Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
03/2014
03/19/2014CN103639089A Developing agent spraying device and method
03/19/2014CN102929110B Device and method for supercritical drying of microwave excitation
03/19/2014CN102809896B Mask and photolithography method thereof
03/19/2014CN102519521B Phase displacement focal length detecting photomask, manufacture method and method for detecting focal length difference
03/19/2014CN102508409B Ultraviolet-light-assisted thermocuring nanoimprint lithography technology and material
03/19/2014CN102437064B Manufacturing method of silicon Nano-wire (SiNW)
03/19/2014CN102411266B Exposure method adopting lithography machine
03/19/2014CN102265221B Method for forming pattern, method for manufacturing semiconductor device, and material for forming coating layer of resist pattern
03/19/2014CN102245367B Method for forming structure and method for manufacturing liquid ejecting head
03/19/2014CN102171618B Lithographic focus and dose measurement using a 2-D target
03/19/2014CN102096340B Lithographic apparatus, projection assembly, combination device and active damping method
03/19/2014CN102023495B Fluid handling structure, lithographic apparatus and device manufacturing method
03/19/2014CN101981154B Base-generating agent, photosensitive resin composition, pattern-forming material comprising the photosensitive resin composition, pattern formation method using the photosensitive resin composition, and article
03/19/2014CN101905209B Priming processing method and priming processing device
03/19/2014CN101727024B High dose implantation strip (hdis) in h2 base chemistry
03/19/2014CN101681110B Positive photosensitive resin composition and method of forming cured film therefrom
03/19/2014CN101573661B Pigment-dispersed composition, curable composition, color filter and production method thereof
03/18/2014US8675276 Catadioptric imaging system for broad band microscopy
03/18/2014US8675178 Microlithographic projection exposure apparatus
03/18/2014US8675177 Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger in first and second pairs of areas
03/18/2014US8675175 Lithographic apparatus and device manufacturing method
03/18/2014US8675173 Lithographic apparatus and device manufacturing method
03/18/2014US8674317 Sample surface inspection apparatus and method
03/18/2014US8673546 Process for forming a hydrophilic coating and hydrophilic coating, and process for forming an ink jet recording head and ink jet recording head
03/18/2014US8673545 Method for manufacturing liquid crystal display device
03/18/2014US8673544 Method of forming openings
03/18/2014US8673543 Method for manufacturing semiconductor device
03/18/2014US8673542 Method and system for charged particle beam lithography
03/18/2014US8673541 Block copolymer assembly methods and patterns formed thereby
03/18/2014US8673540 Photosensitive polymides
03/18/2014US8673539 Photosensitive adhesive composition, and obtained using the same, adhesive film, adhesive sheet, semiconductor wafer with adhesive layer, semiconductor device and electronic part
03/18/2014US8673538 Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the composition
03/18/2014US8673537 Photo-curable resin composition, pattern forming method and substrate protecting film, and film-shaped adhesive and adhesive sheet using said composition
03/18/2014US8673536 Photosensitive polymeric networks
03/18/2014US8672563 Development method, method of manufacturing photomask, method of manufacturing semiconductor device and development device
03/13/2014WO2014039321A1 Positive-working lithographic printing plate precursors and use
03/13/2014WO2014038795A1 Light-exposure device and substrate treatment device using same
03/13/2014WO2014038680A1 Composition for forming resist underlayer film and pattern forming method
03/13/2014WO2014038579A1 Fluorine-containing compound, substrate for pattern formation, photodegradable coupling agent, pattern formation method, and compound
03/13/2014WO2014038576A1 Photosensitive resin composition for photo spacer, and photo spacer
03/13/2014WO2014038483A1 Composition for forming resist upper layer film for lithography and method for manufacturing semiconductor device using same
03/13/2014WO2014038454A1 Pattern forming method, structures, interdigitated electrode manufacturing method, and rechargeable battery
03/13/2014WO2014037449A1 Blocking element for protecting optical elements in projection exposure apparatuses
03/13/2014WO2014037302A1 Exposure apparatus
03/13/2014WO2014037044A1 Structure stamp, device and method for embossing
03/13/2014WO2014036747A1 Oven and adjustable baking system
03/13/2014US20140074428 Method for measuring and calibrating centroid of coarse stage of photolithography tool
03/13/2014US20140072916 Hybrid photoresist composition and pattern forming method using thereof
03/13/2014US20140072915 Photoresist composition containing a protected hydroxyl group for negative development and pattern forming method using thereof
03/13/2014US20140072914 Methods for manufacturing resin structure and micro-structure
03/13/2014US20140072913 Method of Controlling Surface Roughness of a Flexographic Printing Plate
03/13/2014US20140072905 Positive resist composition, and resist film, resist-coated mask blank, resist pattern forming method and photomask each using the composition
03/13/2014US20140072904 Photomask, photomask set, exposure apparatus and exposure method
03/13/2014US20140072632 Methods for fabricating isolated micro- or nano-structures using soft or imprint lithography
03/13/2014US20140071423 Substrate processing apparatus and substrate processing system
03/13/2014US20140071422 Dual wafer stage switching system for a lithography machine
03/13/2014US20140071421 Lithographic apparatus, programmable patterning device and lithographic method
03/13/2014US20140071420 Lithographic apparatus and device manufacturing method
03/13/2014US20140071419 Fly's eye optical mirror with a plurality of optical elements rotationally aligned along two axes
03/13/2014US20140071418 Imaging optical unit
03/13/2014US20140071417 Liquid optically clear adhesive lamination process control
03/13/2014US20140071416 Method and system to predict lithography focus error using simulated or measured topography
03/13/2014US20140071414 Microlithography projection system with an accessible diaphragm or aperture stop
03/13/2014US20140071413 Pattern formation method, pattern formation apparatus, and recording medium recorded with alignment program
03/13/2014US20140071412 Immersion lithography apparatus and method having movable liquid diverter between immersion liquid confinement member and substrate
03/13/2014US20140071411 Developing treatment apparatus and developing treatment method
03/13/2014US20140069702 Novel photosensitive resin composition and use thereof
03/13/2014US20140069458 Processes and compositions for removing substances from substrates
03/13/2014DE112006002971B4 Verfahren zur Herstellung einer integrierten Schaltung A method of fabricating an integrated circuit
03/13/2014DE102013203751A1 Lighting system for microlithographic projection exposure system, has optical element directing light beam on another optical element such that main beam extends from non-zero angle to optical axis of illumination system
03/13/2014DE102013201082A1 Arrangement for actuation of optical element e.g. mirror in microlithography projection exposure system, has actuators that are arranged in natural vibration mode of the optical element
03/13/2014DE102013111801A1 Cooling system for e.g. collector mirrors, of EUV projection exposure system for lithographic manufacturing of semiconductor component, has cooling passage receiving heat from system components and discharging received heat
03/13/2014DE102010029049B4 Beleuchtungsoptik für ein Metrologiesystem für die Untersuchung eines Objekts mit EUV-Beleuchtungslicht sowie Metrologiesystem mit einer derartigen Beleuchtungsoptik Illumination optics for a metrology system for scanning an object with EUV illumination light and metrology system with an illumination optics
03/13/2014DE102008046699B4 Abbildende Optik The imaging optics
03/13/2014DE102007020033B4 Verfahren zur Qualitätsbestimmung einer Lichtquelle Method for determining the quality of a light source
03/12/2014EP2706411A1 Centre of mass calibration method for coarse stage of lithography equipment
03/12/2014EP2705526A2 Euv lithography flare calculation and compensation
03/12/2014EP2705408A2 Method for offset imaging
03/12/2014CN203482506U Foldable PCB film
03/12/2014CN203480210U Novel LED ultraviolet exposure machine light source system
03/12/2014CN203480209U Photomask clamping device
03/12/2014CN203480208U Fully-automatic exposure developing printer
03/12/2014CN203480207U Spiral airflow dynamic gas lock for extreme ultraviolet lithography machine
03/12/2014CN203480206U Sealing apparatus for developing solution storing bottle
03/12/2014CN103635974A Method for producing a reflective optical element for EUV lithography
03/12/2014CN103635859A Imaging optical unit
03/12/2014CN103635858A Resist underlayer film-forming composition which contains alicyclic skeleton-containing carbazole resin
03/12/2014CN103635541A Dye dispersion, photosensitive resin composition for color filter, color filter, liquid crystal display device, and organoluminescent display device
03/12/2014CN103633005A Large-area special-shaped wafer glue coating uniformity control device
03/12/2014CN103631103A Composition for removing photo-resist
03/12/2014CN103631102A Rinsing agent for lithography, method for forming a resist pattern, and method for producing a semiconductor device
03/12/2014CN103631101A Photoresist stripping agent containing fluorine-containing surfactant
03/12/2014CN103631100A Wafer development apparatus and method
03/12/2014CN103631099A Environmental-friendly plate processor applied to water washing type printing plate materials
03/12/2014CN103631098A Photo-etching machine and non-contact type leveling and focusing system and method thereof
03/12/2014CN103631097A Photolithographic 3-dimensional printer
03/12/2014CN103631096A Source mask polarization optimization method based on Abbe vector imaging model
03/12/2014CN103631095A Dynamic electronic mask plate system used for preparing monolithic integration capacitive touch screen through collage method
03/12/2014CN103631094A Method of forming tight-pitched pattern
03/12/2014CN103631093A Photoresist film and manufacturing method for organic light emitting display device using the same
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