Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
08/2005
08/24/2005EP1566692A1 Photosensitive composition and pattern-forming method using the photosensitive composition
08/24/2005EP1566691A2 Method for correcting mask pattern, exposure mask, and mask producing method
08/24/2005EP1566663A2 EUV light spectrum measuring apparatus and calculating method of EUV light intensity
08/24/2005EP1566472A2 Production of low stress non-(111) oriented large volume single crystals with low stress related birefringence and homogenous refractive index, as well as their application
08/24/2005EP1566471A2 Production of low stress, large volume crystals with low stress related birefringence and homogenous refractive index and application thereof
08/24/2005EP1566469A2 Process for producing a large volume CaF2 single crystal with a low scattering and improved laser stability, as well as such a crystal and its application
08/24/2005EP1566422A1 Uv-cure adhesive composition for optical disk, cured material and goods
08/24/2005EP1566283A1 Light-sensitive lithographic printing plate precursor
08/24/2005EP1566267A2 Planographic printing method and planographic printing plate precursor used therein
08/24/2005EP1565791A2 Method for the removal of organic residues from finely structured surfaces
08/24/2005EP1565790A1 Radiation-sensitive elements and their storage stability
08/24/2005EP1565789A2 Photosensitive resin composition comprising a halogen-free colorant
08/24/2005EP1565788A1 Photopolymer composition suitable for lithographic printing plates
08/24/2005EP1565787A2 Template
08/24/2005EP1565769A1 Projection lens with non- round diaphragm for microlithography
08/24/2005EP1269266A4 A method of improving photomask geometry
08/24/2005CN2720487Y Table-top light figuring device based on ultraviolet ray semiconductor light source
08/24/2005CN1659937A Descriptive device and descriptive method
08/24/2005CN1659691A Replication and transfer of microstructures and nanostructures
08/24/2005CN1659481A Microelectronic cleaning compositions containing oxidant and organic solvent
08/24/2005CN1659480A Cleaning compositions for microelectronic substation
08/24/2005CN1659479A Exposure head, exposure apparatus, and application thereof
08/24/2005CN1659478A Method and device for imaging a mask onto a substrate
08/24/2005CN1659477A Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds
08/24/2005CN1659476A Selected polymeric sulfonate acid generators and their use in processes for imaging radiation-sensitive elements
08/24/2005CN1659430A Holographic sensor based on a volume hologram in a porous medium
08/24/2005CN1659417A A system and method for manufacturing printed circuit boards employing non-uniformly modified images
08/24/2005CN1659204A Actinic radiation curable compositions and their use
08/24/2005CN1659175A Multimer forms of mono- and bis-acylphosphine oxides
08/24/2005CN1658738A Wet filming method of flexible printed circuit
08/24/2005CN1658380A Load-lock technique
08/24/2005CN1658373A Light irradiation apparatus, light irradiation method, crystallization apparatus, crystallization method, device, and light modulation element
08/24/2005CN1658076A Method of manufacturing reliability checking and verification for lithography process using a calibrated eigen decomposition model
08/24/2005CN1658075A Exposure device
08/24/2005CN1658074A Multifreedom motion and positioning device
08/24/2005CN1658073A Lithographic apparatus and device manufacturing method with feed-forward focus control
08/24/2005CN1658072A Lithographic apparatus and device manufacturing method
08/24/2005CN1658071A Overlay mark for measuring and correcting alignment errors
08/24/2005CN1658069A Preparation method of nano mould in nano-seal technology
08/24/2005CN1658068A Photolithographic process, photomask and manufacturing thereof
08/24/2005CN1658052A Semiconductor device and manufacturing method thereof, liquid crystal television system, and EL television system
08/24/2005CN1658037A Manufacturing method of light board
08/24/2005CN1658026A Reflection liquid crystal display device and its manufacturing method
08/24/2005CN1658007A Microelectromechanical optical display subass embly
08/24/2005CN1657979A Color filter materials, color filters, manufacturing method and image sensor
08/24/2005CN1657865A System and method of using a side-mounted interferometer to acquire position information
08/24/2005CN1657530A Multi-functional linear siloxane compound, a siloxane polymer prepared from the compound, and a process for forming a dielectric film by using the polymer
08/24/2005CN1657456A Synthetic silica glass member, photolithography apparatus and process for producing photolithography apparatus
08/24/2005CN1657313A Printing form having a plurality of planar functional zones
08/24/2005CN1216403C Exposure method
08/24/2005CN1216320C Radiation sensitive refractivity change composition and method for changing refractivity
08/24/2005CN1216319C Photosensitive planographic plate
08/23/2005US6934930 Generating an optical model for lens aberrations
08/23/2005US6934929 Method for improving OPC modeling
08/23/2005US6934038 Method for optical system coherence testing
08/23/2005US6934011 Method for optimizing the image properties of at least two optical elements as well as methods for optimizing the image properties of at least three optical elements
08/23/2005US6934010 Optical proximity correction method utilizing gray bars as sub-resolution assist features
08/23/2005US6934009 Illumination apparatus, illumination-controlling method, exposure apparatus, device fabricating method
08/23/2005US6934008 Multiple mask step and scan aligner
08/23/2005US6934006 Exposure apparatus and exposure method for use in forming a pattern of a semiconductor device
08/23/2005US6934005 Reticle focus measurement method using multiple interferometric beams
08/23/2005US6934004 Exposure apparatus, semiconductor device manufacturing method, maintenance method of exposure apparatus, and semiconductor manufacturing factory
08/23/2005US6934003 Exposure apparatus and device manufacturing method
08/23/2005US6933715 Sensor system for sensing movement
08/23/2005US6933513 Gas flushing system for use in lithographic apparatus
08/23/2005US6933510 Radiation source, lithographic apparatus, and device manufacturing method
08/23/2005US6933247 Method for forming a minute pattern and method for manufacturing a semiconductor device using the same
08/23/2005US6933236 Method for forming pattern using argon fluoride photolithography
08/23/2005US6933100 Method of forming a minute resist pattern
08/23/2005US6933097 comprises polysiloxane copolymers; wet etching; photoresists
08/23/2005US6933096 Photosensitive polymer including fluorine, resist composition containing the same and patterning method using the resist composition
08/23/2005US6933095 Polymers, resist compositions and patterning process
08/23/2005US6933094 A positive-tone radiation-sensitive resin comprising a copolymer which comprises a recurring unit of styrinic phenol, a substituted acrylamide or methacrylamide unit, and a 4-10 tertiary alkyloxy substituted styrene unit; and a photoacid
08/23/2005US6933093 Radiation sensitive coating composition useful for lithographic printing plates and the like
08/23/2005US6933087 Precursor composition for positive photosensitive resin and display made with the same
08/23/2005US6933084 Alternating aperture phase shift photomask having light absorption layer
08/23/2005US6933083 Selecting an intended modified form of illumination that the phase grating is to provide in a photolithography; dividing into subcells; arbitrarily assigning one of a plurality of phase values to the subcells, randomly selecting mask system
08/23/2005US6933082 Photomask with dust-proofing device and exposure method using the same
08/23/2005US6933017 Method of manufacturing lithographic printing plate
08/23/2005US6933015 Moving coating solution discharge member relative to substrate while solution is being discharged to surface and changing discharge direction of solution to outer periphery to decrease amount of application there; uniformity; photolithography
08/23/2005US6932258 Gaming device and method
08/23/2005US6932145 Method and apparatus for production of a cast component
08/23/2005US6931992 Combined ablation and exposure system and method
08/23/2005US6931991 System for and method of manufacturing gravure printing plates
08/23/2005CA2328854C Ticket dispensing modules and method
08/18/2005WO2005076325A1 Exposure equipment and method, position control method and device manufacturing method
08/18/2005WO2005076324A1 Exposure apparatus, exposure method, and device producing method
08/18/2005WO2005076323A1 Aligner, device manufacturing method, maintenance method and aligning method
08/18/2005WO2005076322A1 Aligner and semiconductor device manufacturing method using the aligner
08/18/2005WO2005076321A1 Exposure apparatus and method of producing device
08/18/2005WO2005076084A1 Projection objective for a microlithographic projection exposure apparatus
08/18/2005WO2005076083A1 Illumination system for a microlithographic projection exposure apparatus
08/18/2005WO2005076082A1 Photosensitive printing sleeves and method of forming the same
08/18/2005WO2005076081A2 Reticle fabrication using a removable hard mask
08/18/2005WO2005076080A1 Photosensitive resin composition, photosensitive element comprising the same, process for producing resist pattern, and process for producing printed wiring board
08/18/2005WO2005076079A1 Photosensitive resin composition and cured product thereof
08/18/2005WO2005076076A2 Directly photodefinable polymer compositions and methods thereof
08/18/2005WO2005076075A2 Adaptive real time control of a reticle/mask system
08/18/2005WO2005076074A2 Functionalized photoinitiators
08/18/2005WO2005076060A1 Column spacer, liquid crystal display element and curable resin composition for column spacer