| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/14/2005 | WO2005064404A1 Replacement apparatus for an optical element |
| 07/14/2005 | WO2005064403A1 Composition for forming nitride coating film for hard mask |
| 07/14/2005 | WO2005064402A1 Negative photosensitive composition and negative photosensitive lithographic printing plate |
| 07/14/2005 | WO2005064401A2 Lithographic apparatus having a debris-mitigation system, a source for producing euv radiation having a debris mitigation system and a method for mitigating debris |
| 07/14/2005 | WO2005064400A2 Chuck system, lithographic apparatus using the same and device manufacturing method |
| 07/14/2005 | WO2005064399A2 Lithography system using a programmable electro-wetting mask |
| 07/14/2005 | WO2005064382A1 Apparatus for holding optical element, barrel, exposure apparatus, and device producing method |
| 07/14/2005 | WO2005064363A2 Light-redirecting optical structure with linear prisms, and process for forming same |
| 07/14/2005 | WO2005063498A1 Lithographic printing original plate and lithographic printing plate |
| 07/14/2005 | WO2005063432A1 Device for machining a workpiece using laser light |
| 07/14/2005 | WO2004108846A3 Coating system for glass surfaces, method for the production and use thereof |
| 07/14/2005 | WO2004107407A3 Method of making information storage devices by molecular photolithography |
| 07/14/2005 | US20050154484 Photolithographic parameter feedback system and control method thereof |
| 07/14/2005 | US20050154077 Reacting a polymer such as a polyether sulfone or a polyether carbonyl that has haloalkyl substituents with an allyl alcoholate or an allylphenolate; the allyl ether groups formed can be reacted with a peroxide to form epoxy groups that can be crosslinked; used for thermal ink jet print heads |
| 07/14/2005 | US20050153855 Photoresist cleaning solutions and methods for pattern formation using the same |
| 07/14/2005 | US20050153567 Method of forming patterns |
| 07/14/2005 | US20050153552 Crystallization apparatus and method, manufacturing method of electronic device, electronic device, and optical modulation element |
| 07/14/2005 | US20050153540 Method of forming contact hole and method of manufacturing semiconductor device |
| 07/14/2005 | US20050153466 Photoresist pattern, method of fabricating the same, and method of assuring the quality thereof |
| 07/14/2005 | US20050153464 Holographically defined surface mask etching method and etched opical structures |
| 07/14/2005 | US20050153424 Fluid barrier with transparent areas for immersion lithography |
| 07/14/2005 | US20050153363 Polymer arrays |
| 07/14/2005 | US20050153362 Polymer arrays |
| 07/14/2005 | US20050153249 spraying metal particles over substrate having insulating pattern formed of thermosetting resin, then heating to dissolve the resin pattern and fix the metal particles on the resin pattern, and curing the resins |
| 07/14/2005 | US20050153248 Method for fabricating a molding core |
| 07/14/2005 | US20050153246 Maskless; uses array of mirrors configured to operate in tilting mode and/or piston-displacement mode; photoimaging; gray-scale techniques used for subpixel feature placement |
| 07/14/2005 | US20050153245 Method for forming a pattern and method of manufacturing semiconductor device |
| 07/14/2005 | US20050153244 Sulfonate derivatives and the use thereof as latent acids |
| 07/14/2005 | US20050153240 Norbornene-type monomers and polymers containing pendent lactone or sultone groups |
| 07/14/2005 | US20050153238 copolymers prepared by imidation of acid dianhydride with diamines and photosensitizer mixtures, used as protective coatings for organic electroluminescent devices |
| 07/14/2005 | US20050153237 Photosensitive layer containing: an iron-arene complex photopolymerization initiator; a polymer binder; an unsaturated polymerizable compound; and an anionic dye, especially a xanthene dye, that has a solubility in methyl ethyl ketone of not less than 1 weight % |
| 07/14/2005 | US20050153236 Novel polymer and chemically amplified resist composition containing the same |
| 07/14/2005 | US20050153235 Photosensitive material for immersion photolithography |
| 07/14/2005 | US20050153234 Photosensitive material for immersion photolithography |
| 07/14/2005 | US20050153233 Norbornene-type monomers and polymers containing pendent lactone or sultone groups |
| 07/14/2005 | US20050153232 Positive photoresist composition with a polymer including a fluorosulfonamide group and process for its use |
| 07/14/2005 | US20050153231 a mixture of photoinitiators, acyclic mercaptans, sensitizers and pigments, having high sensitivity and storage stability, used as photoresists for printing plates, color photography, solder, etching, color filter, holography, optical imaging and ultraviolet radiation inks or for forming precise patterns |
| 07/14/2005 | US20050153217 Pattern verification method, pattern verification system, mask manufacturing method and semiconductor device manufacturing method |
| 07/14/2005 | US20050153216 Lithography mask and lithography system for direction-dependent exposure |
| 07/14/2005 | US20050153215 Real-time configurable masking |
| 07/14/2005 | US20050153107 Substrate having functional layer pattern formed thereon and method of forming functional layer pattern |
| 07/14/2005 | US20050153081 Laser addressable thermal transfer imaging element with an interlayer |
| 07/14/2005 | US20050153074 Method of activating a silicon surface for subsequent patterning of molecules onto said surface |
| 07/14/2005 | US20050153066 Method for manufacturing a surface optical layer |
| 07/14/2005 | US20050152155 Field emission backlight unit, method of driving the backlight unit, and method of manufacturing lower panel |
| 07/14/2005 | US20050152146 High efficiency solid-state light source and methods of use and manufacture |
| 07/14/2005 | US20050152088 Substrate holding system and exposure apparatus using the same |
| 07/14/2005 | US20050152046 Optical system, in particular illumination system, of a microlithographic projection exposure apparatus |
| 07/14/2005 | US20050152027 Catadioptric imaging system employing immersion liquid for use in broad band microscopy |
| 07/14/2005 | US20050151955 Method and apparatus for a reticle with purged pellicle-to-reticle gap |
| 07/14/2005 | US20050151954 Lithographic apparatus and device manufacturing method |
| 07/14/2005 | US20050151953 Maskless optical writer |
| 07/14/2005 | US20050151952 Photolithography system with variable shutter and method of using the same |
| 07/14/2005 | US20050151951 Stage alignment in lithography tools |
| 07/14/2005 | US20050151950 Projection optical system, exposure apparatus and device fabrication method |
| 07/14/2005 | US20050151949 Process and apparatus for applying apodization to maskless optical direct write lithography processes |
| 07/14/2005 | US20050151948 Lithographic apparatus and device manufacturing method |
| 07/14/2005 | US20050151947 Position measuring method, position control method, exposure method and exposure apparatus, and device manufacturing method |
| 07/14/2005 | US20050151946 Modulated lithographic beam to reduce sensitivity to fluctuating scanning speed |
| 07/14/2005 | US20050151945 Lithographic apparatus and device manufacturing method |
| 07/14/2005 | US20050151944 Patterning apparatus and method for fabricating continuous pattern using the same |
| 07/14/2005 | US20050151942 Exposure method and apparatus |
| 07/14/2005 | US20050151921 Liquid crystal display apparatus and fabrication method of the same |
| 07/14/2005 | US20050151909 Color filter substrate, liquid crystal display apparatus including color filter substrate, and method of manufacturing color filter substrate |
| 07/14/2005 | US20050151446 System and method for moving an object employing piezo actuators |
| 07/14/2005 | US20050151284 Pattern drawing apparatus, method of manufacturing a master disk for manufacturing information recording media, and method of manufacturing an information recording medium |
| 07/14/2005 | US20050151148 Sensors |
| 07/14/2005 | US20050151096 Lithographic apparatus and device manufacturing method |
| 07/14/2005 | US20050151095 Reflection element of exposure light and production method therefor, mask, exposure system, and production method of semiconductor device |
| 07/14/2005 | US20050150864 Photonic structures, devices, and methods |
| 07/14/2005 | US20050150407 Method for the productuion of a flexographic plate and flexographic plate obtained according to said method |
| 07/14/2005 | US20050150404 Hardened nano-imprinting stamp |
| 07/14/2005 | DE10392704T5 Verfahren zur Bewertung der Homogenität des Brechungsindex von optischen Bauteilen A method for evaluating the homogeneity of the refractive index of optical components |
| 07/14/2005 | DE10360581A1 Pre adjustment process for projection system for EUV lithography for microelectronics or microscopy uses pre adjusting wavelength differing from final wavelength |
| 07/14/2005 | DE10358211A1 Verwendung einer Pigmentzubereitung auf Basis von CI Pigment Yellow 74 Use of a pigment preparation based on CI Pigment Yellow 74 |
| 07/14/2005 | DE10356847A1 Strahlungsempfindliche Zusammensetzungen und darauf basierende bebilderbare Elemente Radiation-sensitive compositions and imageable elements based thereon |
| 07/14/2005 | DE102004059664A1 Semiconductor wafer measurement point focusing method for semiconductor manufacturing process, involves regulating lens current value to perform focusing while widening focus depth, if evaluation value is less than preset level |
| 07/14/2005 | DE102004059493A1 Lighting equipment of microlithographic projection lighting plant, used for producing microstructurized device, e.g. highly integrated circuit on silicon wafer, has mirror in objective on and parallel to optical axis |
| 07/14/2005 | CA2550498A1 Light-redirecting optical structure with linear prisms, and process for forming same |
| 07/13/2005 | EP1553617A1 Method for forming pattern and method for manufacturing semiconductor device |
| 07/13/2005 | EP1553580A1 Spin-coating device and method of producing disk-like recording medium |
| 07/13/2005 | EP1553573A1 Optical recording medium master exposure device and optical recording medium master exposure method |
| 07/13/2005 | EP1553456A2 Method and apparatus for thermal development having a removable support member |
| 07/13/2005 | EP1553455A2 Method for forming images |
| 07/13/2005 | EP1553454A2 Pattern formation method |
| 07/13/2005 | EP1553453A2 Water-soluble material, chemically amplified resist and pattern formation method using the same |
| 07/13/2005 | EP1553452A2 Photoresist compositions comprising polymers |
| 07/13/2005 | EP1553451A1 Photoresist base material, method for purification thereof, and photoresist compositions |
| 07/13/2005 | EP1553450A1 Process for preparing plugged-through-hole printed wiring board and plugged-through-hole printed wiring board |
| 07/13/2005 | EP1553449A1 Active energy ray sensitive resin composition, active energy ray sensitive resin film and method for forming pattern using said film |
| 07/13/2005 | EP1553448A2 Planographic printing plate material and preparing process of planographic printing plate |
| 07/13/2005 | EP1553447A1 Optical image recording material, hologram base body, method of optical image recording and process for producing optical image recording material and hologram base body |
| 07/13/2005 | EP1553112A1 Process for production of fluoropolymers and photoresist composition |
| 07/13/2005 | EP1552955A1 Photosensitive resin composition for lithographic printing forme and original forme for lithographic printing |
| 07/13/2005 | EP1552943A2 Imaging apparatus, imaging method, and printing apparatus |
| 07/13/2005 | EP1552545A1 Spin-coating methods and apparatuses for spin-coating, including pressure sensor |
| 07/13/2005 | EP1552346A1 Lithographic materials based on polymers containing polyhedral oligomeric silsesquioxanes |
| 07/13/2005 | EP1552345A2 Multiphoton photosensitization method |
| 07/13/2005 | EP1552344A2 A method for the removal of an imaging layer from a semiconductor substrate stack |
| 07/13/2005 | EP1552342A2 Compositions substrate for removing etching residue and use thereof |