| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 08/17/2005 | CN1655063A Projection exposure apparatus, device manufacturing method, and sensor unit |
| 08/17/2005 | CN1655062A Method and system for lithographic process window optimization |
| 08/17/2005 | CN1655061A Immersion lithography system, and method of performing irradiation to semiconductor structure having a photoresistive layer |
| 08/17/2005 | CN1655060A Sensitive and radiation resin composite, spacer for display panel and the display panel |
| 08/17/2005 | CN1655059A Photosensitive transfer sheet, photosensitive laminated article, forming method of image pattern and cloth wire pattern |
| 08/17/2005 | CN1655058A Photosensitive transfer sheet |
| 08/17/2005 | CN1655057A Photosensitive semiconductor nanocrystals, photosensitive composition comprising semiconductor nanocrystals and uses thereof |
| 08/17/2005 | CN1655039A Thin film transistor, liquid crystal display using thin film transistor, and method of manufacturing thin film transistor |
| 08/17/2005 | CN1654990A Pigment dispersion inhibitor |
| 08/17/2005 | CN1654534A Method for manufacturing inorganic powder contained resin composition, transfer film and components for display screen |
| 08/17/2005 | CN1215535C Method of manufacturing semiconductor device |
| 08/17/2005 | CN1215533C Method of forming slushing pattern |
| 08/17/2005 | CN1215528C A substrate and a process in connection with the product of structures |
| 08/17/2005 | CN1215383C Hoods for graduated exposure plate method and determining method thereof |
| 08/17/2005 | CN1215382C Antireflective coating material for photoresists |
| 08/17/2005 | CN1215381C Antireflective composition for deep ultraviolet photoresist |
| 08/17/2005 | CN1215380C Conformal photosensitive resin composition and semiconductor device using it |
| 08/17/2005 | CN1215379C Original edition for lithographic printing plate |
| 08/17/2005 | CN1215378C Process for making double inlay structure for preventing positioning error |
| 08/17/2005 | CN1215377C Device for homogeneous heating of an object |
| 08/17/2005 | CN1215376C High-temp heat-stream photoetching method and method for providing technical margins thereof |
| 08/17/2005 | CN1215375C Topcoating composition and method for forming fine pattern using said composition |
| 08/17/2005 | CN1215130C Curable compsn. contg. reactive melamine derivative, cured product, and laminate |
| 08/17/2005 | CN1215099C Polycyclic fluorine-contg. polymers and photoresists for microlithography |
| 08/17/2005 | CN1215094C Organic anti-reflection paint and its preparation |
| 08/17/2005 | CN1215049C Polybenzoxazole resin and precursor thereof |
| 08/17/2005 | CA2496342A1 Printing form having a plurality of planar functional zones |
| 08/16/2005 | US6931619 Apparatus for reshaping a patterned organic photoresist surface |
| 08/16/2005 | US6931361 Real time analysis of periodic structures on semiconductors |
| 08/16/2005 | US6931297 Feature targeted inspection |
| 08/16/2005 | US6931097 Extreme ultraviolet soft x-ray projection lithographic method system and lithographic elements |
| 08/16/2005 | US6930842 Optical element holding device for exposure apparatus |
| 08/16/2005 | US6930838 Variable focus lens by small changes of the equatorial lens diameter |
| 08/16/2005 | US6930837 Optical projection lens system |
| 08/16/2005 | US6930834 Method of manufacturing diffractive optical element |
| 08/16/2005 | US6930762 Master transport apparatus |
| 08/16/2005 | US6930761 Projecting exposure apparatus |
| 08/16/2005 | US6930760 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 08/16/2005 | US6930758 Projection exposure system for microlithography and method for generating microlithographic images |
| 08/16/2005 | US6930757 comprises photoresist films |
| 08/16/2005 | US6930756 Electron beam exposure apparatus and semiconductor device manufacturing method |
| 08/16/2005 | US6930755 Lithographic apparatus and device manufacturing method |
| 08/16/2005 | US6930754 Multiple exposure method |
| 08/16/2005 | US6930753 Lithographic apparatus, device manufacturing method and device manufactured thereby |
| 08/16/2005 | US6930317 Charged particle beam apparatus, charged particle beam irradiation method, and method of manufacturing semiconductor device |
| 08/16/2005 | US6930313 Emission source having carbon nanotube, electron microscope using this emission source, and electron beam drawing device |
| 08/16/2005 | US6929967 Method of forming pattern |
| 08/16/2005 | US6929904 forming a resist image on a microelectronic substrate using a polymer photoresist that is insoluble in water having a pH less than or equal to 7.0, exposing, and using a carbon dioxide solvent to remove exposed portions |
| 08/16/2005 | US6929903 Developing in a state in which the resist dissolution concentration in the developing solution is the estimated dissolution concentration or less; semiconductor manufacturing |
| 08/16/2005 | US6929902 Anti-reflect layer (especially silicon nitride) is interposed between the substrate and the defective photoresist layer; removing the defective layer with oxygen plasma; alkaline solution treatment to react with the anti-reflect layer |
| 08/16/2005 | US6929901 Method for reworking a lithographic process to provide an undamaged and residue free arc layer |
| 08/16/2005 | US6929898 Photopolymers; infrared radiation ablation layer |
| 08/16/2005 | US6929897 Photolithographic addition homopolymer or addition-condensation copolymers, comprising monomer with 1,3-disila-2-oxacyclohexane ring functional group, acid sensitive, photoacid generator, bilayer photoresist stack for forming semiconductos |
| 08/16/2005 | US6929896 Iodonium or sulfonium compounds as photosensitive acid donors in the preparation of colour filters or chemically amplified resists |
| 08/16/2005 | US6929892 Method of monitoring an exposure process |
| 08/16/2005 | US6929891 An endcapped polyamide precursor to a polybenzoxazole, a photoacid generator, a latent crosslinking agent and a solvent that is not NMP (N-Methyl-2-pyrrolidone); NMP has detrimental effects on chemically amplified 248 and 193 nm photoresists |
| 08/16/2005 | US6929890 Positive-type photosensitive resin composition |
| 08/16/2005 | US6929889 Alkenyl or alkyl group containing 50-200 carbon atoms attached to pigment through an arylene, heteroarylene, or alkylene group and a spacer group, e.g., a polyisobutenylsuccinimidylphenyl group |
| 08/16/2005 | US6929888 Liquid crystal display; photolithography; radiation transparent substrate, adjustment of masking patterns |
| 08/16/2005 | US6929887 Printable assist lines and the removal of such |
| 08/16/2005 | US6929886 Method and apparatus for the manufacturing of reticles |
| 08/16/2005 | US6929828 Preparing a photocurable formulation comprising an ethylenically unsaturated polymerizable compound and photoinitiator; applying the formulation to a substrate; curing by irradiation with electromagnetic radiation |
| 08/16/2005 | US6929821 Process for forming a pattern of fluorescent substrate and plasma display panel |
| 08/16/2005 | US6929762 Method of reducing pattern distortions during imprint lithography processes |
| 08/16/2005 | US6929257 Slip sheet capture mechanism and method of operation |
| 08/16/2005 | US6928746 Drying resist with a solvent bath and supercritical CO2 |
| 08/11/2005 | WO2005074015A1 Method and device for supporting plate member, stage device, exposure device, and method of manufacturing device |
| 08/11/2005 | WO2005074014A1 Stage drive method and stage drive apparatus, exposure apparatus, and device producing method |
| 08/11/2005 | WO2005073813A2 Condenser optic with sacrificial reflective surface |
| 08/11/2005 | WO2005073812A1 Photoresist composition for photomask, method for forming resist pattern and method for manufacturing photomask |
| 08/11/2005 | WO2005073811A1 Positive resist composition and method of forming resist pattern |
| 08/11/2005 | WO2005073810A1 Negative resist composition and method for forming resist pattern |
| 08/11/2005 | WO2005073809A1 Photosensitive inorganic paste composition, sheet-shaped unbaked body, and method of producing plasma display front plate |
| 08/11/2005 | WO2005073808A2 Process of producing microcapsules and product thereof |
| 08/11/2005 | WO2005073807A1 Computer-implemented methods for detecting defects in reticle design data |
| 08/11/2005 | WO2005073805A2 Composition comprising microcapsules |
| 08/11/2005 | WO2005073668A1 A method for measuring the position of a mark in a deflector system |
| 08/11/2005 | WO2005073592A1 Actuator arrangement for active vibration isolation using a payload as an inertial reference mass |
| 08/11/2005 | WO2005073208A1 Piperazino sensitisers |
| 08/11/2005 | WO2005072235A2 Structured materials and methods |
| 08/11/2005 | WO2005072120A2 Materials and methods for imprint lithography |
| 08/11/2005 | WO2005047980A3 Monolithic silicon euv collector |
| 08/11/2005 | WO2005043250A3 Process for the use of bis-choline and tris-choline in the cleaning of quartz-coated polysilicon and other materials |
| 08/11/2005 | WO2005040929A3 Apparatus for and method of forming optical images |
| 08/11/2005 | WO2005031030A3 Method for plasma treating a surface |
| 08/11/2005 | WO2004092844A3 Optical element for a lighting system |
| 08/11/2005 | WO2004025367A3 Method for manufacturing and controlling structures and patterns of soluble and colloidal substances by printing on the micrometer and nanometer scale and with reduction of the dimensions of the stamp's features |
| 08/11/2005 | US20050177810 Lithographic process window optimization under complex constraints on edge placement |
| 08/11/2005 | US20050177326 Method and device for data integrity checking |
| 08/11/2005 | US20050177268 Design system for delivering data, system for fabricating a semiconductor device, method of communicating writing data, method for fabricating a semiconductor device |
| 08/11/2005 | US20050176607 Thinner composition and method of removing photoresist using the same |
| 08/11/2005 | US20050176605 polyether surfactants used to reduce surface tension of aqueous or nonaqueous process solutions |
| 08/11/2005 | US20050176603 cleaning microelectronic substrates, and particularly cleaning compositions useful with and having improved compatibility with microelectronic substrates characterized by silicon dioxide, sensitive low- kappa or high- kappa dielectrics and copper, tungsten, tantalum, nickel, gold, cobalt |
| 08/11/2005 | US20050176602 Cleaning compositions suitable for cleaning microelectronic structures having silicon dioxide, low-k or high-k di-electrics and copper or aluminum metallizations contain a polar organic solvent selected from amides, sulfones, sulfolenes, selenones and saturated alcohols and a strong alkaline base. |
| 08/11/2005 | US20050176572 Synthetic quartz glass |
| 08/11/2005 | US20050176259 Method for removing photoresist |
| 08/11/2005 | US20050176254 Pattern forming method and manufacturing method of semiconductor device |
| 08/11/2005 | US20050176182 Forming a plurality of thin-film devices |
| 08/11/2005 | US20050176174 Methodof making an integrated circuit |
| 08/11/2005 | US20050175942 Exposing to infrared radiation, a presensitized plate comprising substrate and image recording layer formed thereon which comprises novolak resin containing xylenol monomer; alkaline developer comprises polyoxyalkylene adduct of alkylene diamine and anionic surfactant |