| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/13/2005 | EP1551936A1 Composition and process for wet stripping removal of sacrificial anti-reflective material |
| 07/13/2005 | EP1551906A2 Polymers, methods of use thereof, and methods of decomposition thereof |
| 07/13/2005 | EP1551887A1 Fluorinated polymers, photoresists and processes for microlithography |
| 07/13/2005 | EP1551886A1 Fluorinated polymers useful as photoresists, and processes for microlithography |
| 07/13/2005 | EP1340123A4 Systems and methods for exposing substrate periphery |
| 07/13/2005 | EP1166181B1 Photosensitive pastes and substrates for plasma display panel using the same |
| 07/13/2005 | EP1152848A4 Method and apparatus for production of a cast component |
| 07/13/2005 | EP0968445A4 Method for creating a color filter layer on a flat panel display screen structure |
| 07/13/2005 | CN1639845A Illuminating method, exposing method, and device for therefor |
| 07/13/2005 | CN1639844A Exposure device and exposure method |
| 07/13/2005 | CN1639645A Full phase shifting mask in damascene process |
| 07/13/2005 | CN1639644A Refractive projection objective for immersion lithography |
| 07/13/2005 | CN1639643A Device, EUV-lithographic device and method for preventing and cleaning contamination on optical elements |
| 07/13/2005 | CN1639642A An image forming method and apparatus |
| 07/13/2005 | CN1639641A Photosensitive resin composition, process for forming photosensitive elements or resist patterns with the same, and process for production of printed wiring boards |
| 07/13/2005 | CN1639640A Fluorinated copolymers for microlithography |
| 07/13/2005 | CN1639639A Aqueous developable photoimageable thick film compositions with photospeed enhancer |
| 07/13/2005 | CN1639634A Negative photoresists for short wavelength imaging |
| 07/13/2005 | CN1639476A Dynamic pressure bearing manufacturing method, dynamic pressure bearing, and dynamic pressure bearing manufacturing device |
| 07/13/2005 | CN1639421A Lining board for lithographic plate and its manufacturing method, and protected lithographic plate and its stack |
| 07/13/2005 | CN1639274A Treated pigment, use thereof, and compound for treating pigment |
| 07/13/2005 | CN1639262A Solvent-soluble block copolyimide composition and process for producing the same |
| 07/13/2005 | CN1638955A Antireflective silicon-containing compositions as hardmask layer |
| 07/13/2005 | CN1638883A Method and device for the decontamination of optical surfaces |
| 07/13/2005 | CN1638053A Method of adjusting deviation of critical dimension of patterns |
| 07/13/2005 | CN1638037A Pattern formation method |
| 07/13/2005 | CN1637621A Low-foam developer for radioactivity-sensitive composition |
| 07/13/2005 | CN1637620A Exposure processing system, exposure processing method and method for manufacturing a semiconductor device |
| 07/13/2005 | CN1637619A Lithographic apparatus with contamination suppression, device manufacturing method, and device manufactured thereby |
| 07/13/2005 | CN1637617A Patterning apparatus and method for fabricating continuous patterns using the same |
| 07/13/2005 | CN1637616A Lithographic apparatus and device manufacturing method |
| 07/13/2005 | CN1637615A Flat display device and method of manufacturing the same |
| 07/13/2005 | CN1637614A Method and apparatus for fabricating flat panel display |
| 07/13/2005 | CN1637613A Lithography equipment |
| 07/13/2005 | CN1637612A Method and apparatus for moving lens for immersion optical lithography |
| 07/13/2005 | CN1637611A Grating patch arrangement, lithographic apparatus, method of testing, device manufacturing method, and device manufactured thereby |
| 07/13/2005 | CN1637610A Exposure apparatus and device manufacturing method |
| 07/13/2005 | CN1637609A Method and system for immersion lithography |
| 07/13/2005 | CN1637608A Lithographic apparatus and device manufacturing method |
| 07/13/2005 | CN1637607A Method for reducing nonuniformity of image printed on substrate using light micro-image cover and light micro- image cover |
| 07/13/2005 | CN1637606A Exposure apparatus and method |
| 07/13/2005 | CN1637605A Lithographic projection apparatus and device manufacturing method |
| 07/13/2005 | CN1637604A Positive photoresist stripping liquid composition |
| 07/13/2005 | CN1637603A Positive photoresist composition with a polymer including a fluorosulfonamide group and process for its use |
| 07/13/2005 | CN1637602A Producing technology for non-rusting agent pattern and thickening material thereof and semiconductor device producing technology |
| 07/13/2005 | CN1637601A Cross-linking polymer for organic anti-reflective coating, organic anti-reflective coating composition comprising the same and method for forming photoresist pattern using the same |
| 07/13/2005 | CN1637600A Water-soluble material, chemically amplified resist and pattern formation method using the same |
| 07/13/2005 | CN1637598A Surface protective film and surface protection material using the same film |
| 07/13/2005 | CN1637596A Laser mask and method of crystallization using the same |
| 07/13/2005 | CN1637594A Exposure mask and exposure method using the same |
| 07/13/2005 | CN1637593A Mask and method of manufacturing liquid crystal display device using the same |
| 07/13/2005 | CN1637589A Image exposure method and apparatus |
| 07/13/2005 | CN1637563A Substrate for a display apparatus, display device, colour filter substrate and liquid crystal display device and producing method thereof |
| 07/13/2005 | CN1637555A Substrate for a liquid crystal display device and fabricating method thereof |
| 07/13/2005 | CN1637540A Thin film layout method and method and equipment for producing flat display device |
| 07/13/2005 | CN1637535A Film transistor array substrate and producing method thereof |
| 07/13/2005 | CN1637531A Trans-reflective type liquid crystal display device and method for fabricating the same |
| 07/13/2005 | CN1637530A Trans-reflective type liquid crystal display device and method for fabricating the same |
| 07/13/2005 | CN1637511A Field emission backlight unit, method of driving the backlight unit, and method of manufacturing lower panel |
| 07/13/2005 | CN1637503A Color filter substrate, liquid crystal display apparatus including color filter substrate, and method of manufacturing color filter substrate |
| 07/13/2005 | CN1637486A Method for fabricating a liquid crystal display device |
| 07/13/2005 | CN1637072A Photosensitive polyimide resin composition, insulating film using the same, process for producing insulating film, and electronic component using the insulating film |
| 07/13/2005 | CN1637066A Composition for forming organic insulating film and organic insulating film formed from the same |
| 07/13/2005 | CN1637027A Ether monomers and polymers having multi-ring structures, and photosensitive polymers and resist compositions obtained from the same |
| 07/13/2005 | CN1636971A Oxime derivatives and the use thereof as latent acids |
| 07/13/2005 | CN1636914A Method for manufacturing a transparent element with invisible electrodes |
| 07/13/2005 | CN1210762C Making process of double-layered photoresist for semiconductor manufacture |
| 07/13/2005 | CN1210627C Alignment apparatus of array optical probe scanning integrated circuit photoetching system |
| 07/13/2005 | CN1210626C Method for preventing development defect and material |
| 07/13/2005 | CN1210625C Developer solution for silver salt diffusing and transferring aluminium-base offset plate and its use |
| 07/13/2005 | CN1210624C Chemical amplifying positive photoetching rubber composition |
| 07/13/2005 | CN1210623C Chemical amplifying type positive photoetching rubber composition |
| 07/13/2005 | CN1210622C Negative photoresist composition for short-wave long light and method for forming image |
| 07/13/2005 | CN1210621C Flexographic printing photosensitive resin and photosensitive resin printing plates material |
| 07/13/2005 | CN1210620C Ultraviolet-curable resin composition and photosolder resist ink containing the composition |
| 07/13/2005 | CN1210619C Red-colouring corrosion-resisting stamp-pad ink and pigment optical filter |
| 07/13/2005 | CN1210618C Dual layer reticle bland and manufacturing process |
| 07/13/2005 | CN1210613C 感光性平版印刷版 Photosensitive lithographic printing plate |
| 07/12/2005 | US6917901 Compensatory exposure tool focus corrections; photolithography |
| 07/12/2005 | US6917472 Achromatic fresnel optics for ultraviolet and x-ray radiation |
| 07/12/2005 | US6917458 Correction of birefringence in cubic crystalline optical systems |
| 07/12/2005 | US6917433 Methods and systems for determining a property of a specimen prior to, during, or subsequent to an etch process |
| 07/12/2005 | US6917420 Rotational stage with vertical axis adjustment |
| 07/12/2005 | US6917419 Methods and systems for determining flatness, a presence of defects, and a thin film characteristic of a specimen |
| 07/12/2005 | US6917413 Perforation and image exposure system |
| 07/12/2005 | US6917412 Modular stage with reaction force cancellation |
| 07/12/2005 | US6917048 Methods and devices for controlling blur resulting from the space-charge effect and geometrical aberration in a charged-particle-beam microlithography apparatus |
| 07/12/2005 | US6917047 Methods and apparatuses for off-axis lithographic illumination |
| 07/12/2005 | US6917046 Positioning apparatus, charged-particle-beam exposure apparatus, and device manufacturing method |
| 07/12/2005 | US6917045 Electron beam exposure apparatus, electron beam exposure apparatus calibration method, and semiconductor element manufacturing method |
| 07/12/2005 | US6917043 Individually addressable cathodes with integrated focusing stack or detectors |
| 07/12/2005 | US6916772 Sulfoxide pyrolid(in)one alkanolamine cleaner composition |
| 07/12/2005 | US6916598 Ionization radiation imageable photopolymer compositions |
| 07/12/2005 | US6916597 Method for fabricating a resist pattern, a method for patterning a thin film and a method for manufacturing a micro device |
| 07/12/2005 | US6916594 Water soluble polymer, acidic compound and water; reduced linewidth of positive patterns; prevention of negative pattern linewidth slimming |
| 07/12/2005 | US6916593 Resist composition |
| 07/12/2005 | US6916592 Comprises fluorinated sulfonate/sulfone monomers; sensitive to high energy radiation, improved transparency, contrast, and adherence; for lithographic microprocessing |
| 07/12/2005 | US6916591 Comprises arylsulfonyloxime; for integrated circuits |
| 07/12/2005 | US6916590 Resist composition which is excellent particularly in transparency to light beams and dry etching properties and gives a resist pattern excellent in sensitivity, resolution, evenness, heat resistance, etc., as a chemical amplification |
| 07/12/2005 | US6916589 Adhesion and image quality is improved by re-ironing the already transferred image utilizing a material resistant to sticking, such as silicone paper |