Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
08/2005
08/09/2005US6928198 Exposure head
08/09/2005US6927901 Reflective projection lens for EUV-photolithography
08/09/2005US6927887 Holographic illuminator for synchrotron-based projection lithography systems
08/09/2005US6927854 Projection exposure device and position alignment device and position alignment method
08/09/2005US6927842 wafers are transported within a lithography system while being affixed and aligned to chucks, thereby maximizing production throughput
08/09/2005US6927840 Positioning device having dynamically isolated frame, and lithographic device provided with such a positioning device
08/09/2005US6927839 Method and apparatus for forming pattern on thin substrate or the like
08/09/2005US6927838 Multiple stage, stage assembly having independent stage bases
08/09/2005US6927836 Exposure apparatus and exposure method capable of controlling illumination distribution
08/09/2005US6927835 Adaptive thermal control of lithographic chemical processes
08/09/2005US6927505 Following stage planar motor
08/09/2005US6927495 Semiconductor device and method of manufacturing same
08/09/2005US6927405 Method for obtaining an extreme ultraviolet radiation source, radiation source and use in lithography
08/09/2005US6927403 Illumination system that suppresses debris from a light source
08/09/2005US6927345 Guard ring having electrically isolated lightening bars
08/09/2005US6927274 Resin compositions, processes for preparing the resin compositions and processes for forming resin films
08/09/2005US6927273 Process for preparing substituted polyarylene ethers
08/09/2005US6927266 Bottom anti-reflective coat forming composition for lithography
08/09/2005US6927172 Process to suppress lithography at a wafer edge
08/09/2005US6927018 Three dimensional printing using photo-activated building materials
08/09/2005US6927016 Molding optics; exposure to laser radiation
08/09/2005US6927015 Underlayer compositions for multilayer lithographic processes
08/09/2005US6927014 Printing images on light sensitive coatings using inks, then curing the coatings and washing to form masks
08/09/2005US6927013 Positive photosensitive resin compositions and semiconductor device
08/09/2005US6927012 Polyamide and/or polyimide mixtures used as pixel separators in liquid crystal or elctroluminescence displays
08/09/2005US6927011 Resins for resists and chemically amplifiable resist compositions
08/09/2005US6927010 Resist material and exposure method
08/09/2005US6927009 Positive photosensitive composition
08/09/2005US6927008 Supports having thermoplastic resins and ligtht sensitive recording multilayers, used for forming images, production of color filters used in liquid crystal displays and/or production of printed circuits
08/09/2005US6927004 Mask for use in lithography, method of making a mask, lithographic apparatus, and device manufacturing method
08/09/2005US6927002 Photomask, the manufacturing method, a patterning method, and a semiconductor device manufacturing method
08/09/2005US6926953 Guided self-assembly of block copolymer films on interferometrically nanopatterned substrates
08/09/2005US6926929 System and method for dispensing liquids
08/09/2005US6926921 for making superconductor devices such as Josephson junctions and superconductor quantum interference devices (SQUIDs) in a reliable and cost effective manner
08/09/2005US6926798 Apparatus for supercritical processing of a workpiece
08/04/2005WO2005071718A1 Optical system, exposure system, and exposure method
08/04/2005WO2005071717A1 Exposure apparatus and device producing method
08/04/2005WO2005071491A2 Exposure apparatus and measuring device for a projection lens
08/04/2005WO2005071490A1 Positive resist composition and method of forming resist pattern
08/04/2005WO2005071489A1 Photosensitive resin composition and cured product thereof
08/04/2005WO2005071488A1 Lithographic printing plate precursors with mercapto-functionalized free-radical polymerizable monomers
08/04/2005WO2005071487A1 Photosensitive film and method for manufacturing printed wiring board using same
08/04/2005WO2005071486A2 Lithographic apparatus and device manufacturing method
08/04/2005WO2005070993A2 Norbornene-type monomers and polymers containing pendent lactone or sultone groups
08/04/2005WO2005070989A2 Thermally stable cationic photocurable compositions
08/04/2005WO2005070692A1 Process for producing printing substrate capable of laser sculpture
08/04/2005WO2005070691A1 Photosensitive resin composition for printing substrate capable of laser sculpture
08/04/2005WO2005070655A1 Production process and production apparatus of three-dimensionally structured material
08/04/2005WO2005070167A2 Nanoscale electric lithography
08/04/2005WO2005043243A3 Methods and apparatuses for applying wafer-alignment marks
08/04/2005WO2005036271A3 Systems and methods for fabricating microstructures by imaging a radiation sensitive layer sandwiched between outer layers, and microstructures fabricated thereby
08/04/2005WO2005034211A3 Sacrificial surfactanated pre-wet for defect reduction in a semiconductor photolithography developing process
08/04/2005WO2005013335A3 Method of depositing patterned films of materials using a positive imaging process
08/04/2005WO2004114023A3 Method and apparatus for manufacturing polygon shaped chips
08/04/2005WO2004065934A8 Semiconductor fabrication method for making small features
08/04/2005US20050171277 inorganic-based compound, at least one absorbing compound, and at least one material modification agent; absorbing compound comprises at least one benzene ring and a reactive group selected from the group comprising hydroxyl groups, amine groups, carboxylic acid groups and substituted silyl groups
08/04/2005US20050171255 Photopolymerization mixture
08/04/2005US20050171229 Photo-crosslinkable multi-coating system having improved gas barrier properties
08/04/2005US20050171226 Radiation sensitive resin composition
08/04/2005US20050170748 Lens made of a crystalline material
08/04/2005US20050170658 Methods for preparing ball grid array substrates via use of a laser
08/04/2005US20050170657 Method of forming nanostructure
08/04/2005US20050170655 Reticle fabrication using a removable hard mask
08/04/2005US20050170654 Manufacturing method for compound semiconductor device
08/04/2005US20050170639 Forming a semiconductor device
08/04/2005US20050170340 Solid support comprising a plurality of immobilized, positionally distinguishable, multi-subunit sequence specific reagents for use in characterization and classification of biological samples; immunoaffinity chromatography
08/04/2005US20050170296 Lithographic apparatus and device manufacturing method
08/04/2005US20050170295 Method for forming micropatterns
08/04/2005US20050170294 Exposing a resist film formed on semiconductor substrate to a light using photomask in which patterns are arranged two-dimensionally at a predetermined altitude; development; reducing an opening size; setting a reflow start temperature, heating; coating with water soluble resin; crosslinking; etching
08/04/2005US20050170293 Exposure apparatus
08/04/2005US20050170292 Structure of imprint mold and method for fabricating the same
08/04/2005US20050170290 Electrodes; dielectrics; photoresist patterning; dry etching; ashing; color filters; transistors; high luminance and quality
08/04/2005US20050170289 Latent imaging; lithography; post development ultraviolet radiation treatment reduces manufacturable feature-size to be below resolution limit; magneto-resistive (MR) heads
08/04/2005US20050170288 Optical lithography; radiation transparent phase shifting masks used in manufacture of semiconductors/integrated circuits
08/04/2005US20050170287 Actinic radiation absorbing compound uniformly distributed throughout support layer, with photopolymerizable material deposited thereon, and masking layer; relief imaging
08/04/2005US20050170286 Printing plates using binder resins having polyethylene oxide segments
08/04/2005US20050170285 Polyurethane binder, photoinitiator, and acrylic acid; for use as image recording layer of negative lithographic printing plate precursor; drawing with laser light
08/04/2005US20050170284 Photosensitive conducting composition for a plasma display panel
08/04/2005US20050170283 Polymers based on cinnamic acid as a bottom antireflective coating for 157 NM photolithography
08/04/2005US20050170279 photomasks comprising polymers of 4-bicyclo{2.2.1}hept-2,3,3-trifluoro-5-en-2-yl-1,1,1-trifluoro-2-(trifluoromethyl)butan-2-ol, used for structuring substrates, in particular silicon wafers
08/04/2005US20050170278 Polymer and photoresist compositions
08/04/2005US20050170277 Fluorinated photoresists prepared, deposited, developed and removed in carbon dioxide
08/04/2005US20050170276 Improved sensitivity and pattern resolution exhibiting high exposure margin and focusing depth latitude; polyvinylphenol; acid generators
08/04/2005US20050170270 Composition for forming wiring protective film and uses thereof
08/04/2005US20050170269 Solidifying flowable film onto which concave and convex portions have been transferred, annealing film with press, then patterning of solidified film burnt by annealing
08/04/2005US20050170268 Circuit patterning substrate, providing mask, collimating incident direction of particles, irradiating
08/04/2005US20050170267 Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region
08/04/2005US20050170266 Dehydrating chemically amplified resist layer on photomask blank in nitrogen-purged environment at above room temperature; patterning; shelf life, storage stability
08/04/2005US20050170265 Mask, exposure method and production method of semiconductor device
08/04/2005US20050170264 Projects images of grating pattern and test pattern; photoresists
08/04/2005US20050170262 Exposure processing system, exposure processing method and method for manufacturing a semiconductor device
08/04/2005US20050170094 Polymerisable composition
08/04/2005US20050170093 Simplifying semiconductor substrate planarization; applying plurality of liquids of different viscosities with fewer steps
08/04/2005US20050170079 Method for manufacturing wiring substrate and method for manufacturing electronic device
08/04/2005US20050169962 Selective photopolymerization of biopolymers to create patterned structures and the patterning of cells within relatively homogenous slabs of biopolymer using dielectrophoresis; use as bioreactors, in bioassays, making artificial cartilage, or providing hepatic support
08/04/2005US20050169784 Force provider for a mover assembly of a stage assembly
08/04/2005US20050169767 Method for recycling gases used in a lithography tool
08/04/2005US20050169589 Compositions and methods involving direct write optical lithography
08/04/2005US20050168851 Image forming method and apparatus
08/04/2005US20050168823 Image exposure system
1 ... 646 647 648 649 650 651 652 653 654 655 656 657 658 659 660 661 662 663 664 665 666 ... 1272