| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/28/2005 | US20050162236 Lange coupler system and method |
| 07/28/2005 | US20050161870 Air-spring vibration isolation device |
| 07/28/2005 | US20050161843 Color precursors for imaging encapsulated; force premix organic hydrophobic liquid core, aqueous phase, stabilizer through a high pressure differetial; stabilizer is silica sol, pectin; encapsulating material is polyurethane, polyamide; photocurable does not use conventional photographic wet processing |
| 07/28/2005 | US20050161666 Photosensitive semiconductor nanocrystals, photosensitive composition comprising semiconductor nanocrystals and method for forming semiconductor nanocrystal pattern using the same |
| 07/28/2005 | US20050161645 Photosensitive material and process of making same |
| 07/28/2005 | US20050161644 carrier medium and at least one additive such as alkyl polyglycoside, alkyl alcohol, or various ethylene oxide adducts; use at an operating wavelength ranging from 140 nm to 248 nm, and a refractive index greater than water at an operating wavelength |
| 07/28/2005 | US20050161620 Charged beam exposure apparatus having blanking aperture and basic figure aperture |
| 07/28/2005 | US20050161615 Position detecting method, surface shape estimating method, and exposure apparatus and device manufacturing method using the same |
| 07/28/2005 | US20050161426 Image-recording apparatus and image-recording process |
| 07/28/2005 | US20050160934 method of imprint lithography that comprises:depositing an imprinting material on a substrate;varying release properties associated with an imprint template by contacting a solution including imprinting materials and a polymeric fluorinated surfactant; |
| 07/28/2005 | DE4207264B4 Negativ arbeitendes strahlungsempfindliches Gemisch und damit hergestelltes Aufzeichnungsmaterial Negative-working radiation-sensitive mixture and thus produced recording material |
| 07/28/2005 | DE112004000021T5 Positiv-Photoresist-Zusammensetzung vom chemisch verstärkten Typ und Methode zur Bildung eines Resistmusters The positive photoresist composition chemically amplified type and method of forming a resist pattern |
| 07/28/2005 | DE10359576A1 Verfahren zur Herstellung einer optischen Einheit A process for producing an optical unit |
| 07/28/2005 | DE10359464A1 Verfahren und Vorrichtung zum Erzeugen von insbesondere EUV-Strahlung und/oder weicher Röntgenstrahlung Method and apparatus for generating in particular EUV radiation and / or soft X-rays |
| 07/28/2005 | DE102004062228A1 Wafer exposing method for use during semiconductor device fabrication, involves transferring image onto shot areas by irradiating projection light, and scanning die area of wafer by irradiating scanning light |
| 07/28/2005 | DE102004060721A1 Optical material selection method, e.g. for selecting calcium fluoride crystal for use in microlithography systems, whereby a sample is irradiated with energetic radiation and its transmission properties measured before and after |
| 07/28/2005 | DE102004057180A1 Photomask for patterning integrated circuit device, has substrate including array of shadowing units via which patterning radiation is passed, where transmittance of radiation is greater than approximately twenty percentage |
| 07/28/2005 | DE102004037009A1 Verfahren zum Herstellen einer Flüssigkristalldisplay-Vorrichtung A method of manufacturing a liquid crystal display device |
| 07/28/2005 | DE10132988B4 Projektionsbelichtungsanlage Projection exposure apparatus |
| 07/28/2005 | DE10044199B9 Ablenkanordnung und Projektionssystem für geladene Teilchen Deflection device and projection system for charged particles |
| 07/28/2005 | CA2551875A1 Photoresist compositions and processes of use |
| 07/27/2005 | EP1557869A1 Exposure transfer mask and exposure transfer mask pattern exchange method |
| 07/27/2005 | EP1557844A2 Use of a top layer on a mirror for use in a lithographic apparatus, mirror for use in a lithographic apparatus, lithographic apparatus comprising such a mirror and device manufacturing method |
| 07/27/2005 | EP1557723A2 Alignment stage apparatus |
| 07/27/2005 | EP1557722A1 Optical element, lithographic apparatus comprising such optical element and device manufacturing method |
| 07/27/2005 | EP1557721A2 Immersion lithography fluids |
| 07/27/2005 | EP1557720A1 Positive resist composition and pattern formation method using the same |
| 07/27/2005 | EP1557719A2 Chemically amplified resist and pattern formation method |
| 07/27/2005 | EP1557718A1 Radiation-sensitive resin composition |
| 07/27/2005 | EP1557717A1 Sensors comprising barriers of photoresist material |
| 07/27/2005 | EP1557585A1 Air-spring vibration isolation device |
| 07/27/2005 | EP1557484A2 Aluminium sheet embossing roll |
| 07/27/2005 | EP1557438A1 Capsule type hardener and composition |
| 07/27/2005 | EP1557413A1 Novel aromatic sulfonium salt compound, photo-acid generator comprising the same and photopolymerizable composition containing the same, resin composition for optical three-dimensional shaping, and method of optically forming three-dimensional shape |
| 07/27/2005 | EP1556896A2 Anti-reflective compositions comprising triazine compounds |
| 07/27/2005 | EP1556881A2 Electron beam exposure system |
| 07/27/2005 | EP1556740A2 Ionic photoacid generators with segmented hydrocarbon-fluorocarbon sulfonate anions |
| 07/27/2005 | EP1556739A2 Lithographic method for forming mold inserts and molds |
| 07/27/2005 | EP1556738A2 Self-aligning contacts for stacked electronics |
| 07/27/2005 | EP1556737A2 Nanometer-scale engineered structures, methods and apparatus for fabrication thereof, and applications to mask repair, enhancement, and fabrication |
| 07/27/2005 | EP1556365A1 Improvement in the storage stability of photoinitiators |
| 07/27/2005 | EP1292859B1 Data storage medium comprising colloidal metal and preparation process thereof |
| 07/27/2005 | EP1175811B1 Disposable modular hearing aid |
| 07/27/2005 | EP0741914B1 Packaged strain actuator |
| 07/27/2005 | CN2713515Y Dim light phase shift light cover having double embedded layers |
| 07/27/2005 | CN2713514Y 透明喷墨打印胶片 Transparent inkjet printing film |
| 07/27/2005 | CN1647257A Method for removing photoresist and etch residues |
| 07/27/2005 | CN1647249A Exposure apparatus and device fabrication method using the same |
| 07/27/2005 | CN1647181A Stamper original and its manufacturing method, stamper and its manufacturing method, and optical disk |
| 07/27/2005 | CN1646993A Method, device and computer program product for lithography |
| 07/27/2005 | CN1646992A Method of forming optical images |
| 07/27/2005 | CN1646991A Positively photosensitive resin composition and method of pattern formation |
| 07/27/2005 | CN1646990A Method of treatment of porous dielectric films to reduce damage during cleaning |
| 07/27/2005 | CN1646989A Antireflective sio-containing compositions for hardmask layer |
| 07/27/2005 | CN1646968A Light modulating engine |
| 07/27/2005 | CN1646884A A mask blank and a method for producing the same |
| 07/27/2005 | CN1646732A Washing liquid |
| 07/27/2005 | CN1646628A Novolak resin mixtures and photosensitive compositions comprising the same |
| 07/27/2005 | CN1646600A Novel polyether compound containing acid group and unsaturated group, process for producing the same, and resin composition |
| 07/27/2005 | CN1646593A Actinic radiation hardenable resin composition and hardening product thereof |
| 07/27/2005 | CN1646592A Unsaturated polybranched compounds, curable compositions containing the same and cured articles thereof |
| 07/27/2005 | CN1646440A Synthetic quartz glass for optical member, projection exposure device, and projection exposure method |
| 07/27/2005 | CN1645592A Semiconductor device and forming method for interconnecting structure and copper wiring processing method |
| 07/27/2005 | CN1645571A Composition for cleaning semiconductor device |
| 07/27/2005 | CN1645566A Method for producing a hard mask in a capacitor device and a hard mask for use in a capacitor device |
| 07/27/2005 | CN1645548A Charged particle beam device, its control method, substrate inspecting method and manufacture of semiconductor device |
| 07/27/2005 | CN1645259A Photoresist residue remover composition and manufacture of semiconductor circuit components |
| 07/27/2005 | CN1645258A Photoetching imaging polarized controller with high value aperture |
| 07/27/2005 | CN1645257A Pattern drawing apparatus, method of manufacturing a master disk for manufacturing information recording media, and method of manufacturing an information recording medium |
| 07/27/2005 | CN1645256A Exposure process |
| 07/27/2005 | CN1645255A Optimized calibration of thermal deformation of a wafer in a lithographic process |
| 07/27/2005 | CN1645254A Chemical amplification type positive resist composition |
| 07/27/2005 | CN1645253A Photosensitive resin composition, photosensitive element using the same, method for producing resist pattern and method for producing printed wiring board |
| 07/27/2005 | CN1645252A Polymers and photoresist compositions comprising same |
| 07/27/2005 | CN1645231A Thin-membrane transistor with microlens structure, forming method and liquid crystal displaying panel thereof |
| 07/27/2005 | CN1645226A Manufacture of thin-membrane transistor of liquid crystal displaying device |
| 07/27/2005 | CN1645224A Manufacture of pixel electrode contacting point of thin-membrane transistor liquid crystal displaying device |
| 07/27/2005 | CN1645220A Radiation sensitive resin composition for forming partition, its forming method and liquid crystal display device |
| 07/27/2005 | CN1645170A Blue colored composition for color filter and color filter |
| 07/27/2005 | CN1644345A Ultraviolet radiation apparatus |
| 07/27/2005 | CN1212658C Monitoring system and method for monitoring process condition change by electron beam |
| 07/27/2005 | CN1212645C Pattern formation method |
| 07/27/2005 | CN1212644C Mask pattern forming method, computer programme product, and optical mask production |
| 07/27/2005 | CN1212549C Making method of micro text and pattern mold |
| 07/27/2005 | CN1212548C Method of forming isolated line using multiple exposure |
| 07/27/2005 | CN1212547C Antireflection or light-absorbing coating composition and polymer thereof |
| 07/27/2005 | CN1212546C Conformal photosensitive composition and lithographic printing plate made by it |
| 07/27/2005 | CN1212545C Photosensitive insulated glue composition and photosensitive film of the glue |
| 07/27/2005 | CN1212544C 感光性树脂组合物 The photosensitive resin composition |
| 07/27/2005 | CN1212543C Method for fixing biological macro molecule pattern on polymer surface by micro transfer technology |
| 07/26/2005 | US6922458 X-ray exposure method |
| 07/26/2005 | US6922428 Gas laser apparatus for lithography |
| 07/26/2005 | US6922291 Catoptric projection optical system and exposure apparatus |
| 07/26/2005 | US6922230 DUV scanner linewidth control by mask error factor compensation |
| 07/26/2005 | US6921916 Overlay marks, methods of overlay mark design and methods of overlay measurements |
| 07/26/2005 | US6921630 Silica superposed on a titanium/copper/titanium substrate |
| 07/26/2005 | US6921628 Exposure device and method of fabricating liquid crystal display panel using the same |
| 07/26/2005 | US6921626 Processing inorganic nanoparticles and a carrier to form an electroconductive pattern area that adheres to the surface of a substrate |
| 07/26/2005 | US6921623 Active components and photosensitive resin composition containing the same |
| 07/26/2005 | US6921622 Photoresist monomers, polymers thereof and photoresist compositions containing the same |