| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/12/2005 | US6916585 Use of alignment marks disposed on both the template and substrate |
| 07/12/2005 | US6916584 Alignment methods for imprint lithography |
| 07/12/2005 | US6916543 Chemical amplification; organosilicon moieties; binder resins; etching resistant; photolithography |
| 07/12/2005 | US6916511 Method of hardening a nano-imprinting stamp |
| 07/12/2005 | US6916360 Adsorption methods |
| 07/12/2005 | US6916222 Process of making barrier ribs, electrodes, and the like for a plasma panel |
| 07/12/2005 | US6916126 Developing method for semiconductor substrate |
| 07/12/2005 | US6915743 Device and method for detecting the edge of a recording material |
| 07/12/2005 | US6915665 Method of inducing transmission in optical lithography preforms |
| 07/12/2005 | CA2162254C Printing screen and method for printing a variable thickness pattern |
| 07/07/2005 | WO2005062351A1 Exposure apparatus and device manufacturing method |
| 07/07/2005 | WO2005062350A1 Light flux conversion element, exposure system, lighting optical system and exposure method |
| 07/07/2005 | WO2005062134A1 Photosensitive composition for volume hologram recording |
| 07/07/2005 | WO2005062130A2 Utilities transfer system in a lithography system |
| 07/07/2005 | WO2005062129A1 Method for making fluid emitter orifice |
| 07/07/2005 | WO2005062128A2 Immersion lithographic process using a conforming immersion medium |
| 07/07/2005 | WO2005062127A2 Method for joining at least two members |
| 07/07/2005 | WO2005062126A1 A process for the manufacture of flexographic printing plates |
| 07/07/2005 | WO2005062101A1 Projection optical system and exposure apparatus with the same |
| 07/07/2005 | WO2005062100A1 Optical element holding apparatus, barrel, exposure apparatus, and device producing method |
| 07/07/2005 | WO2005061586A1 Polyamide acid resin having unsaturated group, photosensitive resin composition using same, and cured product thereof |
| 07/07/2005 | WO2005061566A1 Hyperbranched polymer, process for producing the same and resist composition containing the hyperbranched polymer |
| 07/07/2005 | WO2005061237A1 Method and apparatus for micro-contact printing |
| 07/07/2005 | WO2005061127A1 Biolithographical deposition, and materials and devices formed therefrom |
| 07/07/2005 | WO2005060668A2 Methods of modifying surfaces |
| 07/07/2005 | WO2005038529A3 Method for determining relative swing curve amplitude |
| 07/07/2005 | WO2005036267A3 Photosensitive resin compositions and photosensitive dry films using the same |
| 07/07/2005 | WO2005031465A3 Immersion lithography method and device for illuminating a substrate |
| 07/07/2005 | WO2004111727A3 Methods of removing photoresist from substrates |
| 07/07/2005 | WO2004095138A3 Micromachining process, system and product |
| 07/07/2005 | WO2004092834A3 System for regulating and maintaining a gas atmosphere in an optical system |
| 07/07/2005 | WO2004075174A3 System and method for cutting using a variable astigmatic focal beam spot |
| 07/07/2005 | US20050149902 Eigen decomposition based OPC model |
| 07/07/2005 | US20050148789 Process for preparing acrylate compound |
| 07/07/2005 | US20050148695 Organic component comprises long-chain cycloaliphatic epoxy resin, short-chain cycloaliphatic epoxy resin, cyanate ester, lewis acid catalyst; useful in die attach adhesives, underfills, encapsulants, via fills, prepreg binders |
| 07/07/2005 | US20050148694 Actinic radiation hardenable resin composition and hardening product thereof |
| 07/07/2005 | US20050148690 Coloring composition |
| 07/07/2005 | US20050148679 Aryl sulfonium salt, polymerizable composition and polymerization method of the same |
| 07/07/2005 | US20050148211 Device manufacturing method and a lithographic apparatus |
| 07/07/2005 | US20050148210 Lithographic projection apparatus, reflector assembly for use therein, and device manufacturing method |
| 07/07/2005 | US20050148204 Method and system of coating polymer solution on surface of a substrate |
| 07/07/2005 | US20050148203 Method, apparatus, system and computer-readable medium for in situ photoresist thickness characterization |
| 07/07/2005 | US20050148193 Photolithographic method for forming a structure in a semiconductor substrate |
| 07/07/2005 | US20050148192 Method for removal of pattern resist over patterned metal having an underlying spacer layer |
| 07/07/2005 | US20050148169 Solvent vapor-assisted plasticization of photoresist films to achieve critical dimension reduction during temperature reflow |
| 07/07/2005 | US20050148027 Very large scale immobilized polymer synthesis |
| 07/07/2005 | US20050148002 Sequence of surface immobilized polymers utilizing microfluorescence detection |
| 07/07/2005 | US20050147930 Dimensional precision photolithography; high density and microfabrication of semiconductor devices; removal of antireflective film undercoating without affecting resist film |
| 07/07/2005 | US20050147928 Pre-exposure of patterned photoresist films to achieve critical dimension reduction during temperature reflow |
| 07/07/2005 | US20050147927 Patterning semiconductor layers using phase shifting and assist features |
| 07/07/2005 | US20050147926 Forming layer of photoresist on semiconductor; defining a predetermined pattern; removing unnecessary portions; compaction; argon plasma processing to densify |
| 07/07/2005 | US20050147925 System and method for analog replication of microdevices having a desired surface contour |
| 07/07/2005 | US20050147924 Forming wafer with thin film, release, and patterned layer of photoresist; layer of metal is added to wafer; heating to above glass transition temperature to cause deformation or cracks; solvent is applied to dissolve release layer and penetrate cracks; etching, milling, baking |
| 07/07/2005 | US20050147922 Method for exposing a photosensitive resist layer with near-field light |
| 07/07/2005 | US20050147921 Lines oriented in first direction are created on layer of photosensitive material on substrate using a first standing wave interference pattern with a portion trimmed to create first sub-pattern; semiconductors; interferometric photolithography |
| 07/07/2005 | US20050147920 Method and system for immersion lithography |
| 07/07/2005 | US20050147918 Photoresist compositions, hardened forms thereof, hardened patterns thereof and metal patterns formed using them |
| 07/07/2005 | US20050147916 Low outgassing and non-crosslinking series of polymers for EUV negative tone photoresists |
| 07/07/2005 | US20050147915 homopolymer or copolymer with vinyl ether, sulfonate, or sulfonamide monomers having pendant diamantane or triamantane rings and an acid generator; polymer is insoluble in basic solutions; ultraviolet radiation curable; semiconductors; microlithography |
| 07/07/2005 | US20050147914 positive photosensitive resin formualtion contains alkali-soluble acrylic copolymeric resin, a 1,2-quinone diazide compound, a crosslinking compound having at least two epoxy groups and a surfactant |
| 07/07/2005 | US20050147913 High volume reticle (HVR) configured for registration with a low volume reticle; an array of dies; plurality of scribeswrapped around each die in array of dies; processing of gate arrays, embedded arrays and rapid chips |
| 07/07/2005 | US20050147901 Lithography pattern shrink process and articles |
| 07/07/2005 | US20050147900 Coating a photoresist layer; forming a first pattern on a housing of a motor; providing a color filter; optically aligning first and second pattern; and assembling color filter and housing; high speed fabrication, accuracyl; projection technology |
| 07/07/2005 | US20050147898 Photolithography using interdependent binary masks |
| 07/07/2005 | US20050147748 e.g. coating a semiconductor wafer with photoresist; controls the rate of evaporation of solvent from the polymer solution during the coating process to give a uniform thickness coating; includes rotatable chuck support, dispenser, vapor distributor, and solvent remover |
| 07/07/2005 | US20050147204 Optical unit and X-ray exposure system |
| 07/07/2005 | US20050147138 Method of forming an image |
| 07/07/2005 | US20050146798 Optical system and method for the production of microstructured components by microlithography |
| 07/07/2005 | US20050146793 Method of forming optical images, apparatus for carrying out said method and process for manufacturing a device using said method |
| 07/07/2005 | US20050146789 Device for polarization-specific examination, an optical imaging system and a calibration method |
| 07/07/2005 | US20050146721 Method of measurement, method for providing alignment marks, and device manufacturing method |
| 07/07/2005 | US20050146704 Microlithographic exposure method as well as a projection exposure system for carrying out the method |
| 07/07/2005 | US20050146703 Device manufacturing method, device manufactured thereby and a mask for use in the method |
| 07/07/2005 | US20050146702 Lithographic apparatus and device manufacturing method |
| 07/07/2005 | US20050146701 Projection method including pupillary filtering and a projection lens therefor |
| 07/07/2005 | US20050146700 Grating for EUV lithographic system aberration measurement |
| 07/07/2005 | US20050146699 Lithographic apparatus with alignment subsystem, device manufacturing method, and device manufactured thereby |
| 07/07/2005 | US20050146698 Lithographic apparatus, device manufacturing method and positioning system |
| 07/07/2005 | US20050146696 Exposure apparatus, maintenance method therefor, semiconductor device manufacturing method using the apparatus, and semiconductor manufacturing factory |
| 07/07/2005 | US20050146695 Exposure apparatus and device manufacturing method |
| 07/07/2005 | US20050146694 Exposure apparatus and device manufacturing method |
| 07/07/2005 | US20050146693 Exposure apparatus |
| 07/07/2005 | US20050146690 Deep ultraviolet unit-magnification projection optical system and projection exposure apparatus |
| 07/07/2005 | US20050146658 Substrate for a display apparatus |
| 07/07/2005 | US20050146169 Alignment device |
| 07/07/2005 | US20050146083 Method and device for transferring a pattern |
| 07/07/2005 | US20050146079 Lithographic method for molding a pattern |
| 07/07/2005 | US20050146060 Peltier module and manufacturing method therefor |
| 07/07/2005 | US20050145962 Fabrication of MEMS devices with spin-on glass |
| 07/07/2005 | US20050145836 Influence of surface geometry |
| 07/07/2005 | US20050145835 Emitter for electron-beam projection lithography system and manufacturing method thereof |
| 07/07/2005 | US20050145821 Radiation durable organic compounds with high transparency in the vaccum ultraviolet, and method for preparing |
| 07/07/2005 | US20050145805 Lithographic apparatus and device manufacturing method |
| 07/07/2005 | US20050145803 Moving lens for immersion optical lithography |
| 07/07/2005 | US20050145168 Substrate treatment apparatus |
| 07/07/2005 | DE10357775A1 Marking semiconductor wafers by converting identification numbers into binary coded pattern which is projected bit by bit onto resist layer, followed by etching |
| 07/07/2005 | DE10357432A1 Verfahren und Vorrichtung zur Bebilderung einer Druckform Method and device for imaging a printing forme |
| 07/07/2005 | DE10355573A1 Verfahren und System zum Erhöhen der Produktionsausbeute durch Steuern der Lithographie auf der Grundlage elektrischer Geschwindigkeitsdaten A method and system for increasing the production yield by controlling the lithography on the basis of electrical speed data |
| 07/07/2005 | DE10355264A1 Verfahren zur Verbesserung eines Simulationsmodells der photolithographischen Projektion A method for improving a simulation model of the photolithographic projection |
| 07/07/2005 | DE10297731T5 Umkehrprägetechnik Reverse embossing technology |