Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
08/2005
08/04/2005US20050168820 Achromatic fresnel optics for ultraviolet and x-ray radiation
08/04/2005US20050168791 System and method for calibrating a spatial light modulator array using shearing interferometry
08/04/2005US20050168790 System and method for calibrating a spatial light modulator
08/04/2005US20050168789 Light modulating engine
08/04/2005US20050168758 Structure inspection method, pattern formation method, process condition determination method and resist pattern evaluation apparatus
08/04/2005US20050168754 Cyclic error reduction in average interferometric position measurements
08/04/2005US20050168753 Optical measurement of device features using interferometric illumination
08/04/2005US20050168750 Measurement system for determining the thickness of a layer during a plating process
08/04/2005US20050168740 Method of evaluating reticle pattern overlay registration
08/04/2005US20050168718 Apparatus for kinematic registration of a reticle
08/04/2005US20050168717 Apparatus for characterization of photoresist resolution, and method of use
08/04/2005US20050168716 Method of patterning process metrology based on the intrinsic focus offset
08/04/2005US20050168714 Lithographic apparatus, measurement system, and device manufacturing method
08/04/2005US20050168713 Immersion photolithography system and method using microchannel nozzles
08/04/2005US20050168712 Exposure apparatus and device manufacturing method
08/04/2005US20050168672 Liquid crystal display and method for fabricating the same
08/04/2005US20050168498 Source optimization for image fidelity and throughput
08/04/2005US20050168438 Capacitive sensing and data input device power management
08/04/2005US20050168086 Magnetic floating device
08/04/2005US20050168076 Wafer stage operable in a vacuum environment
08/04/2005US20050167894 Patterned structure reproduction using nonsticking mold
08/04/2005US20050167852 Method of manufacturing a structure having a projection
08/04/2005US20050167847 Method for transferring a pattern
08/04/2005US20050167692 Semiconductor substrate, method of manufacturing the semiconductor substrate, semiconductor device and pattern forming method
08/04/2005US20050167661 Lithography evaluating method, semiconductor device manufacturing method and program medium
08/04/2005US20050167618 Light source device and exposure equipment using the same
08/04/2005US20050167514 Adaptive real time control of a reticle/mask system
08/04/2005US20050167395 Mask, method of fabricating the same, and method of fabricating organic electro-luminescence device using the same
08/04/2005US20050167312 Composite substrate carrier
08/04/2005US20050167284 immersing printed circuits, substrates, metal maskings, semiconductor wafers or magnetic heads having patterned conductive layers, in neutral solutions, then applying a voltage to induce current between the conductive layer and a counter electrode at a specified current density, rinsing and drying
08/04/2005US20050167272 includes providing substrates, then forming patterned layers on the substrates, and electroforming to form stamps having predetermined shapes without cutting
08/04/2005US20050166845 Method of heating a substrate in a variable temperature process using a fixed temperature chuck
08/04/2005US20050166779 Method for producing flexo printing forms by means of laser direct engraving
08/04/2005DE3931525B4 Lichtempfindliche Zusammensetzung The light-sensitive composition
08/04/2005DE10338556A1 Verfahren sowie Anordnung zur Herstellung eines Hologramms A method and arrangement for producing a hologram
08/04/2005DE102004063529A1 Transflektiv-Flüssigkristallanzeigevorrichtung und Herstellungsverfahren derselben Transflective liquid crystal display device and production method thereof
08/04/2005DE102004059778A1 Refractive projection objective for production of semiconductor elements by immersion microlithography, comprises five lens groups and a system screen, forming a single-waist system of light beam diameters
08/04/2005CA2552905A1 Photosensitive resin composition and cured product thereof
08/03/2005EP1560268A2 Nanometer-scale memory device with self-aligned rectifying elements and manufacture thereof using nano-imprint lithography
08/03/2005EP1560073A2 Method of predicting and minimizing model opc deviation due to mix/match of exposure tools using a calibrated eigen decomposition model
08/03/2005EP1560072A2 Computer aided modeling, reliability checking and verification of a lithography process using a calibrated eigen decomposition model
08/03/2005EP1560071A1 Electron beam exposure method and electron beam exposure system
08/03/2005EP1560070A1 Composition for forming antireflection film for lithography
08/03/2005EP1560069A1 Photosensitive composition for interlayer dielectric and method of forming patterned interlayer dielectric
08/03/2005EP1560068A1 Negative type photosensitive resin composition
08/03/2005EP1559678A2 Nanostructures and methods of making the same
08/03/2005EP1559130A2 Polymer microneedles
08/03/2005EP1558977A2 Probability constrained optimization for electrical fabrication control
08/03/2005EP1558654A2 Novel copolymer, photoresist compositions thereof and deep uv bilayer system thereof
08/03/2005EP1131677B1 Photoresists, polymers and processes for microlithography
08/03/2005EP1038196B1 Amplitude mask, and apparatus and method for manufacturing long period grating filter using the same
08/03/2005CN2715199Y Etching system and pure water supplement apparatus therefor
08/03/2005CN1650401A Exposure method, exposure apparatus, and method for manufacturing device
08/03/2005CN1650318A Metrology diffraction signal adaptation for tool-to-tool matching
08/03/2005CN1650235A Method for removing photoresist
08/03/2005CN1650234A Lighting system, particularly for use in extreme ultraviolet (EUV) lithography
08/03/2005CN1650233A On-press developable ir sensitive printing plates using binder resins having polyethylene oxide segments
08/03/2005CN1650232A Photoresist compositions comprising acetals and ketals as solvents
08/03/2005CN1650231A Radiation curable resin composition and rapid prototyping process using the same
08/03/2005CN1650230A Photocurable compositions containing reactive particles
08/03/2005CN1649179A Ultraviolet radiator, ultraviolet radiation condition setting method and ultraviolet radiation method
08/03/2005CN1649121A Alignment stage apparatus
08/03/2005CN1649101A Manufacturing method for compound semiconductor device
08/03/2005CN1649088A Method and system for forming a semiconductor device
08/03/2005CN1649086A Structure inspection method, pattern formation method, process condition determination and method for producing semiconductor device
08/03/2005CN1649083A Crystallization apparatus and method, manufacturing method of electronic device, electronic device, and optical modulation element
08/03/2005CN1648890A High speed synchronous broadcast bus and bus platform of step scanning projection photo etching machine
08/03/2005CN1648889A Synchronous bus controller of step scanning projection photo etching machine and synchronous control system
08/03/2005CN1648777A Lithographic apparatus, device manufacturing method, and device manufactured thereby
08/03/2005CN1648776A Optical element, lithographic apparatus comprising such optical element and device manufacturing method
08/03/2005CN1648775A System and method for processing masks with oblique features
08/03/2005CN1648774A Micro image parameter feedback system and control method
08/03/2005CN1648773A Immersion lithography fluids
08/03/2005CN1648772A Photosensitive conducting composition for a plasma display panel
08/03/2005CN1648771A Chemically amplified resist and pattern formation method
08/03/2005CN1648750A Liquid crystal display device and its producing method
08/03/2005CN1648747A Method of manufacturing substrate for display and method of manufacturing display utilizing the same
08/03/2005CN1648739A Radiation sensitive composition for color filter, its preparing method and color filter and color liquid crystal display device
08/03/2005CN1648733A High light gain penetration reflective plate of liquid crystal display and its producing process
08/03/2005CN1648729A Exposure device for exposure base plate and method of exposure panel
08/03/2005CN1648154A Process for preparing water base developing photosensitive polyimide material
08/03/2005CN1213463C Method for making semiconductor with ruthenium or ruthenium deoxide
08/03/2005CN1213460C Foundation treating system and method
08/03/2005CN1213345C Method and device for phase-shifting optical cover
08/03/2005CN1213344C Hoods with exposure meter for graduated exposion plate method and determining method thereof
08/03/2005CN1213343C Iodonium salt used as potential acie provider and its use, photoresist induding it and radiosensitive composition
08/03/2005CN1212929C Method and equipment for producing a printing block
08/02/2005US6925629 Reticle fabrication method
08/02/2005US6925202 System and method of providing mask quality control
08/02/2005US6924937 Aberration correcting optical system
08/02/2005US6924896 Interferometry system error compensation in twin stage lithography tools
08/02/2005US6924891 Method and apparatus for article inspection including speckle reduction
08/02/2005US6924886 photoresists; photolithography; comprises optical microscopes
08/02/2005US6924885 Lithographic apparatus and device manufacturing method
08/02/2005US6924883 Exposure device
08/02/2005US6924882 Balanced positioning system for use in lithographic apparatus
08/02/2005US6924881 Projection exposure apparatus
08/02/2005US6924880 Large-area mask and exposure system having the same
08/02/2005US6924879 Calibrating exposure patterns; photolithography; accuracy transferring masking patterns; semiconductors, liquid crystals
08/02/2005US6924877 Chemical filter arrangement for a semiconductor manufacturing apparatus
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