| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/07/2005 | DE10255605B4 Reflektionsmaske zur Projektion einer Struktur auf einen Halbleiterwafer sowie Verfahren zu deren Herstellung Reflection mask for projecting a pattern on a semiconductor wafer, as well as processes for their preparation |
| 07/07/2005 | DE102004059034A1 Ein Verfahren zum Herstellen einer Hartmaske in einem Kondensatorbauelement und eine Hartmaske zur Verwendung in einem Kondensatorbauelement A process for producing a hard mask in a capacitor device and a hard mask for use in a capacitor device |
| 07/07/2005 | DE10137100B4 Transparenzverbesserung von Resist-Copolymeren für die 157 nm-Fotolithografie durch Einsatz von fluorierten Zimtsäurederivaten Improving transparency resist copolymers for 157 nm photolithography through the use of fluorinated cinnamic acid derivatives |
| 07/07/2005 | CA2550676A1 Polyamide acid resin containing unsaturated group, photosentive resin composition using same, and cured product thereof |
| 07/06/2005 | EP1551066A1 Material with pattern surface for use as template and process for producing the same |
| 07/06/2005 | EP1551055A1 Method for manufacturing semiconductor device |
| 07/06/2005 | EP1551020A1 Method of producing optical disk-use original and method of producing optical disk |
| 07/06/2005 | EP1550912A1 Method for removing photoresist |
| 07/06/2005 | EP1550677A1 Composition for holography, method of curing the same, and cured article |
| 07/06/2005 | EP1550654A1 Aryl sulfonium salt, polymerizable composition and polymerization method of the same |
| 07/06/2005 | EP1550004A2 Lighting system comprising a device for adjusting the light intensity |
| 07/06/2005 | EP1550003A1 193nm resist |
| 07/06/2005 | EP1549984A2 Retainer, exposure apparatus, and semiconductor device fabrication method |
| 07/06/2005 | EP1549920A2 Irradiation device for testing objects coated with light-sensitive paint |
| 07/06/2005 | EP1549481A2 Film having a patterned fibrillar surface, and method and apparatus for making the film |
| 07/06/2005 | EP1549475A1 Imprint lithography processes and systems |
| 07/06/2005 | EP1444551B1 Photoresist composition for deep uv radiation containing an additive |
| 07/06/2005 | EP1430361B1 Carl for bioelectronics: substrate linkage using a conductive layer |
| 07/06/2005 | EP1171292A4 Process for direct digital printing of circuit boards |
| 07/06/2005 | CN1636268A Exposure apparatus, substrate processing system, and device manufacturing method |
| 07/06/2005 | CN1636166A Composition for forming anti-reflective coating |
| 07/06/2005 | CN1636165A Phase conflict resolution for photolithographic masks |
| 07/06/2005 | CN1636040A Process for making green pigment compositions useful for colour filters and lcd's |
| 07/06/2005 | CN1635611A Structure for lithography process and method for manufacturing semiconductor component |
| 07/06/2005 | CN1635433A Heat-pipe constant-temperature high-precision sampling resistor |
| 07/06/2005 | CN1635427A Frame of display panel and constructing method thereof |
| 07/06/2005 | CN1635426A Frame glue refiller for display panel and filling method therefor |
| 07/06/2005 | CN1635425A Method for restoring chromium pollution point on mask and used positioning board |
| 07/06/2005 | CN1635424A Light shield processor and method for processing light shield using same |
| 07/06/2005 | CN1635413A Method for making metallic reflective layer of silicon based LCD device |
| 07/06/2005 | CN1635407A Method for manufacturing light guiding plate |
| 07/06/2005 | CN1635406A Method for manufacturing light guiding plate core |
| 07/06/2005 | CN1634909A 3- or 4- carbonyl substituted coumarin connected with naphthenones and its synthesis method and use |
| 07/06/2005 | CN1634865A Photosensitive quaternary ammonium salt and its preparation method and use |
| 07/06/2005 | CN1209686C Chemical-amplifying type positive photoetching gel composition |
| 07/06/2005 | CN1209685C Photosensitive resin composition, photosensitive element using the same, method for producing resist pattern, and method for producing printed wiring board |
| 07/06/2005 | CN1209684C Portrait appraising method and lithographic printing quality management method |
| 07/06/2005 | CN1209682C Method for manufacturing semiconductor integrated circuit device, optical mask used therefor, method for manufacturing the same, and mask blanks used therefor |
| 07/06/2005 | CN1209440C Composition containing azacyclic compound and glycol for grain decoration of resin material, removal of stain and removal of resin material |
| 07/06/2005 | CN1209417C Active energy line solidified polyimide resin composition |
| 07/06/2005 | CN1209388C Resin for chemically amplified resist |
| 07/06/2005 | CN1209383C Method for manufacturing optical element by radiation curable fluorinated compound |
| 07/06/2005 | CN1209349C Sulfonium salt preparation method |
| 07/05/2005 | US6915505 Method and apparatus for performing rule-based gate shrink utilizing dipole illumination |
| 07/05/2005 | US6915179 Pipe structure, alignment apparatus, electron beam lithography apparatus, exposure apparatus, exposure apparatus maintenance method, semiconductor device manufacturing method, and semiconductor manufacturing factory |
| 07/05/2005 | US6915177 Comprehensive integrated lithographic process control system based on product design and yield feedback system |
| 07/05/2005 | US6914927 Laser discharge chamber passivation by plasma |
| 07/05/2005 | US6914919 Six to ten KHz, or greater gas discharge laser system |
| 07/05/2005 | US6914732 Support stand |
| 07/05/2005 | US6914723 Reflective lithography mask inspection tool based on achromatic Fresnel optics |
| 07/05/2005 | US6914708 Apparatus and method for selectively exposing photosensitive materials using a spatial light modulator |
| 07/05/2005 | US6914703 Capable of permanently forming a hologram having a low light scattering loss and high diffraction efficiency |
| 07/05/2005 | US6914667 Exposure apparatus and purging method for the same |
| 07/05/2005 | US6914666 Method and system for optimizing parameter value in exposure apparatus and exposure apparatus and method |
| 07/05/2005 | US6914665 Exposure apparatus, exposure method, and device manufacturing method |
| 07/05/2005 | US6914664 Lithographic apparatus, alignment method and device manufacturing method |
| 07/05/2005 | US6914663 Exposure apparatus |
| 07/05/2005 | US6914252 Charged beam exposure apparatus having blanking aperture and basic figure aperture |
| 07/05/2005 | US6914114 Absorbing compounds for spin-on-glass anti-reflective coatings for photolithography |
| 07/05/2005 | US6914017 Residue free overlay target |
| 07/05/2005 | US6913873 Photoresist amplification; phenolic resin, acrylic polymer and acid generator |
| 07/05/2005 | US6913872 Forming a photoresist structure having reduced thickness and rounded corners |
| 07/05/2005 | US6913871 Fabricating sub-resolution structures in planar lightwave devices |
| 07/05/2005 | US6913868 Conductive bi-layer e-beam resist with amorphous carbon |
| 07/05/2005 | US6913867 Negative photosensitive resin composition, negative photosensitive dry film and method of forming pattern |
| 07/05/2005 | US6913866 Multicolor image-forming material and multicolor image-forming method |
| 07/05/2005 | US6913865 For patterning semiconductor wafers |
| 07/05/2005 | US6913861 Method of observing exposure condition for exposing semiconductor device and its apparatus and method of manufacturing semiconductor device |
| 07/05/2005 | US6913859 Mask for differential curing and process for making same |
| 07/05/2005 | US6913858 Plurality of apertures expose first surface and second opaque pattern formed on transparent substrate; semiconductors, liquid crystal displays |
| 07/05/2005 | US6913857 Reduced deformation due to heat generation |
| 07/05/2005 | US6913781 Substrate processing apparatus and method including a device for applying a coating and a device for measuring the film quality of the coating |
| 07/05/2005 | US6913373 Optical illumination device, exposure device and exposure method |
| 07/05/2005 | US6913027 Resist stripping method and apparatus |
| 07/05/2005 | US6912956 printing plate material comprising a substrate and a component layer provided thereon, the substrate having a center line average surface roughness Ra of from 0.2 to 1.0 mu m, and an oil-retention volume A2 of from 1 to 10, wherein |
| 07/05/2005 | CA2352168C Color filters for flat panel displays |
| 06/30/2005 | WO2005060055A2 Gas discharge laser light source beam delivery unit |
| 06/30/2005 | WO2005059977A1 Stage apparatus, exposure apparatus, and exposure method |
| 06/30/2005 | WO2005059976A1 Substrate processing method, substrate processing apparatus and computer-readable recording medium |
| 06/30/2005 | WO2005059655A2 A process for the fabrication of optical microstructures |
| 06/30/2005 | WO2005059654A1 Objective as a microlithography projection objective with at least one liquid lens |
| 06/30/2005 | WO2005059653A2 Polarization optically effective delay system for a microlithographic projection illumination device |
| 06/30/2005 | WO2005059652A2 Photoresist composition for deep uv and process thereof |
| 06/30/2005 | WO2005059649A2 Liquid crystal cell that resists degradation from exposure to radiation |
| 06/30/2005 | WO2005059648A2 Deffect mitigation in spatial light modulator used for dynamic photolithography |
| 06/30/2005 | WO2005059647A2 Real time image resizing for dynamic digital photolithography |
| 06/30/2005 | WO2005059646A2 Photosensitive composition remover |
| 06/30/2005 | WO2005059645A2 Microlithography projection objective with crystal elements |
| 06/30/2005 | WO2005059618A2 Microlithography projection objective with crystal lens |
| 06/30/2005 | WO2005059617A2 Projection objective having a high aperture and a planar end surface |
| 06/30/2005 | WO2005059598A2 Spatial light modulator and method for performing dynamic photolithography |
| 06/30/2005 | WO2005059531A1 Advanced roughness metrology |
| 06/30/2005 | WO2005043603A3 Integrated ashing and implant annealing method |
| 06/30/2005 | WO2005040890A3 Catadioptric projection objective with real intermediate images |
| 06/30/2005 | WO2005038865A3 Amorphous carbon layer to improve photoresist adhesion |
| 06/30/2005 | WO2005024325A3 Method and system for drying a substrate |
| 06/30/2005 | WO2005000552A3 Method to reduce adhesion between a conformable region and a pattern of a mold |
| 06/30/2005 | WO2004105096A3 Method of making barrier layers |
| 06/30/2005 | WO2004105093A3 Tetra-organic ammonium fluoride and hf in supercritical fluid for photoresist and residue removal |
| 06/30/2005 | WO2004093145A3 Voltage tunable photodefinable dielectric and method of manufacture therefore |