| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 08/02/2005 | US6924494 Method of exposing a target to a charged particle beam |
| 08/02/2005 | US6924492 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 08/02/2005 | US6924474 Light leakage detecting device of an optical transmission system using fiber optic cable |
| 08/02/2005 | US6924323 Sulfonium salt compound |
| 08/02/2005 | US6924230 Method for forming a conductive layer |
| 08/02/2005 | US6924090 Method of recording identifier and set of photomasks |
| 08/02/2005 | US6924088 Method and system for realtime CD microloading control |
| 08/02/2005 | US6924087 Performing a series of selective radiation and development steps to form a plurality of microneedles at least partially formed from a radiation sensitive polymer by photolithography; drug delivery; sharpness; impact strength; |
| 08/02/2005 | US6924086 Developing photoresist with supercritical fluid and developer |
| 08/02/2005 | US6924085 Photoresist coatings for copper clad stainless steel printing plates |
| 08/02/2005 | US6924084 Electron exposure to reduce line edge roughness |
| 08/02/2005 | US6924083 Mask layout and exposing method for reducing diffraction effects by using a single mask in the process of semiconductor production |
| 08/02/2005 | US6924081 A photoresist on the surface of a substrate exposed only by light polarized parallel with the substrate; immersion in a high index transparent fluid for exposing finer features than a transparent material having an index of refraction of one |
| 08/02/2005 | US6924079 Resist resin, chemical amplification type resist, and method of forming of pattern with the same |
| 08/02/2005 | US6924078 Multi-oxygen-containing compound which with polymerizable carbon-carbon double bond and ethyleneoxy moiety |
| 08/02/2005 | US6924072 A photoresist film formed on a peripheral area of a wafer is exposed by radiating a light toward the peripheral area of the wafer and moving the wafer while inspecting for a uniformly radiated predetermined width of the edge |
| 08/02/2005 | US6924071 Moving a selected feature located in a cell between a first boundary and a second boundary from a first pattern file to a second pattern file and exposing a resist layer of a photomask blank with the first pattern file by using step/repeat; |
| 08/02/2005 | US6924068 Photomask fabrication method, photomask, and exposure method thereof |
| 08/02/2005 | US6924023 Method of manufacturing a structure having pores |
| 08/02/2005 | US6923930 Metal mold with a monomolecular nonstick layer; fluoroalkyl compound with at least one mercapto group |
| 08/02/2005 | US6923920 Method and compositions for hardening photoresist in etching processes |
| 08/02/2005 | US6922910 Exposure apparatus |
| 08/02/2005 | US6922906 Apparatus to orientate a body with respect to a surface |
| 07/28/2005 | WO2005069355A1 Exposure apparatus and device producing method |
| 07/28/2005 | WO2005069082A1 Differential critical dimension and overlay metrology apparatus and measurement method |
| 07/28/2005 | WO2005069081A2 Polarization-modulating optical element |
| 07/28/2005 | WO2005069080A2 Device and method for the optical measurement of an optical system, measurement structure support, and microlithographic projection exposure apparatus |
| 07/28/2005 | WO2005069079A1 Device and method for wave front measuring of an optical reproduction system and microlithographic projection illumination system |
| 07/28/2005 | WO2005069078A1 Microlithographic projection exposure apparatus with immersion projection lens |
| 07/28/2005 | WO2005069077A2 Method and system of coating polymer solution on surface of a substrate |
| 07/28/2005 | WO2005069076A1 Upper layer film forming composition for liquid immersion and method of forming photoresist pattern |
| 07/28/2005 | WO2005069075A1 Photosensitive polymer composition, process for producing pattern, and electronic part |
| 07/28/2005 | WO2005069055A2 Catadioptric projection objective |
| 07/28/2005 | WO2005069050A1 Imprinting method for making photonic structures |
| 07/28/2005 | WO2005068535A1 Resin and resin composition |
| 07/28/2005 | WO2005068199A1 Device and method for double printing in an accurately fitting manner |
| 07/28/2005 | WO2005067815A1 Stage alignment in lithography tools |
| 07/28/2005 | WO2005067634A2 Advanced multi-pressure worpiece processing |
| 07/28/2005 | WO2005067567A2 Photoresist compositions and processess of use |
| 07/28/2005 | WO2005067514A2 Method and system for reconstructing aberrated image profiles through simulation |
| 07/28/2005 | WO2005050316A3 Method involving a mask or a reticle |
| 07/28/2005 | WO2005037446A3 Applying imprinting material to substrates employing electromagnetic fields |
| 07/28/2005 | WO2005017620A3 Illumination device and polariser for a microlithographic projection exposure installation |
| 07/28/2005 | WO2005015962A3 Plasma radiation source and device for creating a gas curtain for plasma radiation sources |
| 07/28/2005 | WO2005015310A3 Illumination system for a microlithographic projection exposure apparatus |
| 07/28/2005 | WO2005013194A3 Reduction smith-talbot interferometer prism for micropatterning |
| 07/28/2005 | WO2005001432A3 Optical fluids, and systems and methods of making and using the same |
| 07/28/2005 | WO2004099878A3 Method for preventing contamination and lithographic device |
| 07/28/2005 | WO2004097527A3 Maskless lithographic system |
| 07/28/2005 | WO2004095065A3 Lithium salt of polyacetylene as radiation sensitive filaments and preparation and use thereof |
| 07/28/2005 | WO2004034435A3 Bottom anti-reflective coatings derived from small core molecules with multiple epoxy moieties |
| 07/28/2005 | US20050166174 System and method for lithography simulation |
| 07/28/2005 | US20050166173 Design data format and hierarchy management for processing |
| 07/28/2005 | US20050166172 Critical pattern extracting method, critical pattern extracting program, and method of manufacturing semiconductor device |
| 07/28/2005 | US20050166118 Cyclic error compensation in interferometry systems |
| 07/28/2005 | US20050166112 Method and system for efficiently verifying optical proximity correction |
| 07/28/2005 | US20050165152 applying a repelling barrier selectively to a substrate; applying a radiant energy sensitive material to the substrate in spaces formed by the repelling barrier composition; and removing the repelling barrier composition to form a pattern on the substrate |
| 07/28/2005 | US20050165141 Thermally stable cationic photocurable compositions |
| 07/28/2005 | US20050165127 Epoxide; aromatic or cycloaliphatic acrylate; reactive hydroxyl-containing material; cationic photoinitiator; and free radical photoinitiator; stereolithography |
| 07/28/2005 | US20050165126 Thioxanthone derivatives, and their use as cationic photoinitiators |
| 07/28/2005 | US20050164522 Optical fluids, and systems and methods of making and using the same |
| 07/28/2005 | US20050164520 Method for manufacturing semiconductor device |
| 07/28/2005 | US20050164507 Negative photoresist composition including non-crosslinking chemistry |
| 07/28/2005 | US20050164502 Immersion liquids for immersion lithography |
| 07/28/2005 | US20050164501 Process for making photonic crystal circuits using an electron beam and ultraviolet lithography combination |
| 07/28/2005 | US20050164494 Method for forming semiconductor device |
| 07/28/2005 | US20050164270 Methods and system for providing a polymorphism database |
| 07/28/2005 | US20050164249 Solid support comprising a plurality of immobilized, positionally distinguishable, multi-subunit sequence specific reagents for use in characterization and classification of biological samples; immunoaffinity chromatography |
| 07/28/2005 | US20050164134 Method and apparatus for a two-step resist soft bake to prevent ILD outgassing during semiconductor processing |
| 07/28/2005 | US20050164133 Forming submicron lithographic features using currently available resist materials and radiation sources; simple, efficient, high fidelity |
| 07/28/2005 | US20050164132 Nanostructures and methods of making the same |
| 07/28/2005 | US20050164129 Photomask and manufacturing method of semiconductor device |
| 07/28/2005 | US20050164128 Mask for manufacturing semiconductor device and method of manufacture thereof |
| 07/28/2005 | US20050164126 Silazane compound and methods for using the same |
| 07/28/2005 | US20050164125 Photoimageable composition |
| 07/28/2005 | US20050164124 For laser scanning exposure; irradiation polymerizaion with high pressure mercury lamp |
| 07/28/2005 | US20050164123 An acid generator, a solubilizing resin; high precision patterns by using a vacuum ultraviolet ray with a wavelength less than 160 nm; ultramicrolithography |
| 07/28/2005 | US20050164122 Producing defect free semiconductor devices; utilizing lower gas permeability, water soluble polymer |
| 07/28/2005 | US20050164120 High photosensitivity, visible laser recording materials; comprised of novel squarylium compound metal complexes, free radical generators and monomers |
| 07/28/2005 | US20050164119 Monomer of acrylic ester or methacrylic ester as the polymer resin in a chemical-amplification-type resist |
| 07/28/2005 | US20050164118 Method of joining a workpiece and a microstructure light exposure |
| 07/28/2005 | US20050164116 a polymeric microcapsule suspended in an aqueous media, which contains a stabilizer of an anionic polymeric mixture containing a first sulfonated polystyrene polymer and a second sulfonated polystyrene polymer in a specific ratio |
| 07/28/2005 | US20050164102 image receiving layer of a receiver element for laser-induced thermal transfer imaging made from a caprolactone polymer and a cellulose ester; useful in proofing and color filter applications. |
| 07/28/2005 | US20050164098 Pattern dimension accuracy; aligning mask or reticle with reference system and determining offset angle; rotating and processing in horizontal or vertical direction |
| 07/28/2005 | US20050164096 Simple, low cost; utilizing test pattern within step distance of patterned layer |
| 07/28/2005 | US20050163517 Method and device for measuring surface potential distribution, method and device for measuring insulation resistance, electrostatic latent image measurement device, and charging device |
| 07/28/2005 | US20050163502 Drying device and drying method |
| 07/28/2005 | US20050162881 Nanometer-scale memory device utilizing self-aligned rectifying elements and method of making |
| 07/28/2005 | US20050162802 Offset gap control for electromagnetic devices |
| 07/28/2005 | US20050162664 Compensation for errors in off-axis interferometric measurements |
| 07/28/2005 | US20050162636 System to increase throughput in a dual substrate stage double exposure lithography system |
| 07/28/2005 | US20050162634 Cable tray assembly for precision drive stage |
| 07/28/2005 | US20050162633 Exposure apparatus |
| 07/28/2005 | US20050162630 Interferometer system for measuring a height of wafer stage |
| 07/28/2005 | US20050162629 Lithographic apparatus and device manufacturing method |
| 07/28/2005 | US20050162628 Scanning exposure apparatus and device manufacturing method |
| 07/28/2005 | US20050162627 Enhanced lithographic resolution through double exposure |
| 07/28/2005 | US20050162626 Lithographic alignment system |
| 07/28/2005 | US20050162625 Exposure apparatus and purging method for the same |
| 07/28/2005 | US20050162401 Position encoded sensing device with amplified light reflection intensity and a method of manufacturing the same |