hole patterns at lattice points, which are the intersections of the grid; semiconductor integrated circuit manufacturing; flexibility of hole pattern arrangement and quality of hole pattern arrangement easily evaluated |
| 06/30/2005 | US20050142452 Polycrystalline silicon thin film having uniform crystallization characteristics |
| 06/30/2005 | US20050142320 Processing method for photoresist master, production method for recording medium-use mater, production method for recording medium, photoresist master, recording medium-use master and recording medium |
| 06/30/2005 | US20050142298 Method for fabricating nano pore |
| 06/30/2005 | US20050142292 Intaglio printing process using radically curable printing inks |
| 06/30/2005 | US20050141891 Line width measuring method, substrate processing method, substrate processing apparatus and substrate cooling processing unit |
| 06/30/2005 | US20050141761 Method and apparatus for measuring dimensions of a pattern on a semiconductor device |
| 06/30/2005 | US20050141243 Differentially-cured materials and process for forming same |
| 06/30/2005 | US20050141098 Very high-aperture projection objective |
| 06/30/2005 | US20050140988 Optical critical dimension measurement equipment |
| 06/30/2005 | US20050140986 Lithographic apparatus, overlay detector, device manufacturing method, and device manufactured thereby |
| 06/30/2005 | US20050140967 Method for evaluating refractive index homogeneity of optical member |
| 06/30/2005 | US20050140962 Lithographic apparatus and device manufacturing method |
| 06/30/2005 | US20050140960 Method and device for alignment of a substrate |
| 06/30/2005 | US20050140959 Exposure device, exposure method and device manufacturing method |
| 06/30/2005 | US20050140958 Illumination system and polarizer for a microlithographic projection exposure apparatus |
| 06/30/2005 | US20050140957 Optical attenuator device, radiation system and lithographic apparatus therewith and device manufacturing method |
| 06/30/2005 | US20050140956 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 06/30/2005 | US20050140954 Projection optical system |
| 06/30/2005 | US20050140952 Method of exposing a wafer to a light, and reticle, reticle assembly and exposing apparatus for performing the same |
| 06/30/2005 | US20050140951 Lithographic apparatus |
| 06/30/2005 | US20050140950 Lithographic apparatus and a method of compensating for thermal deformation in a lithographic apparatus |
| 06/30/2005 | US20050140949 Lithographic apparatus, device manufacturing methods, mask and method of characterizing a mask and/or pellicle |
| 06/30/2005 | US20050140948 Exposure apparatus and method |
| 06/30/2005 | US20050140947 Exposure apparatus and device manufacturing method |
| 06/30/2005 | US20050140946 Exposure system and method for manufacturing device |
| 06/30/2005 | US20050140945 Lithographic apparatus having a debris-mitigation system, a source for producing EUV radiation having a debris mitigation system and a method for mitigating debris |
| 06/30/2005 | US20050140943 Concentration measuring mechanism, exposure apparatus, and device production method |
| 06/30/2005 | US20050140877 Trans-reflective type liquid crystal display device and method for fabricating the same |
| 06/30/2005 | US20050140874 Transflective liquid crystal display device and fabricating method thereof |
| 06/30/2005 | US20050140842 Substrate for a liquid crystal display device and fabricating method thereof |
| 06/30/2005 | US20050140775 Film exposure method and apparatus using liquid crystal display |
| 06/30/2005 | US20050140326 Positioning system and positioning method |
| 06/30/2005 | US20050140017 Semiconductior device having improved contact hole structure and method for fabricating the same |
| 06/30/2005 | US20050139935 Contactless flash memory array |
| 06/30/2005 | US20050139790 Lithographic apparatus and device manufacturing method |
| 06/30/2005 | US20050139785 Lithographic apparatus and radiation source comprising a debris-mitigation system and method for mitigating debris particles in a lithographic apparatus |
| 06/30/2005 | US20050139576 Method and apparatus for fabricating flat panel display |
| 06/30/2005 | US20050139242 Method for removing color photoresist |
| 06/30/2005 | US20050139106 Image recording apparatus |
| 06/30/2005 | US20050139103 Method and apparatus for micro-contact printing |
| 06/30/2005 | US20050138988 Lithographic apparatus, method of calibration, calibration plate, device manufacturing method, and device manufactured thereby |
| 06/30/2005 | DE10356668A1 Herstellungsverfahren für eine Hartmaske auf einer Halbleiterstruktur Production method of a hard mask on a semiconductor structure |
| 06/30/2005 | DE10355725A1 Optisches System sowie Verfahren zur mikrolithographischen Herstellung mikrostrukturierter Bauteile Optical system and method for microlithographic production of microstructured components |
| 06/30/2005 | DE10354582A1 Anordnung und Verfahren zur Unterdrückung von Speckle-Strukturen eines gepulsten Laserstrahles Arrangement and method for suppressing speckle structures of a pulsed laser beam |
| 06/30/2005 | CA2549189A1 A process for the fabrication of optical microstructures |
| 06/29/2005 | EP1548855A2 System and method for moving an object employing piezo actuators |
| 06/29/2005 | EP1548816A2 Composition for cleaning semiconductor device |
| 06/29/2005 | EP1548806A1 Alignment method, alignment substrate, production method for alignment substrate, exposure method, exposure system and mask producing method |
| 06/29/2005 | EP1548805A1 Complementary division mask having alignment mark, method for forming alignment mark of the complementary division mask, semiconductor device manufactured by using the complementary division mask, and its manufacturing method |
| 06/29/2005 | EP1548804A1 Illuminating optical system, exposure system and exposure method |
| 06/29/2005 | EP1548803A1 Optical integrator, illumination optical device, exposure apparatus, and exposure method |
| 06/29/2005 | EP1548802A1 Light conducting device |
| 06/29/2005 | EP1548507A1 Method of measurement and a substrate |
| 06/29/2005 | EP1548506A1 Lithographic apparatus and methods for use thereof |
| 06/29/2005 | EP1548505A1 Lithographic projection apparatus and device manufacturing method |
| 06/29/2005 | EP1548504A1 Thermal deformation of a wafer in a lithographic process |
| 06/29/2005 | EP1548503A2 Lithographic apparatus and device manufacturing mehtod |
| 06/29/2005 | EP1548502A1 Lithographic apparatus and device manufacturing method |
| 06/29/2005 | EP1548501A2 Laser unit, exposure apparatus for micro-lithiographie and associated method |
| 06/29/2005 | EP1548500A2 Patterning apparatus and method for fabricating continuous patterns using the same |
| 06/29/2005 | EP1548499A1 Photosensitive composition for interlayer dielectric and method of forming patterned interlayer dielectric |
| 06/29/2005 | EP1548498A1 Composition sensitive to visible light |
| 06/29/2005 | EP1548497A1 Radiation sensitive composition, microlens, process for forming the microlens and use of the microlens |
| 06/29/2005 | EP1548062A1 Optical material containing photocurable fluoropolymer and photocurable fluororesin composition |
| 06/29/2005 | EP1547802A2 Image recording apparatus |
| 06/29/2005 | EP1547801A2 Aluminum support for lithographic printing plate and base plate for lithographic printing plate |
| 06/29/2005 | EP1547769A2 Printing process and manufacturing process of printing plate material |
| 06/29/2005 | EP1547132A1 Surface processing method |
| 06/29/2005 | EP1547126A2 System and method for manufacturing embedded conformal electronics |
| 06/29/2005 | EP1546944A1 Methods and systems for process control of corner feature embellishment |
| 06/29/2005 | EP1546813A1 Low silicon-outgassing resist for bilayer lithography |
| 06/29/2005 | EP1546812A2 Lithographic method for wiring a side surface of a substrate |
| 06/29/2005 | EP1546811A2 Lithographic printing members and a method and a system for preparation of lithographic printing members |
| 06/29/2005 | EP1546809A2 Multiphoton photosensitization system |
| 06/29/2005 | EP1546808A1 Photopolymerizable resin composition for sandblast resist |
| 06/29/2005 | EP1546807A2 Planar inorganic device |
| 06/29/2005 | EP1546806A2 Resist system, use of a resist system and lithography method for the production of semiconductor elements |