| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/20/2005 | EP1555576A2 Driving apparatus, exposure apparatus, and device manufacturing method |
| 07/20/2005 | EP1555575A1 Lithographic apparatus and device manufacturing method |
| 07/20/2005 | EP1555574A2 Maskless pattern generating system |
| 07/20/2005 | EP1555573A2 Optical attenuator device, radiation system and lithographic apparatus therewith and device manufacturing method |
| 07/20/2005 | EP1555571A1 Curable resin composition and flexographic plate material using the curable resin composition |
| 07/20/2005 | EP1554634A2 Lithography system |
| 07/20/2005 | EP1554633A2 Card printing system and method |
| 07/20/2005 | EP1554626A1 A device having a light-absorbing mask and a method for fabricating same |
| 07/20/2005 | EP1554622A1 Device for holding a beam splitter element |
| 07/20/2005 | EP1554616A2 Improvements in or relating to multiple exposures of photosensitive material |
| 07/20/2005 | EP1554347A1 Polymer for heat-sensitive lithographic printing plate precursor |
| 07/20/2005 | EP1554346A2 Polymer for heat-sensitive lithographic printing plate precursor |
| 07/20/2005 | EP1554324A1 Polymer for heat-sensitive lithographic printing plate precursor |
| 07/20/2005 | EP1554322A2 Anti-reflective coatings and dual damascene fill compositions comprising styrene-allyl alcohol copolymers |
| 07/20/2005 | EP1554252A1 Hexaarylbiimidazole compounds and photopolymerization initiator compositions containing the same |
| 07/20/2005 | EP1554033A2 Improved semiconductor stress buffer coating edge bead removal compositions and method for their use |
| 07/20/2005 | EP1456870B1 Resistless lithography method for producing fine structures |
| 07/20/2005 | EP1266266A4 Novel photosensitive resin compositions |
| 07/20/2005 | EP1237824A4 A method and apparatus for treating a substrate with an ozone-solvent solution |
| 07/20/2005 | EP1064713A4 Exposure device having a planar motor |
| 07/20/2005 | EP0945276B1 Imaging device, imaging method, and printing device |
| 07/20/2005 | CN1643659A Surface treatment method, semiconductor device, method of fabricating semiconductor device, and treatment apparatus |
| 07/20/2005 | CN1643650A Laser assisted direct imprint lithography |
| 07/20/2005 | CN1643586A Optical information medium |
| 07/20/2005 | CN1643454A PH buffered compositions for cleaning semiconductor substrates |
| 07/20/2005 | CN1643453A Method and apparatus for printing large data flows |
| 07/20/2005 | CN1643452A Controlling of photolithography overlay incorporating feedforward overlay information |
| 07/20/2005 | CN1643451A Photosensitive resin composition and use thereof |
| 07/20/2005 | CN1643407A Pigment-dispersed resist composition for color filters |
| 07/20/2005 | CN1643406A Microlens array substrate and fabrication method thereof, and projection-type liquid crystal display device using same |
| 07/20/2005 | CN1643007A Polymerisable composition |
| 07/20/2005 | CN1642992A Photoinitiator and photocurable composition of novel compound |
| 07/20/2005 | CN1642738A Variable data lithographic printing device and method |
| 07/20/2005 | CN1642665A Removal of contaminants using supercritical processing |
| 07/20/2005 | CN1642631A Apparatus for treatment of light-sensitive biopolymers |
| 07/20/2005 | CN1642371A Suction nozzle for radiation etching apparatus |
| 07/20/2005 | CN1641834A Method and device for improving key size consistency between different patterns for semiconductor assembly |
| 07/20/2005 | CN1641833A Film forming method and substrate board treatment method |
| 07/20/2005 | CN1641485A Exposure system, test mask for flare testing, method for evaluating lithography process |
| 07/20/2005 | CN1641484A Method of measurement, method for providing alignment marks, and device manufacturing method |
| 07/20/2005 | CN1641483A Method for forming metal pattern with low resistivity |
| 07/20/2005 | CN1641482A Lithographic apparatus and device manufacturing method |
| 07/20/2005 | CN1641481A Light-sensitive transfer sheet, light-sensitive layers, method for forming image pattern and method for distribution pattern |
| 07/20/2005 | CN1641480A Mould core manufacturing method |
| 07/20/2005 | CN1641455A Liquid crystal display apparatus and fabrication method of the same |
| 07/20/2005 | CN1641450A Liquid crystal display device, and its manufacturing method anbd transistor array substrate and manufacturing method |
| 07/20/2005 | CN1641427A Method for making display board and reflection light diffusing structure |
| 07/20/2005 | CN1641423A Flat-board display device and method and device for making same |
| 07/20/2005 | CN1641414A Optical attenuator device, radiation system and lithographic apparatus therewith and device manufacturing method |
| 07/20/2005 | CN1640683A Printing plate, fabricating method thereof, method of making a printing plate with a print image, method of reproducing the printing plate with a print image, and printing press |
| 07/20/2005 | CN1211837C Double-bulb exposure device |
| 07/20/2005 | CN1211836C Method for reducing pattern size in photoresist bond line |
| 07/20/2005 | CN1211834C Semiconductor integrated circuit device mfg. method |
| 07/20/2005 | CN1211710C Method and apparatus for developing photosensitive resin relief printing plate |
| 07/20/2005 | CN1211709C Photoreactive resin composition and circuit board and method for making multilayer ceramic base material |
| 07/20/2005 | CN1211708C Photoresist composition, its preparation method and method for forming pattern by using it |
| 07/20/2005 | CN1211707C Method of making fluid jet equipments |
| 07/20/2005 | CN1211706C Device for transferring a pattern on an object |
| 07/20/2005 | CN1211672C Optical filter and manufacture thereof |
| 07/20/2005 | CN1211439C Process for producing coatings using surface-active photoinitiators |
| 07/20/2005 | CN1211197C Method for producing three-dimensionally arranged conducting and connecting structures for volumetric and energy flows |
| 07/19/2005 | US6920628 Method and apparatus for defining mask patterns utilizing a spatial frequency doubling technique |
| 07/19/2005 | US6920368 Method and device for correcting proximity effects |
| 07/19/2005 | US6919964 CD metrology analysis using a finite difference method |
| 07/19/2005 | US6919957 Methods and systems for determining a critical dimension, a presence of defects, and a thin film characteristic of a specimen |
| 07/19/2005 | US6919952 Direct write lithography system |
| 07/19/2005 | US6919951 Illumination system, projection exposure apparatus and device manufacturing method |
| 07/19/2005 | US6919658 Coordinate measuring stage |
| 07/19/2005 | US6919574 Electron beam exposure apparatus, deflection apparatus, and electron beam exposure method |
| 07/19/2005 | US6919573 Method and apparatus for recycling gases used in a lithography tool |
| 07/19/2005 | US6919564 Inspection method, apparatus and system for circuit pattern |
| 07/19/2005 | US6919411 Process for producing polymer compound |
| 07/19/2005 | US6919385 Energy-ray curing resin composition |
| 07/19/2005 | US6919211 Solid support comprising amino acid sequences for sequencing, fingerprinting and mapping biological macromolecules; structure and function analysis |
| 07/19/2005 | US6919169 Forming a photosensitive resin layer on the head substrate; molding a convex portion having the sharp-pointed portion on a surface of the resin layer by pressing a molds against the suface of resin layer, exposing the resin, then developing |
| 07/19/2005 | US6919167 Exposing the polymer resist layer to radiant energy to form at least one light field region in the polymer resist layer, and then contacting the polymer resist layer with CO2 solvent system to remove light field region |
| 07/19/2005 | US6919166 Method for preparing lithographic printing plate |
| 07/19/2005 | US6919165 Hydrophobic and hydrophilic regions for lithographic printing formed on polyimide surface via imaging/patterning with electromagnetic radiation; offset printing |
| 07/19/2005 | US6919164 Applying photosensitive layer to substrate; electron beam exposure; contacting developers |
| 07/19/2005 | US6919163 Lithographic printing plate precursor |
| 07/19/2005 | US6919161 Silicon-containing polymer, resist composition and patterning process |
| 07/19/2005 | US6919160 Acrylic compounds for sub-200 nm photoresist compositions and methods for making and using same |
| 07/19/2005 | US6919159 Mixture of addition polymer and cyanine dye |
| 07/19/2005 | US6919157 Positive type radiation-sensitive composition and process for producing pattern with the same |
| 07/19/2005 | US6919153 Illuminating a mask with illumination light, which is disposed in projection exposure apparatus and in which a dose monitor pattern is formed, passing only a 0th-order diffracted light through a pupil surface of projection exposure apparatus |
| 07/19/2005 | US6919152 Template is aligned with the substrate by the use of alignment marks disposed on both the tmplate and substrate, the alignment is then determined and corrected for before the layer is processed |
| 07/19/2005 | US6919148 Member for a mask film, process for producing a mask film using the member and process for producing a printing plate of a photosensitive resin using the mask |
| 07/14/2005 | WO2005064679A1 Wafer with optical control modules in ic fields |
| 07/14/2005 | WO2005064678A1 Wafer with optical control modules in dicing paths |
| 07/14/2005 | WO2005064656A1 Development device and development method |
| 07/14/2005 | WO2005064655A1 Developing device and developing method |
| 07/14/2005 | WO2005064413A1 Water-developable photopolymer plate for letterpress printing |
| 07/14/2005 | WO2005064412A2 Lithographic apparatus and device manufacturing method |
| 07/14/2005 | WO2005064411A2 Lithographic apparatus and with a debris-mitigation system |
| 07/14/2005 | WO2005064410A2 Lithographic apparatus and method of calibration |
| 07/14/2005 | WO2005064409A2 Removable pellicle for immersion lithography |
| 07/14/2005 | WO2005064408A2 Wafer with optical control modules in exposure fields |
| 07/14/2005 | WO2005064407A2 Lithographic projection apparatus and device manufacturing method |
| 07/14/2005 | WO2005064406A2 Projection optical system |
| 07/14/2005 | WO2005064405A2 Lithographic apparatus and device manufacturing method |