| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
|---|
| 08/11/2005 | US20050175940 projecting patterned radiation beams having an exposure wavelength onto a target portion of a substrate, having a layer of light sensitive materials and immersion liquids, that refract the beam as it passes, allows the imaging of smaller features on the substrate |
| 08/11/2005 | US20050175938 hybrid microelectronic device; commercially fabricate a viable integrated capacitor in the thin film industry, using conventional thin film technologies; efficiency, accuracy, low production cost |
| 08/11/2005 | US20050175937 etching the first lower layer pattern having a width of two minimum line width and a space pattern, before doping by halogenation; prevent defects; improve cell voltage difference |
| 08/11/2005 | US20050175936 Chemically amplified resist composition and method for forming patterned film using same |
| 08/11/2005 | US20050175935 Polymer, resist composition, and patterning process |
| 08/11/2005 | US20050175934 Polymerizable photosensitive layer and a protective layer containing polyvinyl alcohol and a polyoxyethylene castor oil ether surfactant on a support; direct plate making of the lithographic printing plate precursor without using a film original |
| 08/11/2005 | US20050175932 Planographic printing plate material, printing plate and printing method |
| 08/11/2005 | US20050175930 comprising an alkali-soluble resins, photopolymerizable monomers, photoinitiators, solvents and a black pigments, having high photosensitivity and forms patterns with good smoothness of edge, high resolution and nonpeeling after development |
| 08/11/2005 | US20050175928 acid generator, additive, and unsaturated hydroxyl-containing monomer; not subject to swelling and/or microbridging when exposed photoresist is dissolved in developer solution, avoiding limited spatial resolution in photolithography |
| 08/11/2005 | US20050175927 Composition for antireflection film formation |
| 08/11/2005 | US20050175926 Coating forming agent for reducing pattern dimension and method of forming fine pattern therewith |
| 08/11/2005 | US20050175925 Photocurable compositions containing reactive particles |
| 08/11/2005 | US20050175908 satisfactory color hue with fading stability such as heat resistance and light resistance; photolithography |
| 08/11/2005 | US20050175787 Plurality of photoresist bottles for storage and plurality of supply pipes are connected to photoresist bottles; valve system selectively opens and closes the supply pipes in response to control signals; automatic |
| 08/11/2005 | US20050175776 illuminators, supports and projectors arranged to transfer pattern onto substrates, and liquid supply system comprising tanks and fluid flow controllers |
| 08/11/2005 | US20050175775 Improving the uniformity of resist layers; includes a rotatable substrate support, a resist supply, a control fluid supply and a controller |
| 08/11/2005 | US20050175497 Temperature control method and apparatus and exposure method and apparatus |
| 08/11/2005 | US20050175472 Liquid medicine supplying device and method for venting air from liquid medicine supplying device |
| 08/11/2005 | US20050175302 Exposure head, exposure apparatus, and application thereof |
| 08/11/2005 | US20050175301 Planar optical waveguide assembly |
| 08/11/2005 | US20050174650 Lighting system, particularly for use in extreme ultraviolet (euv) lithography |
| 08/11/2005 | US20050174649 Micro-lens array substrate and production method therefor, and projection type liquid crystal display unit using those |
| 08/11/2005 | US20050174584 Method and apparatus for high-speed thickness mapping of patterned thin films |
| 08/11/2005 | US20050174583 Method and apparatus for high-speed thickness mapping of patterned thin films |
| 08/11/2005 | US20050174576 Gas discharge MOPA laser spectral analysis module |
| 08/11/2005 | US20050174574 Overlay alignment mark design |
| 08/11/2005 | US20050174557 Exposure pattern forming method and exposure pattern |
| 08/11/2005 | US20050174556 Method, device and computer program product for lithography |
| 08/11/2005 | US20050174555 Electrostatic clamp assembly for a lithographic apparatus |
| 08/11/2005 | US20050174553 Mask-making member and its production method, mask and its making method, exposure process, and fabrication method of semiconductor device |
| 08/11/2005 | US20050174551 Position control and heat dissipation for photolithography systems |
| 08/11/2005 | US20050174550 Lithographic apparatus and device manufacturing method |
| 08/11/2005 | US20050174549 Lithographic apparatus and device manufacturing method |
| 08/11/2005 | US20050174424 Method for manufacturing recording media, method for manufacturing production plate used when manufacturing recording media, apparatus for manufacturing recording media, and apparatus for manufacturing production plate used when manufacturing recording media |
| 08/11/2005 | US20050173762 Thin film transistor, liquid crystal display using thin film transistor, and method of manufacturing thin film transistor |
| 08/11/2005 | US20050173683 Materials, methods, and uses for photochemical generation of acids and/or radical species |
| 08/11/2005 | US20050173682 carrier medium and at least one additive such as alkyl polyglycoside, alkyl alcohol, or various ethylene oxide adducts; use at an operating wavelength ranging from 140 nm to 365 nm |
| 08/11/2005 | US20050173653 Exposure apparatus and method |
| 08/11/2005 | US20050173647 Radiation detector assembly, lithographic apparatus, method of determining an amount of radiation, an intensity of the amount of radiation, or an amount of contamination of an optical element, device manufacturing method, and device manufactured thereby |
| 08/11/2005 | US20050173049 Method and device for transferring a pattern from stamp to a substrate |
| 08/11/2005 | US20050172848 Device and method for transferring a pattern to a substrate |
| 08/11/2005 | US20050172847 Alignment elements for an apparatus for handling printing plates |
| 08/11/2005 | US20050172704 Methods utilizing scanning probe microscope tips and products thereof or produced thereby |
| 08/11/2005 | US20050172703 Scanning probe microscopy inspection and modification system |
| 08/11/2005 | DE10393394T5 Intelligentes integriertes Lithographiesteuerungssystem auf der Grundlage des Produktaufbaus und Ausbeuterückkopplungssystem Intelligent integrated lithography control system on the basis of the product structure and yield feedback system |
| 08/11/2005 | DE10301799B4 Projektionsbelichtungsanlage und Verfahren zur Homogenisierung optischer Eigenschaften einer optischen Komponente Projection exposure apparatus and method for homogenizing optical properties of an optical component |
| 08/11/2005 | DE10241165B4 Stabilisierte infrarotempfindliche Elemente Stabilized infrared-sensitive elements |
| 08/11/2005 | DE10239858B4 Verfahren und Anordnung zur Kompensation von Unebenheiten in der Oberfläche eines Substrates Method and apparatus for compensating for irregularities in the surface of a substrate |
| 08/11/2005 | DE102005000734A1 Verfahren zum Einstellen einer Abweichung einer kritischen Abmessung von Mustern Method for adjusting a deviation of a critical dimension of patterns |
| 08/10/2005 | EP1562080A1 Lithographic apparatus and device manufacturing method |
| 08/10/2005 | EP1562079A2 Projection exposure apparatus and sensor unit |
| 08/10/2005 | EP1562078A2 Polymerizable lithographic printing plate precursor |
| 08/10/2005 | EP1562077A1 Chemically amplified positive photosensitive resin composition |
| 08/10/2005 | EP1562076A2 Mask, exposure method and production method of semiconductor device |
| 08/10/2005 | EP1561597A2 Planographic printing plate material, printing plate and printing method |
| 08/10/2005 | EP1561151A2 Process for using protective layers in the fabrication of electronic devices |
| 08/10/2005 | EP1560664A1 Nanostructured and nanoporous film compositions, structures, and methods for making the same |
| 08/10/2005 | EP1299448B1 Accelerators useful for energy polymerizable compositions |
| 08/10/2005 | EP1228401B1 Step and flash imprint lithography |
| 08/10/2005 | CN1653596A Resist removing apparatus and method of removing resist |
| 08/10/2005 | CN1653595A Resist film removing apparatus, method of removing resist film, organic matter removing apparatus and method of removing organic matter |
| 08/10/2005 | CN1653391A Nanoimprint resist |
| 08/10/2005 | CN1653390A Method for producing a unit having a three-dimensional surface patterning, and use of this method |
| 08/10/2005 | CN1653389A Critical dimension control using full phase and trim masks |
| 08/10/2005 | CN1653388A Patterning semiconductor layers using phase shifting and assist features |
| 08/10/2005 | CN1653359A Objective with crystal lenses |
| 08/10/2005 | CN1653297A High efficiency solid-state light source and methods of use and manufacture |
| 08/10/2005 | CN1652030A Seven freedom positioning mechanism |
| 08/10/2005 | CN1652029A Aligning method for bottom alignment of double face photoetching machine |
| 08/10/2005 | CN1652028A Picture drawing device |
| 08/10/2005 | CN1652027A Method for etching surface of holf club head |
| 08/10/2005 | CN1652026A Organic anti-reflective coating composition and method for forming photoresist pattern using the same |
| 08/10/2005 | CN1652025A Method for reducing pattern dimension in photoresist layer |
| 08/10/2005 | CN1652024A Method for reducing pattern dimension in photoresist layer |
| 08/10/2005 | CN1652023A Method for reducing pattern dimension in photoresist layer |
| 08/10/2005 | CN1652022A Flatness simulation system for mask substrate |
| 08/10/2005 | CN1652021A Raster polarization photomask plate and its application in projection photoetching system |
| 08/10/2005 | CN1652020A 蚀刻掩模 Etching mask |
| 08/10/2005 | CN1652004A TFT array substrate of liquid crystal display, liquid crystal display panel and its mfg. method |
| 08/10/2005 | CN1652000A Liquid crystal display and method for fabricating the same |
| 08/10/2005 | CN1651985A Liquid crystal display device and method for mfg. bottom substrate |
| 08/10/2005 | CN1651962A Deep UV projection photoetching objective lens |
| 08/10/2005 | CN1651512A 可聚合组合物 Polymerizable composition |
| 08/10/2005 | CN1651409A Aryl sulfonium salt, polymerizable composition and polymerization method of the same |
| 08/10/2005 | CN1651155A Device and method for forming coating film |
| 08/10/2005 | CN1214697C Mask and its mfg. method, electroluminance device and its mfg. method |
| 08/10/2005 | CN1214446C Amorphous carbon layer for improved adhesion of photoresist |
| 08/10/2005 | CN1214301C Method for controlling treater |
| 08/10/2005 | CN1214292C Forming method for photoresist design and its laminating products |
| 08/10/2005 | CN1214291C Composite relief image printing elements |
| 08/10/2005 | CN1214290C Method for forming planarization films on matrix, matrix for coating films and film forming composition |
| 08/10/2005 | CN1214289C Composite relief image printing plates and preparing method |
| 08/10/2005 | CN1214288C Photosensitive resin composition, dry type film and processing component using same |
| 08/10/2005 | CN1214287C Black matrix in colour picture tubes and method of producing the black matrix |
| 08/10/2005 | CN1214286C Method of forming optical images, mask for use in this method, method of manufacturing device using this method, and apparatus for carrying out this method |
| 08/10/2005 | CN1214054C Compositions for microlithography |
| 08/10/2005 | CN1213876C Product for lithographic plates |
| 08/09/2005 | US6928636 Rule based OPC evaluating method and simulation-based OPC model evaluating method |
| 08/09/2005 | US6928634 Matrix optical process correction |
| 08/09/2005 | US6928628 Use of overlay diagnostics for enhanced automatic process control |