Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
08/2005
08/18/2005WO2005076045A1 Polarization conversion element, lighting optical device, exposure system, and exposure method
08/18/2005WO2005075446A1 Unsaturated carboxylic acid hemiacetal ester, polymer, and resin composition for photoresist
08/18/2005WO2005074606A2 Method of photolithography using a fluid and a system thereof
08/18/2005WO2005074499A2 Processless digitally imaged photopolymer elements using microspheres
08/18/2005WO2005043244A3 Methods and systems for controlling radiation beam characteristics for microlithographic processing
08/18/2005WO2005015316A3 Projection objective for microlithography
08/18/2005WO2005000912A3 Novel positive photosensitive resin compositions
08/18/2005WO2004111730A3 Developer composition for resists and method for formation of resist pattern
08/18/2005WO2004104708A3 Seal and support structure for semiconductor wafer
08/18/2005WO2003061354A3 System and methods for conveying and transporting levitated articles
08/18/2005US20050183056 Simulator of lithography tool, simulation method, and computer program product for simulator
08/18/2005US20050182593 Wafer target design and method for determining centroid of wafer target
08/18/2005US20050181711 Substrate confinement apparatus and method
08/18/2005US20050181629 Fibrillar microstructure and processes for the production thereof
08/18/2005US20050181571 Method and apparatus for forming patterned photoresist layer
08/18/2005US20050181314 Light emitting diodes; semiconductor lasers
08/18/2005US20050181313 Method for forming openings in a substrate using a packing and unpacking process
08/18/2005US20050181312 Patterning a workpiece covered with a layer sensitive to electromagnetic radiation by concurrently using a plurality of exposure beams having a predetermined separation; reducing compact disk errors
08/18/2005US20050181311 capable of preventing deformation of a lens plan shape; transferring the convex lens shape of each of the plurality of convex lenses to the principal surface of the translucent substrate by dry etching
08/18/2005US20050181310 Method for etching metal surface of golf club head
08/18/2005US20050181308 Preparation method of printing plate material and printing plate material
08/18/2005US20050181306 Light-sensitive lithographic printing plate precursor
08/18/2005US20050181305 titanocene compound, pyridine compound, and cyan compound; for lithographic printing plate precursor highly sensitive to oscillation wavelength semiconductor laser
08/18/2005US20050181304 Method of forming fine pattern
08/18/2005US20050181303 Comprises support and photopolymerizable layer for imaging by scanning with laser beam
08/18/2005US20050181302 comprising hydrophilic supports having image forming layers containing thermoplastic resin microstructure particles and light to heat conversion materials
08/18/2005US20050181301 High printing durability, employing a near infrared light
08/18/2005US20050181300 Photobase generator and curable composition
08/18/2005US20050181299 Coating compositions
08/18/2005US20050181298 Compositions for positive heat sensitive lithographic pringting plates
08/18/2005US20050181297 Novel photosensitive resin compositions
08/18/2005US20050181293 Imprinting device and substrate holding device thereof
08/18/2005US20050181288 Photolithography; reticles
08/18/2005US20050181187 Printing form having a plurality of planar functional zones
08/18/2005US20050181132 Methods utilizing scanning probe microscope tips and products therefor or produced thereby
08/18/2005US20050181089 a preform comprising a nickel base and a semi-crosslinked photoresist layer and a prebaked photoresist layer containing a methoxymethyl melamine; compact and digital video disks
08/18/2005US20050180744 Developing apparatus and method
08/18/2005US20050180712 Photoimageable waveguide composition and waveguide formed therefrom
08/18/2005US20050180692 Exposure head, exposure apparatus, and application thereof
08/18/2005US20050180023 Method of optimizing an objective with fluoride crystal lenses, and objective with fluoride crystal lenses
08/18/2005US20050180011 Objective with pupil obscuration
08/18/2005US20050180008 Stationary and dynamic radial transverse electric polarizer for high numerical aperture systems
08/18/2005US20050179994 Catadioptric imaging system for high numerical aperture imaging with deep ultraviolet light
08/18/2005US20050179909 Lithographic apparatus, device manufacturing method, and method for determining z-displacement
08/18/2005US20050179898 Position detection method and apparatus, and exposure method and apparatus
08/18/2005US20050179886 Method of predicting and minimizing model OPC deviation due to mix/match of exposure tools using a calibrated eigen decomposition model
08/18/2005US20050179885 Light irradiation apparatus, light irradiation method, crystallization apparatus, crystallization method, device, and light modulation element
08/18/2005US20050179884 Lithographic apparatus and device manufacturing method
08/18/2005US20050179883 System for automated focus measuring of a lithography tool
08/18/2005US20050179882 Lithographic apparatus and device manufacturing method
08/18/2005US20050179881 Exposure apparatus and method
08/18/2005US20050179880 Lithographic apparatus and device manufacturing method with feed-forward focus control
08/18/2005US20050179879 Lithographic apparatus, interferometer and device manufacturing method
08/18/2005US20050179877 Lithographic apparatus and device manufacturing method
08/18/2005US20050179772 Exposure head, exposure, apparatus, and application thereof
08/18/2005US20050179036 Semiconductor device and manufacturing method thereof, liquid crystal television system, and EL television system
08/18/2005US20050178979 Light generator and exposure apparatus
08/18/2005US20050178944 Method for optically detecting deviations of an image plane of an imaging system from the surface of a substrate
08/18/2005US20050178752 Method and device for correcting pattern film on a semiconductor substrate
08/18/2005US20050178401 applying heated ozone-solvent solution to the material at the elevated pressure; reduces the rate of loss of ozone from the ozone-solvent solution resulting from heating the ozone-solvent solution
08/18/2005US20050178280 Imprinting apparatus with independently actuating separable modules
08/18/2005DE10258423B4 Verfahren zur Charakterisierung eines Linsensystems A method for characterizing a lens system
08/18/2005DE102004003340A1 Flat substrate comprises a surface with structured elements that form a macro-structure, and a micro-structure which forms a second structure element
08/18/2005DE102004003143A1 Strahlungsempfindliche Zusammensetzungen mit mercapto-funktionalisierten, radikalisch polymerisierbaren Monomeren Radiation-sensitive compositions with mercapto-functionalized, free-radically polymerizable monomers
08/17/2005EP1564793A1 Exposure device, exposure method, and semiconductor device manufacturing method
08/17/2005EP1564756A2 An integral lens for a particle flux of high energies, a method of producing such lenses and their usage in analytical devices, devices for radiotherapy and lithography
08/17/2005EP1564734A1 Method for producing stamper used for producing optical disc and optical disc producing method
08/17/2005EP1564595A2 Composition for cleaning microelectronic substrates containing halogen oxygen acids and derivatives thereof
08/17/2005EP1564594A1 Projection lens sytem for microlithography
08/17/2005EP1564593A2 Exposure apparatus and exposure method
08/17/2005EP1564592A1 Protection of resist for immersion lithography technique
08/17/2005EP1564591A2 Polymerizable composition
08/17/2005EP1564590A2 Photosensitive composition
08/17/2005EP1564589A1 Photosensitive lithographic printing plate precursor
08/17/2005EP1564259A1 Azo dye, colored curable composition, color filter and producing method therefor
08/17/2005EP1564255A1 Photobase generator and curable composition
08/17/2005EP1564232A1 Photosensitive resin composition and process for the formation of hydrogel
08/17/2005EP1564020A1 Printing plate precursor material
08/17/2005EP1563992A2 Printing plate with several functional layers
08/17/2005EP1563343A1 Antireflective compositions for photoresists
08/17/2005EP1563119A1 Apparatus and method for deposition of an electrophoretic emulsion
08/17/2005EP1458794B1 Heat-curable resin composition
08/17/2005EP1451642A4 Chemical rinse composition
08/17/2005EP1212151A4 Process and apparatus for treating a workpiece such as a semiconductor wafer
08/17/2005EP0873573B1 Electron sources utilizing negative electron affinity photocathodes with ultra-small emission areas
08/17/2005CN1656601A Semiconductor manufacturing method and device thereof
08/17/2005CN1656428A Radiation-sensitive resin composition, patterned resin film, method for formation of the film, and use thereof
08/17/2005CN1656427A Photosensitive resin composition and method for preparing heat-resistant resin film
08/17/2005CN1656426A Selected acid generating agents and their use in processes for imaging radiation-sensitive elements
08/17/2005CN1656425A Method of passivating of low dielectric materials in wafer processing
08/17/2005CN1656423A Method for producing photoresist masks for structuring semiconductor substrates by means of optical lithography
08/17/2005CN1656398A Photocurable resin composition for forming overcoats, rgb pixels, black matrixes or spacers in color filter production, and color filters
08/17/2005CN1656206A Ammonia-free alkaline microelectronic cleaning compositions with improved substrate compatibility
08/17/2005CN1656132A Anti-reflective coatings and dual damascene fill compositions comprising styrene-allyl alcohol copolymers
08/17/2005CN1656129A Photo-crosslinkable multi-coating system having improved gas-barrier properties
08/17/2005CN1656127A Thiol compound, photopolymerization initiator composition and photosensitive composition
08/17/2005CN1655932A Stabilized infrared-sensitive polymerizable systems
08/17/2005CN1655341A Forming a plurality of thin-film devices
08/17/2005CN1655065A Thinner composition and method of removing photoresist using the same
08/17/2005CN1655064A In-situ detection method for stray light in step scan projection mask aligner