| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/26/2005 | US6921621 Mixture of modified polyvinylphenol and acid generator; high resolution photoresist pattern |
| 07/26/2005 | US6921620 Imageable composition containing colorant having a counter anion derived from a non-volatile acid |
| 07/26/2005 | US6921615 High-resolution overlay alignment methods for imprint lithography |
| 07/26/2005 | US6921614 Binders differing in glass transition temperature are incorporated into a transfer layer |
| 07/26/2005 | US6921193 Chemical concentration control device for semiconductor processing apparatus |
| 07/26/2005 | US6920703 Microstructure drying treatment method and its apparatus and its high pressure vessel |
| 07/21/2005 | WO2005067048A2 Contactless flash memory array |
| 07/21/2005 | WO2005067013A1 Exposure apparatus, exposure method, and device producing method |
| 07/21/2005 | WO2005067012A1 Exposure method and apparatus, and device producing method |
| 07/21/2005 | WO2005067011A1 Coater/developer and coating/developing method |
| 07/21/2005 | WO2005067008A2 Method and system for coating polymer solution on a substrate in a solvent saturated chamber |
| 07/21/2005 | WO2005066949A1 Novel optical storage materials based on narrowband optical properties |
| 07/21/2005 | WO2005066717A1 Method and apparatus for removing photoresist from a substrate |
| 07/21/2005 | WO2005066716A2 Lithographic apparatus and device manufacturing method |
| 07/21/2005 | WO2005066715A2 A low outgassing and non-crosslinking series of polymers for euv negative tone photoresists |
| 07/21/2005 | WO2005066714A2 Photoresist composition |
| 07/21/2005 | WO2005066672A1 Process for producing photonic crystals and controlled defects therein |
| 07/21/2005 | WO2005066240A1 Coating compositions |
| 07/21/2005 | WO2005066231A1 Radiation curable aqueous compositions for low extractable film packaging |
| 07/21/2005 | WO2005065066A2 Method and device for data integrity checking in a spatial light modulator |
| 07/21/2005 | WO2005052694A3 Improvements in and relating to printing plate ovens |
| 07/21/2005 | WO2005013004A3 Measuring the effect of flare on line width |
| 07/21/2005 | WO2004096514A3 Compositions and methods for use in three dimensional model printing |
| 07/21/2005 | WO2003106693A3 Gradient structures interfacing microfluidics and nanofluidics, methods for fabrication and uses thereof |
| 07/21/2005 | US20050160394 Driven inspection or measurement |
| 07/21/2005 | US20050160388 Streamlined IC mask layout optical and process correction through correction reuse |
| 07/21/2005 | US20050160383 Combined e-beam and optical exposure semiconductor lithography |
| 07/21/2005 | US20050160011 Method for concurrently employing differing materials to form a layer on a substrate |
| 07/21/2005 | US20050159281 Aluminum sheet embossing roll |
| 07/21/2005 | US20050159019 Method for manufacturing large area stamp for nanoimprint lithography |
| 07/21/2005 | US20050159016 Electron exposure to reduce line edge roughness |
| 07/21/2005 | US20050158743 Arrays for detecting nucleic acids |
| 07/21/2005 | US20050158673 Liquid-filled balloons for immersion lithography |
| 07/21/2005 | US20050158672 Overcoating substrate with photoresist; preferential irradiation; development using aqueou solution containing cyclodextrin ; fine patterns |
| 07/21/2005 | US20050158671 forming resist patterns on films provided for the semiconductor substrates, forming pattern of conductive films, etching using the resist pattern as a mask, stripping using liquids and rinsing the substrate to remove particles or metal impurities |
| 07/21/2005 | US20050158670 Apparatus for processing substrate and method of processing the same |
| 07/21/2005 | US20050158669 three-dimensional silicon substrate having patterns on the surfaces, covered with silicon oxide release layer and electroconductive plating surfaces, used for the fabrication of microstructure metal components |
| 07/21/2005 | US20050158667 Solvent free photoresist strip and residue removal processing for post etching of low-k films |
| 07/21/2005 | US20050158665 substrates having film patterns including dielectric, semiconductor, electroconductive and protective films, having low wettability; displays; electronics |
| 07/21/2005 | US20050158664 Method of integrating post-etching cleaning process with deposition for semiconductor device |
| 07/21/2005 | US20050158663 Regenerative plate making and printing process, and plate making and printing apparatus |
| 07/21/2005 | US20050158662 Adamantane derivatives and resin compositions using the same as raw material |
| 07/21/2005 | US20050158661 Resins curable with actinic energy ray, process for the production thereof, and photocurable and thermosetting resin composition |
| 07/21/2005 | US20050158660 Solid imaging compositions for preparing polypropylene-like articles |
| 07/21/2005 | US20050158659 Photosensitive resin composition for black matrix |
| 07/21/2005 | US20050158657 Radiation-sensitive resin composition |
| 07/21/2005 | US20050158656 Chemical amplification type positive resist composition |
| 07/21/2005 | US20050158655 Ionic photoacid generators with segmented hydrocarbonfluorocarbon sulfonate anions |
| 07/21/2005 | US20050158654 Reducing outgassing of reactive material upon exposure of photolithography resists |
| 07/21/2005 | US20050158653 spin coating thin films having electrical resistance on semiconductor wafer, photomask and optical masks, then evaluating using radiation beams |
| 07/21/2005 | US20050158651 Adhesive compound and method for forming photoresist pattern using the same |
| 07/21/2005 | US20050158650 Irradiating a hydroxystyrene-hydroxystyrene-1,2-naphthoquinone-2-diazide terpolymer with extreme ultraviolet radiation to effect ring condensation, carboxylation and nitrogen; no reactive outgassing nor use of photoacid generators; contrast |
| 07/21/2005 | US20050158638 transferring apperture patterns onto photoresist films, using projectors and phase shifting masks having radiation transparent films and light shields, to manufacture a dynamic random access memory |
| 07/21/2005 | US20050158637 comprising radiation transparent plates through which light passes, having blocking patterns for selectively blocking the light, and concave and convex portions for imprinting pateerns on photoresist films; lithography |
| 07/21/2005 | US20050158419 Thermal processing system for imprint lithography |
| 07/21/2005 | US20050157915 Method and apparatus for providing a bioinformatics database |
| 07/21/2005 | US20050157438 Combination current sensor and relay |
| 07/21/2005 | US20050157401 Objective with crystal lenses |
| 07/21/2005 | US20050157400 Projection objective having adjacently mounted aspheric lens surfaces |
| 07/21/2005 | US20050157399 High storage stability and resolution and good balance among characteristic properties such as transparency, heat resistance, thermal discoloration resistance and solvent resistance; liquid crystal display device |
| 07/21/2005 | US20050157391 Diffractive optical element |
| 07/21/2005 | US20050157384 Multilayer reflective mirrors for EUV, wavefront-aberration-correction methods for same, and EUV optical systems comprising same |
| 07/21/2005 | US20050157383 Condenser optic with sacrificial reflective surface |
| 07/21/2005 | US20050157297 Periodic patterns and technique to control misalignment between two layers |
| 07/21/2005 | US20050157296 Method and apparatus for measuring optical overlay deviation |
| 07/21/2005 | US20050157286 Method and system for detecting sensitivity of photosensitive materials and exposure correcting method |
| 07/21/2005 | US20050157285 Lithographic apparatus |
| 07/21/2005 | US20050157284 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 07/21/2005 | US20050157283 Optical element with a self-assembled monolayer, lithographic projection apparatus including such an optical element, and device manufacturing method |
| 07/21/2005 | US20050157282 Optical element, lithographic apparatus comprising such optical element and device manufacturing method |
| 07/21/2005 | US20050157281 Off-axis levelling in lithographic projection apparatus |
| 07/21/2005 | US20050157280 Lithographic projection method and apparatus |
| 07/21/2005 | US20050157279 Light source unit, exposure apparatus, and device manufacturing method |
| 07/21/2005 | US20050157278 Exposure apparatus and exposure method |
| 07/21/2005 | US20050157161 Multibeam exposure device |
| 07/21/2005 | US20050156552 Driving apparatus, exposure apparatus, and device manufacturing method |
| 07/21/2005 | US20050156357 Planarization method of patterning a substrate |
| 07/21/2005 | US20050156353 Method to improve the flow rate of imprinting material |
| 07/21/2005 | US20050156288 UV-activated dielectric layer |
| 07/21/2005 | US20050156265 Lithography device for semiconductor circuit pattern generation |
| 07/21/2005 | US20050156147 Two-photon polymerizable composition and process for polymerization thereof |
| 07/21/2005 | US20050155707 Polymeric mold for producing a micro scale part; photoresist layer on mold substrate of silicon, metals, or ceramic having an intermediate adhesion layer |
| 07/21/2005 | US20050155624 deflect dust eroded from discharge electrodes by hot plasma by use of a solenoid surrounding the optics |
| 07/21/2005 | US20050155550 Coating film forming apparatus and coating unit |
| 07/21/2005 | US20050155388 Substantially dry, silica-containing soot, fused silica and optical fiber soot preforms, apparatus, methods and burners for manufacturing same |
| 07/21/2005 | DE3926666C5 Lichtempfindliche Zusammensetzung The light-sensitive composition |
| 07/21/2005 | DE10360414A1 EUV-Projektionsobjektiv sowie Verfahren zu dessen Herstellung EUV projection lens, and methods for its preparation |
| 07/21/2005 | DE10359667A1 Transportvorrichtung für Druckplatten Transport device for printing plates |
| 07/21/2005 | DE10359273A1 Justiervorrichtung Adjusting |
| 07/21/2005 | DE10359102A1 Optical component comprises a material with a longitudinal expansion coefficient which is spatially dependent |
| 07/21/2005 | DE10358081A1 α-(1'-Hydroxyalkyl)acrylate enthaltende Beschichtungsmassen α- (1'-hydroxyalkyl) acrylates containing coating compositions |
| 07/21/2005 | DE10352040A1 In Lage, Form und/oder den optischen Eigenschaften veränderbare Blenden-und/oder Filteranordnung für optische Geräte, insbesondere Mikroskope In position, shape and / or the optical properties changeable aperture and / or filter arrangement for optical devices, particularly microscopes |
| 07/21/2005 | DE10307453B4 Oxazol-Derivate enthaltende strahlungsempfindliche Zusammensetzungen und darauf basierende bebilderbare Elemente Oxazole derivatives containing radiation-sensitive compositions and imageable elements based thereon |
| 07/21/2005 | DE10233849B4 Polymerisierbare Zusammensetzung, Polymer, Resist und Lithographieverfahren The polymerizable composition, polymer, resist and lithography processes |
| 07/21/2005 | DE102004059439A1 Methode zur Entfernung eines Resistmusters Method of removing a resist pattern |
| 07/21/2005 | DE102004055223A1 Stempel für die Prägelithographie Stamp for imprint lithography |
| 07/21/2005 | DE102004015580B3 Beam shaping/deflection for extreme ultraviolet radiation involves total reflection at reflection surface of molded body with surface area formed by solidifying material from viscous molten material and with extent of at least 5 by 5 mm |
| 07/21/2005 | DE10120675B4 Verfahren zur Strukturierung einer Photolackschicht A method for patterning a photoresist layer |
| 07/21/2005 | DE10053911B4 Substratbearbeitungsverfahren und eine Vorrichtung zum Bearbeiten von Substraten The substrate processing method and apparatus for processing substrates |
| 07/21/2005 | CA2550008A1 Radiation curable aqueous compositions for low extractable film packaging |